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1. 发明专利

JP2008028388A Lithography equipment, aberration correction device, and device fabrication method 有权
标题翻译：算术设备，校正校正装置和器件制造方法
公开(公告)号：JP2008028388A
公开(公告)日：2008-02-07
申请号：JP2007181687
申请日：2007-07-11
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： UITTERDIJK TAMMO , JORRITSMA LAURENTIUS CATRINUS
IPC分类号： H01L21/027
CPC分类号： G03F7/70891 , G03F7/70308 , G03F7/706
摘要： PROBLEM TO BE SOLVED: To provide an improved compensation against lens heating effects. SOLUTION: An aberration compensation device can be used in lithography equipment has two elements capable of relatively rotating around an optical axis. One surface of each element has an aspheric shape which can be represented by a high-order Zernike polynomial equation. When two surfaces are aligned in respect of rotation, the device has a flat plate optical effect. When there exists a slight relative rotational deviation in the two elements of the device, the device effect is a phase shift which can be represented by aspheric shape differentiation. To compensate aberration due to lens heating, the compensation device can be used in a projection system with a lighting mode and a pattern type causing intensive off-axis localized pupil filling. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供对透镜加热效果的改进的补偿。解决方案：像差补偿装置可以用在光刻设备中，具有能够围绕光轴相对旋转的两个元件。每个元件的一个表面具有可以由高阶泽尔尼克多项式方程表示的非球面形状。当两个表面相对于旋转对准时，该装置具有平板光学效果。当在器件的两个元件中存在轻微的相对旋转偏差时，器件效应是可以通过非球面形状区分表示的相移。为了补偿由于透镜加热造成的像差，补偿装置可以用于具有照明模式和图案类型的投影系统，这导致强烈的离轴局部瞳孔填充。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2007208257A Lithography apparatus, method of manufacturing device, and exchangeable optical element 有权
标题翻译：光刻设备，制造方法和可交换光学元件
公开(公告)号：JP2007208257A
公开(公告)日：2007-08-16
申请号：JP2007012368
申请日：2007-01-23
申请人： Asml Netherlands Bv , Carl Zeiss Smt Ag , エーエスエムエルネザーランズビー.ブイ. , カール・ツァイス・エスエムティー・アーゲー
发明人： LOOPSTRA ERIK R , ENGELEN ADRIANUS FRANCISCUS PE , LUTTIKHUIS BERNARDUS ANTONIUS , RUBINGH MARIA JOHANNA AGNES , HAZENBERG JOHANNES MARTINUS AN , JORRITSMA LAURENTIUS CATRINUS , DE KLERK JOHANNES W , GEUPPERT BERNHARD , SCHAPP PETER , VAN BEUZEKOM AART ADRIANUS , PETRUS FRANCISCUS WILHELMUS MA , SORG FRANZ , DEUFEL PETER
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70308 , G03F7/70825 , G03F7/70933
摘要： PROBLEM TO BE SOLVED: To provide a lithography apparatus having improved focusing ability, a method of manufacturing a device, and an exchangeable optical element. SOLUTION: A projection system PS has one or several faces PP which correspond to Fourier conjugate of an object surface at which a patterning device MA is disposed, or an image surface at which a substrate W is disposed. Such a surface is known as pupil surface. While a projection image can be usefully improved by disposing an optical element 10 in the pupil surface, the system further has an assembly in which the optical element 10 can be exchanged in the pupil surface. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有改进的聚焦能力的光刻设备，一种制造器件的方法和可更换的光学元件。解决方案：投影系统PS具有一个或多个对应于设置有图案形成装置MA的物体表面的傅立叶共轭或者设置基板W的图像面的PP。这样的表面被称为瞳孔表面。虽然通过将光学元件10设置在瞳孔表面中可以有效地改善投影图像，但是该系统还具有其中可以在瞳孔表面中更换光学元件10的组件。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2008004937A Method for reducing wavefront aberration, and computer program 有权
标题翻译：减少波形失真的方法和计算机程序
公开(公告)号：JP2008004937A
公开(公告)日：2008-01-10
申请号：JP2007158118
申请日：2007-06-15
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： TEL WIM TJIBBO , STOFFELS FREERK ADRIAAN , JORRITSMA LAURENTIUS CATRINUS , UITTERDIJK TAMMO , DE KLERK JOHANNES W
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03B27/72 , G03B27/53 , G03F7/70125 , G03F7/70258 , G03F7/706 , G03F7/70891
摘要： PROBLEM TO BE SOLVED: To provide a method for reducing wavefront aberration in a lithography process. SOLUTION: At first, a product structure as a portion of an IC layer pattern is selected 151. Then, exposure conditions including an illumination mode are specified and selected 152. Then, intensity distribution is calculated based on the geometry characteristics and illumination mode characteristics and mask pattern data of a pattern feature 154. Then, a threshold is set in an intensity profile for specifying and selecting an area where a radiant flux passing through a pupil becomes the highest in the pupil 155. Calculated adjustments are searched as the result of least square fitting 157 for minimizing the root mean square value of wavefront aberration in a pupil area determined in 155. Finally, the calculated adjustments are applied to each optical element of a projection system 158. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种降低光刻工艺中的波前像差的方法。首先，选择作为IC层图案的一部分的产品结构151.然后，指定并选择包括照明模式的曝光条件152.然后，基于几何特性和照明计算强度分布模式特征和掩模图案数据。然后，在用于指定和选择在瞳孔155中通过瞳孔的辐射通量变得最高的区域的强度分布中设置阈值。计算的调整被搜索为最小二乘拟合的结果157用于最小化在155中确定的瞳孔面积中的波前像差的均方根值。最后，将所计算的调整应用于投影系统158的每个光学元件。版权所有（C）2008 ，JPO＆INPIT

