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    • 2. 发明授权
    • Semiconductor optical modulator
    • 半导体光调制器
    • US08031984B2
    • 2011-10-04
    • US12445616
    • 2007-10-24
    • Tadao IshibashiNobuhiro KikuchiKen Tsuzuki
    • Tadao IshibashiNobuhiro KikuchiKen Tsuzuki
    • G02F1/025
    • G02F1/017B82Y20/00G02F1/025G02F2202/101
    • The present invention can provide an npin-type optical modulator that has a high withstand voltage and is easily fabricated. A semiconductor optical amplifier (10) according to an embodiment of the present invention is an npin-type semiconductor optical modulator in which layers are sequentially stacked, with a cathode layer (12-1) arranged on the substrate side, including at least a first n-type cladding layer (13-1), a p-type cladding layer (14), a core layer (17) and a second n-type cladding layer (13-2). In this semiconductor optical modulator, the p-type cladding layer (14) is electrically connected to an electrode (18-1) of the cathode layer. Accordingly, the accumulation of holes in the p-type cladding layer associated with light absorption in the npin-type optical modulator can be absorbed in the electrode on the negative side. This npin-type semiconductor optical modulator can be comparatively easily fabricated using conventional semiconductor manufacturing techniques by adopting a mesa type waveguide structure.
    • 本发明可以提供一种耐压高且易于制造的npin型光调制器。 根据本发明的实施例的半导体光放大器(10)是其中依次堆叠层的衬底型半导体光调制器,其中布置在衬底侧上的阴极层(12-1)包括至少第一 n型包覆层(13-1),p型包覆层(14),芯层(17)和第二n型包覆层(13-2)。 在该半导体光调制器中,p型覆层(14)与阴极层的电极(18-1)电连接。 因此,能够在负极侧的电极中吸收与npin型光调制器中的光吸收有关的p型覆层的空穴积聚。 通过采用台面型波导结构,可以使用常规的半导体制造技术相对容易地制造该npin型半导体光调制器。
    • 4. 发明申请
    • SEMICONDUCTOR OPTICAL MODULATOR
    • 半导体光学调制器
    • US20100296766A1
    • 2010-11-25
    • US12445616
    • 2007-10-24
    • Tadao IshibashiNobuhiro KikuchiKen Tsuzuki
    • Tadao IshibashiNobuhiro KikuchiKen Tsuzuki
    • G02F1/025
    • G02F1/017B82Y20/00G02F1/025G02F2202/101
    • The present invention can provide an npin-type optical modulator that has a high withstand voltage and is easily fabricated. A semiconductor optical amplifier (10) according to an embodiment of the present invention is an npin-type semiconductor optical modulator in which layers are sequentially stacked, with a cathode layer (12-1) arranged on the substrate side, including at least a first n-type cladding layer (13-1), a p-type cladding layer (14), a core layer (17) and a second n-type cladding layer (13-2). In this semiconductor optical modulator, the p-type cladding layer (14) is electrically connected to an electrode (18-1) of the cathode layer. Accordingly, the accumulation of holes in the p-type cladding layer associated with light absorption in the npin-type optical modulator can be absorbed in the electrode on the negative side. This npin-type semiconductor optical modulator can be comparatively easily fabricated using conventional semiconductor manufacturing techniques by adopting a mesa type waveguide structure.
    • 本发明可以提供一种耐压高且易于制造的npin型光调制器。 根据本发明的实施例的半导体光放大器(10)是其中依次堆叠层的衬底型半导体光调制器,其中布置在衬底侧上的阴极层(12-1)包括至少第一 n型包覆层(13-1),p型包覆层(14),芯层(17)和第二n型包覆层(13-2)。 在该半导体光调制器中,p型覆层(14)与阴极层的电极(18-1)电连接。 因此,能够在负极侧的电极中吸收与npin型光调制器中的光吸收有关的p型覆层的空穴积聚。 通过采用台面型波导结构,可以使用常规的半导体制造技术相对容易地制造该npin型半导体光调制器。
    • 5. 发明授权
    • Semiconductor optoelectronic waveguide
    • 半导体光电波导
    • US07787736B2
    • 2010-08-31
    • US12219061
    • 2008-07-15
    • Tadao IshibashiSeigo AndoKen Tsuzuki
    • Tadao IshibashiSeigo AndoKen Tsuzuki
    • G02B6/10
    • G02F1/01708B82Y20/00
    • The present invention relates to a semiconductor optoelectronic waveguide having a nin-type hetero structure which is able to stably operate an optical modulator. On the upper and lower surfaces of the core layer determined for the structure so that electro-optical effects are effectively exerted at an operating light wavelength and are provided with intermediate clad layers having a band gap which is greater than that of the core layer 11. Respectively on the upper and the lower surface of the intermediate clad layer are provided the clad layers having the band gap which is greater than those of the intermediate clad layers. On the upper surface of the clad layer are sequentially laminated a p-type layer and an n-type layer. In the applied voltage range used under an operating state, a whole region of the p-type layer and a part or a whole region of the n-type layer are depleted.
