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    • 2. 发明授权
    • Avalanche photodiode
    • 雪崩光电二极管
    • US09006854B2
    • 2015-04-14
    • US13819559
    • 2011-09-01
    • Tadao IshibashiSeigo AndoMasahiro NadaYoshifumi MuramotoHaruki Yokoyama
    • Tadao IshibashiSeigo AndoMasahiro NadaYoshifumi MuramotoHaruki Yokoyama
    • H01L31/107H01L31/02H01L31/0224
    • H01L31/02002H01L31/022416H01L31/03046H01L31/035281H01L31/1075Y02E10/544
    • An APD is provided with the semi-insulating substrate, a first mesa having a first laminate constitution in which a p-type electrode layer, a p-type light absorbing layer, a light absorbing layer with a low impurity concentration, a band gap inclined layer, a p-type electric field control layer, an avalanche multiplier layer, an n-type electric field control layer, and an electron transit layer with a low impurity concentration are stacked in this order on a surface of the semi-insulating substrate, a second mesa having an outer circumference provided inside an outer circumference of the first mesa as viewed from the laminating direction and having a second laminate constitution in which an n-type electrode buffer layer and an n-type electrode layer are stacked in this order on a surface on the electron transit layer side, and a depletion control region that is provided in layers on the second mesa side relative to the p-type electric field control layer, formed in an encircling portion provided inside an outer circumference of the first mesa and encircling an outer circumference of the second mesa, and prevents the encircling portion of the p-type electric field control layer from being depleted when bias is applied.
    • APD设置有半绝缘基板,第一台面具有第一层叠结构,其中p型电极层,p型光吸收层,具有低杂质浓度的光吸收层,带隙倾斜 层叠,p型电场控制层,雪崩乘法器层,n型电场控制层和具有低杂质浓度的电子传输层依次层叠在半绝缘基板的表面上, 第二台面,其具有从层叠方向观察时设置在第一台面的外周的外周,并且具有第二层叠结构,其中n型电极缓冲层和n型电极层依次层叠在 电子转移层侧的表面和相对于p型电场控制层设置在第二台面侧的层的耗尽控制区域,形成在环状端口 n设置在第一台面的外周内并且围绕第二台面的外周,并且在施加偏压时防止p型电场控制层的环绕部分耗尽。
    • 4. 发明申请
    • AVALANCHE PHOTODIODE
    • AVALANCHE光电
    • US20130154045A1
    • 2013-06-20
    • US13819279
    • 2011-09-01
    • Tadao IshibashiSeigo AndoMasahiro NadaYoshifumi MuramotoHaruki Yokoyama
    • Tadao IshibashiSeigo AndoMasahiro NadaYoshifumi MuramotoHaruki Yokoyama
    • H01L31/0352
    • H01L31/035281H01L31/03046H01L31/1075Y02E10/544
    • An APD is provided with a semi-insulating substrate, a first mesa having a first laminate constitution in which a p-type electrode layer, a p-type light absorbing layer, a light absorbing layer with a low impurity concentration, a band gap inclined layer, a p-type electric field control layer, an avalanche multiplier layer, an n-type electric field control layer, and an electron transit layer with a low impurity concentration are stacked in this order on a surface of the semi-insulating substrate, a second mesa having an outer circumference provided inside an outer circumference of the first mesa as viewed from the laminating direction and having a second laminate constitution in which an n-type electrode buffer layer and an n-type electrode layer are stacked in this order on a surface on the electron transit layer side of the first mesa, and in the APD, a total donor concentration of the n-type electric field control layer is lower than a total acceptor concentration of the p-type electric field control layer in a range of 2×1011 to 1×1012/cm2.