4. 发明专利

JP2013153168A Method of reducing wave front aberration, and computer program 审中-公开
标题翻译：减少波前失真的方法和计算机程序
公开(公告)号：JP2013153168A
公开(公告)日：2013-08-08
申请号：JP2013020237
申请日：2013-02-05
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： TEL WIM TJIBBO , STOFFELS FREERK ADRIAAN , JORRITSMA LAURENTIUS CATRINUS , UITTERDIJK TAMMO , DE KLERK JOHANNES W
IPC分类号： H01L21/027 , G02B13/00 , G02B17/00 , G03F7/20
CPC分类号： G03B27/72 , G03B27/53 , G03F7/70125 , G03F7/70258 , G03F7/706 , G03F7/70891
摘要： PROBLEM TO BE SOLVED: To provide a method of reducing wave front aberration in a lithographic process.SOLUTION: Wave front aberration is reduced based on a selected pattern to be printed and a selected illumination mode used for exposure. Wave front aberration of a projection system of a lithographic apparatus is measured and reduced by calculating adjustments of optical elements of the projection system and applying the calculated adjustments to the projection system. The calculation of adjustments is based on information on spatial distribution of radiant intensity in a pupil of the projection system which occurs during exposure of a radiation sensitive layer, and is limited to aberration in projection lens pupil areas of relatively high radiant flux.
摘要翻译：要解决的问题：提供降低光刻工艺中的波前像差的方法。解决方案：基于要打印的选定图案和用于曝光的选定照明模式，波前像差减小。通过计算投影系统的光学元件的调整并将计算的调整应用于投影系统来测量和减少光刻设备的投影系统的波前像差。调整的计算基于在辐射敏感层的曝光期间发生的投影系统的光瞳的辐射强度的空间分布的信息，并且被限制在相对高的辐射通量的投影透镜瞳孔区域中的像差。

