专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06724199B1 Pin and cup devices for measuring film thickness 失效
标题翻译：针和杯装置用于测量膜厚度
公开(公告)号：US06724199B1
公开(公告)日：2004-04-20
申请号：US10165690
申请日：2002-06-07
申请人： Bharat Bhushan , Christopher D. Hahm
发明人： Bharat Bhushan , Christopher D. Hahm
IPC分类号： G01R2726
CPC分类号： H02J1/10 , G01Q10/06 , G11B2005/001
摘要： Capacitive film thickness measurement devices and measurement systems used in machines or instruments. A capacitance measurement device and technique useful in determining lubricant film thickness on substrates such as magnetic thin-film rigid disks. Variations in lubricant thickness on the Angstrom scale or less may be measured quickly and nondestructively.
摘要翻译：用于机器或仪器的电容薄膜厚度测量装置和测量系统。一种用于确定诸如磁性薄膜刚性盘的衬底上的润滑剂膜厚度的电容测量装置和技术。润滑剂厚度的变化在埃刻度或更小可以快速和非破坏性地测量。

2. 发明授权

US06756791B1 Method for measuring film thickness using capacitance technique 失效
标题翻译：使用电容技术测量膜厚度的方法
公开(公告)号：US06756791B1
公开(公告)日：2004-06-29
申请号：US10165497
申请日：2002-06-07
申请人： Bharat Bhushan , Christopher D. Hahm
发明人： Bharat Bhushan , Christopher D. Hahm
IPC分类号： G01R2726
CPC分类号： H02J1/10 , G01Q10/06 , G11B2005/001
摘要： The present invention includes capacitive film thickness measurement devices and measurement systems. The invention also includes machines or instruments using those aspects of the invention. The present invention additionally includes methods and procedures using those devices of the present invention. The present invention discloses a capacitance measurement device and technique useful in determining lubricant film thickness on substrates such as magnetic thin-film rigid disks. Using the present invention, variations in lubricant thickness on the Angstrom scale or less may be measured quickly and nondestructively.
摘要翻译：本发明包括电容膜厚度测量装置和测量系统。本发明还包括使用本发明的这些方面的机器或仪器。本发明另外包括使用本发明的那些装置的方法和程序。本发明公开了一种用于确定诸如磁性薄膜刚性盘的衬底上的润滑剂膜厚度的电容测量装置和技术。使用本发明，可以快速且非破坏性地测量润滑剂厚度在埃刻度或更小的变化。

3. 发明授权

US06504386B1 Liquid dielectric capacitor for film thickness mapping, measurement methods using same 失效
标题翻译：液体介质电容器用于膜厚度测绘，测量方法采用相同方式
公开(公告)号：US06504386B1
公开(公告)日：2003-01-07
申请号：US09422376
申请日：1999-10-21
申请人： Bharat Bhushan , Christopher D. Hahm
发明人： Bharat Bhushan , Christopher D. Hahm
IPC分类号： G01R2726
CPC分类号： H02J1/10 , G01Q10/06 , G11B2005/001
摘要： The present invention includes capacitive film thickness measurement devices and measurement systems used in machines or instruments. A capacitance measurement device and technique useful in determining lubricant film thickness on substrates such as magnetic thin-film rigid disks. Using the present invention, variations in lubricant thickness on the Angstrom scale or less may be measured quickly and nondestructively.
摘要翻译：本发明包括用于机器或仪器中的电容膜厚度测量装置和测量系统。一种用于确定诸如磁性薄膜刚性盘的衬底上的润滑剂膜厚度的电容测量装置和技术。使用本发明，可以快速且非破坏性地测量润滑剂厚度在埃刻度或更小的变化。

4. 发明授权

US06459280B1 Capacitance devices for film thickness mapping, measurement methods using same 失效
标题翻译：电容器用于膜厚测绘，测量方法采用相同的方法
公开(公告)号：US06459280B1
公开(公告)日：2002-10-01
申请号：US09619831
申请日：2000-07-20
申请人： Bharat Bhushan , Christopher D. Hahm
发明人： Bharat Bhushan , Christopher D. Hahm
IPC分类号： G01R2726
CPC分类号： H02J1/10 , G11B2005/001
摘要： The present invention includes capacitive film thickness measurement devices and measurement systems. The invention also includes machines or instruments using those aspects of the invention. The present invention additionally includes methods and procedures using those devices of the present invention. The present invention discloses a capacitance measurement device and technique useful in determining lubricant film thickness on substrates such as magnetic thin-film rigid disks. Also disclosed is a device and technique for determining film thickness by suspending the film in a liquid dielectric. Using the present invention, variations in lubricant thickness on the Angstrom scale or less may be measured quickly and nondestructively.
摘要翻译：本发明包括电容膜厚度测量装置和测量系统。本发明还包括使用本发明的这些方面的机器或仪器。本发明另外包括使用本发明的那些装置的方法和程序。本发明公开了一种用于确定诸如磁性薄膜刚性盘的衬底上的润滑剂膜厚度的电容测量装置和技术。还公开了通过将膜悬浮在液体电介质中来确定膜厚度的装置和技术。使用本发明，可以快速且非破坏性地测量润滑剂厚度在埃刻度或更小的变化。

