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1. 发明授权

US06475630B1 Planographic printing plate, non-woven cloth roller, and method and apparatus for preliminarily polishing a metal plate for printing plate 失效
标题翻译：普通印刷版，无纺布辊，以及用于对印版的金属板进行预先研磨的方法和装置
公开(公告)号：US06475630B1
公开(公告)日：2002-11-05
申请号：US09518369
申请日：2000-03-03
申请人： Akio Uesugi , Masahiro Endo , Yoshinori Hotta
发明人： Akio Uesugi , Masahiro Endo , Yoshinori Hotta
IPC分类号： B32B1504
CPC分类号： B41N3/04 , B41N3/034 , Y10T428/12736 , Y10T428/12764 , Y10T428/12993 , Y10T428/266
摘要： The present invention provides a planographic printing plate capable of ensuring improvement of productivity and stability of a small dot net portion due to improvement of adhesion. There is provided a planographic printing plate, characterized in that a surface of an aluminum plate being a support element of the planographic printing plate has been subjected to preliminarily polishing mechanically by at least 0.1 &mgr;m; chemical etching treatment by at least 0.1 &mgr;m; electrochemically surface-roughening; and anodic oxidation, and for a surface structure of the aluminum plate: (a) an area (S) for a graphic formed by a reference straight line drawn from a top of a third highest mountain of a two-dimensional roughness curve downwardly by 1 &mgr;m and a roughness curve upper than the reference straight line is 30 &mgr;m2≦S≦150 &mgr;m2; (b) an average roughness Ra of average lines is 0.15 &mgr;m≦S≦Ra≦0.60 &mgr;m; (c) a relationship between the average roughness Ra of average lines and a height Rp of a center line is Rp≦6Ra; (d) a relationship between a maximum height Rmax and the average roughness Ra of average lines is Rmax≦12Ra; and (e) a surface area difference is between 20% and 70%.
摘要翻译：本发明提供一种平面印刷版，其能够确保由于粘合性的提高而提高小网状部分的生产率和稳定性。提供了一种平版印刷版，其特征在于，将作为平版印刷版的支撑元件的铝板的表面经过机械预先磨光至少0.1μm; 化学蚀刻处理至少0.1毫米; 电化学表面粗糙化; 和阳极氧化，以及铝板的表面结构：（a）由二维粗糙度曲线的第三高山顶部的参考直线形成的图形区域（S）向下1 妈妈和高于参考直线的粗糙度曲线为30 mum2 <= S <= 150 mum2; （b）平均线的平均粗糙度Ra为0.15μm<= S <= Ra <=0.60μm; （c）平均线的平均粗糙度Ra与中心线的高度Rp之间的关系为Rp <= 6Ra; （d）最大高度Rmax与平均线的平均粗糙度Ra之间的关系为Rmax <= 12Ra; 和（e）表面积差为20％至70％。

2. 发明申请

US20120091495A1 LIGHT REFLECTING SUBSTRATE AND PROCESS FOR MANUFACTURE THEREOF 审中-公开
标题翻译：光反射基板及其制造方法
公开(公告)号：US20120091495A1
公开(公告)日：2012-04-19
申请号：US13380779
申请日：2010-06-23
申请人： Yusuke Hatanaka , Yoshinori Hotta , Akio Uesugi
发明人： Yusuke Hatanaka , Yoshinori Hotta , Akio Uesugi
IPC分类号： H01L33/60 , C25D5/44 , C25D7/00 , G02B5/08
CPC分类号： H01L33/60 , H01L2224/16 , H01L2224/48091 , H01L2224/73265 , H01L2924/1301 , H01L2933/0058 , H01L2924/00014 , H01L2924/00
摘要： A light reflecting substrate comprises at least: an insulating layer and a metal layer disposed in contact with the insulating layer. The total reflectivity of light in the wavelength range of more than 320 nm and not more than 700 nm is not less than 50% and the total reflectivity of light in the wavelength range of 300 nm to 320 nm is not less than 60%. The light reflecting substrate further improves the emission power of the light-emitting device when used as the substrate therefor.
摘要翻译：光反射基板至少包括：绝缘层和设置成与绝缘层接触的金属层。在大于320nm且不大于700nm的波长范围内的光的总反射率不小于50％，并且在300nm至320nm的波长范围内的光的总反射率不小于60％。光反射基板当用作基板时，进一步提高了发光装置的发光功率。

