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1. 发明授权

US07027129B2 System for laser beam expansion without expanding spatial coherence 失效
标题翻译：用于激光束扩张的系统，而不会扩大空间相干性
公开(公告)号：US07027129B2
公开(公告)日：2006-04-11
申请号：US10947347
申请日：2004-09-23
申请人： Alexander Kremer , Stanley W. Drazkiewicz
发明人： Alexander Kremer , Stanley W. Drazkiewicz
IPC分类号： G03B27/54 , G03B27/72
CPC分类号： G02B27/0977 , G02B27/09 , G02B27/0905 , G02B27/102 , G02B27/106 , G02B27/1073 , G02B27/144 , G02B27/145 , G02B27/48 , G03F7/70583
摘要： An system and method that expand emitted light from a laser beam without changing spatial coherence or producing speckle. The system includes a laser source and an optical projection system having a multiplexing device. The multiplexing device expands light emitted by laser source into plural beams having light intensity about equal to each other without changing spatial coherence. The multiplexing device has a plurality of spatially separated beam splitters positioned parallel to and on a same side of a mirror. The system further includes an illuminating optical system that focuses each of the plural beams and a projection optical system that projects an image of a mask illuminated with light output from illuminating optical system onto a substrate.
摘要翻译：在不改变空间相干性或产生斑点的情况下，扩大来自激光束的发射光的系统和方法。该系统包括激光源和具有复用装置的光学投影系统。复用装置将由激光源发射的光扩展成具有彼此相等的光强度的多个光束，而不改变空间相干性。多路复用装置具有多个空间分离的分束器，其平行于反射镜的同一侧定位。该系统还包括：将多个光束中的每一个聚焦的照明光学系统和将从照明光学系统输出的光照射的掩模的图像投影到基板上的投影光学系统。

2. 发明授权

US06801299B2 System for laser beam expansion without expanding spatial coherence 有权
标题翻译：用于激光束扩张的系统，而不会扩大空间相干性
公开(公告)号：US06801299B2
公开(公告)日：2004-10-05
申请号：US10208046
申请日：2002-07-31
申请人： Alexander Kremer , Stanley W. Drazkiewicz
发明人： Alexander Kremer , Stanley W. Drazkiewicz
IPC分类号： G03B2754
CPC分类号： G02B27/0977 , G02B27/09 , G02B27/0905 , G02B27/102 , G02B27/106 , G02B27/1073 , G02B27/144 , G02B27/145 , G02B27/48 , G03F7/70583
摘要： An system and method that expand emitted light from a laser beam without changing spatial coherence or producing speckle. The system includes a laser source and an optical projection system having a multiplexing device. The multiplexing device expands light emitted by laser source into plural beams having light intensity about equal to each other without changing spatial coherence. The multiplexing device has a plurality of spatially separated beam splitters positioned parallel to and on a same side of a mirror. The system further includes an illuminating optical system that focuses each of the plural beams and a projection optical system that projects an image of a mask illuminated with light output from illuminating optical system onto a substrate.
摘要翻译：扩大激光束发射光而不改变空间相干性或产生斑点的系统和方法。该系统包括激光源和具有复用装置的光学投影系统。复用装置将由激光源发射的光扩展成具有彼此相等的光强度的多个光束，而不改变空间相干性。多路复用装置具有多个空间分离的分束器，其平行于反射镜的同一侧定位。该系统还包括：将多个光束中的每一个聚焦的照明光学系统和将从照明光学系统输出的光照射的掩模的图像投影到基板上的投影光学系统。

