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1. 发明申请

WO2016079051A3 MASK ASSEMBLY 审中-公开
标题翻译：面罩大会
公开(公告)号：WO2016079051A3
公开(公告)日：2016-09-22
申请号：PCT/EP2015076687
申请日：2015-11-16
申请人： ASML NETHERLANDS BV , ASML HOLDING NV
发明人： KRUIZINGA MATTHIAS , JANSEN MAARTEN MATHIJS MARINUS , AZEREDO LIMA JORGE MANUEL , BOGAART ERIK WILLEM , BROUNS DERK SERVATIUS GERTRUDA , BRUIJN MARC , BRULS RICHARD JOSEPH , DEKKERS JEROEN , JANSSEN PAUL , KAMALI MOHAMMAD REZA , KRAMER RONALD HARM GUNTHER , LANSBERGEN ROBERT GABRIËL MARIA , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LIPSON MATTHEW , LOOPSTRA ERIK ROELOF , LYONS JOSEPH H , ROUX STEPHEN , VAN DEN BOSCH GERRIT , VAN DEN HEIJKANT SANDER , VAN DER GRAAF SANDRA , VAN DER MEULEN FRITS , VAN LOO JÉRÔME FRANÇOIS SYLVAIN VIRGILE , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN
IPC分类号： G03F1/62 , G03F1/00 , G03F7/20
CPC分类号： G03F7/70983 , G03F1/64 , G03F7/70825
摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
摘要翻译：适用于光刻过程的掩模组件，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述支架被构造成相对于所述图案形成装置悬挂所述薄膜框架，使得所述薄膜框架和所述图案形成装置之间存在间隙; 并且其中所述安装件在所述图案形成装置和所述薄膜框架之间提供可释放地接合的附接。

2. 发明专利

CA2968151A1 MASK ASSEMBLY 未知
公开(公告)号：CA2968151A1
公开(公告)日：2016-05-26
申请号：CA2968151
申请日：2015-11-16
申请人： ASML HOLDING NV , ASML NETHERLANDS BV
发明人： KRUIZINGA MATTHIAS , JANSEN MAARTEN MATHIJS MARINUS , AZEREDO LIMA JORGE MANUEL , BOGAART ERIK WILLEM , BROUNS DERK SERVATIUS GERTRUDA , BRUIJN MARC , BRULS RICHARD JOSEPH , DEKKERS JEROEN , JANSSEN PAUL , KAMALI MOHAMMAD REZA , KRAMER RONALD HARM GUNTHER , LANSBERGEN ROBERT GABRIEL MARIA , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LIPSON MATTHEW , LOOPSTRA ERIK ROELOF , LYONS JOSEPH H , ROUX STEPHEN , VAN DEN BOSCH GERRIT , VAN DEN HEIJKANT SANDER , VAN DER GRAAF SANDRA , VAN DER MEULEN FRITS , VAN LOO JEROME FRANCOIS SYLVAIN VIRGILE , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN
IPC分类号： G03F1/62 , G03F1/00 , G03F7/20
摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