5. 发明授权

US06717419B1 Liquid dielectric capacitor for film thickness mapping 失效
标题翻译：液体介质电容器用于膜厚度映射
公开(公告)号：US06717419B1
公开(公告)日：2004-04-06
申请号：US10165687
申请日：2002-06-07
申请人： Bharat Bhushan , Christopher D. Hahm
发明人： Bharat Bhushan , Christopher D. Hahm
IPC分类号： G01R2726
CPC分类号： H02J1/10 , G01Q10/06 , G11B2005/001
摘要： The present invention includes capacitive film thickness measurement devices and measurement systems. The invention also includes machines or instruments using those aspects of the invention. The present invention additionally includes methods and procedures using those devices of the present invention. The present invention discloses a capacitance measurement device and technique useful in determining lubricant film thickness on substrates such as magnetic thin-film rigid disks. Using the present invention, variations in lubricant thickness on the Angstrom scale or less may be measured quickly and nondestructively.
摘要翻译：本发明包括电容膜厚度测量装置和测量系统。本发明还包括使用本发明的这些方面的机器或仪器。本发明另外包括使用本发明的那些装置的方法和程序。本发明公开了一种用于确定诸如磁性薄膜刚性盘的衬底上的润滑剂膜厚度的电容测量装置和技术。使用本发明，可以快速且非破坏性地测量润滑剂厚度在埃刻度或更小的变化。

6. 发明授权

US09606926B2 System for pre-fetching data frames using hints from work queue scheduler 有权
公开(公告)号：US09606926B2
公开(公告)日：2017-03-28
申请号：US14556143
申请日：2014-11-29
申请人： Vakul Garg , Bharat Bhushan
发明人： Vakul Garg , Bharat Bhushan
IPC分类号： G06F12/00 , G06F12/0862
CPC分类号： G06F12/0862 , G06F2212/1021 , G06F2212/6028
摘要： A system for pre-fetching a data frame from a system memory to a cache memory includes a processor, a queue manager, and a pre-fetch manager. The processor issues a de-queue request associated with the data frame. The queue manager receives the de-queue request, identifies a frame descriptor associated with the data frame, and generates a pre-fetch hint signal. The pre-fetch manager receives the pre-fetch hint signal and generates a pre-fetch signal and enables the cache memory to pre-fetch the data frame. Subsequently, the queue manager de-queues the frame descriptor. The processor receives the frame descriptor and reads the data frame from the cache memory.

7. 发明申请

US20160154737A1 SYSTEM FOR PRE-FETCHING DATA FRAMES USING HINTS FROM WORK QUEUE SCHEDULER 有权
标题翻译：用于使用工作队列调度员的提示来预先切断数据框架的系统
公开(公告)号：US20160154737A1
公开(公告)日：2016-06-02
申请号：US14556143
申请日：2014-11-29
申请人： Vakul Garg , Bharat Bhushan
发明人： Vakul Garg , Bharat Bhushan
IPC分类号： G06F12/08
CPC分类号： G06F12/0862 , G06F2212/1021 , G06F2212/6028
摘要： A system for pre-fetching a data frame from a system memory to a cache memory includes a processor, a queue manager, and a pre-fetch manager. The processor issues a de-queue request associated with the data frame. The queue manager receives the de-queue request, identifies a frame descriptor associated with the data frame, and generates a pre-fetch hint signal. The pre-fetch manager receives the pre-fetch hint signal and generates a pre-fetch signal and enables the cache memory to pre-fetch the data frame. Subsequently, the queue manager de-queues the frame descriptor. The processor receives the frame descriptor and reads the data frame from the cache memory.
摘要翻译：用于将数据帧从系统存储器预取入高速缓冲存储器的系统包括处理器，队列管理器和预取管理器。处理器发出与数据帧相关联的解除队列请求。队列管理器接收去队列请求，识别与数据帧相关联的帧描述符，并生成预取提示信号。预取管理器接收预取提示信号并产生预取信号，并使缓存存储器能够预取数据帧。随后，队列管理器对帧描述符进行排队。处理器接收帧描述符并从高速缓冲存储器读取数据帧。