3. 发明申请

US20220343010A1 System and Method to enable Shared SaaS Multi-Tenancy using Customer Data Storage, Customer-controlled Data Encryption Keys 有权
公开(公告)号：US20220343010A1
公开(公告)日：2022-10-27
申请号：US17760783
申请日：2020-09-21
申请人： Khurram Ghafoor , Alexander Kremer
发明人： Khurram Ghafoor , Alexander Kremer
IPC分类号： G06F21/62 , H04L9/08
摘要： A system controls access to data for customer of a multi-tenant software as a service (SaaS) system. A multi-tenant SaaS system cloud includes a metadata store. A customer-controlled storage realm includes a customer-controlled key management system (KMS) and a data store for storing encrypted customer data objects. An agent at a user endpoint identifies customer data for storage in the customer data store, transmits metadata and telemetry information related to the customer data to a SaaS application interface (API), and provides a storage reference for a SaaS metadata store. The agent is pre-configured with credentials from the KMS for storing customer data objects in the data store. The customer-controlled storage realm is not in direct communication with the SaaS system cloud.

4. 发明申请

US20060139608A1 De-focus uniformity correction 有权
标题翻译：去焦均匀性校正
公开(公告)号：US20060139608A1
公开(公告)日：2006-06-29
申请号：US11022888
申请日：2004-12-28
申请人： Roberto Wiener , Alexander Kremer , Elizabeth Stone , Richard Zimmerman
发明人： Roberto Wiener , Alexander Kremer , Elizabeth Stone , Richard Zimmerman
IPC分类号： G03B27/54
CPC分类号： G02B27/0012 , G02B7/346 , G03F7/70125 , G03F7/70191
摘要： A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. “pupils” are then superimposed onto the grid. Multiple second grids are also defined. Each ““pupil”” is mapped to a second grid such that the center of the second grid is coincident with the ““pupil”” center. The continuous intensity integral is then discretized using the first grid, plurality of second grids, and ““pupil”” mappings.
摘要翻译：一种用于均匀性校正的系统和方法，使得满足定义的均匀性规范，同时使得一组选定的约束最小化。该系统包括照明光学器件，光学机械校正系统，对比度装置，投影光学器件和耦合到校正系统的校正模块。校正系统包括多个可调组件，例如手指。校正模块被配置为确定对组件的调整以校正均匀性。还提供了用于离散连续强度积分的方法。照明槽被分成具有多个网格点的网格。 “瞳孔”然后叠加到网格上。还定义了多个第二个网格。每个“”瞳孔“”被映射到第二格子，使得第二格子的中心与“瞳孔”中心一致。然后使用第一格栅，多个第二格栅和“”瞳孔“”映射离散化连续强度积分。

5. 发明申请

US20050036125A1 System for laser beam expansion without expanding spatial coherence 失效
标题翻译：用于激光束扩张的系统，而不会扩大空间相干性
公开(公告)号：US20050036125A1
公开(公告)日：2005-02-17
申请号：US10947347
申请日：2004-09-23
申请人： Alexander Kremer , Stanley Drazkiewicz
发明人： Alexander Kremer , Stanley Drazkiewicz
IPC分类号： H01S3/10 , G02B27/09 , G02B27/14 , G02B27/48 , G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G02B27/0977 , G02B27/09 , G02B27/0905 , G02B27/102 , G02B27/106 , G02B27/1073 , G02B27/144 , G02B27/145 , G02B27/48 , G03F7/70583
摘要： An system and method that expand emitted light from a laser beam without changing spatial coherence or producing speckle. The system includes a laser source and an optical projection system having a multiplexing device. The multiplexing device expands light emitted by laser source into plural beams having light intensity about equal to each other without changing spatial coherence. The multiplexing device has a plurality of spatially separated beam splitters positioned parallel to and on a same side of a mirror. The system further includes an illuminating optical system that focuses each of the plural beams and a projection optical system that projects an image of a mask illuminated with light output from illuminating optical system onto a substrate.
摘要翻译：在不改变空间相干性或产生斑点的情况下，扩大来自激光束的发射光的系统和方法。该系统包括激光源和具有复用装置的光学投影系统。复用装置将由激光源发射的光扩展成具有彼此相等的光强度的多个光束，而不改变空间相干性。多路复用装置具有多个空间分离的分束器，其平行于反射镜的同一侧定位。该系统还包括：将多个光束中的每一个聚焦的照明光学系统和将从照明光学系统输出的光照射的掩模的图像投影到基板上的投影光学系统。

