专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2006165579A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2006165579A
公开(公告)日：2006-06-22
申请号：JP2005354268
申请日：2005-12-08
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： JOSEPHINA MOORS JOHANNES HUBER , ROBERTUS NICODEMUS JACOBUS VAN , VADIM YEVGENYEVICH BANINE , HEERENS GERT-JAN , ELISABETH HEUTS FREDERIK THEOD , JACOBS JOHANNES HENRICUS WILHE , LIEBREGTS PAULUS MARTINUS MARI , NEERHOF HENDRIK ANTONY JOHANNE
IPC分类号： H01L21/027
CPC分类号： G03F7/70916 , G03F7/70883 , G03F7/70908
摘要： PROBLEM TO BE SOLVED: To provide a method for reducing the amount of contaminants that may flow to the optics compartment as much as possible in a lithographic projection apparatus.
SOLUTION: A device manufacturing method includes projecting a patterned beam of radiation through an optics compartment and a channel that provides an open connection between the optics compartment and a substrate compartment onto a substrate, maintaining an ionized flush gas at a higher pressure in the channel than in the substrate compartment and in the optics compartment during the projecting, intercepting particles that emanate from the substrate with the ionized flush gas, pumping the flush gas carrying the intercepted particles from the substrate compartment using a pump coupled to a gas outlet of the substrate compartment coupled to at least one of the compartments, and establishing an electrical potential difference between a wall of the channel and the outlet and/or a rotor of the pump so that the outlet and/or the rotor of the pump attracts positively charged ions that stem from the ionized flush gas in the channel.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种在光刻投影设备中尽可能多地减少可能流到光学隔室的污染物的量的方法。解决方案：一种器件制造方法包括将图案化的辐射束投射通过光学隔室和通道，其在光学隔室和衬底隔室之间提供开放连接到衬底上，将电离冲洗气体保持在较高压力在通过电离冲洗气体从基板突出的截断颗粒的过程中，通道比衬底隔室和光学隔室中的通道使用连接到基板隔室的气体出口的泵来泵送从基板室运送被拦截的颗粒的冲洗气体所述衬底隔室联接到所述隔室中的至少一个，并且在所述通道的壁与所述泵的出口和/或转子之间建立电势差，使得所述泵的出口和/或转子吸引带正电源自通道中的电离冲洗气体的离子。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2005183959A Lithographic device and manufacturing method therefor 有权
标题翻译：光刻设备及其制造方法
公开(公告)号：JP2005183959A
公开(公告)日：2005-07-07
申请号：JP2004361720
申请日：2004-12-14
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： OTTENS JOOST JEROEN , NEERHOF HENDRIK ANTONY JOHANNE , ZAAL KOEN JACOBUS JOHANNES MAR , LE KLUSE MARCO
IPC分类号： G03F7/20 , H01L21/027 , H01L21/683 , H01L21/68
CPC分类号： H01L21/6831 , G03F7/707 , G03F7/70708
摘要： PROBLEM TO BE SOLVED: To provide a substrate holder in which a fixing force between the top face of the substrate holder and the rear of a substrate is out of the question. SOLUTION: A lithographic device contains an illumination system supplying the beams of a radiation, and an article supporter supporting a flat article arranged in the path of the beam of the radiation. The lithographic device further contains a back-fill gas supply arranged to the article supporter for supplying the rear of the article with a back-fill gas when the back-fill gas supply is supported by a supporting means and a clamp clamping the article to the article supporter during a projection. The device based on one mode has a controller adjusting the clamp and/or a back-fill supply pressure with the object of the release of the clamp before the back-fill gas supply pressure is reduced. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种基板保持器，其中基板保持器的顶面和基板的后部之间的固定力不在问题之中。解决方案：光刻设备包含供应辐射束的照明系统和支撑布置在辐射束的路径中的平坦物品的物品支撑件。平版印刷装置还包含一个背面填充气体供应装置，该填充气体供应装置设置在物品支撑件上，用于当背面填充气体供应由支撑装置支撑时，用于向物品的后部供应填充气体，夹具将夹具夹持到投影中的物品支持者。基于一种模式的装置具有控制器，在填充气体供应压力降低之前，调整夹具和/或补充供给压力，释放夹具。版权所有（C）2005，JPO＆NCIPI

