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1. 发明专利

JP2005340825A Lithography device having gas flushing device 有权
标题翻译：具有气体冲洗装置的算术装置
公开(公告)号：JP2005340825A
公开(公告)日：2005-12-08
申请号：JP2005150621
申请日：2005-05-24
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： BECKERS MARCEL , HULTERMANS RONALD J , KATE NICOLAAS TEN , KEMPER NICOLAAS R , KOPPELAARS NICOLAAS F , SCHOTSMAN JAN-MARIUS , DER HAM RONALD V , VAN UIJTREGT JOHANNES ANTONIUS
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70933 , G03F7/70908
摘要： PROBLEM TO BE SOLVED: To provide a lithography device having a gas flushing device.
SOLUTION: The lithography device includes a lighting system which supplies projection beams, and a support structure which supports a patterning device useful for supplying beams having a pattern in the section thereof. The lithography device also has a gas flushing device which flushes a practically layered gas flow across the projection beams and/or along the surface of optical components and includes a single gas exit having an inner rim on the downstream end thereof. The inner rim demarcates the entire area of the gas exit, which is equipped with a laminator having an effective area where the layered gas flow practically comes out therefrom when the gas is used. The effective area of the laminator has a laminator opening and includes a material at least having the same size as the entire area of the gas exit.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种具有气体冲洗装置的光刻装置。解决方案：光刻设备包括提供投影光束的照明系统，以及支撑结构，其支撑用于在其部分中提供具有图案的光束的图案形成装置。光刻装置还具有气体冲洗装置，其冲刷跨越投影束和/或沿着光学部件的表面的实际分层的气流，并且包括在其下游端具有内缘的单个气体出口。内缘划分出气体出口的整个区域，该气体出口配备有当使用气体时具有有效面积的层压气体实际上从其出来的层压机。层压机的有效面积具有层压机开口，并且包括至少与气体出口的整个区域具有相同尺寸的材料。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2006080535A Lithography apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHY设备和设备制造方法
公开(公告)号：JP2006080535A
公开(公告)日：2006-03-23
申请号：JP2005263564
申请日：2005-09-12
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VAN DER NET ANTONIUS J , VAN EMPEL TJARKO ADRIAAN RUDOL , DER HAM RONALD V
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70933 , G03F7/70775 , G03F7/70883
摘要： PROBLEM TO BE SOLVED: To reduce the pollution of a certain apparatus component that can assure and improve the desired action of an interferometer positioning device.
SOLUTION: This lithography apparatus is equipped with a support unit that supports a pattern setting device giving patterns to the cross-section of a radiation beam to form the radiation beam with a preset patterns; substrate table that holds a substrate; projection system that projects the radiation beam with the preset pattern to the target part of the substrate; internal space where an interferometer beam propagate; and a primary gas supply source that supplies purge gas to prevent the pollution of the projection system. The purge gas has a predetermined refraction index. This apparatus is also provided with a secondary gas supply source to supply gas for adjustment in the internal space for adjusting the internal space and a refractive index matching unit to match the refractive index of the gas for adjustment with the predetermined refractive index of the purge gas.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了减少可以确保和改善干涉仪定位装置的期望动作的特定装置部件的污染。解决方案：该光刻设备配备有支撑单元，该支撑单元支撑图案设置装置，其给出辐射束横截面的图案以形成具有预设图案的辐射束; 保持基板的基板台; 投影系统，其将具有预设图案的辐射束投射到基板的目标部分; 干涉仪光束传播的内部空间; 以及提供净化气体以防止投影系统的污染的主要气体供应源。净化气体具有预定折射率。该装置还设置有二次气体供应源，用于在内部空间中供应用于调节内部空间的气体和折射率匹配单元，以将用于调节的气体的折射率与净化气体的预定折射率相匹配。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2006013502A Lithographic apparatus and device manufacturing method 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2006013502A
公开(公告)日：2006-01-12
申请号：JP2005181472
申请日：2005-06-22
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： JOERI LOF , MULKENS JOHANNES CATHARINUS HU , MERTENS JEROEN JOHANNES SOPHIA , VAN DER NET ANTONIUS J , DER HAM RONALD V , LALLEMANT NICOLAS , BECKERS MARCEL
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70933 , G03F7/70341 , G03F7/70808
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus which reduces disturbances in at least one of a projection system and an illumination system arising from flow induced noise, and a method for manufacturing a device. SOLUTION: A purge hood of a purging system supplies gas to a purge volume including at least a portion of a projection system and/or at least a portion of an illumination system, and is floated over a substrate and/or a substrate table by gas bearings. The gas bearings 12 and 14 also function as coupling devices which stably maintain a small gap 22 from the substrate W through gas flow regulation by a regulator 26. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供减少由流动引起的噪声引起的投影系统和照明系统中的至少一个的干扰的光刻设备以及用于制造设备的方法。解决方案：清洗系统的净化罩向包括投影系统的至少一部分和/或照明系统的至少一部分的净化容积提供气体，并且浮在基板和/或基板上气体轴承表。气体轴承12和14还用作通过调节器26通过气流调节从衬底W稳定地保持小间隙22的耦合装置。（C）2006年，JPO和NCIPI