5. 发明专利

JP2008135742A Lithographic apparatus, method of manufacturing device, and computer program product 有权
标题翻译：平面设备，制造方法和计算机程序产品
公开(公告)号：JP2008135742A
公开(公告)日：2008-06-12
申请号：JP2007300017
申请日：2007-11-20
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： STOELDRAIJER JUDOCUS MARIE DOM , LOOPSTRA ERIK R , MULDER HEINE MELLE , SENGERS TIMOTHEUS FRANCISCUS , STOFFELS FREERK ADRIAAN , JORRITSMA LAURENTIUS CATRINUS , JUNGBLUT REINER MARIA
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70891 , G03F7/70108 , G03F7/70216
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus, capable of reducing an uneven heating effects on an element of a projection system, when using, for example, a local illumination mode, or to provide a method improved for reducing the uneven heating effects. SOLUTION: In the lithographic apparatus, a corrective irradiation step is performed by using an illumination mode arranged so as to heat a selected part on which a large amount of heat is not applied during the production exposure of the element of the projection system close to the pupil plane of the lithographic apparatus. The corrective irradiation step is performed to improve uniformity of optical component heating of the projection system and/or reduce the phase gradient. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种光刻设备，其能够减少对投影系统的元件的不均匀的加热效应，当使用例如局部照明模式时，或提供改进以减少不均匀的方法加热效果。解决方案：在光刻设备中，通过使用照射模式来执行校正照射步骤，所述照射模式被布置为在投影系统的元件的生产曝光期间加热不施加大量热量的选定部分靠近光刻设备的光瞳平面。执行校正照射步骤以改善投影系统的光学部件加热的均匀性和/或降低相位梯度。版权所有（C）2008，JPO＆INPIT

6. 发明专利

JP2014039069A Lithographic apparatus and method of operating lithographic apparatus 有权
标题翻译：平面设备和操作平面设备的方法
公开(公告)号：JP2014039069A
公开(公告)日：2014-02-27
申请号：JP2013243543
申请日：2013-11-26
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BRUIJSTENS JEROEN PETER JOHANNES , BRULS RICHARD JOSEPH , JANSEN HANS , SIEBE LANDHEER , JORRITSMA LAURENTIUS CATRINUS , MEESTER ARNOUT JOHANNES , JANSEN BAUKE , THOMAS IVO ADAM JOHANNES , MIRANDA MARCIO ALEXANDRE CANO , VAN DER LEE MAURICE MARTINUS JOHANNES , TANASA GHEORGHE , NOORDAM LAMBERTUS DOMINICUS
IPC分类号： H01L21/027
CPC分类号： G03F7/70341 , G03B27/52
摘要： PROBLEM TO BE SOLVED: To provide a system to reduce effect of droplets and/or a boundary surface between gas/liquid and a final element on the final element, or to substantially avoid such droplet formation.SOLUTION: A lithographic apparatus comprises: a projection system; and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure, and a substrate and/or a substrate table. In the lithographic apparatus, means is taken for, e.g., reducing effect of droplets on a final element of the projection system or substantially avoiding such droplet formation.
摘要翻译：要解决的问题：提供一种系统，以减少液体和/或气体/液体与最终元件上的最终元件之间的边界表面的影响，或基本上避免这种液滴形成。解决方案：光刻设备包括：投影系统; 以及液体限制结构，其被配置为至少部分地将浸没液体限制在由所述投影系统，所述液体限制结构以及衬底和/或衬底台限定的浸没空间中。在光刻设备中，采取手段来例如减少液滴对投影系统的最终元件的影响或基本上避免这种液滴形成。

7. 发明专利

JP2013016865A Lithographic apparatus and method of operating lithographic apparatus 有权
标题翻译：平面设备和操作平面设备的方法
公开(公告)号：JP2013016865A
公开(公告)日：2013-01-24
申请号：JP2012227010
申请日：2012-10-12
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BRUIJSTENS JEROEN PETER JOHANNES , BRULS RICHARD JOSEPH , JANSEN HANS , SIEBE LANDHEER , JORRITSMA LAURENTIUS CATRINUS , MEESTER ARNOUT JOHANNES , JANSEN BAUKE , THOMAS IVO ADAM JOHANNES , MIRANDA MARCIO ALEXANDRE CANO , VAN DER LEE MAURICE MARTINUS JOHANNES , TANASA GHEORGHE , NOORDAM LAMBERTUS DOMINICUS
IPC分类号： H01L21/027
CPC分类号： G03F7/70341 , G03B27/52
摘要： PROBLEM TO BE SOLVED: To provide a system to reduce effect of droplets and/or an interface between gas/liquid and a final element on the final element or to substantially avoid such droplet formation.SOLUTION: A lithographic apparatus comprises a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. In the lithographic apparatus, means is taken for, e.g., reducing effect of droplets lying on a final element of the projection system or substantially avoiding such droplet formation.
摘要翻译：要解决的问题：提供一种降低液滴和/或气体/液体与最终元件上的最终元件之间的界面的作用的系统，或基本避免这种液滴的形成。解决方案：光刻设备包括投影系统和液体限制结构，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和衬底和/或衬底台限定的浸没空间中。在光刻设备中，采取手段来例如降低位于投影系统的最终元件上的液滴的作用或基本上避免这种液滴形成。版权所有（C）2013，JPO＆INPIT

