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1. 发明授权

US07632132B2 Camera module connector 失效
标题翻译：相机模块连接器
公开(公告)号：US07632132B2
公开(公告)日：2009-12-15
申请号：US12213104
申请日：2008-06-13
申请人： Atsushi Nishio , Takashi Kawasaki , Makoto Murayama
发明人： Atsushi Nishio , Takashi Kawasaki , Makoto Murayama
IPC分类号： H01R13/627
CPC分类号： H01R12/7076 , H01R12/716
摘要： A module connector reliably locks a module such as a camera module, which is accommodated, to prevent the module from falling and make a module connector in lower profile. This module connector has contact pins (120) that electrically connect with the module inside a container (110) in which the camera module is inserted. Retaining members (150) are provided in sides of the container (110), elastically deform when the module is inserted such that claw parts (159), which form the tip parts of arm parts (158) projecting toward the container (110), move to the sides of the container (110), and engage with an engaged part (230) of the camera module accommodated in the container (110). An arm part (158) connects with an upper end part of a second body part (156) bent from the tip of a first body part (154), which projects toward the container (110) in the side of the container (110), in the direction going away from the container (110) and extends upward.
摘要翻译：模块连接器可靠地锁定诸如被容纳的相机模块的模块，以防止模块掉落并使模块连接器处于下部轮廓。该模块连接器具有与相机模块插入的容器（110）内的模块电连接的接触销（120）。保持构件（150）设置在容器（110）的侧面，当模块插入时弹性变形，使得形成臂部（158）的尖端部的爪部（159）朝向容器（110）突出，移动到容器（110）的侧面，并与容纳在容器（110）中的相机模块的被接合部分（230）接合。臂部158与从第一主体部154的前端弯曲的第二主体部156的上端部连通，第一主体部154在容器110的侧面朝向容器110突出，在远离容器（110）的方向上向上延伸。

2. 发明申请

US20080311782A1 Module connector 失效
标题翻译：模块连接器
公开(公告)号：US20080311782A1
公开(公告)日：2008-12-18
申请号：US12213104
申请日：2008-06-13
申请人： Atsushi Nishio , Takashi Kawasaki , Makoto Murayama
发明人： Atsushi Nishio , Takashi Kawasaki , Makoto Murayama
IPC分类号： H01R13/627
CPC分类号： H01R12/7076 , H01R12/716
摘要： A module connector reliably locks a module such as a camera module, which is accommodated, to prevent the module from falling and make a module connector in lower profile. This module connector has contact pins (120) that electrically connect with the module inside a container (110) in which the camera module is inserted. Retaining members (150) are provided in sides of the container (110), elastically deform when the module is inserted such that claw parts (159), which form the tip parts of arm parts (158) projecting toward the container (110), move to the sides of the container (110), and engage with an engaged part (230) of the camera module accommodated in the container (110). An arm part (158) connects with an upper end part of a second body part (156) bent from the tip of a first body part (154), which projects toward the container (110) in the side of the container (110), in the direction going away from the container (110) and extends upward.
摘要翻译：模块连接器可靠地锁定诸如被容纳的相机模块的模块，以防止模块掉落并使模块连接器处于下部轮廓。该模块连接器具有与相机模块插入的容器（110）内的模块电连接的接触销（120）。保持构件（150）设置在容器（110）的侧面，当模块插入时弹性变形，使得形成臂部（158）的尖端部的爪部（159）朝向容器（110）突出，移动到容器（110）的侧面，并与容纳在容器（110）中的相机模块的被接合部分（230）接合。臂部158与从第一主体部154的前端弯曲的第二主体部156的上端部连通，第一主体部154在容器110的侧面朝向容器110突出，在远离容器（110）的方向上向上延伸。

3. 外观设计

USD539223S1 Connector 有权
公开(公告)号：USD539223S1
公开(公告)日：2007-03-27
申请号：US29260434
申请日：2006-05-25
申请人： Atsushi Nishio , Takashi Kawasaki , Makoto Murayama
设计人： Atsushi Nishio , Takashi Kawasaki , Makoto Murayama

4. 外观设计

USD539745S1 Connector 有权
公开(公告)号：USD539745S1
公开(公告)日：2007-04-03
申请号：US29254319
申请日：2006-02-23
申请人： Atsushi Nishio , Takashi Kawasaki , Makoto Murayama
设计人： Atsushi Nishio , Takashi Kawasaki , Makoto Murayama

5. 外观设计

USD539224S1 Connector 有权
公开(公告)号：USD539224S1
公开(公告)日：2007-03-27
申请号：US29260479
申请日：2006-05-26
申请人： Atsushi Nishio , Takashi Kawasaki , Makoto Murayama
设计人： Atsushi Nishio , Takashi Kawasaki , Makoto Murayama

