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1. 发明专利

JP2014013915A Imprint lithography apparatus and method 有权
标题翻译： IMPRINT LITHOGRAPHY APPARATUS和方法
公开(公告)号：JP2014013915A
公开(公告)日：2014-01-23
申请号：JP2013169108
申请日：2013-08-16
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KRUIJT-STEGEMAN YVONNE WENDELA , JEUNINK ANDRE BERNARDUS , JOHANNES PETRUS MARTINUS BERNARDUS
IPC分类号： H01L21/027 , B29C59/02
CPC分类号： G03F7/0002 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/70716 , G03F7/70725 , G03F7/70766 , G03F7/70783
摘要： PROBLEM TO BE SOLVED: To prevent misalignment from residual strain in a substrate in a lithography apparatus.SOLUTION: An imprint lithography apparatus and manufacturing method can lead to mechanical stress being formed in a substrate to which an imprint pattern is being applied. This may cause strain within the substrate leading to misalignment of a subsequent pattern with an earlier pattern in a part of the substrate, which is strained. An apparatus and method is disclosed which allows stress relaxation in the substrate prior to further patterning in order to reduce, minimize or prevent such misalignment from residual strain. This is achieved by locally unclamping a portion of substrate (including arbitrarily the entire substrate) from a corresponding portion of a substrate holder so that mechanical stress leading to local strain may relax prior to further patterning. In order to overcome residual frictional force between the substrate and the substrate holder, the substrate and the substrate holder may be physically separated prior to further patterning.
摘要翻译：要解决的问题：为了防止光刻设备中的基板中的残余应变的不对准。解决方案：压印光刻设备和制造方法可以导致在施加印记图案的基板中形成机械应力。这可能导致衬底内的应变导致随后的图案与基片的一部分中的较早的图案的未对准，其被应变。公开了一种在进一步构图之前允许衬底中的应力松弛的装置和方法，以便减少，最小化或防止这种从残余应变的偏移。这是通过从衬底保持器的相应部分局部松开衬底的一部分（包括任意整个衬底）来实现的，使得导致局部应变的机械应力在进一步图案化之前可能松弛。为了克服衬底和衬底保持器之间的残余摩擦力，衬底和衬底保持器可以在进一步构图之前物理分离。

2. 发明专利

JP2010087533A Imprint lithography 有权
标题翻译： IMPRINT LITHOGRAPHY
公开(公告)号：JP2010087533A
公开(公告)日：2010-04-15
申请号：JP2010003894
申请日：2010-01-12
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KRUIJT-STEGEMAN YVONNE WENDELA , JANSSEN HENDRICUS WILHELMUS A , KOLESNYCHENKO ALEKSEY YURIEVICH , VAN SANTEN HELMAR
IPC分类号： H01L21/027 , B81C99/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C23F1/02 , Y10S977/887
摘要： PROBLEM TO BE SOLVED: To provide an imprint lithography where resolution is greatly improved.
SOLUTION: The imprint method includes applying imprint force to a template, thereby having an imprintable medium contact a target region on a first surface of a substrate, adding compensation force to a second surface of the substrate opposite to the first surface so as to reduce the distortion of the substrate caused by the application of the imprint force while applying the imprint force thereto, and separating the template from the imprinted medium, in order to form the imprint on the medium.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供分辨率大大提高的压印光刻技术。压印方法包括向模板施加压印力，由此使可压印介质与基板的第一表面上的目标区域接触，向与第一表面相对的第二表面添加补偿力，以便以减小由于施加压印力而引起的基板的变形，并且将印模分离到印刷介质上，以便在介质上形成印记。版权所有（C）2010，JPO＆INPIT