3. 发明申请

US20110043239A1 PROBE CARD 审中-公开
标题翻译：探针卡
公开(公告)号：US20110043239A1
公开(公告)日：2011-02-24
申请号：US12922378
申请日：2009-03-09
申请人： Tadabumi Tomita , Yoshinori Hotta , Akio Uesugi , Yusuke Hatanaka
发明人： Tadabumi Tomita , Yoshinori Hotta , Akio Uesugi , Yusuke Hatanaka
IPC分类号： G01R31/00
CPC分类号： G01R1/0735 , G01R3/00 , G01R31/2863 , H01R12/7076 , H01R12/7082 , H01R13/2414
摘要： An object of the present invention is to provide a probe card which has good stability of the connection between testing electrodes and test electrodes even after exposure to high temperatures in the burn-in test, and is less susceptible to displacements in the positions of contact between the testing electrodes and conductive portions or between the conductive portions and probe needles or the test electrodes even after repeated use of the probe card. The probe card of the present invention is a probe card which includes a testing circuit board having the testing electrodes formed so as to correspond to the test electrodes and an anisotropic conductive member electrically connecting the test electrodes with the testing electrodes. The testing electrodes are formed so that at least ends of the testing electrodes protrude from a surface of the testing circuit board, and the anisotropic conductive member is a member which has an insulating base made of an anodized aluminum film having micropores therein and a plurality of conductive paths made of a conductive material, insulated from one another, and extending through the insulating base in a thickness direction of the insulating base.
摘要翻译：本发明的目的是提供一种探针卡，即使在老化试验中暴露于高温之后，测试电极和测试电极之间的连接也具有良好的稳定性，并且不太容易受到在测试电极和导电部分，或者即使在重复使用探针卡之后，在导电部分和探针或测试电极之间。本发明的探针卡是一种探针卡，其包括测试电路板，其具有形成为对应于测试电极的测试电极和将测试电极与测试电极电连接的各向异性导电部件。测试电极形成为使得测试电极的至少一端从测试电路板的表面突出，并且各向异性导电构件是具有由其中具有微孔的阳极氧化铝膜制成的绝缘基底的构件，并且多个由导电材料制成的导电路径彼此绝缘，并且在绝缘基底的厚度方向上延伸穿过绝缘基底。

4. 发明申请

US20100264036A1 MICROSTRUCTURE 审中-公开
标题翻译：微结构
公开(公告)号：US20100264036A1
公开(公告)日：2010-10-21
申请号：US12743154
申请日：2008-08-21
申请人： Yusuke Hatanaka , Yoshinori Hotta , Akio Uesugi
发明人： Yusuke Hatanaka , Yoshinori Hotta , Akio Uesugi
IPC分类号： C25D5/02 , C25D5/48
CPC分类号： H05K3/423 , C25D11/045 , C25D11/12 , C25D11/20 , H01L23/49827 , H01L2924/0002 , H05K1/0306 , H05K3/002 , H05K2201/0116 , H05K2201/10378 , H05K2203/0315 , H05K2203/1142 , H05K2203/1476 , H01L2924/00
摘要： Disclosed is a microfine structure which can be used as an anisotropic conductive member. Also disclosed is a method for producing such a microfine structure. Specifically disclosed is a microfine structure which is composed of a base having penetrating micropores at a density of not less than 10,000,000 micropores/mm2. In this microfine structure, some penetrating micropores are filled with a substance other than the material of the base.
摘要翻译：公开了可用作各向异性导电构件的微细结构。还公开了这种微细结构的制造方法。具体公开了一种微细结构，其由具有不小于10,000,000微孔/ mm 2的密度的穿透微孔的基底组成。在这种微细结构中，一些穿透微孔填充有除基底材料之外的物质。

5. 发明授权

US07722754B2 Microstructure and method of manufacturing the same 有权
标题翻译：微结构及其制造方法
公开(公告)号：US07722754B2
公开(公告)日：2010-05-25
申请号：US11808502
申请日：2007-06-11
申请人： Yusuke Hatanaka , Tadabumi Tomita , Yoshinori Hotta , Akio Uesugi
发明人： Yusuke Hatanaka , Tadabumi Tomita , Yoshinori Hotta , Akio Uesugi
IPC分类号： C25D11/06 , B32B3/26
CPC分类号： C25D11/12 , C25D11/045 , C25D11/18 , Y10T428/249953
摘要： A method of manufacturing a microstructure wherein an aluminum member having an aluminum substrate and a micropore-bearing anodized film present on a surface of the aluminum substrate is subjected at least to, in order, a pore-ordering treatment which involves performing one or more cycles of a step that includes a first film dissolution treatment for dissolving the anodized film until a barrier layer has a thickness of 3 to 50 nm, and an anodizing treatment which follows the first film dissolution treatment; and a second film dissolution treatment for dissolving the anodized film so that a ratio of a diameter of a micropore opening “a” to a micropore diameter at a height “a/2” from a micropore bottom “b” (a/b) is in a range of 0.9 to 1.1, whereby the microstructure having micropores formed on a surface thereof is obtained. The manufacturing method enables microstructures having an ordered array of pits to be obtained in a short period of time.
摘要翻译：一种制造微结构的方法，其中具有铝基板和存在于铝基板表面上的具有微孔阳极氧化膜的铝构件至少依次进行包括执行一个或多个循环的孔序处理包括用于溶解阳极氧化膜直到阻挡层具有3至50nm的厚度的第一膜溶解处理和在第一膜溶解处理之后的阳极氧化处理的步骤; 以及用于溶解阳极化膜的第二膜溶解处理，使得微孔开口“a”的直径与微孔底部“b”（a / b）的高度“a / 2”处的微孔直径的比率为在0.9〜1.1的范围内，由此得到其表面上形成微孔的微结构。该制造方法能够在短时间内获得具有有序排列阵列的微结构。