3. 发明专利

JP2010016372A Parallel process focus compensation 有权
标题翻译：并行程序聚焦补偿
公开(公告)号：JP2010016372A
公开(公告)日：2010-01-21
申请号：JP2009148145
申请日：2009-06-23
申请人： Asml Holding Nv , エーエスエムエルホールディングエヌ.ブイ.
发明人： LYONS JOSEPH H
IPC分类号： H01L21/027 , G03F7/207
CPC分类号： G03B27/52 , G03F9/7003 , G03F9/7011 , G03F9/7019 , G03F9/7026
摘要： PROBLEM TO BE SOLVED: To provide systems, methods, and computer program for compensation for process errors of a lithography tool.
SOLUTION: Such methods may include three steps. First, a first sensor senses a top surface of a wafer to provide first-sensor data which defines a first topographic map of the first surface of the wafer. The first sensor is, for example, an air gauge. Second, a second sensor senses the top surface of the wafer in parallel with the first sensor to provide second-sensor data which defines a second topographic map of the first surface of the wafer. The second sensor is, for example, an optical sensor or a capacitance sensor. Third, a calibration module calibrates focus-positioning parameters of an exposure system on the basis of the first- and the second-sensor data. The calibration module may be embodied in hardware, software, firmware, or a combination thereof.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供用于补偿光刻工具的工艺误差的系统，方法和计算机程序。解决方案：这样的方法可以包括三个步骤。首先，第一传感器感测晶片的顶表面以提供限定晶片的第一表面的第一地形图的第一传感器数据。第一传感器例如是空气量规。第二，第二传感器与第一传感器平行地感测晶片的顶表面，以提供限定晶片的第一表面的第二地形图的第二传感器数据。第二传感器例如是光学传感器或电容传感器。第三，校准模块基于第一传感器数据和第二传感器数据来校准曝光系统的聚焦定位参数。校准模块可以以硬件，软件，固件或其组合来体现。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2010112946A Fluid assisted gas gauge proximity sensor 审中-公开
标题翻译：流体辅助气体测量接近传感器
公开(公告)号：JP2010112946A
公开(公告)日：2010-05-20
申请号：JP2009240417
申请日：2009-10-19
申请人： Asml Holding Nv , エーエスエムエルホールディングエヌ.ブイ.
发明人： LYONS JOSEPH H , SCHULTZ GEOFFREY ALAN
IPC分类号： G01B13/12 , G03F7/20 , H01L21/027
CPC分类号： G03B27/72 , G01B13/00 , G03F9/7057
摘要： PROBLEM TO BE SOLVED: To provide a fluid assisted gas gauge proximity sensor capable of outputting an appropriate frequency response in a useful low pressure and a useful sensitivity and facilitating a remote sensing of chamber pressure. SOLUTION: The fluid assisted gas gauge, coupled to a pressure sensor, can perform proximity measurement within a wide bandwidth. A two-chamber gas gauge, containing a gas-filled measurement chamber and a fluid-filled transfer chamber and a diaphragm separating the two chambers, exhausts gas onto a measured surface, while an incompressible fluid transmits the pressure to a pressure sensor. Response time is shortened by minimizing the gas volume of the gas gauge. In addition, the incompressible fluid permits the pressure sensor to be remotely located from the measurement point without sacrificing the response time performance. A differential bridge version of the fluid assisted gas gauge reduces the influence of common mode. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够在有用的低压和有用的灵敏度下输出适当的频率响应且便于远程感测室压力的流体辅助气量计接近传感器。
解决方案：耦合到压力传感器的流体辅助气量计可以在宽带宽内执行接近度测量。包含充气测量室和流体输送传送室的两室气体计量器和分隔两个室的隔膜将气体排出到测量表面上，而不可压缩的流体将压力传递到压力传感器。通过最小化气量计的气体体积来缩短响应时间。此外，不可压缩流体允许压力传感器远离测量点，而不会牺牲响应时间性能。流体辅助气量计的差动桥型减少了普通模式的影响。版权所有（C）2010，JPO＆INPIT

