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1. 发明公开

EP1493170A2 MULTI-DIRECTIONAL SCANNING OF MOVABLE MEMBER AND ION BEAM MONITORING ARRANGEMENT THEREFOR 审中-公开
标题翻译：设备技术多元化经营ELLEN运动的元素
公开(公告)号：EP1493170A2
公开(公告)日：2005-01-05
申请号：EP03710006.2
申请日：2003-03-21
申请人： Applied Materials, Inc.
发明人： SMICK, Theodore, H. , SAKASE, Takao , ROBERTS, Frank, D. , RYDING, Geoffrey , FARLEY, Marvin , MURRELL, Adrian , EDWARDS, Peter , HARRISON, Bernard
IPC分类号： H01J37/20 , H01J37/317 , H01L21/00
CPC分类号： H01J37/20 , H01J37/18 , H01J37/3171 , H01J2237/20 , H01J2237/2006 , H01J2237/2007 , H01J2237/20221 , H01J2237/20228 , H01J2237/20278 , H01L21/682 , H01L21/6835
摘要： Semiconductor processing apparatus is disclosed which provides for movement of a scanning arm (60) of a substrate or wafer holder (180), in at least two generally orthogonal directions (so-called X-Yscanning). Scanning in a first direction is longitudinally through an aperture (55) in a vacuum chamber wall. The arm (60) is reciprocated by one or more linear motors (90A, 90B). The arm (60) is supported relative to a slide (100) using gimballed air bearings so as to provide cantilever support for the arm relative to the slide (100). A compliant feedthrough (130) into the vacuum chamber for the arm (60) then acts as a vacuum seal and guide but does not itself need to provide bearing support. A Faraday (450) is attached to the arm (60) adjacent the substrate holder (180) to allow beam profiling to be carried out both prior to and during implant. The Faraday (450) can instead or additionally be mounted adjacent the rear of the substrate holder or at 90° to it to allow beam profiling to be carried out prior to implant, with the substrate support reversed or horizontal and out of the beam line.

2. 发明申请

WO2003088303A2 MULTI-DIRECTIONAL SCANNING OF MOVABLE MEMBER AND ION BEAM MONITORING ARRANGEMENT THEREFOR 审中-公开
标题翻译：可移动构件的多方向扫描和离子束监测装置
公开(公告)号：WO2003088303A2
公开(公告)日：2003-10-23
申请号：PCT/GB2003/001221
申请日：2003-03-21
申请人： APPLIED MATERIALS INC. , CROSS, Rupert, Edward, Blount
发明人： SMICK, Theodore, H. , SAKASE, Takao , ROBERTS, Frank, D. , RYDING, Geoffrey , FARLEY, Marvin , MURRELL, Adrian , EDWARDS, Peter , HARRISON, Bernard
IPC分类号： H01J37/00
CPC分类号： H01J37/20 , H01J37/18 , H01J37/3171 , H01J2237/20 , H01J2237/2006 , H01J2237/2007 , H01J2237/20221 , H01J2237/20228 , H01J2237/20278 , H01L21/682 , H01L21/6835
摘要： Semiconductor processing apparatus is disclosed which provides for movement of a scanning arm (60) of a substrate or wafer holder (180), in at least two generally orthogonal directions (so-called X-Yscanning). Scanning in a first direction is longitudinally through an aperture (55) in a vacuum chamber wall. The arm (60) is reciprocated by one or more linear motors (90A, 90B). The arm (60) is supported relative to a slide (100) using gimballed air bearings so as to provide cantilever support for the arm relative to the slide (100). A compliant feedthrough (130) into the vacuum chamber for the arm (60) then acts as a vacuum seal and guide but does not itself need to provide bearing support. A Faraday (450) is attached to the arm (60) adjacent the substrate holder (180) to allow beam profiling to be carried out both prior to and during implant. The Faraday (450) can instead or additionally be mounted adjacent the rear of the substrate holder or at 90° to it to allow beam profiling to be carried out prior to implant, with the substrate support reversed or horizontal and out of the beam line.
摘要翻译：公开了一种半导体处理装置，其提供基板或晶片保持器（180）的扫描臂（60）在至少两个大致正交的方向（所谓的X-Y扫描）上的移动。沿着第一方向进行扫描纵向穿过真空室壁中的孔（55）。臂（60）由一个或多个线性马达（90A，90B）往复运动。臂（60）相对于滑块（100）使用支撑的空气轴承支撑，以便相对于滑块（100）为臂提供悬臂支撑。进入用于臂（60）的真空室中的柔性馈通（130）然后用作真空密封和引导件，但本身不需要提供轴承支撑。法拉第（450）在邻近衬底保持器（180）附接到臂（60），以允许在植入之前和期间进行光束剖面。法拉第（450）可以替代地或附加地安装在衬底保持器的后部或与其成90°的位置，以允许在植入之前执行光束轮廓，其中衬底支撑件反向或水平并且离开束线。