4. 发明专利

JP2009141356A Lithography apparatus, and method for manufacturing device 有权
标题翻译：平面设备和制造设备的方法
公开(公告)号：JP2009141356A
公开(公告)日：2009-06-25
申请号：JP2008307707
申请日：2008-12-02
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： ROGER JOHANNES MARIA HUBERTUS , CORNELISSEN SEBASTIAAN MARIA J , LAMBERTUS DONDERS SJOERD NICOL , KATE NICOLAAS TEN , DER HAM RONALD V , ROSET NIEK JACOBUS JOHANNES , FRANSISCUS MATHIJS JACOBS , GERARDUS ARNOLDUS HENDRICUS FR , REINDER WIETSE ROOS , MATTIJS HOGELAND , RIEPEN MICHEL
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70716 , G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a system for removing liquid from an upper surface of a substrate table in immersion lithography. SOLUTION: An immersion lithography projection apparatus is disclosed. The apparatus includes a substrate table for holding the substrate and a liquid feed system for feeding the liquid to the substrate. The device is constructed to allow a liquid flow flowing outside the substrate and traversing at least two outside end parts of an upper surface of the substrate table. The shape of the end part may be optimized in such a way as to reduce the thickness as a layer of the fluid on the upper surface in a static state. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于在浸没式光刻中从衬底台的上表面去除液体的系统。解决方案：公开了一种浸没光刻投影装置。该装置包括用于保持基板的基板台和用于将液体供给到基板的液体供给系统。该装置被构造成允许液体流动流过基板并横过基板台的上表面的至少两个外端部分。端部的形状可以以如下方式进行优化：将静电状态下的上表面上的流体层的厚度减小。版权所有（C）2009，JPO＆INPIT

5. 发明专利

JP2009141357A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2009141357A
公开(公告)日：2009-06-25
申请号：JP2008307832
申请日：2008-12-02
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KATE NICOLAAS TEN , VENEMA WILLEM JURRIANUS , DER HAM RONALD V
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341
摘要： PROBLEM TO BE SOLVED: To remove unwanted droplets of an immersion fluid from a surface of a lithographic apparatus. SOLUTION: The immersion lithographic apparatus is provided which has an electrode set to remove unwanted droplets of an immersion fluid from a particular surface. Unwanted droplets of immersion fluid may form on a plurality of different surfaces of the immersion apparatus, such as on a liquid barrier member. If allowed to evaporate and/or dry, those droplets may cause a problem such as uncontrolled heat loading of the apparatus and/or staining of the surface. An electrode set is provided on a surface where the droplets are likely to be formed. A controlled voltage is applied to the electrodes within the electrode set to electrostatically remove the droplets from the surface. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：从光刻设备的表面去除浸没流体的不想要的液滴。解决方案：提供浸没式光刻设备，其具有设置成从特定表面去除浸没流体的不想要的液滴的电极。浸没液体的不希望的液滴可以形成在浸没设备的多个不同表面上，例如在液体屏障构件上。如果允许蒸发和/或干燥，则这些液滴可能引起诸如装置的不受控制的热负荷和/或表面污染等问题。在可能形成液滴的表面上设置电极组。将受控电压施加到电极组中的电极，以从表面静电除去液滴。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2007096294A Lithography apparatus and internal space adjustment method of device manufacturing apparatus 有权
标题翻译：设备制造设备的平面设备和内部空间调整方法
公开(公告)号：JP2007096294A
公开(公告)日：2007-04-12
申请号：JP2006239753
申请日：2006-09-05
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VAN EMPEL TJARKO ADRIAAN RUDOL , DER HAM RONALD V , ROSET NIEK JACOBUS JOHANNES
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70933 , G03F7/70775 , G03F7/70883
摘要： PROBLEM TO BE SOLVED: To provide a lithography apparatus and an internal space adjustment method of device manufacturing apparatus. SOLUTION: The lithography apparatus comprises at least a first gas shower constituted so as to supply a first air current into an internal space of the lithography apparatus, and at least a second gas shower constituted so as to supply a second air current into the internal space of the lithography apparatus, wherein the first and second air currents are at least partially directed to one another by the gas shower. Further, there is provided a method of adjusting the internal space of a device manufacturing apparatus, wherein the first adjusted air current and the second adjusted air current are supplied to the internal space, so that they are at least partially directed to one another. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：解决的问题：提供一种装置制造装置的光刻装置和内部空间调整方法。解决方案：光刻设备至少包括第一气体喷淋器，其构造成将第一气流提供到光刻设备的内部空间中，并且至少第二气体喷淋器构造成将第二气流供应到光刻设备的内部空间，其中第一和第二气流至少部分地通过气体淋浴相互指向。此外，提供了一种调节装置制造装置的内部空间的方法，其中第一调节气流和第二调节气流被提供给内部空间，使得它们至少部分地彼此指向。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2008072139A Lithographic apparatus, and device manufacturing method 有权
标题翻译： LITHOGRAPHIC设备和设备制造方法
公开(公告)号：JP2008072139A
公开(公告)日：2008-03-27
申请号：JP2007300911
申请日：2007-11-20
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JOERI LOF , MULKENS JOHANNES CATHARINUS HU , MERTENS JEROEN JOHANNES SOPHIA , VAN DER NET ANTONIUS J , DER HAM RONALD V , LALLEMANT NICOLAS , BECKERS MARCEL
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70933 , G03F7/70341 , G03F7/70808
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus including: an illumination system for adjusting a beam of radiation; and to provide a support structure designed to support a patterning device. SOLUTION: In the lithographic apparatus, a purge hood of a purge system supplies gas to at least a part of a projection system and/or to a purge volume including at least a part of the illumination system; and the purge food floats on a substrate and/or a substrate table by gas bearings. The gas bearings 12 and 14 serves as a coupling device for keeping a gap 22 between each of the gas bearings and a substrate W stable and small by a gas flow control with a control element 26. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种光刻设备，包括：用于调整辐射束的照明系统; 并且提供设计成支撑图案形成装置的支撑结构。解决方案：在光刻设备中，清洗系统的净化罩向投影系统的至少一部分和/或包括至少一部分照明系统的净化容积供应气体; 并且吹扫食物通过气体轴承漂浮在基板和/或基板台上。气体轴承12和14用作用于通过控制元件26通过气体流量控制来保持每个气体轴承和基板W之间的间隙22的联接装置。（C）2008年， JPO＆INPIT

