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1. 发明申请

US20050231694A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050231694A1
公开(公告)日：2005-10-20
申请号：US10823777
申请日：2004-04-14
申请人： Aleksey Kolesnychenko , Johannes Jacobus Baselmans , Sjoerd Donders , Christiaan Hoogendam , Hans Jansen , Jeroen Johannes Mertens , Johannes Mulkens , Felix Peeters , Bob Streefkerk , Franciscus Johannes Teunissen , Helmar Santen
发明人： Aleksey Kolesnychenko , Johannes Jacobus Baselmans , Sjoerd Donders , Christiaan Hoogendam , Hans Jansen , Jeroen Johannes Mertens , Johannes Mulkens , Felix Peeters , Bob Streefkerk , Franciscus Johannes Teunissen , Helmar Santen
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42
CPC分类号： G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
摘要： A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
摘要翻译：公开了一种浸没式光刻设备的衬底台，其包括构造成收集液体的阻挡层。屏障围绕基板并与衬底间隔开。以这种方式，可以收集从液体供应系统溢出的任何液体，以减少光刻投影设备的精细部件污染的风险。

2. 发明申请

US20060082746A1 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20060082746A1
公开(公告)日：2006-04-20
申请号：US10966108
申请日：2004-10-18
申请人： Jeroen Johannes Mertens , Sjoerd Nicolaas Donders , Roelof De Graaf , Christiaan Hoogendam , Antonius Van Der Net , Franciscus Johannes Teunissen , Patricius Aloysius Tinnemans , Martinus Cornelis Verhagen , Jacobus Johannus Leonardus Verspay , Edwin Van Gompel
发明人： Jeroen Johannes Mertens , Sjoerd Nicolaas Donders , Roelof De Graaf , Christiaan Hoogendam , Antonius Van Der Net , Franciscus Johannes Teunissen , Patricius Aloysius Tinnemans , Martinus Cornelis Verhagen , Jacobus Johannus Leonardus Verspay , Edwin Van Gompel
IPC分类号： G03B27/42
CPC分类号： G03F7/70716 , G03F7/70341
摘要： A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.

3. 发明申请

US20060226062A1 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20060226062A1
公开(公告)日：2006-10-12
申请号：US11101653
申请日：2005-04-08
申请人： Franciscus Johannes Teunissen , Raymond Carnahan
发明人： Franciscus Johannes Teunissen , Raymond Carnahan
IPC分类号： B01D15/02 , B01D15/00 , B01D24/00 , B01D24/32 , B01D27/02 , B01D29/62 , B01D33/17 , B01D33/46
CPC分类号： B01J39/04 , C02F1/42 , G03F7/70341 , G03F7/70925
摘要： A method and apparatus for monitoring a level of silicon dioxide in a liquid and removing the silicon dioxide using polishers is disclosed. In an embodiment, two polishers that absorb carbon dioxide and silicon dioxide, but which have a greater affinity for carbon dioxide, are placed in series along a conduit containing the liquid for use in an immersion lithographic apparatus. The upstream polisher absorbs carbon dioxide and silicon dioxide until it is saturated, at which point it desorbs the silicon dioxide in preference for the carbon dioxide. Silicon dioxide continues down the conduit and is absorbed by the downstream polisher. Once the upstream polisher is saturated with carbon dioxide, carbon dioxide present in the liquid flows downstream where it is absorbed by the downstream polisher. A sensor between the polishers senses the presence of carbon dioxide and initiates a request for the one or more of polishers to be cleaned or replaced.

4. 发明申请

US20080023652A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20080023652A1
公开(公告)日：2008-01-31
申请号：US11902857
申请日：2007-09-26
申请人： Franciscus Johannes Teunissen , Raymond Carnahan
发明人： Franciscus Johannes Teunissen , Raymond Carnahan
IPC分类号： B01D15/00 , B01D35/14 , B01J39/00
CPC分类号： B01J39/04 , C02F1/42 , G03F7/70341 , G03F7/70925
摘要： A method and apparatus for monitoring a level of silicon dioxide in a liquid and removing the silicon dioxide using polishers is disclosed. In an embodiment, two polishers that absorb carbon dioxide and silicon dioxide, but which have a greater affinity for carbon dioxide, are placed in series along a conduit containing the liquid for use in an immersion lithographic apparatus. The upstream polisher absorbs carbon dioxide and silicon dioxide until it is saturated, at which point it desorbs the silicon dioxide in preference for the carbon dioxide. Silicon dioxide continues down the conduit and is absorbed by the downstream polisher. Once the upstream polisher is saturated with carbon dioxide, carbon dioxide present in the liquid flows downstream where it is absorbed by the downstream polisher. A sensor between the polishers senses the presence of carbon dioxide and initiates a request for the one or more of polishers to be cleaned or replaced.
摘要翻译：公开了一种用于监测液体中二氧化硅水平并使用抛光机去除二氧化硅的方法和装置。在一个实施方案中，吸收二氧化碳和二氧化硅但是对二氧化碳具有更大亲合力的两个抛光机沿着包含用于浸没式光刻设备的液体的导管串联放置。上游抛光机吸收二氧化碳和二氧化硅直到其饱和，此时它优先于二氧化碳解吸二氧化硅。二氧化硅继续向下导管并被下游抛光机吸收。一旦上游抛光机饱和二氧化碳，液体中存在的二氧化碳就会流向下游，被下游抛光机吸收。抛光机之间的传感器感测二氧化碳的存在，并启动对一个或多个抛光机进行清洁或更换的请求。

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