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    • 6. 发明申请
    • HEAT-SENSITIVE COATING COMPOSITIONS BASED ON RESORCINYL TRIAZINE DERIVATIVES
    • 基于间苯二酚衍生物的热敏涂料组合物
    • WO2008110487A1
    • 2008-09-18
    • PCT/EP2008/052637
    • 2008-03-05
    • CIBA HOLDING INC.CUNNINGHAM, Allan, FrancisEHLIS, ThomasBIRBAUM, Jean-LucHAYOZ, PascalFONDEKAR, Kamalesh Pai
    • CUNNINGHAM, Allan, FrancisEHLIS, ThomasBIRBAUM, Jean-LucHAYOZ, PascalFONDEKAR, Kamalesh Pai
    • C09D5/26C09D7/00C07D251/24C08K5/3492C07D251/14B41M5/333
    • B41M5/3335B41M5/3336C08K5/3492C09D5/26C09D7/41Y10T428/24802
    • The present invention provides heat-sensitive coating compositions, which comprise a a colour developer of formula (1) or mixtures thereof wherein R 1 can be hydrogen, C 1-20 -alkyl, C 3-8 -cycloalkyl, C 2-10 -alkenyl, aryl or SO 3 H, and R 2 and R 3 can be the same or different and can be hydrogen, halogen, C 1-20 -alkyl, C 3-8 -cyclo-alkyl, C 2-10 -alkenyl, aryl, OR 6 , NR 7 R 8 , SR 9 , SO 3 H or COOR 10 and R 4 and R 5 can be the same or different, and can be hydrogen, halogen, C 1-20 -alkyl, C 3-8 -cyclo-alkyl, C 2-10 -alkenyl, aryl, OR 6 , NR 7 R 8 or SR 9 , R 6 , R 7 , R 8 , R 9 and R 10 can be the same or different and can be hydrogen, C 1-30 -alkyl, C 3-8 -cycloalkyl, C 2-10 -alkenyl or aryl, wherein C 1-20 -alkyl can be unsubstituted or substituted with one or more C 3-8 -cycloalkyl, C 2-10 -alkenyl, phenyl, halogen, OR 11 , NR 12 R 13 , SR 14 , SO 3 H or COOR 15 , and aryl can be unsubstituted or substituted with one or more halogen, C 1-10 -alkyl, halogenated C 1-10 -alkyl, C 3-8 -cycloalkyl, C 2-10 -alkenyl, phenyl, OR 11 , NR 12 R 13 , SR 14 , SO 3 H or COOR 15 , wherein R 11 , R 12 , R 13 , R 14 and R 15 can be the same or different and can be hydrogen, C 1-10 -alkyl, C 3-8 -cycloalkyl or C 2-10 -alkenyl, a process for the preparation of these compositions, a process of coating substrates with these compositions, substrates coated with these compositions, a process for preparing marked substrates using these compositions, marked substrates obtainable by the latter process, and certain colour developers.
    • 本发明提供热敏涂料组合物,其包含式(1)的显色剂或其混合物,其中R 1可以是氢,C 1〜20位 - 烷基 C 3-8 - 环烷基,C 2-10 - 烯基,芳基或SO 3 H,R 2, SO 2和R 3可以相同或不同,并且可以是氢,卤素,C 1-20 - 烷基,C 3-8 - 环烷基,C 2-10 - 烯基,芳基,OR 6,NR 7,R 8, SO 3,SO 3 H或COOR 10和R 4和R 5, 可以是相同或不同的,并且可以是氢,卤素,C 1-20 - 烷基,C 3-8 - 环烷基,C 2- 10个 - 烯基,芳基,OR 6,NR 7 R 8或SR 9,R 7,R 7,R 8,R 9和R 10可以是 相同或不同,可以是氢,C 1-3 - 烷基,C 3-8 - 环烷基,C 2-10 - 烯基或芳基,其中C 1-20 - 烷基可以是未取代的或被一个或多个C 3-8 - 环烷基,C 2-10 - 亚烷基,苯基,卤素,OR 11,NR 12,R 13,SR 14, H 3或COOR 15,且芳基可以是未取代的或被一个或多个卤素取代,C 1-10烷基,卤代C 可以相同或不同,并且可以是氢,C 1-10 - 烷基,C 3-8 - 环烷基或C 2-10 - 烯基,这些组合物的制备方法,用这些组合物涂覆基质的方法,用这些组合物涂覆的基材,使用这些共聚物制备标记的底物的方法 可以通过后一种方法获得的粘合剂,标记的底物和某些彩色显影剂。
    • 10. 发明申请
    • SULPHONIUM SALT INITIATORS
    • 硫酸钡发射器
    • WO2007003507A1
    • 2007-01-11
    • PCT/EP2006/063378
    • 2006-06-21
    • CIBA SPECIALTY CHEMICALS HOLDING INC.WOLF, Jean-PierreLATIKA, AttilaBIRBAUM, Jean-LucILG, StephanHAYOZ, Pascal
    • WOLF, Jean-PierreLATIKA, AttilaBIRBAUM, Jean-LucILG, StephanHAYOZ, Pascal
    • C07C381/12G03F7/004G03F7/039
    • C07D209/88B33Y70/00C07C309/06C07C381/12G03F7/0045G03F7/038Y10S430/122
    • Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C 1 -C 20 alkyl; C 2 -C 20 alkyl interrupted by one or more O; is -L-X-R 2 or - L-R 2 ; R 1 has ofr example one of the meanings as given for R; R 2 is a monovalent sensitizer or photoinitiator moiety; Ar 1 and Ar 2 for example independently of one another are phenyl substituted by C 1 -C 20 alkyl, halogen or OR 3 ; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C 1 -C 20 alkyl, OH or OR 3 ; or are -Ar 4 -A-Ar 3 ; Ar 3 is unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C 1 -C 20 alkyl, OR 3 or benzoyl; Ar 4 is phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C 1 -C 20 alkylene; X is CO, C(O)O, OC(O), O, S or NR 3 ; L is C 1 -C 20 alkylene or C 2 -C 20 alkylene interrupted by one or more O; R 3 is C 1 -C 20 alkyl or C 1 -C 20 hydroxyalkyl; and Y is an anion, are suitable as photolatent acid generators.
    • 式(I),(II),(III),(IV)的化合物,其中R是氢,C 1 -C 20烷基; 被一个或多个O中断的C 2 -C 20烷基; 是-L-X-R 2或-L-R 2; R 1具有如R给出的含义之一; R 2 2是单价敏化剂或光引发剂部分; Ar 1和Ar 2,例如彼此独立地是被C 1 -C 20烷基取代的苯基, 卤素或OR 3; 或未取代的萘基,蒽基,菲基或联苯基; 或被C 1 -C 20烷基,OH或OR 3取代的萘基,蒽基,菲基或联苯基; 或为-Ar 4 -Ar -Ar 3 N; Ar 3是未取代的苯基萘基,蒽基,菲基或联苯基; 或者是被C 1 -C 20烷基,OR 3或苯甲酰基取代的苯基,萘基,蒽基,菲基或联苯基。 Ar 4是亚苯基,亚萘基,亚蒽基或菲基; A是直接键合,S,O或C 1 -C 20亚烷基; X是CO,C(O)O,OC(O),O,S或NR 3。 L是被一个或多个O中断的C 1 -C 20亚烷基或C 2 -C 20 -C 20亚烷基; R 3是C 1 -C 20烷基或C 1 -C 20烷基或C 1 -C 20烷基或C 1 -C 20烷基, 羟; 并且Y是阴离子,适合作为光潜酸产生剂。