    • 本发明涉及能够稳定地操作光调制器的具有n型异质结构的半导体光电波导。 在对于结构确定的芯层的上表面和下表面上,使得电光效应在工作光波长下有效地施加,并且设置有具有比芯层11的带隙大的带隙的中间包层。 在中间包层的上表面和下表面上分别设置具有大于中间包层的带隙的包覆层。 在包覆层的上表面依次层叠p型层和n型层。 在工作状态下使用的施加电压范围内,p型层的整个区域和n型层的一部分或全部区域耗尽。
    • 6. 发明申请
    • Semiconductor optoelectronic waveguide
    • 半导体光电波导
    • US20080304786A1
    • 2008-12-11
    • US12219061
    • 2008-07-15
    • Tadao IshibashiSeigo AndoKen Tsuzuki
    • Tadao IshibashiSeigo AndoKen Tsuzuki
    • G02F1/035
    • G02F1/01708B82Y20/00
    • The present invention relates to a semiconductor optoelectronic waveguide having a nin-type hetero structure which is able to stably operate an optical modulator. On the upper and lower surfaces of the core layer determined for the structure so that electro-optical effects are effectively exerted at an operating light wavelength and are provided with intermediate clad layers having a band gap which is greater than that of the core layer 11. Respectively on the upper and the lower surface of the intermediate clad layer are provided the clad layers having the band gap which is greater than those of the intermediate clad layers. On the upper surface of the clad layer are sequentially laminated a p-type layer and an n-type layer. In the applied voltage range used under an operating state, a whole region of the p-type layer and a part or a whole region of the n-type layer are depleted.
    • 本发明涉及能够稳定地操作光调制器的具有n型异质结构的半导体光电波导。 在对于结构确定的芯层的上表面和下表面上,使得电光效应在工作光波长下有效地施加,并且设置有具有比芯层11的带隙大的带隙的中间包层。 在中间包层的上表面和下表面上分别设置具有大于中间包层的带隙的包覆层。 在包覆层的上表面依次层叠p型层和n型层。 在工作状态下使用的施加电压范围内,p型层的整个区域和n型层的一部分或全部区域耗尽。
    • 7. 发明授权
    • Semiconductor optoelectronic waveguide
    • 半导体光电波导
    • US07599595B2
    • 2009-10-06
    • US10574513
    • 2004-10-04
    • Tadao IshibashiSeigo AndoKen Tsuzuki
    • Tadao IshibashiSeigo AndoKen Tsuzuki
    • G02B6/10
    • G02F1/01708B82Y20/00
    • The present invention relates to a semiconductor optoelectronic waveguide having a nin-type hetero structure which is able to stably operate an optical modulator. On the upper and lower surfaces of the core layer determined for the structure so that electro-optical effects are effectively exerted at an operating light wavelength and are provided with intermediate clad layers having a band gap which is greater than that of the core layer 11. Respectively on the upper and the lower surface of the intermediate clad layer are provided the clad layers having the band gap which is greater than those of the intermediate clad layers. On the upper surface of the clad layer are sequentially laminated a p-type layer and an n-type layer. In the applied voltage range used under an operating state, a whole region of the p-type layer and a part or a whole region of the n-type layer are depleted.