5. 发明专利

JP2005338094A Gas gauge proximity sensor and measurement method 有权
标题翻译：气体测量传感器和测量方法
公开(公告)号：JP2005338094A
公开(公告)日：2005-12-08
申请号：JP2005156348
申请日：2005-05-27
申请人： Asml Holding Nv , エーエスエムエルホールディングナームローゼフェンノートシャップ
发明人： GALBURT DANIEL N , EBERT EARL W , LYONS JOSEPH H
IPC分类号： G01B13/12 , G01B17/00
CPC分类号： G01B13/12
摘要： PROBLEM TO BE SOLVED: To provide a method and a gas gauge proximity sensor, measuring a very short distance by imparting substantial unresponsiveness to external noise.
SOLUTION: This gas gauge sensor has: a measurement part detecting a first gas flow near a surface to be measured; a reference part detecting a second gas flow near a reference surface; a modulator forming a modulated third gas flow based on gas received from a gas supply source, at least partially passing and flowing through the measurement part and reference part; a detector forming a difference signal corresponding to difference between the first gas flow and the second gas flow; a filter filtering the difference signal to form a filter signal; and a demodulator when demodulating the filter signal to form a measurement signal.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种方法和气量计接近传感器，通过对外部噪声施加大量的反应来测量非常短的距离。
解决方案：该气量计传感器具有：测量部件，检测待测表面附近的第一气流; 检测参考面附近的第二气流的基准部分; 调制器，其基于从气体供应源接收的气体形成调制的第三气流，至少部分地通过和流过测量部分和参考部分; 检测器，形成对应于第一气流和第二气流之间的差的差信号; 过滤滤波差分信号以形成滤波器信号; 以及当解调滤波器信号以形成测量信号时的解调器。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2007212444A Pressure sensor 有权
标题翻译：压力传感器
公开(公告)号：JP2007212444A
公开(公告)日：2007-08-23
申请号：JP2006347276
申请日：2006-12-25
申请人： Asml Holding Nv , エーエスエムエルホールデイングエヌ.ブイ.
发明人： LYONS JOSEPH H , KOCHERSPERGER PETER C , WALSH JAMES , MALI RAJAN
IPC分类号： G01L13/00 , H01L21/027
CPC分类号： G01B13/12
摘要： PROBLEM TO BE SOLVED: To disclose a vacuum-driven gas gage proximity sensor for sensing a difference between a reference surface standoff and a measuring surface standoff.
SOLUTION: In this vacuum-driven gas gage proximity sensor, a gas flow passed through the proximity sensor is reversed using vacuum, and gas is made to flow into an inside via a measuring nozzle and a reference nozzle across over the measuring standoff and the reference standoff. Regulation-finished peripheral gases sucked by the reference nozzle and the measuring nozzle flow through a reference channel and a measuring channel, and the reference channel and the measuring channel are connected at a junction point to be formed into a single channel. The single channel is connected to the vacuum used to evacuate the regulation-finished peripheral gases through the proximity sensor. A bridge channel connects the reference channel to the measuring channel. A mass flow sensor along the bridge channel monitors a flow rate to detect the measuring standoff used for starting a control operation.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：公开一种用于感测参考表面间隔和测量表面间隔之间的差异的真空驱动气体计量接近传感器。解决方案：在这种真空驱动的气体计量接近传感器中，通过接近传感器的气流通过真空反转，气体通过测量喷嘴和参考喷嘴穿过测量支架和参考对峙。由参考喷嘴吸引的调节成品的外围气体和测量喷嘴流过参考通道和测量通道，并且参考通道和测量通道在连接点处连接以形成单个通道。单个通道连接到用于通过接近传感器排出调节完成的外围气体的真空。桥接通道将参考通道连接到测量通道。沿桥通道的质量流量传感器监测流量以检测用于启动控制操作的测量间隔。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2004040102A Method of calibrating lithography tool 有权
公开(公告)号：JP2004040102A
公开(公告)日：2004-02-05
申请号：JP2003185184
申请日：2003-06-27
申请人： Asml Holding Nv , エーエスエムエルホールディングナームローゼフェンノートシャップ
发明人： LYONS JOSEPH H , WHELAN JOSEPH G
IPC分类号： G01B11/00 , G03F7/20 , G03F7/207 , G03F7/22 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70516 , G01B11/00 , G03F7/70641
摘要： PROBLEM TO BE SOLVED: To provide a method to calibrate a lithography tool by automatically measuring the focus offset and the focus tilt.
SOLUTION: A wafer is exposed so that a resulting, patterned image is tilted in relation to the wafer. The exposed wafer is developed, and the characteristics of the tilted, patterned image is measured by using a portion of the lithography tool so as to determine the focus parameters of the exposure system. The lithography tool is calibrated by using the focus parameters.
COPYRIGHT: (C)2004,JPO

8. 发明专利

JP2010112948A Reverse flow gas gauge proximity sensor 有权
标题翻译：反向流量计流量传感器
公开(公告)号：JP2010112948A
公开(公告)日：2010-05-20
申请号：JP2009247191
申请日：2009-10-28
申请人： Asml Holding Nv , エーエスエムエルホールディングエヌ.ブイ.
发明人： LYONS JOSEPH H
IPC分类号： G01B13/12 , G03F7/20 , H01L21/027
CPC分类号： G03B27/42 , G03F9/7057
摘要： PROBLEM TO BE SOLVED: To provide a device and a method achieving a gas gauge proximity sensor with an improved response time and thus an improved bandwidth. SOLUTION: The gas gauge proximity sensor 200 supplies a gas in reverse flow direction from an injection chamber 220 to a measurement chamber 210. Supplying gas in reverse flow direction enables transient behaviors in the sensor to stabilize more rapidly, resulting in increase of bandwidth. Optionally, a scavenger chamber 255 can be used to remove an excess gas by locating a scavenger aperture 260 of the scavenger chamber 255 adjacent to the exit aperture 225 of the injection chamber 220. A bridge proximity sensor with a reference chamber to receive gas flow from a location close to the exit aperture 225 of the injection chamber 220 can be used in order to reduce common mode errors. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有改进的响应时间并因此提高带宽的实现气量计接近传感器的装置和方法。气体计量接近传感器200将反向流动方向的气体从注射室220供给到测量室210.以反向流动方向供应气体使得传感器中的瞬态行为更稳定地稳定，导致带宽。任选地，清除室255可用于通过将清除室255的清除器孔255定位成邻近注射室220的出口孔225来去除过量的气体。具有参考室的桥接近传感器用于接收来自可以使用靠近注射室220的出口孔225的位置，以便减少共模误差。版权所有（C）2010，JPO＆INPIT