    • APD设置有半绝缘基板,第一台面具有第一层叠结构,其中p型电极层,p型光吸收层,具有低杂质浓度的光吸收层,带隙倾斜 层叠,p型电场控制层,雪崩乘法器层,n型电场控制层和具有低杂质浓度的电子传输层依次层叠在半绝缘基板的表面上, 第二台面,其具有从层叠方向观察时设置在第一台面的外周的外周,并且具有第二层叠结构,其中n型电极缓冲层和n型电极层依次层叠在 在第一台面的电子转移层侧的表面,并且在APD中,n型电场控制层的总施主浓度低于p型电子的总受主浓度 在2×1011到1×1012 / cm2的范围内的场域控制层。
    • 5. 发明授权
    • Semiconductor optical modulator
    • 半导体光调制器
    • US08031984B2
    • 2011-10-04
    • US12445616
    • 2007-10-24
    • Tadao IshibashiNobuhiro KikuchiKen Tsuzuki
    • Tadao IshibashiNobuhiro KikuchiKen Tsuzuki
    • G02F1/025
    • G02F1/017B82Y20/00G02F1/025G02F2202/101
    • The present invention can provide an npin-type optical modulator that has a high withstand voltage and is easily fabricated. A semiconductor optical amplifier (10) according to an embodiment of the present invention is an npin-type semiconductor optical modulator in which layers are sequentially stacked, with a cathode layer (12-1) arranged on the substrate side, including at least a first n-type cladding layer (13-1), a p-type cladding layer (14), a core layer (17) and a second n-type cladding layer (13-2). In this semiconductor optical modulator, the p-type cladding layer (14) is electrically connected to an electrode (18-1) of the cathode layer. Accordingly, the accumulation of holes in the p-type cladding layer associated with light absorption in the npin-type optical modulator can be absorbed in the electrode on the negative side. This npin-type semiconductor optical modulator can be comparatively easily fabricated using conventional semiconductor manufacturing techniques by adopting a mesa type waveguide structure.
    • 本发明可以提供一种耐压高且易于制造的npin型光调制器。 根据本发明的实施例的半导体光放大器(10)是其中依次堆叠层的衬底型半导体光调制器,其中布置在衬底侧上的阴极层(12-1)包括至少第一 n型包覆层(13-1),p型包覆层(14),芯层(17)和第二n型包覆层(13-2)。 在该半导体光调制器中,p型覆层(14)与阴极层的电极(18-1)电连接。 因此,能够在负极侧的电极中吸收与npin型光调制器中的光吸收有关的p型覆层的空穴积聚。 通过采用台面型波导结构,可以使用常规的半导体制造技术相对容易地制造该npin型半导体光调制器。
    • 7. 发明申请
    • AVALANCHE PHOTODIODE
    • AVALANCHE光电
    • US20130168793A1
    • 2013-07-04
    • US13819559
    • 2011-09-01
    • Tadao IshibashiSeigo AndoMasahiro NadaYoshifumi MuramotoHaruki Yokoyama
    • Tadao IshibashiSeigo AndoMasahiro NadaYoshifumi MuramotoHaruki Yokoyama
    • H01L31/02
    • H01L31/02002H01L31/022416H01L31/03046H01L31/035281H01L31/1075Y02E10/544
    • An APD is provided with the semi-insulating substrate, a first mesa having a first laminate constitution in which a p-type electrode layer, a p-type light absorbing layer, a light absorbing layer with a low impurity concentration, a band gap inclined layer, a p-type electric field control layer, an avalanche multiplier layer, an n-type electric field control layer, and an electron transit layer with a low impurity concentration are stacked in this order on a surface of the semi-insulating substrate, a second mesa having an outer circumference provided inside an outer circumference of the first mesa as viewed from the laminating direction and having a second laminate constitution in which an n-type electrode buffer layer and an n-type electrode layer are stacked in this order on a surface on the electron transit layer side, and a depletion control region that is provided in layers on the second mesa side relative to the p-type electric field control layer, formed in an encircling portion provided inside an outer circumference of the first mesa and encircling an outer circumference of the second mesa, and prevents the encircling portion of the p-type electric field control layer from being depleted when bias is applied.