3. 发明专利

JP2005148742A Lithographic apparatus and method for manufacturing device 有权
标题翻译：平面设备和制造设备的方法
公开(公告)号：JP2005148742A
公开(公告)日：2005-06-09
申请号：JP2004328307
申请日：2004-11-12
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： NEERHOF HENDRIK ANTONY JOHANNE , HEERENS GERT-JAN
IPC分类号： G03F1/14 , G03F7/20 , G21K5/10 , H01J37/08 , H01L21/027
CPC分类号： G03F7/70858 , G03F7/70916 , G03F7/7095 , G03F7/70983
摘要： PROBLEM TO BE SOLVED: To prevent damages which may be caused by dielectric breakdown of a high voltage system in a lithographic apparatus.
SOLUTION: A high voltage conductor in a dielectric pellicle or ion damage prevention system is coated with a separation layer having a resistance low enough to prevent accumulation of charges on its surface and also high enough to restrict a peak current on dielectric breakdown.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了防止由光刻设备中的高压系统的介电击穿引起的损坏。解决方案：电介质薄膜或离子损伤防止系统中的高电压导体涂覆有具有足够低的电阻的隔离层，以防止电荷在其表面上的累积，并且还足够高以限制电介质击穿时的峰值电流。版权所有（C）2005，JPO＆NCIPI

4. 发明专利

JP2006128676A Lithographic device and manufacturing method of device 有权
标题翻译：装置的制造装置和制造方法
公开(公告)号：JP2006128676A
公开(公告)日：2006-05-18
申请号：JP2005306503
申请日：2005-10-21
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： NEERHOF HENDRIK ANTONY JOHANNE , MOORS JOHANNES HUBERTUS JOSEPH , OTTENS JOOST JEROEN , LE KLUSE MARCO
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70783
摘要： PROBLEM TO BE SOLVED: To provide a lithographic device provided with a structure for preventing the deformation of an article supported by an article support.
SOLUTION: The lithographic device includes an illuminating system adapted to provide a radiation beam, the article support adapted to support the article disposed in a beam path of the radiation beam, a multi-electrode clamp adapted to apply a clamping force for clamping the article against the article support, and a bias voltage circuit adapted to bias at least one electrode of the multi-electrode clamp so as to be able to avoid the formation of ridges appearing by electrostatic charge on the article.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种设置有用于防止由物品支撑件支撑的物品变形的结构的光刻设备。解决方案：光刻设备包括适于提供辐射束的照明系统，所述物品支撑件适于支撑设置在辐射束的光束路径中的物品，多电极夹具适于施加用于夹紧的夹紧力所述制品抵靠所述物品支撑，以及偏置电压电路，其适于偏置所述多电极夹的至少一个电极，以便能够避免形成由所述物品上的静电电荷出现的脊。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2004247731A Lithography apparatus and method of detecting accurate fixing of object 审中-公开
公开(公告)号：JP2004247731A
公开(公告)日：2004-09-02
申请号：JP2004033098
申请日：2004-02-10
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： NEERHOF HENDRIK ANTONY JOHANNE
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/707 , G03F7/70866
摘要： PROBLEM TO BE SOLVED: To provide a lithography apparatus and a method of detecting the accurate fixing of an object.
SOLUTION: The lithography apparatus comprises a support structure mask stage for fixing an object 5 (a substrate such as a wafer and a mask) and a wafer stage, wherein partitions are delimited by the support structure mask stage, the wafer stage, and the object 5 (a substrate such as a wafer and a mask) fixed on the support structure mask stage and the wafer stage. A supply means 11 is connected to the partition and supplies fluid to the partition. The supply means 11 comprises an instrument 15 for measuring a change in at least one of the flow velocity and pressure of the fluid.
COPYRIGHT: (C)2004,JPO&NCIPI

