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1. 发明专利

JP2006039566A System and method to modify spatial response of pattern generator 审中-公开
标题翻译：用于修改图案发生器空间响应的系统和方法
公开(公告)号：JP2006039566A
公开(公告)日：2006-02-09
申请号：JP2005216007
申请日：2005-07-26
申请人： Asml Holding Nv , エーエスエムエルホールディングナームローゼフェンノートシャップASML Holding N.V.
发明人： LIPSON MATTHEW , WILKLOW RONALD A
IPC分类号： G03F1/08 , C23C14/04
CPC分类号： C23C14/044 , C23C14/24 , C23C16/042 , C23C16/482 , G03F1/00 , G03F1/50 , G03F7/70291 , G03F7/70475
摘要： PROBLEM TO BE SOLVED: To provide a system and a method to modify the spatial response of a pattern generator. SOLUTION: The method is characterized in that: (a) a material is directed to a layer of a pattern generator device to form a coating on the layer; and (b) at least a part of the material is prevented from reaching the layer in the step (a) so as to generate a trapezoidal profile of reflected light from the coating on the pattern generator. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于修改图案生成器的空间响应的系统和方法。解决方案：该方法的特征在于：（a）材料被引导到图案发生器装置的层以在层上形成涂层; 和（b）在步骤（a）中防止材料的至少一部分到达层，从而产生来自图案发生器上的涂层的反射光的梯形轮廓。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2006113594A System and method to block unwanted light reflecting from pattern generating portion from reaching object 审中-公开
标题翻译：阻止从图案生成部分吸收的物体的反射光的系统和方法
公开(公告)号：JP2006113594A
公开(公告)日：2006-04-27
申请号：JP2005302176
申请日：2005-10-17
申请人： Asml Holding Nv , エーエスエムエルホールディングナームローゼフェンノートシャップASML Holding N.V.
发明人： LIPSON MATTHEW , MASON CHRISTOPHER J , KREUZER JUSTIN L
IPC分类号： G03B21/00
CPC分类号： G03B27/42
摘要： PROBLEM TO BE SOLVED: To provide a system and a method used to substantially restrain or prevent light reflecting from the unwanted area of a spatial optical modulator from reaching an object.
SOLUTION: The system and the method include a pattern generating portion including active areas and inactive areas, a projection system and the object. In the system, the pattern generating portion patterns light traveling towards the active areas and the projection system projects the patterned light onto the object. The pattern generating portion directs light traveling towards the inactive areas away from the object. In the method, the part of a radiated beam traveling along a path including the active areas of the pattern generating portion is patterned, the patterned beam is projected onto the object, and the part of the radiated beam traveling along a path towards the inactive areas of the pattern generating portion is directed away from the object.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于基本上抑制或防止从空间光学调制器的不需要的区域反射的光到达物体的系统和方法。解决方案：系统和方法包括包括活动区域和非活动区域的图案生成部分，投影系统和对象。在该系统中，图案产生部分图案向着有源区域传播的光线，并且投影系统将图案化的光投射到物体上。图案产生部分引导朝向远离对象的非活动区域行进的光。在该方法中，沿着包括图案生成部分的有效区域的路径行进的辐射光束的部分被图案化，图案化的光束被投射到物体上，并且辐射光束的一部分沿着朝向无效区域的路径行进图案生成部分被指向远离物体。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2006135332A Lithography system and device manufacturing method 审中-公开
