会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Process for the preparation of indoles
    • 吲哚的制备方法
    • US4727161A
    • 1988-02-23
    • US798919
    • 1985-11-15
    • Atsuyoshi YamauchiSeiya IguchiYuzo OnoHiroshii KimuraSatoshi Morita
    • Atsuyoshi YamauchiSeiya IguchiYuzo OnoHiroshii KimuraSatoshi Morita
    • C07D209/04C07D209/08C07C85/26C07D209/12
    • C07D209/08
    • A process for producing an indole which comprises reacting an aniline and a diol in the presence of a catalyst to produce a reaction mixture containing the indole, unreacted aniline and by-products, condensing the reaction mixture to obtain a liquid reaction product, recovering the unreacted aniline from the liquid reaction product, reducing the contents of specified by-products in the recovered aniline below specified levels and reutilizing the resulting recovered aniline. To reduce the contents of the specified by-products in the recovered aniline below specified levels, it is preferred to subject the liquid reaction product or an aniline fraction separated therefrom to a heat-treatment and then to distillation. In the above manner, the recovered aniline can be reutilized in the reaction without causing the activity of the catalyst to deteriorate.
    • 一种制备吲哚的方法,其包括在催化剂存在下使苯胺和二醇反应以产生含有吲哚,未反应的苯胺和副产物的反应混合物,将反应混合物冷凝以获得液体反应产物,回收未反应的 苯胺从液体反应产物中降低回收苯胺中指定副产物的含量低于指定水平,并再循环回收苯胺。 为了将回收苯胺中指定的副产物的含量降低到指定水平以下,优选使液体反应产物或与其分离的苯胺级分进行热处理,然后进行蒸馏。 以上述方式,回收的苯胺可以在反应中重新利用,而不会导致催化剂的活性劣化。
    • 3. 发明授权
    • Communication system, switch
    • 通讯系统,开关
    • US07848226B2
    • 2010-12-07
    • US12078180
    • 2008-03-27
    • Satoshi Morita
    • Satoshi Morita
    • H04L12/26
    • H04L41/0677H04L41/0663H04L43/0817
    • According to an aspect of an embodiment, a communication system comprises: a. a first information processing device; b. a first communication line and a first backup line connected to the first information processing device, respectively; c. a second information processing device; d. a second communication line and second backup line connected to the second information processing device, respectively; e. a first switch comprising: a first port connected to the first communication line; a second port connected to the second backup line; and a controller for performing of: detecting a failure of the first port; switching the second backup line; and sending a notification; and f. a second switch comprising: a third port connected to the first backup line; a fourth port connected to the second communication line; and a controller for performing of: receiving the notification; switching the first backup line and the second communication line.
    • 根据实施例的一个方面,通信系统包括:a。 第一信息处理装置; b。 分别连接到第一信息处理装置的第一通信线路和第一备用线路; C。 第二信息处理装置; d。 分别连接到第二信息处理装置的第二通信线路和第二备用线路; e。 第一开关,包括:连接到所述第一通信线路的第一端口; 连接到第二备用线路的第二端口; 以及控制器,用于执行:检测所述第一端口的故障; 切换第二条备用线路; 并发送通知; 和f。 第二开关,包括:连接到第一备用线的第三端口; 连接到第二通信线路的第四端口; 以及控制器,用于执行以下操作:接收所述通知; 切换第一备用线路和第二通信线路。
    • 4. 发明授权
    • Liquid crystal display device and method for manufacturing the same
    • 液晶显示装置及其制造方法
    • US07573538B2
    • 2009-08-11
    • US11998955
    • 2007-12-03
    • Shinichiro NomuraTakayuki KatoSatoshi MoritaHideki KanekoMasahiro Horiguchi
    • Shinichiro NomuraTakayuki KatoSatoshi MoritaHideki KanekoMasahiro Horiguchi
    • G02F1/1343
    • G02F1/136213G02F1/136259G02F2202/42H01L27/1255H01L29/4908
    • A liquid crystal display panel 10A of the invention has gate electrodes G of TFTs, scan lines 16, and auxiliary capacitor electrodes 18a, which are coated with a first insulating film 27 composed of a thick insulating layer 25 and thinned insulating layer 26. A part above the auxiliary capacitor electrodes 18a is coated only with the thinned insulating layer 26, and drain electrodes D are extended on the first insulating film 27, which is not thinned, so as to coat the thinned insulating layer 26. On a second insulating film 28 provided between the pixel electrodes 20 and the drain electrodes D, contact holes 30 are formed at portions above the drain electrodes D on the first insulating film 27, which is not thinned, above the auxiliary capacitor electrodes 18a, and via the contact holes 30, the pixels 20 and the drain electrodes D are electrically coupled to each other. By providing such a constitution, a liquid crystal display device and its manufacturing method can be provided, with only a small number of bright point defects, and with an increased capacitance of the auxiliary capacitor electrodes without a reduction in the aperture ratio of each pixel.
