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1. 发明专利

JP2007208257A Lithography apparatus, method of manufacturing device, and exchangeable optical element 有权
标题翻译：光刻设备，制造方法和可交换光学元件
公开(公告)号：JP2007208257A
公开(公告)日：2007-08-16
申请号：JP2007012368
申请日：2007-01-23
申请人： Asml Netherlands Bv , Carl Zeiss Smt Ag , エーエスエムエルネザーランズビー.ブイ. , カール・ツァイス・エスエムティー・アーゲー
发明人： LOOPSTRA ERIK R , ENGELEN ADRIANUS FRANCISCUS PE , LUTTIKHUIS BERNARDUS ANTONIUS , RUBINGH MARIA JOHANNA AGNES , HAZENBERG JOHANNES MARTINUS AN , JORRITSMA LAURENTIUS CATRINUS , DE KLERK JOHANNES W , GEUPPERT BERNHARD , SCHAPP PETER , VAN BEUZEKOM AART ADRIANUS , PETRUS FRANCISCUS WILHELMUS MA , SORG FRANZ , DEUFEL PETER
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70308 , G03F7/70825 , G03F7/70933
摘要： PROBLEM TO BE SOLVED: To provide a lithography apparatus having improved focusing ability, a method of manufacturing a device, and an exchangeable optical element. SOLUTION: A projection system PS has one or several faces PP which correspond to Fourier conjugate of an object surface at which a patterning device MA is disposed, or an image surface at which a substrate W is disposed. Such a surface is known as pupil surface. While a projection image can be usefully improved by disposing an optical element 10 in the pupil surface, the system further has an assembly in which the optical element 10 can be exchanged in the pupil surface. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有改进的聚焦能力的光刻设备，一种制造器件的方法和可更换的光学元件。解决方案：投影系统PS具有一个或多个对应于设置有图案形成装置MA的物体表面的傅立叶共轭或者设置基板W的图像面的PP。这样的表面被称为瞳孔表面。虽然通过将光学元件10设置在瞳孔表面中可以有效地改善投影图像，但是该系统还具有其中可以在瞳孔表面中更换光学元件10的组件。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2007329457A Optical element for correction of aberration, and a lithographic apparatus having same 有权
标题翻译：用于校正光学元件的光学元件和具有该光学元件的光刻设备
公开(公告)号：JP2007329457A
公开(公告)日：2007-12-20
申请号：JP2007109016
申请日：2007-04-18
申请人： Asml Netherlands Bv , Carl Zeiss Smt Ag , エーエスエムエルネザーランズビー.ブイ. , カール・ツァイス・エスエムティー・アーゲー
发明人： LOOPSTRA ERIK R , GRAUPNER PAUL , MULKENS JOHANNES CATHARINUS HU
IPC分类号： H01L21/027 , G02B1/06
CPC分类号： G03B27/52 , G02B27/0068 , G03F7/70266
摘要： PROBLEM TO BE SOLVED: To correct aberrations caused by lenses in a lens system.
SOLUTION: An optical element ACE1 for correcting aberrations in an optical apparatus has a casing. The casing is filled with liquid 13 and has a support layer 1 and a cover layer 15 designed to pass light of a predetermined wavelength range. The casing accommodates several actuators AC31, AC32, AC33, and AC34. Each of the actuators has a first end supporting the cover layer and a second end supporting the support layer. Each of the actuators is able to locally change a local distance between the support layer and the cover layer to correct local aberrations in a light beam directed to the optical element by providing local phase shifts.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：校正透镜系统中的透镜引起的像差。解决方案：用于校正光学装置中的像差的光学元件ACE1具有壳体。外壳充满液体13，并具有支撑层1和设计成使预定波长范围的光通过的覆盖层15。外壳可容纳多个执行器AC31，AC32，AC33和AC34。每个致动器具有支撑覆盖层的第一端和支撑支撑层的第二端。每个致动器能够局部地改变支撑层和覆盖层之间的局部距离，以通过提供局部相移来校正定向到光学元件的光束中的局部像差。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2011029658A Lithography equipment and method of manufacturing device 有权
标题翻译： LITHOGRAPHY EQUIPMENT AND METHODS MANUFACTURING DEVICE
公开(公告)号：JP2011029658A
公开(公告)日：2011-02-10
申请号：JP2010220938
申请日：2010-09-30
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JACOBS HERNES , GILISSEN NOUD JAN , JANSEN HANS , KATE NICOLAAS TEN , KEMPER NICOLAAS R , ANTONIUS LEENDERS MARTINUS HENDRIKUS , LOOPSTRA ERIK R , HUBERTUS MULKENS JOHANNES C , HARMEN KLAAS VAN DER SCHOOT , STAVENGA MARCO KOERT , STREEFKERK BOB , VERHAGEN MARTINUS CORNELIS MARIA , STEIJAART PETER PAUL , VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS , VAN DER HOEVEN JAN CORNELIS
IPC分类号： H01L21/027
CPC分类号： G03F7/70341
摘要： PROBLEM TO BE SOLVED: To moderate a defect induced by an immersion liquid in an immersion lithography projection apparatus where a liquid removal system surrounds a liquid supply system for providing liquid to a space between a projection system and a substrate. SOLUTION: The liquid removal system 100 is moveable relative to the liquid supply system (partially shown as a barrier member 12) and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system (partially shown as the barrier member 12) and the liquid removal system 100 may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained so that the vapor pressure of liquid is relatively high. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为了缓和浸没光刻投影装置中的浸没液体引起的缺陷，其中液体移除系统围绕用于向投影系统和基板之间的空间提供液体的液体供应系统。解决方案：液体移除系统100可相对于液体供应系统（部分地示出为阻挡构件12）移动，并且被控制为相对于移动的衬底台具有基本上零的速度。可以覆盖液体供应系统（部分示为阻挡构件12）和液体移除系统100之间的间隙，并且可以保持液体供应系统和衬底台之上的液体移除系统之间的气氛，使得蒸气压的液体比较高。版权所有（C）2011，JPO＆INPIT