3. 发明申请

WO2003088299A2 A METHOD OF IMPLANTING A SUBSTRATE AND AN ION IMPLANTER FOR PERFORMING THE METHOD 审中-公开
标题翻译：一种用于实施方法的衬底和离子植入物的方法
公开(公告)号：WO2003088299A2
公开(公告)日：2003-10-23
申请号：PCT/GB2003/001222
申请日：2003-03-21
申请人： APPLIED MATERIALS, INC. , CROSS, Rupert, Edward, Blount
发明人： MURRELL, Adrian , HARRISON, Bernard , EDWARDS, Peter , KINDERSLEY, Peter , SAKASE, Takao , FARLEY, Marvin , SATOH, Shu , RYDING, Geoffrey
IPC分类号： H01J27/00
CPC分类号： H01J37/3171 , H01J37/304 , H01J2237/20228 , H01J2237/31703
摘要： An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.
摘要翻译：注入器提供相对于注入束的衬底的二维扫描，使得光束在衬底上绘制扫描线的光栅。在离开衬底的周转点处测量束电流，并且使用电流值来控制随后的快速扫描速度，以补偿束电流中任何变化对慢扫描方向上的剂量均匀性的影响。扫描可以产生不相交的均匀间隔的平行扫描线的光栅，并且选择线之间的间隔以确保适当的剂量均匀性。

4. 发明申请

WO2003075305A2 INDIRECTLY HEATED BUTTON CATHODE FOR AN ION SOURCE 审中-公开
标题翻译：用于离子源的独立加热按钮阴茎
公开(公告)号：WO2003075305A2
公开(公告)日：2003-09-12
申请号：PCT/GB2003/000733
申请日：2003-02-20
申请人： APPLIED MATERIALS, INC. , CROSS, Rupert, Edward, Blount
发明人： FARLEY, Marvin , SAKASE, Takao , SATOH, Shu , RYDING, Geoffrey , ROSE, Peter , CHRISTOU, Christos
IPC分类号： H01J37/00
CPC分类号： H01J37/08 , H01J27/08 , H01J2237/31701
摘要： An indirectly heated button cathode for use in the ion source of an ion implanter has a button member formed of a slug piece mounted in a collar piece. The slug piece is thermally insulated from the collar piece to enable it to operate at a higher temperature so that electron emission is enhanced and concentrated over the surface of the slug piece. The slug piece and collar piece can be both of tungsten. Instead the slug piece may be of tantalum to provide a lower thermionic work function. The resultant concentrated plasma in the ion source is effective to enhance the production of higher charge state ions, particularly P +++ for subsequent acceleration for high energy implantation.
摘要翻译：用于离子注入机的离子源的间接加热纽扣阴极具有由安装在轴环件中的塞片形成的纽扣件。芯块与套环件绝热，使其能够在更高的温度下工作，从而使电子发射增强并集中在芯块的表面上。 lug lug piece piece piece。。。。。。。。。。替代地，块塞可以是钽以提供较低的热离子功能。离子源中产生的浓缩等离子体有效地增强高电荷状态离子的产生，特别是用于高能量注入的后续加速的P +++。

