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1. 发明专利

JP2006191092A Substrate handler 有权
标题翻译：基板处理器
公开(公告)号：JP2006191092A
公开(公告)日：2006-07-20
申请号：JP2005377858
申请日：2005-12-28
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： JACOBS HERNES , LUTTIKHUIS BERNARDUS ANTONIUS , VAN DER SCHOOT HARMEN KLAAS , VOSTERS PETRUS MATTHIJS HENRIC
IPC分类号： H01L21/677 , B65G49/06 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a substrate handler which can function more efficiently. SOLUTION: A substrate handler 12 for moving a substrate 8 relative to a substrate table 6 of a lithographic apparatus is adapted to load a substrate 8 the substrate table and to unload the substrate 8 from the substrate table 6 before and after exposure, and comprises at least one support surface or a platform 14 adapted to carry a plurality of the independent substrates 8, 8 simultaneously. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供可以更有效地起作用的基板处理器。解决方案：用于使基板8相对于光刻设备的基板台6移动的基板处理器12适于将基板8加载到基板台并且在曝光之前和之后从基板台6卸载基板8，并且包括适于同时承载多个独立基板8,8的至少一个支撑表面或平台14。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2004343067A Lithographic apparatus, method for fabricating device, and device fabricated through process 有权
标题翻译：平面设备，制造装置的方法和通过工艺制造的装置
公开(公告)号：JP2004343067A
公开(公告)日：2004-12-02
申请号：JP2004067421
申请日：2004-03-10
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： HOL SVEN ANTOIN JOHAN , BUIJS EDWIN JOHAN , VAN DER SCHOOT HARMEN KLAAS , VREUGDEWATER PATRICIA
IPC分类号： H01L21/027 , G03F7/20 , H02K9/22 , H02K41/02 , H02K41/03 , H02K41/035
CPC分类号： G03F7/70858 , G03F7/70758 , H02K9/22 , H02K41/0356
摘要： PROBLEM TO BE SOLVED: To obtain a lithographic system in which dispersive heat generation is reduced by suppressing an eddy current being induced in the cooling element of a Lorentz actuator for moving a substrate or a mask, and performance and reliability of the actuator are prevented from lowering.
SOLUTION: One or more slits 7 made in the cooling element 1 of a Lorentz actuator act as a barrier of eddy current being induced and since electric resistance of an eddy current passage increases, quantity of eddy current is reduced thus lowering the level of damping force and dispersive heat generation. These slits are preferably arranged perpendicularly to an electric field being induced and substantially in parallel with each other. A cooling water channel may be combined with these channels in such a manner as a plurality of parallel passages are formed to reduce the flow impedance of coolant. The lowering of performance is prevented through reduction in heat generation and since a fragile material, e.g. ceramic, is not required, the lowering of reliability is also prevented.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了获得通过抑制在用于移动衬底或掩模的洛伦兹致动器的冷却元件中感应的涡流而降低分散发热的平版印刷系统，以及致动器的性能和可靠性被防止降低。解决方案：在洛仑兹致动器的冷却元件1中制造的一个或多个狭缝7被感应为涡流的阻挡层，并且由于涡流通道的电阻增加，涡流量减少，从而降低了电平的阻尼力和分散发热。这些狭缝优选地垂直于被感应并且基本上彼此平行的电场布置。冷却水通道可以与形成多个平行通道的方式与这些通道组合以减少冷却剂的流动阻抗。通过减少发热来防止性能的降低，并且由于脆弱的材料，例如，不需要陶瓷，也可以防止可靠性的降低。版权所有（C）2005，JPO＆NCIPI