4. 发明专利

JP2008010864A Lithography apparatus and method of manufacturing device 有权
标题翻译：平面设备及其制造方法
公开(公告)号：JP2008010864A
公开(公告)日：2008-01-17
申请号：JP2007158123
申请日：2007-06-15
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JACOBS HERNES , GILISSEN NOUD JAN , JANSEN HANS , KATE NICOLAAS TEN , KEMPER NICOLAAS R , ANTONIUS LEENDERS MARTINUS HEN , LOOPSTRA ERIK R , HUBERTUS MULKENS JOHANNES C , HARMEN KLAAS VAN DER SCHOOT , STAVENGA MARCO KOERT , STREEFKERK BOB , VERHAGEN MARTINUS CORNELIS MAR , STEIJAART PETER PAUL , VERMAELEN MARKUS MARTINUS PETR , VAN DER HOEVEN JAN CORNELIS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide an immersion lithography projection apparatus in which a liquid removal system surrounds a liquid supply system that supplies a liquid to a space between a projection system and a substrate. SOLUTION: The liquid removal system is capable of moving with respect to the liquid supply system and is controlled so that is has substantially a relative velocity of zero with respect to a moving substrate table. A gap between the liquid supply system and the liquid removal system can be covered and the atmosphere on the substrate table can be maintained so that the liquid vapor pressure becomes relatively high between the liquid supply system and the liquid removal system. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。解决方案：液体移除系统能够相对于液体供应系统移动并且被控制为使得相对于移动的基板台具有基本相对的零速度。可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持基板台上的气氛，使得液体供应系统和液体移除系统之间的液体蒸气压力变得相对较高。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2007251137A Lithographic apparatus and device manufacturing method 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2007251137A
公开(公告)日：2007-09-27
申请号：JP2007027476
申请日：2007-02-07
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： LUTTIKHUIS BERNARDUS ANTONIUS , LOOPSTRA ERIK R , HARMEN KLAAS VAN DER SCHOOT , FRANSICUS MATHIJS JACOBS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03B27/42 , G03F7/707 , G03F7/70783
摘要： PROBLEM TO BE SOLVED: To clamp a patterning device without deforming it in a lithographic apparatus. SOLUTION: A first surface of a mask in the lithographic apparatus is clamped using a first clamp device, and a second surface different from the first surface is clamped using a second clamp device. A clamp force is preferably applied using a thin film. The first clamp device clamps a substrate from a direction parallel to a plane of the patterning device, a direction perpendicular to the plane of the patterning device and a rotational direction. The second clamp device clamps the patterning device only in the direction parallel to the substrate plane. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：夹持图案形成装置而不使其在光刻设备中变形。解决方案：使用第一夹紧装置夹持光刻设备中的掩模的第一表面，并且使用第二夹紧装置夹住与第一表面不同的第二表面。优选使用薄膜来施加夹紧力。第一夹持装置从平行于图案形成装置的平面的方向，垂直于图案形成装置的平面的方向和旋转方向夹持基板。第二夹持装置仅在平行于基板平面的方向上夹持图案形成装置。版权所有（C）2007，JPO＆INPIT