8. 发明授权

US07886238B1 Visual yield analysis of intergrated circuit layouts 有权
标题翻译：集成电路布局的视觉产量分析
公开(公告)号：US07886238B1
公开(公告)日：2011-02-08
申请号：US11564223
申请日：2006-11-28
申请人： Harsh Dev Sharma , Rajeev Srivastava , Srinivas R. Kommoori , Bharat Bhushan , Mithunjoy Parui , Albert Lee
发明人： Harsh Dev Sharma , Rajeev Srivastava , Srinivas R. Kommoori , Bharat Bhushan , Mithunjoy Parui , Albert Lee
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G06F2217/12 , Y02P90/265
摘要： Systems and methods to optimize a layout based on the yield analysis is disclosed. The method includes generating an integrated circuit layout having two or more layers of wire interconnect to form net segments and having one or more via contact layers to couple net segments in the wire interconnect together. The method further includes performing a yield analysis of the net segments in the integrated circuit layout and displaying the net segments with a visual depiction of the yield analysis using multiple levels of opacity to reflect yield scores of the net segments in the integrated circuit layout.
摘要翻译：公开了基于产量分析优化布局的系统和方法。该方法包括生成具有两层或更多层导线互连的集成电路布局，以形成网段，并且具有一个或多个通孔接触层以将导线互连中的网段耦合在一起。该方法还包括对集成电路布局中的网段执行收益率分析，并使用多个不透明度级别对收益率分析的视觉描绘来显示净段以反映集成电路布局中的网段的收益率。

9. 发明授权

US07600208B1 Automatic placement of decoupling capacitors 失效
标题翻译：自动放置去耦电容
公开(公告)号：US07600208B1
公开(公告)日：2009-10-06
申请号：US11669872
申请日：2007-01-31
申请人： Harsh Dev Sharma , Rajeev Srivastava , Srivinas R. Kommoori , Bharat Bhushan , Mithunjoy Parui , Albert Lee
发明人： Harsh Dev Sharma , Rajeev Srivastava , Srivinas R. Kommoori , Bharat Bhushan , Mithunjoy Parui , Albert Lee
IPC分类号： G06F17/50
CPC分类号： G06F17/5036 , G06F17/5068
摘要： Disclosed are methods, systems and apparatus for automatically placing decoupling capacitors in an integrated circuit to compensate for voltage drops that might otherwise occur in a power grid. In one embodiment of the invention, the method includes generating one or more regions of the integrated circuit design, with each region having one or more cells, determining an amount of decoupling capacitance required in each region of the integrated circuit design by analyzing each cell in the region, and adding sufficient decoupling capacitor cells to the region to compensate for the potential voltage drop.
摘要翻译：公开了用于在集成电路中自动放置去耦电容器以补偿电网中可能出现的电压降的方法，系统和装置。在本发明的一个实施例中，该方法包括生成集成电路设计的一个或多个区域，每个区域具有一个或多个单元，通过分析集成电路设计的每个单元来确定集成电路设计的每个区域中所需的去耦电容量并且向该区域添加足够的去耦电容器单元以补偿潜在的电压降。

10. 发明授权

US07023220B2 Method for measuring nm-scale tip-sample capacitance 失效
标题翻译：测量nm尺度尖端样品电容的方法
公开(公告)号：US07023220B2
公开(公告)日：2006-04-04
申请号：US10967930
申请日：2004-10-19
申请人： Jonathan P. Pelz , David T. Lee , Bharat Bhushan
发明人： Jonathan P. Pelz , David T. Lee , Bharat Bhushan
IPC分类号： G01R27/26
CPC分类号： G01Q60/46 , G01R27/2605 , Y10S977/866
摘要： A method for measuring nm-scale tip-sample capacitance including (a) measuring a cantilever deflection and a change in probe-sample capacitance relative to a reference level as a function of a probe assembly height; (b) fitting out-of-contact data to a function; (c) subtracting the function from capacitance data to get a residual capacitance as a function of the probe assembly height; and (d) determining the residual capacitance at a z-position where the cantilever deflection is zero.
摘要翻译：一种用于测量nm尺度尖端样本电容的方法，包括（a）测量悬臂偏转和相对于参考水平的探针样品电容的变化，作为探针组件高度的函数; （b）将不合格数据拟合到一个功能上; （c）从电容数据中减去该功能，以获得作为探头组件高度的函数的残余电容; 和（d）确定悬臂偏转为零的z位置处的残余电容。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式