6. 发明授权

US07362413B2 Uniformity correction for lithographic apparatus 失效
标题翻译：光刻设备的均匀性校正
公开(公告)号：US07362413B2
公开(公告)日：2008-04-22
申请号：US11007580
申请日：2004-12-09
申请人： Alexander Kremer , Marcel Mathijs Theodore Marie Dierichs , Erik Roelof Loopstra
发明人： Alexander Kremer , Marcel Mathijs Theodore Marie Dierichs , Erik Roelof Loopstra
IPC分类号： G03B27/52 , G03B27/54 , G21F1/00
CPC分类号： G03F7/70083 , G03F7/70066 , G03F7/70558
摘要： A uniformity correction module for improving the uniformity of a radiation distribution in a rectangular illumination slit having two longer sides and two shorter sides, including a plurality of movable blades arranged along each long side of the illumination slit and a chamber containing a fluid wherein said movable blades are at least partly immersed in said fluid, and wherein the difference between the refractive index of each blade and the refractive index of said fluid is sufficiently small to prevent significant reflection and refraction at the surface of each blade.
摘要翻译：一种用于改善具有两个长边和两个短边的矩形照明狭缝中的辐射分布的均匀性的均匀性校正模块，包括沿着照明狭缝的每个长边布置的多个可动刀片和包含流体的腔室，其中所述可移动叶片至少部分地浸没在所述流体中，并且其中每个叶片的折射率与所述流体的折射率之间的差异足够小以防止在每个叶片的表面处的显着的反射和折射。

7. 发明授权

US07843549B2 Light attenuating filter for correcting field dependent ellipticity and uniformity 有权
标题翻译：用于校正场依赖椭圆率和均匀性的光衰减滤波器
公开(公告)号：US07843549B2
公开(公告)日：2010-11-30
申请号：US11752710
申请日：2007-05-23
申请人： Alexander Kremer
发明人： Alexander Kremer
IPC分类号： G03B27/68 , G03B27/54 , G03B27/72
CPC分类号： G03B27/72
摘要： Ellipticity in an illumination beam may be corrected by measuring an ellipticity of the illumination beam and substantially eliminating the ellipticity using a light attenuating filter at a defocus position of the illumination beam, wherein the light attenuating filter has a two-dimensional pattern that compensates for ellipticity variations in the illumination beam. The light attenuating filter may stand alone, or the filter may be combined with a uniformity correction system, such that it corrects both uniformity and ellipticity. In one embodiment, the light attenuating filter is printed with an assembly of microscopic dots according to the two-dimensional pattern.
摘要翻译：可以通过测量照明光束的椭圆率并且在照明光束的散焦位置使用光衰减滤光器基本消除椭圆率来校正照明光束中的椭圆度，其中光衰减滤光器具有补偿椭圆率的二维图案照明光束的变化。光衰减滤光片可以独立存在，也可以将滤光片与均匀性校正系统组合，从而校正均匀性和椭圆度。在一个实施例中，光衰减滤光器根据二维图案印刷有微小点的组件。