    • 本发明的液晶显示面板10A具有TFT,扫描线16和辅助电容电极18a的栅电极G,它们涂覆有由厚的绝缘层25和薄的绝缘层26组成的第一绝缘膜27.一部分 在辅助电容器电极18a上方仅用薄化的绝缘层26涂覆,并且漏极电极D在未被减薄的第一绝缘膜27上延伸,以便涂覆变薄的绝缘层26.在第二绝缘膜28上 设置在像素电极20和漏电极D之间的接触孔30上,在辅助电容电极18a上方并未变薄的第一绝缘膜27上的漏电极D的上方的部分形成接触孔30, 像素20和漏电极D彼此电耦合。 通过提供这样的结构,可以提供只有少量亮点缺陷的液晶显示装置及其制造方法,并且辅助电容器电极的电容增加,而不会降低每个像素的开口率。
    • 6. 发明授权
    • Photosensitive material processing apparatus
    • 感光材料加工设备
    • US5396309A
    • 1995-03-07
    • US231839
    • 1994-04-25
    • Satoshi MoritaHisatsugu Torii
    • Satoshi MoritaHisatsugu Torii
    • G03D3/13G03D3/08
    • G03D3/132
    • In a photosensitive material processing apparatus, a conveying rack is provided so as to be able to be immersed in and lifted out from both of first and second processing chambers simultaneously. The conveying rack includes a plurality of conveying roller pairs and conveys a photosensitive material from the first to the second processing chamber via a processing solution partitioning member while immersing it in the processing solutions. At least one of the plurality of conveying roller pairs which are provided in the first processing chamber is a one-way rotating conveying roller pair which is rotated only in a rotating direction corresponding to a direction of conveying the photosensitive material. When the conveying rack which is immersed in the first and second processing chambers is lifted out therefrom, levels of the processing solutions in the first and second processing chambers are changed equally. Even if the conveying rack is lifted with the photosensitive material therein, the photosensitive material is smoothly withdrawn and the processing solution partitioning member follows changes in a conveying path of the photosensitive material. Therefore, a function of separating the processing solutions does not deteriorate, and the processing solutions in the first and second processing chambers do not mix.
