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1. 发明申请

WO2005040917A2 SYSTEM AND METHOD FOR LITHOGRAPHY SIMULATION 审中-公开
标题翻译：系统和方法进行算术仿真
公开(公告)号：WO2005040917A2
公开(公告)日：2005-05-06
申请号：PCT/US2004/028864
申请日：2004-09-07
申请人： BRION TECHNOLOGIES, INC. , YE, Jun , LU, Yen-Wen , CAO, Yu , CHEN, Luoqi , CHEN, Xun
发明人： YE, Jun , LU, Yen-Wen , CAO, Yu , CHEN, Luoqi , CHEN, Xun
IPC分类号： G03F
CPC分类号： G06F17/5009 , G03F1/00 , G03F7/004 , G03F7/705 , G03F7/70666 , G06F17/5081 , G06F19/00 , G06F2217/12 , G06F2217/14 , G06T7/0004 , G06T2207/30148 , G21K5/00
摘要： There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques. In this regard, in one embodiment, the present invention employs a lithography simulation system architecture, including application-specific hardware accelerators, and a processing technique to accelerate and facilitate verification, characterization and/or inspection of a mask design, for example, RET design, including detailed simulation and characterization of the entire lithography process to verify that the design achieves and/or provides the desired results on final wafer pattern. The system includes: (1) general purpose-type computing device(s) to perform the case-based logic having branches and interdependency in the data handling and (2) accelerator subsystems to perform a majority of the computation intensive tasks.
摘要翻译：这里描述和说明了许多发明。在一个方面，本发明涉及用于模拟，验证，检查，表征，确定和/或评估光刻设计，技术和/或系统的技术和系统，和/或由其执行的各个功能或使用的组件在其中。在一个实施例中，本发明是加速光刻特性和/或性质的光刻模拟，检查，表征和/或评估以及光刻系统和处理技术的效果和/或相互作用的系统和方法。在这方面，在一个实施例中，本发明采用光刻仿真系统架构，包括特定于应用的硬件加速器，以及用于加速和促进掩模设计的验证，表征和/或检查的处理技术，例如RET设计，包括对整个光刻工艺进行详细的仿真和表征，以验证设计在最终的晶片图案上实现和/或提供期望的结果。该系统包括：（1）通用目的型计算设备，用于执行在数据处理中具有分支和相互依赖性的基于案例的逻辑，以及（2）加速器子系统来执行大部分计算密集型任务。

2. 发明申请

WO2011051249A1 METHOD OF PATTERN SELECTION FOR SOURCE AND MASK OPTIMIZATION 审中-公开
标题翻译：用于源和掩模优化的图案选择方法
公开(公告)号：WO2011051249A1
公开(公告)日：2011-05-05
申请号：PCT/EP2010/066106
申请日：2010-10-26
申请人： ASML NETHERLANDS B.V. , LIU, Hua-Yu , LI, Jiangwei , LI, Zhi-Pan , CHEN, Hong , CHEN, Luoqi , ZHANG, Youping , YE, Jun , TSAl, Min-Chun , LU, Yen-Wen
发明人： LIU, Hua-Yu , LI, Jiangwei , LI, Zhi-Pan , CHEN, Hong , CHEN, Luoqi , ZHANG, Youping , YE, Jun , TSAl, Min-Chun , LU, Yen-Wen
IPC分类号： G03F1/14 , G03F7/20
CPC分类号： G06F17/5081 , G03F1/144 , G03F1/36 , G03F7/70125 , G03F7/70425 , G03F7/70441 , G03F7/705 , G03F7/70666 , G06F17/50 , G06F17/5009
摘要： The present invention relates to a method of selecting a subset of patterns from a design, to a method of performing source and mask optimization, and to a computer program product for performing the method of selecting a subset of patterns from a design. According to certain aspects, the present invention enables coverage of the full design while lowering the computation cost by intelligently selecting a subset of patterns from a design in which the design or a modification of the design is configured to be imaged onto a substrate via a lithographic process. The method of selecting the subset of patterns from a design includes identifying a set of patterns from the design related to the predefined representation of the design. By selecting the subset of patterns according to the method, the selected subset of patterns constitutes a similar predefined representation of the design as the set of patterns.
摘要翻译：本发明涉及从设计中选择模式子集的方法，以及执行源和掩码优化的方法以及用于执行从设计中选择模式子集的方法的计算机程序产品。根据某些方面，本发明能够覆盖整个设计，同时降低计算成本，通过智能地从设计中选择图案子集，其中设计的设计或修改被配置为经由光刻成像到基板上处理。从设计中选择图案子集的方法包括从与设计的预定义表示相关的设计中识别一组图案。通过根据该方法选择模式子集，所选择的模式子集构成与模式集合相似的设计表示。

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