标题翻译： LITHOGRAPHY系统和器件制造方法
公开(公告)号：JP2006135332A
公开(公告)日：2006-05-25
申请号：JP2005321293
申请日：2005-11-04
申请人： Asml Holding Nv , エーエスエムエルホールディングナームローゼフェンノートシャップASML Holding N.V.
发明人： LIPSON MATTHEW , LATYPOV AZAT M
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70291 , G03F7/70283
摘要： PROBLEM TO BE SOLVED: To provide a system and a method in which the optical performance of a mask-less lithography system is improved. SOLUTION: The lithography system 1 comprises an illumination system IL that supplies radiation beams and a projection system PS. The projection system PS comprises an optical system and a patterning device PD located at a pupil plane. The patterning device PD patterns the radiation beams and the optical system projects the patterned radiation beams onto the target of a substrate W. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：解决的问题：提供一种提高无掩模光刻系统的光学性能的系统和方法。解决方案：光刻系统1包括提供辐射束的照明系统IL和投影系统PS。投影系统PS包括位于光瞳平面处的光学系统和图案形成装置PD。图案形成装置PD对辐射束进行成像，并且光学系统将图案化的辐射束投射到衬底W的靶上。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2005203795A Covering method of effective aperture of optical element between piles of protective layer for glue 审中-公开
标题翻译：玻璃保护层桩之间的光学元件有效孔的覆盖方法
公开(公告)号：JP2005203795A
公开(公告)日：2005-07-28
申请号：JP2005008191
申请日：2005-01-14
申请人： Asml Holding Nv , エーエスエムエルホールディングナームローゼフェンノートシャップ
发明人： LIPSON MATTHEW
IPC分类号： H01L21/027 , B05D1/32 , B05D5/06
CPC分类号： B05D1/322
摘要： PROBLEM TO BE SOLVED: To provide a method which protects an effective aperture of an optical element while an outer peripheral part of the optical element is covered with a protective layer for glue.
SOLUTION: This method comprises the following steps: (a) an optical element is held, a first domain of this optical element is covered and a second domain of this optical element is exposed; (b) a first cover is provided on the second domain; (c) the holding state of the optical element is released; (d) a second cover is provided on the optical element; and (e) the first cover and the second cover are removed from the second domain of the optical element.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种保护光学元件的有效孔径的方法，同时光学元件的外周部分被胶水保护层覆盖。解决方案：该方法包括以下步骤：（a）保持光学元件，该光学元件的第一区域被覆盖，并且该光学元件的第二区域被暴露; （b）在第二域上设置第一盖; （c）释放光学元件的保持状态; （d）第二盖设置在光学元件上; 和（e）第一盖和第二盖从光学元件的第二区域移除。版权所有（C）2005，JPO＆NCIPI

