专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07014702B2 Method and apparatus for preparation of binary and higher order compounds and devices fabricated using same 失效
标题翻译：制备二元和更高级化合物的方法和装置以及使用其制造的器件
公开(公告)号：US07014702B2
公开(公告)日：2006-03-21
申请号：US10296909
申请日：2001-05-30
申请人： Andrea Zappettini , Lucio Zanotti , Mingzheng Zha , Francesco Bissoli
发明人： Andrea Zappettini , Lucio Zanotti , Mingzheng Zha , Francesco Bissoli
IPC分类号： C30B1/02
CPC分类号： C30B11/00 , C30B23/00 , C30B23/002 , C30B29/48
摘要： A heat treatment chamber (30) is provided comprising a treatment region containing a charge (5) of compound material comprising a plurality of n atomic species, each atomic species being associated with at least one gas species. The chamber (30) is placed in a furnace (7). The chamber has a gas permeable barrier, constituted by a plug (4) and wadding (6), which partially encloses the treatment region. The barrier serves as an effusive hole to inhibit, but not prevent, gas vapour release, thereby to elevate the gas vapour pressure in the treatment region. Application of inert gas through a valve (8) is also used to increase background pressure in the treatment region during heat treatment. The elevated gas pressures present in the treatment region during treatment are measurable in an absorption cell (3) adjacent to the treatment region. It is thus possible to monitor the gas pressures during heat treatment and thereby stop the heat treatment once a desired charge stoichiometry is achieved. This improves over prior art heat treatment which is carried out in vacuum and thus precludes optical absorption measurement of the gas pressures during heat treatment.
摘要翻译：提供了一种热处理室（30），其包括含有包含多个n原子物质的复合材料的电荷（5）的处理区域，每个原子物质与至少一种气体物质相关联。室（30）放置在炉（7）中。腔室具有气体渗透屏障，由塞子（4）和填塞物（6）构成，其部分地包围处理区域。阻挡层用作抑制气体蒸气释放而不是防止气体蒸发的渗出孔，从而提高处理区域中的气体蒸汽压力。惰性气体通过阀门（8）的应用也用于在热处理过程中增加处理区域的背景压力。处理期间处理区域中存在的升高的气体压力可在与处理区域相邻的吸收池（3）中测量。因此，可以在热处理期间监测气体压力，从而一旦达到所需的电荷化学计量即可停止热处理。这比在真空中进行的现有技术的热处理改进，因此排除热处理期间气体压力的光吸收测量。

IPRDB

热门服务

关于我们

友情链接

联系方式