6. 发明专利

JP2007184576A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2007184576A
公开(公告)日：2007-07-19
申请号：JP2006337301
申请日：2006-12-14
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： SENGERS TIMOTHEUS FRANCISCUS , VAN ASTEN NICOLAAS ANTONIUS AL , BOX WILHELMUS JOSEPHUS , VAN EMPEL TJARKO ADRIAAN RUDOL , LEVASIER LEON MARTIN , LOOPSTRA ERIK R , MUITJES MARCEL JOHANNUS ELISAB , OUWEHAND LUBERTHUS , VAN DER SCHOOR LEON JOSEPH MAR , BECKERS MARCEL , JANSEN ROB , VAN LOENHOUT ELKE
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70883 , G03F7/7075 , G03F7/70858 , G03F9/7011 , G03F9/7034
摘要： PROBLEM TO BE SOLVED: To provide a method of highly precisely adjusting a measuring optical system of a lithographic apparatus. SOLUTION: In the lithographic apparatus, a substrate table constituted to hold a substrate is movable to transfer the substrate between a substrate measuring position and a substrate processing position. The lithographic apparatus also includes a measuring system constituted to measure at least one aspect or a characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is constituted to guide at least one measuring beam and/or a field toward the front surface of the substrate. A projection system is constituted to project a patterned radiation beam onto the target of the substrate when the substrate table holds the substrate in the substrate processing position. An adjusting system is constituted to supply adjusting fluid to at least a part of the path of the measuring beam and/or the field of the measuring system to adjust the part of the path. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种高精度地调整光刻设备的测量光学系统的方法。解决方案：在光刻设备中，用于保持衬底的衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。光刻设备还包括测量系统，该测量系统构成为当衬底台将衬底保持在测量位置时测量衬底的至少一个方面或特性。测量系统被构造成朝向基板的前表面引导至少一个测量光束和/或场。投影系统被构造成当衬底台将衬底保持在衬底处理位置时，将图案化的辐射束投影到衬底的靶上。调整系统被构造成将调节流体提供给测量光束的路径的至少一部分和/或测量系统的场以调整路径的一部分。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2008139289A Manufacturing method of lithographic apparatus and device 有权
标题翻译： LITHOGRAPHIC装置和装置的制造方法
公开(公告)号：JP2008139289A
公开(公告)日：2008-06-19
申请号：JP2007284937
申请日：2007-11-01
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： LOOPSTRA ERIK R , EUSSEN EMIEL JOZEF MELANIE , VAN DER PASCH ENGELBERTUS ANTO , LOOPSTRA ONNO BRAM
IPC分类号： G01B11/00 , H01L21/027 , H01L21/68
CPC分类号： G03F9/7011 , G03F7/70516 , G03F7/70775 , G03F9/7019
摘要： PROBLEM TO BE SOLVED: To provide method for calibration of diffraction gratings on encoder measurement system between two adjacent calibrated positions. SOLUTION: This method intends to relocate sensor object containing encoder type sensor and one of the diffraction gratings along the sensor object and the other diffraction grating at a regular speed. It includes the process of such a relocation in which the above speed is selected so that disorder substantially-elongated throughout the span shorter than distance between the two adjacent calibrated positions may not followed by the above sensor object and one of the diffraction gratings or may only partially be followed, and the process of measuring location of the sensor object to the diffraction grating in a plurality of locations between the two adjacent calibrated positions during the above relocation. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供在两个相邻校准位置之间的编码器测量系统上的衍射光栅的校准方法。解决方案：该方法旨在以常规速度沿着传感器对象和其他衍射光栅重新定位包含编码器型传感器的传感器对象和衍射光栅之一。它包括这样的重新定位的过程，其中选择上述速度，使得整个跨度短于两个相邻的校准位置之间的距离的紊乱可能不在上述传感器对象和衍射光栅之一或者仅可以并且在上述重新定位期间在两个相邻校准位置之间的多个位置中测量传感器对象到衍射光栅的位置的过程。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2007251160A Lithographic apparatus and device manufacturing method 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2007251160A
公开(公告)日：2007-09-27
申请号：JP2007054987
申请日：2007-03-06
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： LOOPSTRA ERIK R , VAN DER PASCH ENGELBERTUS ANTO
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70775 , G03F7/70341
摘要： PROBLEM TO BE SOLVED: To continuously measure the positions of a first substrate stage and a second substrate stage, in a lithographic apparatus for confining a liquid in a space between a final element of a projecting system and a substrate. SOLUTION: The lithographic apparatus includes the first and second substrate stages, and is configured and arranged so as to cooperate in performing a joint movement for making the lithographic apparatus transit from a first arrangement in which the liquid is confined between a first substrate held by the first substrate stage and the final element, to a second arrangement in which the liquid is confined between a second substrate held by the second substrate stage and the final element. In this way, during the joint movement, the liquid is essentially confined within the space with respect to the final element. The lithographic apparatus also includes a position measurement system configured, at least during the joint movement, to measure the positions of the first and second substrate stages. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了连续测量第一基板台和第二基板台的位置，用于将液体限制在投影系统的最终元件和基板之间的空间中的光刻设备中。解决方案：光刻设备包括第一和第二衬底台，并且被配置和布置成协作以执行关节运动，以使光刻设备从其中限定液体的第一布置转移到第一衬底由第一衬底台和最终元件固定到第二布置，其中液体被限制在由第二衬底台保持的第二衬底和最终元件之间。以这种方式，在关节运动期间，液体基本上被限制在相对于最终元件的空间内。光刻设备还包括位置测量系统，其至少在关节运动期间被配置为测量第一和第二基底台的位置。版权所有（C）2007，JPO＆INPIT