6. 发明专利

JP2007081395A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2007081395A
公开(公告)日：2007-03-29
申请号：JP2006238794
申请日：2006-09-04
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： NEERHOF HENDRIK ANTONY JOHANNE , BOTMA HAKO , RAVENSBERGEN MARIUS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70191 , G03F7/70083
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device manufacturing method. SOLUTION: A lithographic apparatus comprises: an illumination system configured to condition a radiation beam; a support formed to support a patterning device (formed to impart a cross-sectional pattern to the radiation beam to form a patterned radiation beam); a substrate table formed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An intensity adjustment device is positioned in a radiation system, and comprises multiple members for casting penumbrae in the radiation beam illuminating the patterning device. In addition, an attenuation control device is provided to adjust the members so as to control attenuation of the patterned radiation beam projected onto the target portion of the substrate across the cross section of the patterned radiation beam. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供光刻设备和设备制造方法。解决方案：光刻设备包括：照明系统，被配置为调节辐射束; 形成以支撑图案形成装置（形成为赋予辐射束以形成图案化辐射束的横截面图案）的支撑件; 形成为保持基板的基板台; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上。强度调节装置定位在辐射系统中，并且包括多个用于在照射图案形成装置的辐射束中铸造半暗带的构件。此外，提供衰减控制装置以调整构件，以便控制投射到基板上的图案化辐射束的衰减，跨过图案化的辐射束的横截面。版权所有（C）2007，JPO＆INPIT

7. 发明申请

WO2005057280A3 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：WO2005057280A3
公开(公告)日：2006-02-02
申请号：PCT/NL2004000826
申请日：2004-11-29
申请人： ASML NETHERLANDS BV , VAN ZWET ERWIN JOHN , VAN ELP JAN , MOORS JOHANNES HUBERTUS JOSEPH , NEERHOF HENDRIK ANTONY JOHANNE , OTTENS JOOST JEROEN , DE GROOF ADRIANUS MATHIJS MARI , KUIPERS LEO WILHELMUS MARIA , GIESEN PETER THEODORUS MARIA , LE KLUSE MARCO
发明人： VAN ZWET ERWIN JOHN , VAN ELP JAN , MOORS JOHANNES HUBERTUS JOSEPH , NEERHOF HENDRIK ANTONY JOHANNE , OTTENS JOOST JEROEN , DE GROOF ADRIANUS MATHIJS MARI , KUIPERS LEO WILHELMUS MARIA , GIESEN PETER THEODORUS MARIA , LE KLUSE MARCO
IPC分类号： G03F7/20 , H01L21/00 , H01L21/67 , H02N13/00
CPC分类号： H01L21/67259 , G03F7/707 , G03F7/70741 , G03F7/7075
摘要： A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system for providing a beam of radiation on a flat article to be placed in a beam path of the beam of radiation, and an article handler for handling the article during placement or removal of the article. The article handler includes an electrode and a dielectric layer in order to form an electrostatic clamp for electrostatically clamping the article.
摘要翻译：公开了一种光刻设备。光刻设备包括用于在要放置在辐射束的光束路径中的平坦物品上提供辐射束的照明系统，以及用于在放置或移除物品期间处理物品的物品处理器。物品处理器包括电极和电介质层，以便形成用于静电夹紧物品的静电夹。

8. 发明专利

SG135017A1 LITHOGRAPHIC APPARATUS AND METHOD TO DETECT CORRECT CLAMPING OF AN OBJECT 未知
公开(公告)号：SG135017A1
公开(公告)日：2007-09-28
申请号：SG2004005583
申请日：2004-02-10
申请人： ASML NETHERLANDS BV
发明人： NEERHOF HENDRIK ANTONY JOHANNE
IPC分类号： G03F7/20 , H01L21/027
摘要： A lithographic apparatus includes a support structure adapted to clamp an object. The support structure and the object clamped thereon define a compartment. The supply structure is connected to the compartment and supplies a fluid to the compartment. The supply structure includes a meter to measure a change in at least one of flow velocity of the fluid and pressure of the fluid.

9. 发明专利

SG112968A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 未知
公开(公告)号：SG112968A1
公开(公告)日：2005-07-28
申请号：SG200407386
申请日：2004-11-18
申请人： ASML NETHERLANDS BV
发明人： OTTENS JOOST JEROEN , NEERHOF HENDRIK ANTONY JOHANNE , ZAAL KOEN JACOBUS JOHANNES MAR , LE KLUSE MARCO
IPC分类号： G03F7/20 , H01L21/027 , H01L21/683
摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, an article support for supporting a flat article to be placed in a beam path of the beam of radiation on the article support, a backfill gas feed arranged in the article support for feeding backfill gas to a backside of the article when supported by the article support, and a clamp for clamping the article against the article support during projection. According to one aspect of the invention, the apparatus includes a controller for controlling the clamp and/or the backfill gas feed pressure so as to release the clamp prior to reducing the backfill gas feed pressure.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式