5. 发明公开

EP1481413A2 INDIRECTLY HEATED BUTTON CATHODE FOR AN ION SOURCE 审中-公开
标题翻译：间接加热的阴极按钮的离子源
公开(公告)号：EP1481413A2
公开(公告)日：2004-12-01
申请号：EP03706715.4
申请日：2003-02-20
申请人： Applied Materials, Inc.
发明人： FARLEY, Marvin , SAKASE, Takao , SATOH, Shu , RYDING, Geoffrey , ROSE, Peter , CHRISTOU, Christos
IPC分类号： H01J37/00
CPC分类号： H01J37/08 , H01J27/08 , H01J2237/31701
摘要： An indirectly heated button cathode for use in the ion source of an ion implanter has a button member (21) formed of a slug piece (40) mounted in a collar piece (41). The slug piece is thermally insulated from the collar piece to enable it to operate at a higher temperature so that electron emission is enhanced and concentrated over the surface of the slug piece. The slug piece and collar piece can be both of tungsten. Instead the slug piece may be of tantalum to provide a lower thermionic work function. The resultant concentrated plasma in the ion source is effective to enhance the production of higher charge state ions, particularly P∗∗∗ for subsequent acceleration for high energy implantation.

6. 发明申请

WO2008053138A1 ION BEAM DIAGNOSTICS 审中-公开
标题翻译：离子束诊断
公开(公告)号：WO2008053138A1
公开(公告)日：2008-05-08
申请号：PCT/GB2007/003657
申请日：2007-09-25
申请人： APPLIED MATERIALS, INC. , RYDING, Geoffrey , SMICK, Theodore H. , SAKASE, Takao , FARLEY, Marvin
发明人： RYDING, Geoffrey , SMICK, Theodore H. , SAKASE, Takao , FARLEY, Marvin
IPC分类号： H01J37/244 , H01J37/317
CPC分类号： H01J37/3171 , H01J37/244 , H01J2237/24405 , H01J2237/2446 , H01J2237/24507 , H01J2237/24542 , H01J2237/24578
摘要： This invention relates to a method of measuring a property of an ion beam, for example an ion beam (34) current profile or the emittance of an ion beam (34). A Faraday array (54) comprising an array of ion beam current sensors (58) is employed. The array can provide an ion beam current profile at the plane of the array. The Faraday array is also used in conjunction with an occluding element (56) that may be moved through the ion beam upstream of the Faraday array, there obscuring varying portions of the ion beam from the Faraday array. Suitable manipulation of the signals from the Faraday allows the ion beam current profile to be determined for the plane of the occluding element, and also for the emittance of the ion beam at the plane of the occluding element to be determined.
摘要翻译：本发明涉及一种测量离子束的性质的方法，例如离子束（34）的电流分布或离子束（34）的发射率。采用包括离子束电流传感器（58）阵列的法拉第阵列（54）。该阵列可以在阵列的平面处提供离子束电流分布。法拉第阵列还与可以移动通过法拉第阵列上游的离子束的阻塞元件（56）结合使用，这掩盖了来自法拉第阵列的离子束的变化部分。适当地操纵来自法拉第的信号允许针对封闭元件的平面确定离子束电流轮廓，并且还确定待确定的阻塞元件平面处的离子束的发射率。

7. 发明申请

WO2008037959A1 A METHOD OF IMPLANTING A SUBSTRATE AND AN ION IMPLANTER FOR PERFORMING THE METHOD 审中-公开
标题翻译：一种用于实施方法的衬底和离子植入物的方法
公开(公告)号：WO2008037959A1
公开(公告)日：2008-04-03
申请号：PCT/GB2007/003542
申请日：2007-09-18
申请人： APPLIED MATERIALS, INC. , SATOH, Shu , RYDING, Geoffrey , FARLEY, Marvin , SAKASE, Takao , KINDERSLEY, Peter , BANKS, Peter, M. , DOBSON, Matthew, P. , MURRELL, Adrian
发明人： SATOH, Shu , RYDING, Geoffrey , FARLEY, Marvin , SAKASE, Takao , KINDERSLEY, Peter , BANKS, Peter, M. , DOBSON, Matthew, P. , MURRELL, Adrian
IPC分类号： H01J37/317
CPC分类号： H01J37/3171 , H01J37/3023 , H01J49/30 , H01J2237/20228 , H01J2237/20285 , H01J2237/2487 , H01J2237/30488 , H01J2237/31703 , H01J2237/31708 , H01L21/265 , H01L21/67005 , H01L21/68714 , H01L21/68764 , Y10S438/961
摘要： An implanter provides two-dimensional scanning of a substrate (17) relative to an implant beam (19) so that the beam draws a raster of scan lines (35) on the substrate. The beam current is measured at turnaround points (38) off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.
摘要翻译：注入机提供相对于注入光束（19）的衬底（17）的二维扫描，使得光束在衬底上绘制扫描线（35）的光栅。在离开衬底的周转点（38）处测量束电流，并且使用电流值来控制随后的快速扫描速度，以补偿束电流中任何变化对慢扫描方向上的剂量均匀性的影响。扫描可以产生不相交的均匀间隔的平行扫描线的光栅，并且选择线之间的间隔以确保适当的剂量均匀性。

