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    • 1. 发明申请
    • INTERFEROMETRIC MEASURING DEVICE
    • 干涉测量装置,
    • WO2004065897A3
    • 2004-10-07
    • PCT/DE2004000065
    • 2004-01-20
    • BOSCH GMBH ROBERTLINDNER MICHAELTHOMINET VINCENTSCHMIDTKE BERND
    • LINDNER MICHAELTHOMINET VINCENTSCHMIDTKE BERND
    • G01B9/02G01B11/24G02B26/06G01B9/023G01B11/30
    • G01B9/02065G01B9/02057G01B9/0209G01B11/2441G02B26/06
    • The invention relates to an interferometric measuring device, especially for measuring the form of a surface of an object (O). Said measuring device comprises a radiation source (LQ) emitting short-coherent electromagnetic radiation, a component, especially a beam splitter (ST), for forming an object beam which is guided towards the object (O) via an object light path (OL) and a reference beam which is guided towards a reference plane (R) via a reference light path (RL), and a receiving element (BA) which is used to receive electromagnetic radiation reflected by the object (O) and the reference plane (R) and brought to interference. An adaptive optical element (AOE) is used to influence the imaging of the object (O) onto the receiving element (BA) and/or the wave front of the reference beam and/or the optical path length in the reference light path (RL) and/or the object light path (OL).
    • 它是一种干涉测量装置,尤其是一种物体的表面的形状测定(O)已经提出。 这种具有短相干的电磁辐射发射辐射源(LQ),组件,特别是用于通过物体的光路(OL)形成到所述对象(O)的光束分离器(ST)导致物体光束和一个经由基准光(RL)的参考平面 (R)引导参考光束,和一个接收元件(BA),与所述对象(O)中的所述一个和所述基准平面(R)反射,并带到干扰电磁辐射是应收。 在这种情况下,其中设置在所述对象(O)到所述接收构件的所述图像的自适应光学元件(AOE)由装置(BA)和/或参考光束和/或参考光的光路长度的波阵面(RL)和/或所述 对象光路(OL)可以被影响。