8. 发明专利

JP2010074160A Lithography device and method of operating lithography device 有权
标题翻译： LITHOGRAPHY设备和操作LITHOGRAPHY设备的方法
公开(公告)号：JP2010074160A
公开(公告)日：2010-04-02
申请号：JP2009208754
申请日：2009-09-10
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BRUIJSTENS JEROEN PETER JOHANNES , BRULS RICHARD JOSEPH , JANSEN HANS , SIEBE LANDHEER , JORRITSMA LAURENTIUS CATRINUS , MEESTER ARNOUT JOHANNES , JANSEN BAUKE , THOMAS IVO ADAM JOHANNES , MIRANDA MARCIO ALEXANDRE CANO , VAN DER LEE MAURICE MARTINUS JOHANNES , TANASA GHEORGHE , NOORDAM LAMBERTUS DOMINICUS
IPC分类号： H01L21/027
CPC分类号： G03F7/70341 , G03B27/52
摘要： PROBLEM TO BE SOLVED: To provide a system that reduces an influence of a droplet to a final element and/or an influence of gas and liquid to the interface of the final element, or substantially avoids the formation of such a droplet. SOLUTION: This lithography device includes: a projection system PS; and a liquid confinement structure for at least partially confining an immersion liquid in an immersion space demarcated by the projection system, a liquid confinement structure 12, and also a substrate and/or a substrate table. In the lithography device, for example, the influence of the droplet on the final element of the projection system PS is reduced, or the formation of such a droplet is avoided substantially. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种降低液滴对最终元素的影响和/或气体和液体对最终元件的界面的影响的系统，或基本避免形成这样的液滴。解决方案：该光刻设备包括：投影系统PS; 以及用于至少部分地将浸没液体限制在由投影系统划分的浸没空间中的液体限制结构，液体限制结构12以及基底和/或基底台。在光刻装置中，例如，液滴对投影系统PS的最终元件的影响减小，或者基本上避免了形成这样的液滴。版权所有（C）2010，JPO＆INPIT

9. 发明专利

SG139650A1 LITHOGRAPHIC APPARATUS, ABERRATION CORRECTION DEVICE AND DEVICE MANUFACTURING METHOD 未知
公开(公告)号：SG139650A1
公开(公告)日：2008-02-29
申请号：SG2007050842
申请日：2007-07-06
申请人： ASML NETHERLANDS BV
发明人： UITTERDIJK TAMMO , JORRITSMA LAURENTIUS CATRINUS
摘要： Lithographic Apparatus, Aberration Correction Device and Device Manufacturing Method An aberration correction device useable in lithography comprises two elements relatively rotatable about an optical axis. One surface of each element has an aspheric form describable by higher Zernike polynomials. When the two surfaces are rotationally aligned, the device has the optical effect of a plane plate. If there is a small relative rotation of the two elements the effect of the device is a phase shift describable by the derivative of the aspheric form. The correction device may be used for correcting aberrations caused by lens heating, especially with illumination modes and pattern types resulting in strong off-axis localised pupil filling in the projection system.

10. 发明专利

SG134294A1 LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND EXCHANGEABLE OPTICAL ELEMENT 未知
公开(公告)号：SG134294A1
公开(公告)日：2007-08-29
申请号：SG2007006505
申请日：2007-01-26
申请人： ASML NETHERLANDS BV , ZEISS CARL SMT AG
发明人： LOOPSTRA ERIK ROELOF , ENGELEN ADRIANUS FRANCISCUS PE , LUTTIKHUIS BERNARDUS ANTONIUS , RUBINGH MARIA JOHANA AGNES , HAZENBERG JOHANNES MARTINUS AN , JORRITSMA LAURENTIUS CATRINUS , DE KLERK JOHANNES WILHELMUS , GEUPPERT BERNHARD , SCHAAP PETER , VAN BEUZEKOM AART ADRIANUS , MANDIGERS PETRUS FRANCISCUS WI , SORG FRANZ , DEUFEL PETER
摘要： A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.

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