    • 在感光材料处理装置中,设置有能够同时从第一处理室和第二处理室中浸入和取出的输送架。 输送架包括多个输送辊对,并且通过处理溶液分隔构件将感光材料从第一处理室输送到第二处理室,同时将其浸入处理溶液中。 设置在第一处理室中的多个输送辊对中的至少一个是单向旋转输送辊对,其仅在与传送感光材料的方向相对应的旋转方向上旋转。 当浸没在第一处理室和第二处理室中的传送架被提升出来时,第一处理室和第二处理室中的处理溶液的等级变化均匀。 即使传送架被其中的感光材料提升,感光材料被平滑地取出,并且处理液分隔件遵循感光材料的输送路径的变化。 因此,分离处理液的功能不会恶化,并且第一和第二处理室中的处理溶液不混合。
    • 7. 发明授权
    • Process for the ortho-alkylation of phenolic compounds
    • 酚类化合物的邻烷基化方法
    • US4390737A
    • 1983-06-28
    • US316781
    • 1981-10-30
    • Akihide KudohMotoo KawamataKazushi OhshimaMakoto KotaniTakeshi TsudaSatoshi Morita
    • Akihide KudohMotoo KawamataKazushi OhshimaMakoto KotaniTakeshi TsudaSatoshi Morita
    • B01J23/00B01J23/32C07B61/00C07C27/00C07C37/16C07C39/06C07C67/00
    • B01J23/32C07C37/16
    • This invention relates to a process for the selective ortho-alkylation of a phenolic compound having at least one ortho-positioned hydrogen atom by catalytically reacting the phenolic compound with an alcohol in the vapor phase. In this process, the reaction of the phenolic compound with the alcohol is carried out at a temperature of from 300.degree. to 550.degree. C. in the presence of a catalyst containing manganese oxide, silicon oxide and one or more additives selected from group (A) consisting of germanium oxide, tin oxide and lead oxide, or a catalyst containing manganese oxide, silicon oxide, one or more additives selected from the aforesaid group (A), and one or more additives selected from group (B) consisting of alkali metal oxides and alkaline earth metal oxides. The catalyst used in this invention exhibits not only excellent catalytic activity in the selective ortho-alkylation of phenols, continuous stability of the activity, good shapability, and good mechanical strength but also effective utilization of alcohols.
    • 本发明涉及一种通过使酚类化合物与气相中的醇催化反应,使具有至少一个邻位氢原子的酚类化合物选择性正烷基化的方法。 在该方法中,酚类化合物与醇的反应在含有氧化锰,氧化硅和选自组(A)的一种或多种添加剂的催化剂存在下,在300-550℃的温度下进行。 ),或者含有氧化锰,氧化硅,选自上述组(A)的一种或多种添加剂的一种或多种添加剂和选自由碱金属(B)组成的组分(B))的一种或多种添加剂组成的催化剂,由氧化锗,氧化锡和氧化铅组成的催化剂, 氧化物和碱土金属氧化物。 用于本发明的催化剂不仅在酚的选择性邻烷基化中具有优异的催化活性,活性的连续稳定性,良好的成型性和良好的机械强度,而且还有效地利用醇。
    • 9. 发明授权
    • Substrate processing apparatus
    • 基板加工装置
    • US08978670B2
    • 2015-03-17
    • US12897384
    • 2010-10-04
    • Junya MinamidaIssei UedaYasuhiro ChounoOsamu KurodaKazuyoshi EshimaMasahiro YoshidaSatoshi Morita
    • Junya MinamidaIssei UedaYasuhiro ChounoOsamu KurodaKazuyoshi EshimaMasahiro YoshidaSatoshi Morita
    • B08B3/00H01L21/67
    • H01L21/67051H01L21/6708H01L21/67178H01L21/6719H01L21/67196Y10S414/135
    • Provided is a substrate processing apparatus wherein, even if a trouble occurs, it is bound to continue a process for the substrate without stopping the substrate processing apparatus entirely. The substrate processing apparatus according to the present disclosure includes first and second substrate conveying devices configured to convey wafers, and first and second processing blocks provided on the right and left sides of the substrate conveying device and having processing unit arrays each configured to perform the same process. Processing unit arrays on one side and processing unit arrays on the other side are respectively connected to a processing liquid supply system commonly provided with them. And, when any one of substrate conveying devices, processing liquid supply systems has a problem, the process for the wafer can be performed in the processing unit array to which the substrate conveying device and the processing liquid supply system under normal operation belong.
    • 提供了一种基板处理装置,其中即使发生故障,也必须在不停止基板处理装置的情况下继续进行基板的处理。 根据本公开的基板处理装置包括被配置为输送晶片的第一和第二基板输送装置,以及设置在基板输送装置的左侧和左侧的第一和第二处理块,并且具有各自被配置为执行相同的处理单元阵列 处理。 一侧的处理单元阵列和另一侧的处理单元阵列分别连接到通常设置有它们的处理液体供应系统。 并且,当基板输送装置中的任一个处理液供给系统存在问题时,可以在基板输送装置和处理液供给系统正常运转所属的处理单元阵列中进行晶片的处理。