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    • 9. 发明授权
    • Method for treating surfaces of substrates and apparatus
    • 用于处理基板和装置表面的方法
    • US06409842B1
    • 2002-06-25
    • US09709130
    • 2000-11-08
    • Angelika Roth-FölschErich Arnold
    • Angelika Roth-FölschErich Arnold
    • B08B700
    • H01L21/67028B08B7/0057G03F7/427
    • A method and apparatus for the treatment of surfaces of substrates of organic or inorganic materials, reactive fragments such as radicals or ions are produced by ultraviolet radiation from at least one ultraviolet radiator disposed at a given distance. The radiator has a gas-filled, elongated discharge chamber whose walls are formed by a dielectric, and the ultraviolet radiator is provided on the side facing away from the discharge chamber with at least one electrode. During irradiation, a translational and/or rotatory relative movement is performed between the substrate and the ultraviolet radiator at a comparatively slight distance between radiator and substrate surface, in order to achieve, in a simple manner, an intense and uniform illumination of the surface being irradiated. The treatment is directed especially to silicon substrates or glass substrates.
    • 用于处理有机或无机材料的表面的方法和装置,通过从给定距离处设置的至少一个紫外线辐射器的紫外线辐射产生诸如自由基或离子的反应性碎片。 散热器具有气体填充的细长的放电室,其壁由电介质形成,并且紫外线辐射器设置在背离放电室的一侧上具有至少一个电极。 在照射期间,在辐射器和衬底表面之间的相对较小的距离处在衬底和紫外线辐射器之间进行平移和/或旋转相对运动,以便以简单的方式实现表面的强烈和均匀的照明 照射。 该处理特别针对硅衬底或玻璃衬底。