3. 发明专利

JP2005347756A Lithography device and device manufacturing method 有权
标题翻译： LITHOGRAPHY DEVICE AND DEVICE MANUFACTURING METHOD
公开(公告)号：JP2005347756A
公开(公告)日：2005-12-15
申请号：JP2005163682
申请日：2005-06-03
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： TERKEN MARTINUS ARNOLDUS HENRI , JACOBS HERNES , VAN DER SCHOOT HARMEN KLAAS , VOSTERS PETRUS M H , ZAAL KOEN JACOBUS JOHANNES MAR
IPC分类号： H01L21/027 , G03F7/20 , H01J37/20
CPC分类号： G03F7/70716
摘要： PROBLEM TO BE SOLVED: To provide a lithography, including a light weight carriage for a lithographic device with a large rigidity and having full cooling characteristics and arranging characteristics. SOLUTION: There is provided a lithographic device, having a lighting system for adjusting a radiation beam, an article support member for supporting an article placed in the beam path of the radiation beam, and a lithography device having a movable carriage for moving the article support member. The carriage includes a compartmented compound structure, having a non-compound mounting interface and/or cooling interface. With this structure, for example, interface using metal or ceramic materials can be used in combination with an advantage of the compound structure, such as low specific gravity and high Young's modulus at a position and in a direction requiring high strength and high stability and high electrical resistance. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种平版印刷术，其包括具有大刚性并且具有完全冷却特性和布置特性的用于光刻设备的重量轻的滑架。解决方案：提供了一种光刻设备，其具有用于调节辐射束的照明系统，用于支撑放置在辐射束的光束路径中的物品的物品支撑构件，以及具有用于移动的可移动托架的光刻装置文章支持成员。托架包括具有非复合安装界面和/或冷却界面的分隔的复合结构。通过这种结构，例如可以使用金属或陶瓷材料的界面与复合结构的优点结合使用，例如在要求高强度，高稳定性和高稳定性的位置和方向上的低比重和高杨氏模量电阻。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2004040105A Lithograph apparatus and method for manufacturing device 有权
公开(公告)号：JP2004040105A
公开(公告)日：2004-02-05
申请号：JP2003197462
申请日：2003-06-11
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VOSTERS PETRUS MATTHIJS HENRIC , JACOBS HERNES , VAN DER SCHOOT HARMEN KLAAS , RUTGERS PETER
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70808
摘要： PROBLEM TO BE SOLVED: To provide a lithograph projecting apparatus which avoids or reduces a problem occurring by a complicated mobile type linear seal of a large size with high inertia.
SOLUTION: The linear seal 100 seals an overall slot 112 formed on the wall 110 of a vacuum chamber VC of the lithograph projecting apparatus. The seal 100 includes a slender seal member 120 which locally displaces from the slot 112 at a selective position 125. Thus, a duct 140 can enter into the inside of the chamber VC from the outside of the chamber VC where the slender seal member 120 is locally displaced.
COPYRIGHT: (C)2004,JPO

5. 发明专利

JP2007017977A Substrate handler, lithographic apparatus and device manufacturing method 有权
标题翻译：基板处理器，光刻设备和器件制造方法
公开(公告)号：JP2007017977A
公开(公告)日：2007-01-25
申请号：JP2006185665
申请日：2006-07-05
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VAN DER SCHOOT HARMEN KLAAS , JACOBS HERNES , LUTTIKHUIS BERNARDUS ANTONIUS , VOSTERS PETRUS MATTHIJS HENRIC , HAZENBERG JOHANNES MARTINUS AN , VAN BEUZEKOM AART A
IPC分类号： G03F7/20 , H01L21/027 , H01L21/683
CPC分类号： G03F7/70875 , G03F7/7075
摘要： PROBLEM TO BE SOLVED: To provide a substrate handler, a lithographic apparatus, and a device manufacturing method. SOLUTION: The substrate handler for handling a substrate comprises a conditioning device for conditioning the substrate. The substrate handler is provided with a displacing device configured so as to displace the substrate in the direction substantially parallel to a support surface. The displacing device is configured so as to displace the substrate during the conditioning process from one conditioning position to one or more other conditioning positions. The substrate handler comprises a float device configured to provide an air bed above a support surface of the substrate handler. The substrate handler is configured so as to hold the substrate on an air bed during the conditioning of the substrate. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供基板处理器，光刻设备和器件制造方法。解决方案：用于处理衬底的衬底处理器包括用于调节衬底的调节装置。衬底处理器设置有置换装置，其被配置为在基本上平行于支撑表面的方向上移位衬底。置换装置构造成在调节过程中将衬底从一个调节位置移动到一个或多个其它调理位置。衬底处理器包括浮动装置，其构造成在衬底处理器的支撑表面上方提供空气床。衬底处理器被配置为在衬底调节期间将衬底保持在空气床上。版权所有（C）2007，JPO＆INPIT

6. 发明专利

JP2003257851A APPARATUS FOR LITHOGRAPHY AND METHOD OF MANUFACTURING DEVICE 审中-公开
公开(公告)号：JP2003257851A
公开(公告)日：2003-09-12
申请号：JP2002383104
申请日：2002-12-09
申请人： ASML NETHERLANDS BV
发明人： JACOBS HERNES , VAN DER SCHOOT HARMEN KLAAS , VOSTERS PETRUS MATTHIJS HENRIC , DE GROOT TON
IPC分类号： G03F7/20 , H01L21/027 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a projection apparatus for lithography having a planar magnetic positioning means that can be automatically self-recovered and that suppresses mechanical load applied to guide pipes that are mounted on a substrate table to the smallest extent. SOLUTION: This projection apparatus for lithography has a planar magnetic positioning means with which movement of the substrate table in a plane is accomplished, and a mechanical limiter that limits rotation of the substrate table around a direction normal to the plane. COPYRIGHT: (C)2003,JPO