3. 发明专利

JP2009081421A Imprint lithography 有权
标题翻译： IMPRINT LITHOGRAPHY
公开(公告)号：JP2009081421A
公开(公告)日：2009-04-16
申请号：JP2008211243
申请日：2008-08-20
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： WUISTER SANDER FREDERIK , DIJKSMAN JOHAN FREDERIK , KRUIJT-STEGEMAN YVONNE WENDELA , SCHRAM IVAR , LAMMERS JEROEN HERMAN , SCHROEDERS RICHARD JOSEPH MARI
IPC分类号： H01L21/027 , B29C59/02
CPC分类号： H01L21/683 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S269/903
摘要： PROBLEM TO BE SOLVED: To provide a chuck apparatus provided with a second surface portion deflecting gas over a substrate held on a first surface portion, and holding the substrate. SOLUTION: The chuck apparatus includes the first surface portion on which the substrate is to be held and the second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion and which, in use, is arranged to deflect gas over the first surface portion and thus the substrate that is to be held on the first surface portion. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种卡盘装置，其具有在保持在第一表面部分上的基板上偏转气体的第二表面部分，并且保持基板。解决方案：卡盘装置包括要保持基板的第一表面部分和与第一表面部分相邻的第二表面部分并且至少部分地围绕第一表面部分的边缘延伸并且在使用中被布置成使气体偏转在第一表面部分上，并因此偏转待保持在第一表面部分上的基底。版权所有（C）2009，JPO＆INPIT

4. 发明专利

JP2011023715A Imprint lithography apparatus 有权
标题翻译： IMPRINT LITHOGRAPHY APPARATUS
公开(公告)号：JP2011023715A
公开(公告)日：2011-02-03
申请号：JP2010147032
申请日：2010-06-29
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JEUNINK ANDRE BERNARDUS , BANINE VADIM YEVGENYEVICH , BUTLER HANS , VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS , VERMEULEN JOHANNES PETRUS MARTINUS , KRUIJT-STEGEMAN YVONNE WENDELA
IPC分类号： H01L21/027 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/00
摘要： PROBLEM TO BE SOLVED: To avoid a problem related to expansion and contraction of a template. SOLUTION: The imprint lithography apparatus is arranged away from a substrate holder 58 and arranged between a structure 64 and the substrate holder 58 during the use of imprint template arrangements 50, 52. The structure 64 includes one or more arrays of lines or one or more encoders, and a substrate 56 or the substrate holder 58 and the imprint template have one or more encoders 68 that face the one or more arrays of lines or one or more arrays of lines that face the one or more encoders 68. The configuration determination arrangement is configured to determine a relative configuration between the substrate 56 or substrate holder 58 and the structure 64, and/or a relative configuration between the imprint template arrangements 50, 52 and the structure 64, and/or a relative configuration between the imprint template arrangements 50, 52 and the substrate 56 or substrate holder 58. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：避免与模板的伸缩有关的问题。解决方案：压印光刻设备远离衬底保持器58布置，并且在使用压印模板布置50,52期间布置在结构64和衬底保持器58之间。结构64包括一个或多个线阵列或一个或多个编码器以及衬底56或衬底保持器58和压印模板具有面向一个或多个线阵列或面向一个或多个编码器68的线阵列的一个或多个编码器68。配置确定装置被配置为确定衬底56或衬底保持器58和结构64之间的相对配置，和/或压印模板布置50,52和结构64之间的相对配置，和/或其间的相对配置压印模板布置50,52和基板56或基板支架58.版权所有：（C）2011，JPO＆INPIT

