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1. 发明专利

JP2010187029A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2010187029A
公开(公告)日：2010-08-26
申请号：JP2010123442
申请日：2010-05-28
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JEROEN JOHANNES SOPHIA MARIA MERTENS , CHRISTIAAN ALEXANDER HOOGENDAM , JANSSEN HENDRICUS WILHELMUS A , TINNEMANS PATRICIUS ALOYSIUS J , VAN DEN SCHOOR LEON JOSEPH MARIE , DONDERS SJOERD NICOLAAS LAMBERTUS , STREEFKERK BOB
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a liquid supply system capable of supplying an immersion liquid in a space between a final element of a projection lens and a substrate at an extremely stable flow rate and with a minimum pressure variation in an immersion lithography apparatus. SOLUTION: In the immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of the liquid. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种液体供应系统，其能够以非常稳定的流速和浸没式光刻中的最小压力变化在投影透镜的最终元件和基板之间的空间中提供浸没液体仪器。解决方案：在浸没式光刻设备中，浸渍液体通过限流器从罐中提供。保持在罐中的液体保持在限流器上方基本上恒定的高度，以确保液体的恒定流动。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2010087533A Imprint lithography 有权
标题翻译： IMPRINT LITHOGRAPHY
公开(公告)号：JP2010087533A
公开(公告)日：2010-04-15
申请号：JP2010003894
申请日：2010-01-12
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KRUIJT-STEGEMAN YVONNE WENDELA , JANSSEN HENDRICUS WILHELMUS A , KOLESNYCHENKO ALEKSEY YURIEVICH , VAN SANTEN HELMAR
IPC分类号： H01L21/027 , B81C99/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C23F1/02 , Y10S977/887
摘要： PROBLEM TO BE SOLVED: To provide an imprint lithography where resolution is greatly improved.
SOLUTION: The imprint method includes applying imprint force to a template, thereby having an imprintable medium contact a target region on a first surface of a substrate, adding compensation force to a second surface of the substrate opposite to the first surface so as to reduce the distortion of the substrate caused by the application of the imprint force while applying the imprint force thereto, and separating the template from the imprinted medium, in order to form the imprint on the medium.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供分辨率大大提高的压印光刻技术。压印方法包括向模板施加压印力，由此使可压印介质与基板的第一表面上的目标区域接触，向与第一表面相对的第二表面添加补偿力，以便以减小由于施加压印力而引起的基板的变形，并且将印模分离到印刷介质上，以便在介质上形成印记。版权所有（C）2010，JPO＆INPIT

3. 发明专利

JP2007251195A Lithographic apparatus 审中-公开
标题翻译： LITHOGRAPHIC设备
公开(公告)号：JP2007251195A
公开(公告)日：2007-09-27
申请号：JP2007128365
申请日：2007-05-14
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JANSSEN HENDRICUS WILHELMUS A , RENKENS MICHAEL JOZEFA MATHIJS , TABOR ROB , VIJFVINKEL JAKOB , SCHNEIDER RONALD MAARTEN , BISSCHOPS THEODORUS HUBERTUS J
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： F16C29/025 , F16C32/0603 , F16C33/748 , F16C2300/62 , F16F15/0275 , G03F7/70816 , G03F7/70841 , G03F7/709
摘要： PROBLEM TO BE SOLVED: To provide a bearing means used for a lithograph projecting device, which prevents horizontal vibration transmission, enables displacement in a horizontal surface of a supported object, prevents horizontal vibration transmission of the object, and can be used within a vacuum chamber.
SOLUTION: A lithographic projection apparatus comprises a vacuum chamber having a wall enclosing at least one of first and second object tables. The object table or each object table within the vacuum chamber is connected to a positioning means in a projection system of the apparatus. The positioning means is provided with a pneumatic gravity compensator 40 comprising a piston associated with the object table; a gas-filled pressure chamber in which the gas in the pressure chamber acting on the movable member to counteract the weight of the object table; a gas bearing; and an evacuating means for evacuating gas escaping towards the vacuum chamber through a gap between the movable member and a bearing surface of a cylindrical housing. A partially flexible rod connects the piston to the object table.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种用于防止水平振动传播的平版印刷投影装置的轴承装置，能够在被支撑物体的水平表面中的位移，防止物体的水平振动传播，并且可以在一个真空室。解决方案：光刻投影设备包括真空室，其具有围绕第一和第二目标表中的至少一个的壁。真空室内的物体表或每个物体表与设备的投影系统中的定位装置连接。定位装置设置有气动重力补偿器40，气动重力补偿器40包括与对象台相关联的活塞; 气体填充压力室，其中压力室中的气体作用在可动构件上以抵消物体台的重量; 气体轴承; 以及用于通过可动构件和圆柱形壳体的支承表面之间的间隙将气体排出到真空室的排气装置。部分柔性杆将活塞连接到物体台。版权所有（C）2007，JPO＆INPIT