9. 发明专利

JP2010050449A Proximity sensor for multi nozzle employing common sensing and nozzle shaping 有权
标题翻译：使用普通感光和喷嘴形状的多喷嘴接近传感器
公开(公告)号：JP2010050449A
公开(公告)日：2010-03-04
申请号：JP2009181211
申请日：2009-08-04
申请人： Asml Holding Nv , エーエスエムエルホールディングエヌ.ブイ.
发明人： LYONS JOSEPH H
IPC分类号： H01L21/027
CPC分类号： G03B27/52 , G03F7/70608 , G03F7/70775 , G03F7/70783 , G03F7/70808 , G03F7/7085
摘要： PROBLEM TO BE SOLVED: To provide an accurate proximity sensor which minimizes the cost of the sensor and complexity thereof, while the speed of the measurement is improved.
SOLUTION: A fluid proximity sensor having one or a plurality of measuring nozzles and a reference nozzle is coupled to a common chamber. A diaphragm coupled with the measuring nozzle can be detected by an optical means, a capacitive means or an inductive means for detection. Furthermore, by using a control valve, such that a required high level of topographic sensitivity is maintained, and the nozzles are selectively coupled with a detector, with the number of pressure detectors being minimized. Moreover, the size of the measurement nozzle can be adjusted so as to optimize proximity measurement, in response to accuracy, speed and similar requirements.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供精度接近传感器，其最小化传感器的成本及其复杂性，同时提高测量速度。解决方案：具有一个或多个测量喷嘴和参考喷嘴的流体接近传感器联接到公共室。与测量喷嘴结合的膜片可以通过光学装置，电容装置或用于检测的电感装置来检测。此外，通过使用控制阀，使得保持所需的高水平的地形灵敏度，并且喷嘴选择性地与检测器耦合，压力检测器的数量被最小化。此外，可以调节测量喷嘴的尺寸，以便根据精度，速度和类似要求来优化接近度测量。版权所有（C）2010，JPO＆INPIT

10. 发明专利

JP2007218901A Pressure sensor 有权
标题翻译：压力传感器
公开(公告)号：JP2007218901A
公开(公告)日：2007-08-30
申请号：JP2006345668
申请日：2006-12-22
申请人： Asml Holding Nv , エーエスエムエルホールデイングエヌ.ブイ.
发明人： LYONS JOSEPH H , KOCHERSPERGER PETER C , WALSH JAMES , MALI RAJAN
IPC分类号： G01L19/00 , G01B13/12
CPC分类号： G01B13/12
摘要： PROBLEM TO BE SOLVED: To provide a gas gauge proximity sensor having a choked flow orifice for sensing a difference between a reference surface standoff and a measurement surface standoff.
SOLUTION: Unlike an existing proximity sensor, the gas gauge proximity sensor of the present invention replaces the use of a mass flow controller with the choked flow orifice. The use of the choked flow orifice provides a reduction in device cost and an improved system reliability. A gas supply forces gas into the proximity sensor. The gas flow is forced through the choked flow orifice so as to achieve a sonic condition at which a mass flow rate becomes largely independent of pressure variations. The flow of gas proceeds from the choked flow orifice into a sensor flow channel system. A mass flow sensor within the sensor flow channel system monitors the flow rate to detect the measurement standoffs that can be used to initiate a control action.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有扼流流孔的气量计接近传感器，用于感测参考表面支座与测量表面支座之间的差异。解决方案：与现有的接近传感器不同，本发明的气量计接近传感器取代了具有扼流流量孔口的质量流量控制器的使用。使用扼流流量孔节省设备成本并提高系统的可靠性。气体供应迫使气体进入接近传感器。气流被迫通过扼流流量孔，以达到质量流量在很大程度上独立于压力变化的声音条件。气流从阻塞流动孔进入传感器流道系统。传感器流道系统内的质量流量传感器监测流量以检测可用于启动控制动作的测量间隔。版权所有（C）2007，JPO＆INPIT

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