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    • 3. 发明申请
    • Apparatus and method for treating disc-shaped substrates
    • 用于处理盘形基板的装置和方法
    • US20050178504A1
    • 2005-08-18
    • US10501256
    • 2002-12-20
    • Ulrich SpehEberhard Nagele
    • Ulrich SpehEberhard Nagele
    • B08B3/02H01L21/00B44C1/22C23F1/00
    • H01L21/6708B08B3/02H01L21/67051
    • In order to carry out simple, low-cost, uniform treatment of substrates, a device is provided for the processing of disk-shaped substrates, especially semiconductor wafers, comprising a substantially flat carrier ring, which can be rotated on a plane about an axis of rotation by means of a rotation device, and at least three support elements extending from the plane of the carrier ring, forming a multi-point support for the support at a distance from the plane of the carrier ring. The invention also relates to a device and a method for the treatment of disk-shaped substrates, especially semiconductor wafers, wherein the substrates are rotated about an axis of rotation which is disposed in a substantially vertical position with respect to the plane of the substrates and whereby at least one first group of nozzles are disposed at various distances from the axis of rotation, enabling a first fluid to be applied, said nozzles being controlled either individually or in sub-groups, in order to carry out selective treatment of surface areas of the substrate.
    • 为了进行基板的简单,低成本,均匀的处理,提供了一种用于处理盘状基板,特别是半导体晶片的装置,该半导体晶片包括基本平坦的载体环,其可在围绕轴线的平面上旋转 通过旋转装置的旋转,以及从承载环的平面延伸的至少三个支撑元件,在与承载环的平面相距一定距离处形成用于支撑件的多点支撑。 本发明还涉及一种用于处理盘形基底,特别是半导体晶片的器件和方法,其中基片围绕旋转轴线旋转,该旋转轴线相对于基底的平面设置在基本垂直的位置, 由此至少一个第一组喷嘴设置在与旋转轴线不同的距离处,使得能够施加第一流体,所述喷嘴被单独地或分组地控制,以便执行选择性处理表面积 底物。