5. 发明专利

JP2004126580A Method for reducing light emitted through end part of optical element and optical element 审中-公开
公开(公告)号：JP2004126580A
公开(公告)日：2004-04-22
申请号：JP2003334005
申请日：2003-09-25
申请人： Asml Holding Nv , エーエスエムエルホールディングナームローゼフェンノートシャップ
发明人： LIPSON MATTHEW , WILKLOW RONALD A
IPC分类号： C09J5/00 , B05D1/40 , C03C17/23 , C03C27/00 , G02B3/00 , G02B5/00 , G02B7/02
CPC分类号： G03F7/70341 , G02B1/105 , G02B1/14 , G02B5/003 , G02B7/025 , Y10T156/10
摘要： PROBLEM TO BE SOLVED: To provide a method for reducing light emitted through the end part of an optical element. SOLUTION: The coating of an organic metal oxide compound is applied to the end part of the optical element, the organic metal oxide compound is changed into a corresponding metal oxide by exposing the organic metal oxide compound to ultraviolet rays and thus an adhesive material used for having the coating hold the optical element at a prescribed position is protected from degradation induced by the light. COPYRIGHT: (C)2004,JPO

6. 发明专利

JP2009302559A Lithographic apparatus, and device manufacturing method 有权
标题翻译： LITHOGRAPHIC设备和设备制造方法
公开(公告)号：JP2009302559A
公开(公告)日：2009-12-24
申请号：JP2009208849
申请日：2009-09-10
申请人： Asml Holding Nv , Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ. , エーエスエムエルホールディングエヌ.ブイ.
发明人： LIPSON MATTHEW , DIERICHS MARCEL MATHIJS T M , DONDERS SJOERD NICOLAAS LAMBER , MULKENS JOHANNES CATHARINUS H , STREEFKERK BOB , WILKLOW RONALD , DE JONGE ROEL
IPC分类号： H01L21/027 , G02B13/24 , G03F7/20
CPC分类号： G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus which includes an immersion liquid having a refractive index higher than that of water and has no possibility of agglomeration of contained particles during operation. SOLUTION: In a projection exposure type lithographic apparatus used as a stepper or a scanner, an aqueous solution of one or more alkali metal halides such as alkali metal fluoride, alkali metal chloride, and alkali metal bromide, is used as an immersion liquid having a refractive index higher than that of water. The refractive index is 1.5 or more. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种光刻设备，其包括折射率高于水的浸液，并且在操作期间不具有所包含的颗粒的聚集的可能性。解决方案：在用作步进器或扫描仪的投影曝光型光刻设备中，使用一种或多种碱金属卤化物如碱金属氟化物，碱金属氯化物和碱金属溴化物的水溶液作为浸渍液体的折射率高于水的折射率。折射率为1.5以上。版权所有（C）2010，JPO＆INPIT

7. 发明专利

JP2008199006A Wafer chuck and method of forming wafer chuck 有权
标题翻译：波形卡块及其形成方法
公开(公告)号：JP2008199006A
公开(公告)日：2008-08-28
申请号：JP2008012533
申请日：2008-01-23
申请人： Asml Holding Nv , エーエスエムエルホールディングエヌ.ブイ.
发明人： LIPSON MATTHEW , HARNED ROBERT D , O'CONNOR GEOFFREY , O'NEIL TIMOTHY
IPC分类号： H01L21/027 , H01L21/683
CPC分类号： H01L21/68757 , G03F7/707 , Y10T156/10 , Y10T156/1089 , Y10T428/24744
摘要： PROBLEM TO BE SOLVED: To provide a wafer chuck having improved performance, capable of realizing temperature control and high quality lithography scan. SOLUTION: There is provided a wafer chuck used in a lithography apparatus in which a low thermal expansion glass ceramic substrate, a silicon silicon carbide layer, and an adhesive layer containing silicate salt having a strength of at least about 5 MPa, wherein the silicon silicon carbide layer is stacked on the substrate by the adhesive layer. In addition, a part of the one or both of the low thermal expansion glass ceramic substrate and the silicon silicon carbide layer are coated with adhesive liquid, and the substrate and the silicon silicon carbide layer are brought into contact with each other, to connect the substrate and the silicon silicon carbide layer. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供能够实现温度控制和高质量光刻扫描的具有改进性能的晶片卡盘。解决方案：提供了一种在光刻设备中使用的晶片卡盘，其中低热膨胀玻璃陶瓷基板，硅碳化硅层和含有至少约5MPa的强度的含硅酸盐的粘合剂层，其中通过粘合剂层将硅碳化硅层堆叠在基板上。此外，低热膨胀玻璃陶瓷基板和硅碳化硅层中的一个或两个的一部分涂覆有粘合剂液体，并且使基板和硅碳化硅层彼此接触，以将基板和硅碳化硅层。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2008131045A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2008131045A
公开(公告)日：2008-06-05
申请号：JP2007296177
申请日：2007-11-15
申请人： Asml Holding Nv , Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ. , エーエスエムエルホールディングエヌ.ブイ.
发明人： HUBERTUS MULKENS JOHANNES C , LIPSON MATTHEW , SEWELL HARRY , MARKOYA LOUIS JOHN
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： H01L21/0274 , G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus to be used with one or more immersion liquids from different sources. SOLUTION: A system for tuning the refractive index of immersion liquid in an immersion lithographic apparatus is disclosed. Two or more immersion liquids of different refractive index are mixed together in order to achieve a desired refractive index. Further, the fluids may be conditioned and treated to maintain optical characteristics. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于来自不同来源的一种或多种浸液的浸没式光刻设备。公开了一种用于调节浸没式光刻设备中浸没液的折射率的系统。将两种或更多种不同折射率的浸液混合在一起以达到所需的折射率。此外，流体可以被调节和处理以保持光学特性。版权所有（C）2008，JPO＆INPIT