8. 发明专利

JP2012054572A Lithography apparatus, and device manufacturing method 有权
标题翻译： LITHOGRAPHY设备和设备制造方法
公开(公告)号：JP2012054572A
公开(公告)日：2012-03-15
申请号：JP2011222759
申请日：2011-10-07
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： ROGER JOHANNES MARIA HUBERTUS KROONEN , SEBASTIAN MARIA JOHANNES CORNELISSEN , LAMBERTUS DONDERS SJOERD NICOLAAS , KATE NICOLAAS TEN , DER HAM RONALD V , ROSET NIEK JACOBUS JOHANNES , FRANSISCUS MATHIJS JACOBS , GERARDUS ARNOLDUS HENDRICUS FRANCISCUS JANSSEN , REINDER WIETSE ROOS , MATTIJS HOGELAND , RIEPEN MICHEL
IPC分类号： H01L21/027
CPC分类号： G03F7/70716 , G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a system for removing liquid from an upper surface of a substrate table in immersion lithography.SOLUTION: An immersion lithography projection apparatus is disclosed. The apparatus comprises a substrate table for holding a substrate and a liquid feeding system for feeding liquid to the substrate. The apparatus is constructed to allow a liquid flowing outside the substrate and crossing at least two outside end parts of an upper surface of the substrate table. A shape of the end parts may be optimized in such a way as to reduce thickness of a liquid layer on the upper surface in a static state.

9. 发明专利

JP2009021636A Lithographic apparatus having gas flushing device 有权
标题翻译：具有气体冲洗装置的平面设备
公开(公告)号：JP2009021636A
公开(公告)日：2009-01-29
申请号：JP2008265455
申请日：2008-10-14
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BECKERS MARCEL , HULTERMANS RONALD J , KATE NICOLAAS TEN , KEMPER NICOLAAS R , KOPPELAARS NICOLAAS F , SCHOTSMAN JAN-MARIUS , DER HAM RONALD V , VAN UIJTREGT JOHANNES ANTONIUS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70933 , G03F7/70908
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus having a gas flushing device. SOLUTION: The lithographic apparatus includes an illumination system IL to provide a beam of radiation and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The apparatus also includes the gas flushing device for flushing a substantially laminar flow of gas across the beam PB of radiation and/or along a surface of an optical component. The gas flushing device includes a single gas outlet that has an inner rim at a downstream end of the gas outlet. The inner rim defines a total gas outlet area. The gas outlet is provided with a laminator that has an effective area out of which, in use, the substantially laminar flow of gas flows. The laminator effective area includes material that has laminator openings and is at least as large as the total gas outlet area. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有气体冲洗装置的光刻设备。解决方案：光刻设备包括照明系统IL以提供辐射束和用于支撑图案形成装置的支撑结构。图案形成装置用于在其横截面中赋予光束图案。该装置还包括气体冲洗装置，用于冲洗基本层流的气体穿过辐射束PB和/或沿着光学部件的表面。气体冲洗装置包括单个气体出口，其在气体出口的下游端具有内缘。内缘定义了总气体出口面积。气体出口设置有层压机，其具有在使用中基本上层流的气体流动的有效区域。层压机有效区域包括具有层压机开口并且至少与总气体出口面积一样大的材料。版权所有（C）2009，JPO＆INPIT

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