    • APD设置有半绝缘基板,第一台面具有第一层叠结构,其中p型电极层,p型光吸收层,具有低杂质浓度的光吸收层,带隙倾斜 层叠,p型电场控制层,雪崩乘法器层,n型电场控制层和具有低杂质浓度的电子传输层依次层叠在半绝缘基板的表面上, 第二台面,其具有从层叠方向观察时设置在第一台面的外周的外周,并且具有第二层叠结构,其中n型电极缓冲层和n型电极层依次层叠在 电子转移层侧的表面和相对于p型电场控制层设置在第二台面侧的层的耗尽控制区域,形成在环状端口 n设置在第一台面的外周内并且围绕第二台面的外周,并且在施加偏压时防止p型电场控制层的环绕部分耗尽。
    • 9. 发明授权
    • Semiconductor optoelectronic waveguide
    • 半导体光电波导
    • US07787736B2
    • 2010-08-31
    • US12219061
    • 2008-07-15
    • Tadao IshibashiSeigo AndoKen Tsuzuki
    • Tadao IshibashiSeigo AndoKen Tsuzuki
    • G02B6/10
    • G02F1/01708B82Y20/00
    • The present invention relates to a semiconductor optoelectronic waveguide having a nin-type hetero structure which is able to stably operate an optical modulator. On the upper and lower surfaces of the core layer determined for the structure so that electro-optical effects are effectively exerted at an operating light wavelength and are provided with intermediate clad layers having a band gap which is greater than that of the core layer 11. Respectively on the upper and the lower surface of the intermediate clad layer are provided the clad layers having the band gap which is greater than those of the intermediate clad layers. On the upper surface of the clad layer are sequentially laminated a p-type layer and an n-type layer. In the applied voltage range used under an operating state, a whole region of the p-type layer and a part or a whole region of the n-type layer are depleted.
    • 本发明涉及能够稳定地操作光调制器的具有n型异质结构的半导体光电波导。 在对于结构确定的芯层的上表面和下表面上,使得电光效应在工作光波长下有效地施加,并且设置有具有比芯层11的带隙大的带隙的中间包层。 在中间包层的上表面和下表面上分别设置具有大于中间包层的带隙的包覆层。 在包覆层的上表面依次层叠p型层和n型层。 在工作状态下使用的施加电压范围内,p型层的整个区域和n型层的一部分或全部区域耗尽。
    • 10. 发明申请
    • Avalanche Photodiode
    • 雪崩光电二极管
    • US20070200141A1
    • 2007-08-30
    • US10587818
    • 2005-02-03
    • Tadao IshibashiSeigo AndoYukihiro Hirota
    • Tadao IshibashiSeigo AndoYukihiro Hirota
    • H01L31/00
    • H01L31/1075
    • An ultra high speed APD capable of realizing reduction in an operating voltage and quantum efficiency enhancement at the same time is provided. Under operating conditions APD, a doping concentration distribution of each light absorbing layer is determined so that a p-type light absorbing layer (16) maintains a p-type neutrality except a part thereof, and a low concentration light absorbing layer (15) is depleted. Moreover, a ratio between a layer thickness WAN of the p-type light absorbing layer (16) and a layer thickness WAD of the low concentration light absorbing layer (15) is determined so that WAD>0.3 μm and a delay time of an element response accompanying a transit of carriers generated in the light absorbing layer by light absorption takes on a local minimum under a condition that a layer thickness WA (=WAN+WAD) of the light absorbing layer is constant.
    • 提供能够同时实现工作电压降低和量子效率提高的超高速APD。 在操作条件APD下,确定每个光吸收层的掺杂浓度分布,使得p型光吸收层(16)除了其一部分之外保持p型中性,并且低浓度光吸收层(15)为 耗尽 此外,p型光吸收层(16)的层厚度W AN AN与低浓度光吸收层(15)的层厚度W SUB / SUB之比 ),使得在光吸收层中通过光吸收产生的载流子的转移伴随的元素响应的延迟时间在层的一个条件下成为局部最小值 光吸收层的厚度W A(= W AN AN + W AD AD)是恒定的。