9. 发明申请

WO2016079051A3 MASK ASSEMBLY 审中-公开
标题翻译：面罩大会
公开(公告)号：WO2016079051A3
公开(公告)日：2016-09-22
申请号：PCT/EP2015076687
申请日：2015-11-16
申请人： ASML NETHERLANDS BV , ASML HOLDING NV
发明人： KRUIZINGA MATTHIAS , JANSEN MAARTEN MATHIJS MARINUS , AZEREDO LIMA JORGE MANUEL , BOGAART ERIK WILLEM , BROUNS DERK SERVATIUS GERTRUDA , BRUIJN MARC , BRULS RICHARD JOSEPH , DEKKERS JEROEN , JANSSEN PAUL , KAMALI MOHAMMAD REZA , KRAMER RONALD HARM GUNTHER , LANSBERGEN ROBERT GABRIËL MARIA , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LIPSON MATTHEW , LOOPSTRA ERIK ROELOF , LYONS JOSEPH H , ROUX STEPHEN , VAN DEN BOSCH GERRIT , VAN DEN HEIJKANT SANDER , VAN DER GRAAF SANDRA , VAN DER MEULEN FRITS , VAN LOO JÉRÔME FRANÇOIS SYLVAIN VIRGILE , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN
IPC分类号： G03F1/62 , G03F1/00 , G03F7/20
CPC分类号： G03F7/70983 , G03F1/64 , G03F7/70825
摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
摘要翻译：适用于光刻过程的掩模组件，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述支架被构造成相对于所述图案形成装置悬挂所述薄膜框架，使得所述薄膜框架和所述图案形成装置之间存在间隙; 并且其中所述安装件在所述图案形成装置和所述薄膜框架之间提供可释放地接合的附接。

10. 发明申请

WO2014122151A3 LITHOGRAPHIC APPARATUS 审中-公开
标题翻译： LITHOGRAPHIC设备
公开(公告)号：WO2014122151A3
公开(公告)日：2014-11-20
申请号：PCT/EP2014052204
申请日：2014-02-05
申请人： ASML HOLDING NV , ASML NETHERLANDS BV
发明人： DELPUERTO SANTIAGO E , LIPSON MATTHEW , HENDERSON KENNETH , LAFARRE RAYMOND , MARKOYA LOUIS JOHN , UITTERDIJK TAMMO , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , DE GROOT ANTONIUS FRANCISCUS JOHANNES , VAN DER WILK RONALD
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70708 , H01L21/67109 , H01L21/6831 , H01L21/6875
摘要： A support such as a clamp (310) is configured to releasably hold a patterning device such as a reticle (300) to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate (312) having opposing first (313) and second (315) surfaces, a plurality of burls (316) located on the first surface and configured to contact the reticle, a second substrate (314) having opposing first (317) and second (319) surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements (318) are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.
摘要翻译：诸如夹具（310）的支撑件构造成可释放地保持诸如掩模版（300）的图案形成装置以将其固定并防止其热引起的变形。例如，静电夹具包括具有相对的第一（313）和第二（315）表面的第一基底（312），位于第一表面上并被构造成接触光罩的多个毛刺（316），第二基底）具有相对的第一（317）和第二（319）表面。第二衬底的第一表面耦合到第一衬底的第二表面。多个冷却元件（318）位于第二基板的第一表面和第一基板的第二表面之间。冷却元件构造成使电子从第一衬底的第二表面移动到第二衬底的第一表面。每个冷却元件基本上与相应的毛刺对齐。

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