7. 发明专利

JP2007004175A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2007004175A
公开(公告)日：2007-01-11
申请号：JP2006173228
申请日：2006-06-23
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VAN DER PASCH ENGELBERTUS ANTO , VAN DER SCHOOT HARMEN KLAAS
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70291 , G03F7/70625
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus that can accurately position a substrate upon exposure even when the substrate size increases. SOLUTION: A lithographic apparatus is provided which has an array of individually controllable elements to modulate a cross-section of a radiation beam, a substrate table to support a substrate, a projection system to project the modulated radiation beam onto a target portion of the substrate to apply a pattern, and a position encoder having a position sensor and a scale to determine a position of the substrate table. The pattern comprises a first line and a second line, the first line being offset from the second line. The scale comprises a plurality of lines intended to be straight and parallel to one another. The lithographic apparatus further includes: an imaging device to obtain an image of the first and second lines; and an image process unit to determine the non-uniformity of at least a part of the scale based on separation distances between the first and second lines measured at a plurality of positions. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供即使当基板尺寸增加时也可以在曝光时精确地定位基板的光刻设备。解决方案：提供一种光刻设备，其具有可独立控制的元件的阵列，以调制辐射束的横截面，用于支撑衬底的衬底台，投影系统将调制的辐射束投影到目标部分以及具有位置传感器和刻度的位置编码器，以确定衬底台的位置。该图形包括第一行和第二行，第一行与第二行偏移。该刻度尺包括多条相互直线并平行的线。光刻设备还包括：成像装置，用于获得第一和第二线的图像; 以及图像处理单元，用于基于在多个位置处测量的第一和第二线之间的间隔距离来确定刻度的至少一部分的不均匀性。版权所有（C）2007，JPO＆INPIT

8. 发明专利

JP2003203862A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：JP2003203862A
公开(公告)日：2003-07-18
申请号：JP2002382724
申请日：2002-11-27
申请人： ASML NETHERLANDS BV
发明人： JACOBS HERNES , VOSTERS PIET , HOL SVEN ANTOLN JOHAN , VAN DER SCHOOT HARMEN KLAAS , VAN DIESEN ROBERT JOHANNES P , CALLAN DAVID WILLIAM
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus with reduced a problem of outgassing of the material used for conduit, provided to supply utility to a movable element inside a vacuum chamber. SOLUTION: There is provided the lithographic projection apparatus, in which the conduit is provided with a flexible metal bellows, to prevent outgassing due to the vacuum condition within the vacuum chamber, and the movable element may be moved with at least a first degree of freedom. COPYRIGHT: (C)2003,JPO

9. 发明专利

JP2009231846A Substrate handler 有权
公开(公告)号：JP2009231846A
公开(公告)日：2009-10-08
申请号：JP2009146010
申请日：2009-06-19
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JACOBS HERNES , LUTTIKHUIS BERNARDUS ANTONIUS , VAN DER SCHOOT HARMEN KLAAS , VOSTERS PETRUS MATTHIJS HENRIC
IPC分类号： H01L21/027 , G03F7/20 , H01L21/677
摘要： PROBLEM TO BE SOLVED: To provide a substrate handler capable of functioning more efficiently. SOLUTION: The substrate handler 12 is adapted to load a substrate 8 onto a substrate table 6 before exposure and to unload the substrate 8 from the substrate table 6 after exposure. The substrate handler 12 includes at least one support surface adapted to simultaneously convey a plurality of independent substrates 8, 8, or platforms 14, 16. The substrate handler 12 moves the substrate 8 with respect to the substrate table 6 of a lithographic apparatus. COPYRIGHT: (C)2010,JPO&INPIT

10. 发明专利

JP2009231845A Substrate handler 有权
标题翻译：基板处理器
公开(公告)号：JP2009231845A
公开(公告)日：2009-10-08
申请号：JP2009146006
申请日：2009-06-19
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JACOBS HERNES , LUTTIKHUIS BERNARDUS ANTONIUS , VAN DER SCHOOT HARMEN KLAAS , VOSTERS PETRUS MATTHIJS HENRIC
IPC分类号： H01L21/027 , G03F7/20 , H01L21/677
摘要： PROBLEM TO BE SOLVED: To provide a substrate handler capable of functioning more efficiently. SOLUTION: The substrate handler 12 is adapted to load a substrate 8 onto a substrate table 6 before exposure and to unload the substrate 8 from the substrate table 6 after exposure. The substrate handler 12 includes at least one support surface adapted to simultaneously convey a plurality of independent substrates 8, 8, or platforms 14, 16. The substrate handler 12 moves the substrate 8 with respect to the substrate table 6 of a lithographic apparatus. COPYRIGHT: (C)2010,JPO&INPIT

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