8. 发明申请

WO2003088299A3 A METHOD OF IMPLANTING A SUBSTRATE AND AN ION IMPLANTER FOR PERFORMING THE METHOD 审中-公开
公开(公告)号：WO2003088299A3
公开(公告)日：2003-10-23
申请号：PCT/GB2003/001222
申请日：2003-03-21
申请人： APPLIED MATERIALS, INC. , CROSS, Rupert, Edward, Blount
发明人： MURRELL, Adrian , HARRISON, Bernard , EDWARDS, Peter , KINDERSLEY, Peter , SAKASE, Takao , FARLEY, Marvin , SATOH, Shu , RYDING, Geoffrey
IPC分类号： H01J37/317
摘要： An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

9. 发明申请

WO2008053139A2 SHAPED APERTURES IN AN ION IMPLANTER 审中-公开
标题翻译：在离子植入物中形成的形状
公开(公告)号：WO2008053139A2
公开(公告)日：2008-05-08
申请号：PCT/GB2007/003672
申请日：2007-09-26
申请人： APPLIED MATERIALS, INC. , RYDING, Geoffrey , SAKASE, Takao , FARLEY, Marvin , HAYS, Stephen
发明人： RYDING, Geoffrey , SAKASE, Takao , FARLEY, Marvin , HAYS, Stephen
IPC分类号： H01J37/09 , H01J37/317
CPC分类号： H01J37/3171 , H01J37/09 , H01J2237/0451
摘要： This invention relates to shaped apertures in an ion implanter that may act to clip an ion beam and so adversely affect uniformity of an implant. In particular, the present invention finds application in ion implanters that employ scanning of a substrate to be implanted relative to the ion beam such that the ion beam traces a raster pattern over the substrate. An ion implanter is provided comprising: a substrate scanner arranged to scan a substrate repeatedly through an ion beam in a scanning direction substantially transverse to the ion beam path, thereby forming a series of scan lines across the substrate; and an aperture plate having provided therein an aperture positioned on the ion beam path upstream of the substrate scanner, and wherein the aperture is defined in part by an inwardly-facing projection.
摘要翻译：本发明涉及离子注入机中的成形孔，其可以用于夹住离子束并且对输入物的均匀性产生不利影响。特别地，本发明应用于使用相对于离子束进行植入的衬底的扫描的离子注入器，使得离子束在衬底上追踪光栅图案。提供了一种离子注入机，包括：衬底扫描器，其布置成在基本上横向于离子束路径的扫描方向上反复扫描基板通过离子束，从而在衬底上形成一系列扫描线; 以及孔板，其中设置有位于所述基板扫描器上游的离子束路径上的孔，并且其中所述孔部分地由向内的突起限定。

10. 发明申请

WO2003075305A3 INDIRECTLY HEATED BUTTON CATHODE FOR AN ION SOURCE 审中-公开
公开(公告)号：WO2003075305A3
公开(公告)日：2003-09-12
申请号：PCT/GB2003/000733
申请日：2003-02-20
申请人： APPLIED MATERIALS, INC. , CROSS, Rupert, Edward, Blount
发明人： FARLEY, Marvin , SAKASE, Takao , SATOH, Shu , RYDING, Geoffrey , ROSE, Peter , CHRISTOU, Christos
IPC分类号： H01J37/08
摘要： An indirectly heated button cathode for use in the ion source of an ion implanter has a button member (21) formed of a slug piece (40) mounted in a collar piece (41). The slug piece is thermally insulated from the collar piece to enable it to operate at a higher temperature so that electron emission is enhanced and concentrated over the surface of the slug piece. The slug piece and collar piece can be both of tungsten. Instead the slug piece may be of tantalum to provide a lower thermionic work function. The resultant concentrated plasma in the ion source is effective to enhance the production of higher charge state ions, particularly P∗∗∗ for subsequent acceleration for high energy implantation.

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