5. 发明专利

JP2011014907A Imprint lithography apparatus 有权
标题翻译： IMPRINT LITHOGRAPHY APPARATUS
公开(公告)号：JP2011014907A
公开(公告)日：2011-01-20
申请号：JP2010147028
申请日：2010-06-29
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VERMEULEN JOHANNES PETRUS MARTINUS , JEUNINK ANDRE BERNARDUS , KRUIJT-STEGEMAN YVONNE WENDELA
IPC分类号： H01L21/027 , H02K41/02 , H02K41/035
CPC分类号： B29C67/0051 , B29C64/00 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S425/81
摘要： PROBLEM TO BE SOLVED: To provide an imprint lithography apparatus whose throughput can be increased.SOLUTION: The imprint lithography apparatus is disclosed. The apparatus includes an electromagnetic Lorentz actuator arrangement configured to move an imprint template arrangement, the electromagnetic Lorentz actuator arrangement comprising: an array of magnets; and an array of conductors, each conductor configured to carry an electric current, one of the array of magnets or the array of conductors being moveable and connected to the imprint template arrangement, and the other of the array of magnets or the array of conductors extending at least partially around or forming a part of a substrate holder; the array of magnets and the array of conductors together being in a configuration which facilitates moving of the moveable one of the array of magnets or the array of conductors in six degrees of freedom, such that the imprint template arrangement is also movable in six degrees of freedom.
摘要翻译：要解决的问题：提供可以提高生产量的压印光刻设备。解决方案：公开了压印光刻设备。该设备包括配置成移动压印模板布置的电磁洛伦兹致动器装置，所述电磁洛伦兹致动器装置包括：磁体阵列; 以及导体阵列，每个导体被配置为承载电流，所述磁体阵列中的一个或所述导体阵列可移动并连接到所述压印模板装置，并且所述磁体阵列或所述导体阵列中的另一个延伸至少部分地围绕或形成衬底保持器的一部分; 磁体阵列和导体阵列一起处于有利于以六个自由度移动磁体阵列或导体阵列中的可移动的一个的构造，使得印模模板布置也可以在六度自由。

6. 发明专利

JP2010080918A Imprint lithography 有权
标题翻译： IMPRINT LITHOGRAPHY
公开(公告)号：JP2010080918A
公开(公告)日：2010-04-08
申请号：JP2009143991
申请日：2009-06-17
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KRUIJT-STEGEMAN YVONNE WENDELA , VERMEULEN JOHANNES PETRUS MARTINUS , WUISTER SANDER FREDERIK , LAFARRE RAYMOND WILHELMUS LOUIS , JEUNINK ANDRE BERNARDUS , DE SCHIFFART CATHARINUS , JANSEN NORBERT ERWIN THERENZO
IPC分类号： H01L21/027
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： PROBLEM TO BE SOLVED: To provide an imprint lithography accurately controlling the force of a wide dynamic range actuator. SOLUTION: Disclosed is an imprint lithography apparatus including: a first support structure 21 for supporting a template 20; and a first actuator 22 mounted on the first support structure constituted in use such that it is disposed the first support structure and the template. The first actuator applies force to the template. The imprint lithography apparatus further includes a second support structure 40 and a second actuator 41 disposed between the second support structure and the first support structure. The second actuator applies force to the second support structure, and the moving range of the second actuator is larger than the moving range of the first actuator. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供精确控制宽动态范围致动器的力的压印光刻。解决方案：公开了一种压印光刻设备，包括：用于支撑模板20的第一支撑结构21; 以及安装在第一支撑结构上的第一致动器22，所述第一致动器22构造在使用中，使得其布置在第一支撑结构和模板上。第一个执行器对模板施加强制。压印光刻设备还包括设置在第二支撑结构和第一支撑结构之间的第二支撑结构40和第二致动器41。第二致动器对第二支撑结构施加力，并且第二致动器的移动范围大于第一致动器的移动范围。版权所有（C）2010，JPO＆INPIT

7. 发明专利

JP2007194601A Imprint lithography alignment 有权
标题翻译： IMPRINT LITHOGRAPHY对准
公开(公告)号：JP2007194601A
公开(公告)日：2007-08-02
申请号：JP2006337999
申请日：2006-12-15
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： DIJKSMAN JOHAN FREDERIK , KRUIJT-STEGEMAN YVONNE WENDELA , KNAAPEN RAYMOND JACOBUS , KRASTEV KEASSIMIR TODOROV , WUISTER SANDER FREDERIK , SCHRAM IVAR , VAN WINGERDEN JOHANNES
IPC分类号： H01L21/027 , B29C59/02
CPC分类号： G03F9/7053 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7042 , Y10S977/877 , Y10S977/888
摘要： PROBLEM TO BE SOLVED: To provide a method for aligning an imprint template to a target substrate in an imprint lithography. SOLUTION: An imprint medium 106 having a predetermined volume is stacked within a target area, an imprint template is moved until it contacts the imprint medium 106, and the imprint template or target area or both is subjected to lateral movement mutually under an interface tension between the target area and the imprint template. In accord with this, a material 104 less wet than substrate is provided at least to partially surround the target area of the substrate. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供在压印光刻中将压印模板对准目标衬底的方法。解决方案：将具有预定体积的压印介质106堆叠在目标区域内，压印模板移动直到其接触压印介质106，并且压印模板或目标区域或两者在相互下相互受到横向移动目标区域和压印模板之间的界面张力。与此相对，至少部分地包围基板的目标区域，提供比基板湿润的材料104。版权所有（C）2007，JPO＆INPIT