4. 发明专利

JP2008072147A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2008072147A
公开(公告)日：2008-03-27
申请号：JP2007312122
申请日：2007-12-03
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JEROEN JOHANNES SOPHIA MARIA M , CHRISTIAAN ALEXANDER HOOGENDAM , JANSSEN HENDRICUS WILHELMUS A , TINNEMANS PATRICIUS ALOYSIUS J , VAN DEN SCHOOR LEON JOSEPH MAR , DONDERS SJOERD NICOLAAS LAMBER , STREEFKERK BOB
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a liquid supply system capable of supplying immersion liquid with an extremely stable flow rate and minimum pressure fluctuation into a space between a last element of a projection lens and a substrate in an immersion liquid lithographic apparatus. SOLUTION: In an immersion liquid lithographic apparatus, immersion liquid is supplied from a tank through a flow rate limiter. Liquid preserved in the tank is maintained virtually at a fixed height above the flow rate limiter, thereby, a stable liquid flow is assured. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种液体供应系统，其能够以非常稳定的流速和最小的压力波动将浸没液体供应到浸没液体光刻设备中的投影透镜的最后一个元件与基板之间的空间中。解决方案：在浸没液体光刻设备中，浸没液体通过流速限制器从罐中提供。保存在罐中的液体实际上保持在流量限制器上方的固定高度，从而确保稳定的液体流动。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2005057278A Lithography equipment and device manufacturing method 有权
标题翻译： LITHOGRAPHY设备和设备制造方法
公开(公告)号：JP2005057278A
公开(公告)日：2005-03-03
申请号：JP2004222718
申请日：2004-07-30
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： JEROEN JOHANNES SOPHIA MARIA M , CHRISTIAAN ALEXANDER HOOGENDAM , JANSSEN HENDRICUS WILHELMUS A , TINNEMANS PATRICIUS ALOYSIUS J , VAN DEN SCHOOR LEON JOSEPH MAR , DONDERS SJOERD NICOLAAS LAMBER , STREEFKERK BOB
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a liquid feed system that can supply immersion liquid at a very stable flow rate with the minimum pressure fluctuation to a space between the last element and the substrate of a projection lens in an immersion liquid lithography equipment. SOLUTION: In the immersion liquid lithography equipment, immersion liquid is supplied through a flow rate limiter from a tank. Liquid held in the tank is maintained at a substantially fixed height above the flow rate limiter, by which stable liquid flow is assured. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种液体供给系统，其可以以最小的压力波动以非常稳定的流速向浸没液体光刻设备中的投影透镜的最后一个元件和基板之间的空间供应浸没液体。解决方案：在浸没液体光刻设备中，浸没液体通过流量限制器从罐中提供。保持在罐中的液体保持在流量限制器上方基本上固定的高度，由此确保稳定的液体流动。版权所有（C）2005，JPO＆NCIPI

6. 发明专利

JP2006229232A Imprint lithography 有权
标题翻译： IMPRINT LITHOGRAPHY
公开(公告)号：JP2006229232A
公开(公告)日：2006-08-31
申请号：JP2006039322
申请日：2006-02-16
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KRUIJT-STEGEMAN YVONNE WENDELA , JANSSEN HENDRICUS WILHELMUS A , KOLESNYCHENKO ALEKSEY YURIEVIC , VAN SANTEN HELMAR
IPC分类号： H01L21/027 , B81C99/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C23F1/02 , Y10S977/887
摘要： PROBLEM TO BE SOLVED: To provide an imprint lithography whose resolution is sharply improved. SOLUTION: An imprinting method is disclosed that includes steps for applying an imprinting force to a template to cause the template to contact with an imprintable medium on the target region of the first surface of a substrate to form an imprint in the medium, and applying a compensating force to the second surface of the substrate which is opposite to the first surface to reduce the deformation of the substrate caused by the application of the imprinting force during the application of the imprinting force, and separating the template from the imprinted medium. COPYRIGHT: (C)2006,JPO&NCIPI

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