9. 发明专利

JP2007150291A Lithographic device and motor 有权
标题翻译：电路设备和电机
公开(公告)号：JP2007150291A
公开(公告)日：2007-06-14
申请号：JP2006302217
申请日：2006-11-08
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： HOL SVEN ANTOIN SVEN , DE KLERK ANGELO C P , LOOPSTRA ERIK R , JACOBS FRANSICUS M , SCHOLTEN MARK , BAKKER ARJAN F
IPC分类号： H01L21/027 , G03F7/20 , H01L21/68
CPC分类号： H02K41/03 , G03F7/70758 , H02K2201/18
摘要： PROBLEM TO BE SOLVED: To provide a improved motor and a lithographic device provided with the improved motor. SOLUTION: This motor comprises a magneto assembly generating a magnetic field. The magnetic field has a plurality of portions, alternately oriented in a first direction and a second direction, along the first direction. The portions are extended in a third direction substantially perpendicular to the first direction and the second direction. The motor further comprises a first coil winding through which a first current flows. The first coil winding is extended in the first direction, at the part between the portions of the magnetic field oriented in the second direction, to generate a force in the first direction. The motor further comprises a second coil winding through which a second current flows. The second coil winding is extended in the first direction, at the part between the portions of the magnetic field substantially oriented in the first direction, to generate a force in the second direction. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种改进的电动机和设置有改进的电动机的光刻装置。解决方案：该电动机包括产生磁场的磁组件。所述磁场具有沿所述第一方向在第一方向和第二方向上交替取向的多个部分。这些部分在基本上垂直于第一方向和第二方向的第三方向上延伸。电动机还包括第一电流流过第一线圈绕组。第一线圈绕组在沿第二方向取向的磁场部分之间的第一方向上延伸，以在第一方向上产生力。电动机还包括第二电流流过的第二线圈绕组。所述第二线圈绕组在所述第一方向上的所述磁场部分之间的部分沿第一方向延伸，以在所述第二方向上产生力。版权所有（C）2007，JPO＆INPIT

10. 发明专利

JP2011146738A Lithography device with portion whereto coated film is attached 有权
标题翻译：附带有电影片的电影设备
公开(公告)号：JP2011146738A
公开(公告)日：2011-07-28
申请号：JP2011083005
申请日：2011-04-04
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： LIEBREGTS PAULUS MARTINUS MARIA , FIEN MENNO , LOOPSTRA ERIK R , VAN DER HAM RONALD , SIMONS WILHELMUS FRANCISCUS JOHANNES , DIREKS DANIEL JOSEPH MARIA , JANSSEN FRANCISCUS JOHANNES JOSEPH , BRANDS GERT-JAN GERARDUS JOHANEES THOMAS , STEFFENS KOEN
IPC分类号： H01L21/027
CPC分类号： G03F7/70958 , G03F7/70341 , G03F7/70866 , G03F7/70975 , G03F7/70983
摘要： PROBLEM TO BE SOLVED: To provide a lithography device which is properly protected from a negative effect resulting for ultraviolet radiation and/or immersion liquid, for example. SOLUTION: A lithography device having a detachable sticky film with a coating on at least part thereof is disclosed. A liquid supply system with a liquid confinement structure extended along at least part of a boundary of a space between a projection system and a substrate support is disclosed. The film with coating exists on at least part of the liquid confinement structure. COPYRIGHT: (C)2011,JPO&INPIT

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