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    • 2. 发明申请
    • MICROELECTROMECHANICAL DEVICES AND FABRICATION METHODS
    • 微电子设备和制造方法
    • WO2007021396A8
    • 2007-09-07
    • PCT/US2006026531
    • 2006-07-07
    • BOSCH GMBH ROBERTYAMA GARY
    • YAMA GARY
    • B81C99/00
    • B81C1/00333
    • There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a MEMS device, and technique of fabricating or manufacturing a MEMS device, having mechanical structures encapsulated in a chamber prior to final packaging. An embodiment further includes a buried polysilicon layer and a "protective layer" deposited over the buried polysilicon layer to prevent possible erosion of, or damage to the buried polysilicon layer during processing steps. The material that encapsulates the mechanical structures, when deposited, includes one or more of the following attributes: low tensile stress, good step coverage, maintains its integrity when subjected to subsequent processing, does not significantly and/or adversely impact the performance characteristics of the mechanical structures in the chamber (if coated with the material during deposition), and/or facilitates integration with high-performance integrated circuits. In one embodiment, the material that encapsulates the mechanical structures is, for example, silicon (polycrystalline, amorphous or porous, whether doped or undoped), silicon carbide, silicon-germanium, germanium, or gallium-arsenide.
    • 这里描述和说明了许多发明。 在一个方面,本发明涉及MEMS器件,以及制造或制造MEMS器件的技术,其具有在最终封装之前封装在腔室中的机械结构。 实施例还包括掩埋多晶硅层和沉积在掩埋多晶硅层上的“保护层”,以防止在处理步骤期间可能的侵蚀或损坏埋多晶硅层。 当沉积时,封装机械结构的材料包括以下属性中的一个或多个:低拉伸应力,良好的阶梯覆盖,在经受后续加工时保持其完整性,不会显着和/或不利地影响 室中的机械结构(如果在沉积期间涂覆材料)和/或促进与高性能集成电路的集成。 在一个实施例中,封装机械结构的材料是例如硅(多晶,无定形或多孔,无论掺杂或未掺杂),碳化硅,硅 - 锗,锗或砷化镓。
    • 7. 发明申请
    • SUBSTRATE WITH MULTIPLE ENCAPSULATED PRESSURES
    • 带有多个封装压力的基板
    • WO2010107619A3
    • 2011-04-21
    • PCT/US2010026685
    • 2010-03-09
    • BOSCH GMBH ROBERTCANDLER ROBERT NYAMA GARY
    • CANDLER ROBERT NYAMA GARY
    • B81B7/02B81C1/00
    • H01L23/3171B81B7/02B81B2201/0235B81B2201/0242B81C1/00293B81C2203/0136H01L2924/0002H01L2924/00
    • A method of forming a device with multiple encapsulated pressures is disclosed herein. In accordance with one embodiment of the present invention, there is provided a method of forming a device with multiple encapsulated pressures, including providing a substrate, forming a functional layer on top of a surface of the substrate, the functional layer including a first device portion at a first location, and a second device portion at a second location adjacent to the first location, encapsulating the functional layer, forming at least one diffusion resistant layer above the encapsulated functional layer at a location above the first location and not above the second location, modifying an environment adjacent the at least one diffusion resistant layer, and diffusing a gas into the second location as a result of the modified environment.
    • 本文公开了形成具有多个封装压力的装置的方法。 根据本发明的一个实施例,提供了一种形成具有多个封装压力的器件的方法,包括提供衬底,在衬底的表面的顶部上形成功能层,所述功能层包括第一器件部分 在第一位置处的第二设备部分和与第一位置相邻的第二位置处的第二设备部分,封装功能层,在第一位置上方并且不在第二位置之上的位置处在封装的功能层上方形成至少一个扩散阻挡层 改变邻近所述至少一个扩散阻挡层的环境,以及由于所述改进的环境而将气体扩散到所述第二位置。
    • 8. 发明申请
    • ANTI-STICTION TECHNIQUE FOR ELECTROMECHANICAL SYSTEMS AND ELECTROMECHANICAL DEVICE EMPLOYING SAME
    • 机电系统的防伪技术及其使用的电子设备
    • WO2006115592A8
    • 2007-11-01
    • PCT/US2006008600
    • 2006-03-10
    • BOSCH GMBH ROBERTULM MARKUSMETZ MATTHIASSTARK BRIANYAMA GARYLUTZ MARKUSPARTRIDGE AARONFREY WILHELM
    • ULM MARKUSMETZ MATTHIASSTARK BRIANYAMA GARYLUTZ MARKUSPARTRIDGE AARONFREY WILHELM
    • B81C1/00
    • B81C1/0096B81B3/0005B81C2201/112B82Y30/00H01L2224/13H01L2924/1461H01L2924/00
    • A mechanical structure is disposed in a chamber, at least a portion of which is defined by the encapsulation structure. A first method provides a channel cap having at least one preform portion disposed over or in at least a portion of an anti-stiction channel to seal the anti-stiction channel, at least in part. A second method provides a channel cap having at least one portion disposed over or in at least a portion of an anti-stiction channel to seal the anti-stiction channel, at least in part. The at least one portion is fabricated apart from the electromechanical device and thereafter affixed to the electromechanical device. A third method provides a channel cap having at least one portion disposed over or in at least a portion of the anti-stiction channel to seal an anti-stiction channel, at least in part. The at least one portion may comprise a wire ball, a stud, metal foil or a solder preform. A device includes a substrate, an encapsulation structure and a mechanical structure. An anti-stiction layer is disposed on at least a portion of the mechanical structure. An anti-stiction channel is formed in at least one of the substrate and the encapsulation structure. A cap has at least one preform portion disposed over or in at least a portion of the anti-stiction channel to seal the anti-stiction channel, at least in part.
    • 机械结构设置在室中,其至少一部分由封装结构限定。 第一种方法提供了一种通道盖,其具有至少部分地设置在防静电通道上方或至少一部分中的至少一个预制件部分,以密封抗静电通道。 第二种方法提供了通道盖,其具有至少部分地设置在防静电通道上方或至少一部分中的至少一部分,以密封抗静脉通道。 该至少一个部分与机电装置分开制造,然后固定在机电装置上。 第三种方法提供了通道盖,其具有至少部分地设置在抗静电通道上方或至少一部分中的至少一个部分,以密封抗静脉通道。 所述至少一个部分可以包括线球,螺柱,金属箔或焊料预制件。 一种器件包括衬底,封装结构和机械结构。 抗静电层设置在机械结构的至少一部分上。 在基板和封装结构中的至少一个中形成抗静电通道。 至少部分地,盖具有至少一个预制件部分设置在防静电通道的上方或其至少一部分中,以密封抗静电通道。