6. 发明授权

US06485891B1 Exposure apparatus and method 失效
标题翻译：曝光装置和方法
公开(公告)号：US06485891B1
公开(公告)日：2002-11-26
申请号：US09542072
申请日：2000-04-03
申请人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
发明人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
IPC分类号： G03F720
CPC分类号： G03F7/705 , G03F7/2002 , G03F7/701 , G03F7/70125 , G03F7/70308 , G03F7/70591 , Y10S430/146
摘要： A production method of a semiconductor device, includes the steps of emitting an excimer laser from a light source, illuminating a pattern on a mask with the excimer laser emitted from the light source and passed through a filter, exposing a resist on a substrate of the semiconductor with the excimer laser passed through the mask, and forming a pattern on the substrate in accordance with a portion of the resist exposed with the excimer laser.
摘要翻译：一种半导体器件的制造方法，包括以下步骤：从光源发射准分子激光器，用从光源发射的准分子激光器照射掩模上的图案，并通过过滤器，将抗蚀剂暴露在基板上半导体与准分子激光器通过掩模，并且根据暴露于准分子激光器的抗蚀剂的一部分在衬底上形成图案。

7. 发明授权

US06335146B1 Exposure apparatus and method 失效
标题翻译：曝光装置和方法
公开(公告)号：US06335146B1
公开(公告)日：2002-01-01
申请号：US09542071
申请日：2000-04-03
申请人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
发明人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
IPC分类号： G03F700
CPC分类号： G03F7/705 , G03F7/2002 , G03F7/701 , G03F7/70125 , G03F7/70308 , G03F7/70591 , Y10S430/146
摘要： A production method of a semiconductor device, includes the steps of emitting an excimer laser from a light source, forming the excimer laser in a particular shape, illuminating a pattern on a mask for a phase shifter method with the particular shaped excimer laser, and exposing a resist on a wafer with the excimer laser which passed through the mask. The resist on the wafer is developed and the wafer is etched to form a pattern.
摘要翻译：半导体器件的制造方法包括以下步骤：从光源发射准分子激光，形成特定形状的准分子激光器，照射具有特定形状的准分子激光器的移相器方法的掩模上的图案，以及曝光具有通过掩模的准分子激光器的晶片上的抗蚀剂。显影晶片上的抗蚀剂，蚀刻晶片以形成图案。

8. 发明授权

US07604925B2 Exposure apparatus and method 失效
标题翻译：曝光装置和方法
公开(公告)号：US07604925B2
公开(公告)日：2009-10-20
申请号：US11117493
申请日：2005-04-29
申请人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
发明人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
IPC分类号： H01L21/00
CPC分类号： G03F7/705 , G03F7/2002 , G03F7/701 , G03F7/70125 , G03F7/70308 , G03F7/70591 , Y10S430/146
摘要： A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the semiconductor device, developing the resist exposed by the light pattern to form a wafer pattern with the resist, and etching the substrate on which the wafer pattern with the resist is formed. In the step of exposing the light pattern is formed by illuminating a mask with excimer laser light having an annular shape.
摘要翻译：一种半导体器件的制造方法，包括以下步骤：通过在半导体器件的衬底上投射光图案来曝光涂覆在半导体器件的衬底上的抗蚀剂的步骤，使由光图案曝光的抗蚀剂显影以形成具有并且蚀刻其上形成有抗蚀剂的晶片图案的基板。在曝光的步骤中，通过用具有环形形状的准分子激光照射掩模形成光图案。

9. 发明授权

US07012671B2 Exposure apparatus and method 失效
公开(公告)号：US07012671B2
公开(公告)日：2006-03-14
申请号：US10282081
申请日：2002-10-29
申请人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
发明人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G03F7/705 , G03F7/2002 , G03F7/701 , G03F7/70125 , G03F7/70308 , G03F7/70591 , Y10S430/146
摘要： An apparatus and method for projecting a pattern includes a light source for emitting a laser; an illuminating unit which illuminates a mask on which a pattern is formed with the laser emitted from the light source and formed in a particular shape; a holder which holds the mask; an optical lens unit which projects the pattern formed on the mask onto a surface of a substrate by the laser illuminated on the mask; and a table which mounts the substrate and moves in at least one direction.

10. 发明授权

US6016187A Exposure apparatus and method 失效
标题翻译：曝光装置和方法
公开(公告)号：US6016187A
公开(公告)日：2000-01-18
申请号：US3141
申请日：1998-01-06
申请人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
发明人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
IPC分类号： G03F1/84 , G03F7/20 , H01L21/027 , H01L21/30 , G03B27/42
CPC分类号： G03F7/705 , G03F7/2002 , G03F7/701 , G03F7/70125 , G03F7/70308 , G03F7/70591 , Y10S430/146
摘要： An exposure apparatus and method wherein a mask is illuminated with light and light one of transmitted through and reflected from the illuminated mask is imaged onto a substrate. At least during imaging transmission of light one of transmitted and reflected from the illuminated mask is partially inhibited. More particularly, a spatial filter is utilized for inhibiting at least a portion of O-order diffraction light.
摘要翻译：一种曝光装置和方法，其中用光和光照射掩模，将透射通过和从照射的掩模反射的透镜装置成像到基板上。至少在光的成像传输期间，被照射的掩模的透射和反射之一被部分抑制。更具体地，利用空间滤波器来抑制O级衍射光的至少一部分。

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