8. 发明申请

US20070109518A1 De-focus uniformity correction 有权
标题翻译：去焦均匀性校正
公开(公告)号：US20070109518A1
公开(公告)日：2007-05-17
申请号：US11647419
申请日：2006-12-29
申请人： Roberto Wiener , Alexander Kremer , Elizabeth Stone , Richard Zimmerman
发明人： Roberto Wiener , Alexander Kremer , Elizabeth Stone , Richard Zimmerman
IPC分类号： G03B27/52
CPC分类号： G02B27/0012 , G02B7/346 , G03F7/70125 , G03F7/70191
摘要： A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. “pupils” are then superimposed onto the grid. Multiple second grids are also defined. Each “pupil” is mapped to a second grid such that the center of the second grid is coincident with the “pupil” center. The continuous intensity integral is then discretized using the first grid, plurality of second grids, and “pupil” mappings.
摘要翻译：一种用于均匀性校正的系统和方法，使得满足定义的均匀性规范，同时使得一组选定的约束最小化。该系统包括照明光学器件，光学机械校正系统，对比度装置，投影光学器件和耦合到校正系统的校正模块。校正系统包括多个可调组件，例如手指。校正模块被配置为确定对组件的调整以校正均匀性。还提供了一种用于离散连续强度积分的方法。照明槽被分成具有多个网格点的网格。 “瞳孔”然后叠加到网格上。还定义了多个第二个网格。每个“瞳孔”被映射到第二格子，使得第二格子的中心与“瞳孔”中心重合。然后使用第一格栅，多个第二格栅和“瞳孔”映射离散化连续强度积分。

9. 发明授权

US07173688B2 Method for calculating an intensity integral for use in lithography systems 有权
标题翻译：用于计算光刻系统中使用的强度积分的方法
公开(公告)号：US07173688B2
公开(公告)日：2007-02-06
申请号：US11022888
申请日：2004-12-28
申请人： Roberto B. Wiener , Alexander Kremer , Elizabeth Stone , Richard Zimmerman
发明人： Roberto B. Wiener , Alexander Kremer , Elizabeth Stone , Richard Zimmerman
IPC分类号： G03B27/72 , G03B27/42
CPC分类号： G02B27/0012 , G02B7/346 , G03F7/70125 , G03F7/70191
摘要： A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. “pupils” are then superimposed onto the grid. Multiple second grids are also defined. Each ““pupil”” is mapped to a second grid such that the center of the second grid is coincident with the ““pupil”” center. The continuous intensity integral is then discretized using the first grid, plurality of second grids, and ““pupil”” mappings.
摘要翻译：一种用于均匀性校正的系统和方法，使得满足定义的均匀性规范，同时使得一组选定的约束最小化。该系统包括照明光学器件，光学机械校正系统，对比度装置，投影光学器件和耦合到校正系统的校正模块。校正系统包括多个可调组件，例如手指。校正模块被配置为确定对组件的调整以校正均匀性。还提供了一种用于离散连续强度积分的方法。照明槽被分成具有多个网格点的网格。 “瞳孔”然后叠加到网格上。还定义了多个第二个网格。每个“”瞳孔“”被映射到第二格子，使得第二格子的中心与“瞳孔”中心一致。然后使用第一格栅，多个第二格栅和“”瞳孔“”映射离散化连续强度积分。

10. 发明申请

US20060126036A1 Uniformity correction for lithographic apparatus 失效
标题翻译：光刻设备的均匀性校正
公开(公告)号：US20060126036A1
公开(公告)日：2006-06-15
申请号：US11007580
申请日：2004-12-09
申请人： Alexander Kremer , Marcel Mathijs Marie Dierichs , Erik Loopstra
发明人： Alexander Kremer , Marcel Mathijs Marie Dierichs , Erik Loopstra
IPC分类号： G03B27/52
CPC分类号： G03F7/70083 , G03F7/70066 , G03F7/70558
摘要： A uniformity correction module for improving the uniformity of a radiation distribution in a rectangular illumination slit having two longer sides and two shorter sides, including a plurality of movable blades arranged along each long side of the illumination slit and a chamber containing a fluid wherein said movable blades are at least partly immersed in said fluid, and wherein the difference between the refractive index of each blade and the refractive index of said fluid is sufficiently small to prevent significant reflection and refraction at the surface of each blade.
摘要翻译：一种用于改善具有两个长边和两个短边的矩形照明狭缝中的辐射分布的均匀性的均匀性校正模块，包括沿着照明狭缝的每个长边布置的多个可动刀片和包含流体的腔室，其中所述可移动叶片至少部分地浸没在所述流体中，并且其中每个叶片的折射率与所述流体的折射率之间的差异足够小以防止在每个叶片的表面处的显着的反射和折射。

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