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    • 2. 发明申请
    • ION BEAM SYSTEM
    • 离子束系统
    • US20050274910A1
    • 2005-12-15
    • US10710051
    • 2004-06-15
    • Tushar DesaiEllis HayfordNicholas Mone
    • Tushar DesaiEllis HayfordNicholas Mone
    • H01J37/02H01J37/317
    • H01J37/02H01J2237/022H01J2237/026H01J2237/16H01J2237/31701
    • A method of reducing foreign material contamination of a substrate in an ion beam system and an ion beam system. The system, including: a vacuum chamber having an ion beam axis; a substrate chamber free to tilt about a tilt axis, the tilt axis orthogonal to and intersecting the ion beam axis; a flexible bellows connecting an opening in the substrate chamber and an opening in the vacuum chamber, both openings co-axially aligned with the ion beam axis, the bellows providing a vacuum seal between the substrate chamber and the vacuum chamber; and a hollow foreign material shield open at a top proximate to the vacuum chamber and a bottom proximate to the substrate chamber, the foreign material shield located between the ion beam axis and the flexible bellows, the top and bottom of the foreign material shield co-axially aligned with the ion beam axis.
    • 一种减少离子束系统和离子束系统中的衬底的异物污染的方法。 该系统包括:具有离子束轴的真空室; 基板室可绕倾斜轴线自由倾斜,倾斜轴线与离子束轴线正交并与其相交; 连接基板室中的开口和真空室中的开口的柔性波纹管,两个开口与离子束轴线同轴对准,波纹管在基板室和真空室之间提供真空密封; 以及在靠近真空室的顶部开口的中空异物屏蔽件和靠近基板室的底部,位于离子束轴线和柔性波纹管之间的异物屏蔽层,异物屏蔽层的顶部和底部, 与离子束轴线轴向对准。