    • 本发明涉及能够稳定地操作光调制器的具有n型异质结构的半导体光电波导。 在对于结构确定的芯层的上表面和下表面上,使得电光效应在工作光波长下有效地施加,并且设置有具有比芯层11的带隙大的带隙的中间包层。 在中间包层的上表面和下表面上分别设置具有大于中间包层的带隙的包覆层。 在包覆层的上表面依次层叠p型层和n型层。 在工作状态下使用的施加电压范围内,p型层的整个区域和n型层的一部分或全部区域耗尽。
    • 8. 发明申请
    • SEMICONDUCTOR OPTICAL MODULATOR
    • 半导体光学调制器
    • US20090034904A1
    • 2009-02-05
    • US11817312
    • 2006-03-08
    • Ken TsuzukiNobuhiro KikuchiEiichi Yamada
    • Ken TsuzukiNobuhiro KikuchiEiichi Yamada
    • G02B6/12H01L31/0264
    • G02F1/025G02F2201/07G02F2202/102
    • There is provided a semiconductor optical modulator capable of performing a stable operation and having an excellent voltage-current characteristic to an electric field while exhibiting the characteristic of a semiconductor optical modulator with an n-i-n structure. The semiconductor optical modulator includes a waveguide structure that is formed by sequentially growing an n-type InP clad layer (11), a semiconductor core layer (13) having an electro-optic effect, a p-InAlAs layer (15), and an n-type InP clad layer (16). An electron affinity of the p-InAlAs layer (15) is smaller than an electron affinity of the n-type InP clad layer (16). In the waveguide structure having such a configuration, a non-dope InP clad layer (12) and a non-dope InP clad layer (14) may be respectively provided between the n-type InP clad layer (11) and the semiconductor core layer (13), and between the semiconductor core layer (13) and the p-InAlAs layer (15).
    • 提供了一种能够执行稳定操作并且具有优异的电场电压特性的半导体光调制器,同时具有n-i-n结构的半导体光调制器的特性。 半导体光调制器包括通过依次生长n型InP包覆层(11),具有电光效应的半导体芯层(13),p-InAlAs层(15)和 n型InP覆层(16)。 p-InAlAs层(15)的电子亲和力小于n型InP包覆层(16)的电子亲和力。 在具有这种结构的波导结构中,非掺杂InP覆盖层(12)和非掺杂InP覆盖层(14)可以分别设置在n型InP覆盖层(11)和半导体芯层 (13),以及半导体芯层(13)和p-InAlAs层(15)之间。
    • 9. 发明授权
    • Semiconductor optical modulator
    • 半导体光调制器
    • US07711214B2
    • 2010-05-04
    • US11817312
    • 2006-03-08
    • Ken TsuzukiNobuhiro KikuchiEiichi Yamada
    • Ken TsuzukiNobuhiro KikuchiEiichi Yamada
    • G02F1/035
    • G02F1/025G02F2201/07G02F2202/102
    • There is provided a semiconductor optical modulator capable of performing a stable operation and having an excellent voltage-current characteristic to an electric field while exhibiting the characteristic of a semiconductor optical modulator with an n-i-n structure. The semiconductor optical modulator includes a waveguide structure that is formed by sequentially growing an n-type InP clad layer (11), a semiconductor core layer (13) having an electro-optic effect, a p-InAlAs layer (15), and an n-type InP clad layer (16). An electron affinity of the p-InAlAs layer (15) is smaller than an electron affinity of the n-type InP clad layer (16). In the waveguide structure having such a configuration, a non-dope InP clad layer (12) and a non-dope InP clad layer (14) may be respectively provided between the n-type InP clad layer (11) and the semiconductor core layer (13), and between the semiconductor core layer (13) and the p-InAlAs layer (15).
    • 提供了一种能够执行稳定操作并且具有优异的电场电压特性的半导体光调制器,同时具有n-i-n结构的半导体光调制器的特性。 半导体光调制器包括通过依次生长n型InP包覆层(11),具有电光效应的半导体芯层(13),p-InAlAs层(15)和 n型InP覆层(16)。 p-InAlAs层(15)的电子亲和力小于n型InP包覆层(16)的电子亲和力。 在具有这种结构的波导结构中,非掺杂InP覆盖层(12)和非掺杂InP覆盖层(14)可以分别设置在n型InP覆盖层(11)和半导体芯层 (13),以及半导体芯层(13)和p-InAlAs层(15)之间。