8. 发明专利

JP2011097051A Imprint lithography 有权
标题翻译： IMPRINT LITHOGRAPHY
公开(公告)号：JP2011097051A
公开(公告)日：2011-05-12
申请号：JP2010236003
申请日：2010-10-21
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KRUIJT-STEGEMAN YVONNE WENDELA , DEN BOEF ARIE JEFFREY , JEUNINK ANDRE BERNARDUS
IPC分类号： H01L21/027 , B29C33/38 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7076
摘要： PROBLEM TO BE SOLVED: To improve an alignment mark of an imprint template. SOLUTION: The imprint lithography template is provided with an alignment mark, wherein the alignment mark is formed from dielectric material having a refractive index which differs from the refractive index of the imprint lithography template, the dielectric material having a thickness which is such that it provides a phase difference between alignment radiation which has passed through the dielectric material and alignment radiation which has not passed through the dielectric material. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：改进压印模板的对准标记。压印光刻模板设置有对准标记，其中对准标记由具有与压印光刻模板的折射率不同的折射率的介电材料形成，该电介质材料具有这样的厚度它提供已经通过电介质材料的对准辐射和未通过电介质材料的对准辐射之间的相位差。版权所有（C）2011，JPO＆INPIT

9. 发明专利

JP2009141328A Imprint lithography 有权
标题翻译： IMPRINT LITHOGRAPHY
公开(公告)号：JP2009141328A
公开(公告)日：2009-06-25
申请号：JP2008262679
申请日：2008-10-09
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KRUIJT-STEGEMAN YVONNE WENDELA , KNAAPEN RAYMOND JACOBUS WILHEL , DIJKSMAN JOHAN FREDERIK , WUISTER SANDER FREDERIK , SCHRAM IVAR
IPC分类号： H01L21/027 , B29C59/02
CPC分类号： B29C59/002 , B29C59/02 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： PROBLEM TO BE SOLVED: To assure a desired amount of deformation by applying a desired amount of force to an imprint template.
SOLUTION: An imprint lithography apparatus includes a support structure 51 holding the imprint template. The apparatus further includes: an actuator 52 disposed between the support structure 51 and the side of the imprint template 50 and configured to impart force to the imprint template 50 when the support structure 51 holds the imprint template; and a force sensor 53 disposed between the support structure 51 and the side of the imprint template 50 when the support structure 51 holds the imprint template 50.
COPYRIGHT: (C)2009,JPO&INPIT

10. 发明专利

JP2009065135A Lithography meandering order 有权
标题翻译： LITHOGRAPHY MEANDERING ORDER
公开(公告)号：JP2009065135A
公开(公告)日：2009-03-26
申请号：JP2008203107
申请日：2008-08-06
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： SCHRAM IVAR , DIJKSMAN JOHAN FREDERIK , WUISTER SANDER FREDERIK , KRUIJT-STEGEMAN YVONNE WENDELA , LAMMERS JEROEN HERMAN , SCHROEDERS RICHARD JOSEPH MARI
IPC分类号： H01L21/027 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/7035 , G03F7/70425 , G03F7/70433
摘要： PROBLEM TO BE SOLVED: To provide an imprint lithography method and an apparatus that may obviate or mitigate the issue that a magnification error may occur in different parts of a substrate when applying patterns to the substrate and devices which are formed from these patterns may, e.g., not function consistently with respect to one another. SOLUTION: The imprint lithography method includes imprinting a plurality of patterns in an imprintable medium provided on the substrate, wherein the order in which the patterns are imprinted in the imprintable medium is such that, for the majority of the patterns, two consecutively imprinted patterns are not imprinted adjacent to one another. COPYRIGHT: (C)2009,JPO&INPIT

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