6. 发明授权

US07838105B2 Microstructure and method of manufacturing the same 有权
标题翻译：微结构及其制造方法
公开(公告)号：US07838105B2
公开(公告)日：2010-11-23
申请号：US11856154
申请日：2007-09-17
申请人： Yusuke Hatanaka , Tadabumi Tomita , Yoshinori Hotta , Akio Uesugi
发明人： Yusuke Hatanaka , Tadabumi Tomita , Yoshinori Hotta , Akio Uesugi
IPC分类号： C25D11/06 , B32B3/26
CPC分类号： C25D11/12 , B01D67/0065 , B01D67/0088 , B01D69/02 , B01D69/12 , B01D71/02 , B01D71/024 , B01D71/025 , B01D71/027 , B01D71/34 , B01D2325/02 , C25D11/045 , C25D11/24 , Y10T428/1234 , Y10T428/249953 , Y10T428/249969 , Y10T428/24997 , Y10T428/249974
摘要： Disclosed is a microstructure comprising an aluminum anodized film bearing through micropores, wherein a surface of the microstructure is covered with a protective film for preventing hydration of the aluminum anodized film. The microstructure may be used as a porous alumina membrane filter excellent in filtration rate and its stability with time.
摘要翻译：公开了一种微结构，其包括通过微孔的铝阳极氧化膜轴承，其中微结构的表面覆盖有用于防止铝阳极氧化膜的水合的保护膜。微结构可以用作过滤速率优异的多孔氧化铝膜过滤器及其随时间的稳定性。

7. 发明授权

US07435488B2 Fine structural body and method of producing the same 有权
标题翻译：精细结构体及其制造方法
公开(公告)号：US07435488B2
公开(公告)日：2008-10-14
申请号：US11086368
申请日：2005-03-23
申请人： Tadabumi Tomita , Yoshinori Hotta , Akio Uesugi
发明人： Tadabumi Tomita , Yoshinori Hotta , Akio Uesugi
IPC分类号： G11B5/66 , B32B9/04
CPC分类号： C25D11/20 , B82Y10/00 , B82Y15/00 , B82Y20/00 , B82Y30/00 , C25D11/045 , C25D11/16 , G01N21/658 , G11B5/858 , Y10T428/31
摘要： Described is a structural body including at least partially an aluminum member having on a surface an anodized film with micropores present, in which: the micropores have a coefficient of variation in pore size of 5 to 50%; and the micropores are each sealed with a metal. The structural body can generate localized plasmon resonance having a sufficiently large intensity and be produced at low cost through a simple production process, and having a large surface area.
摘要翻译：描述了至少部分地包括在表面上具有存在微孔的阳极氧化膜的铝构件的结构体，其中：微孔具有5〜50％的孔径变异系数; 并且微孔各自用金属密封。结构体可以产生具有足够大强度的局部等离子体共振，并且通过简单的制造工艺以低成本生产并具有大的表面积。

8. 发明申请

US20080081173A1 Microstructure and method of manufacturing the same 有权
标题翻译：微结构及其制造方法
公开(公告)号：US20080081173A1
公开(公告)日：2008-04-03
申请号：US11702189
申请日：2007-02-05
申请人： Yusuke Hatanaka , Tadabumi Tomita , Yoshinori Hotta , Akio Uesugi
发明人： Yusuke Hatanaka , Tadabumi Tomita , Yoshinori Hotta , Akio Uesugi
IPC分类号： C23F1/02
CPC分类号： C25D11/20 , C25D11/12 , C25D11/24 , Y10T428/12042 , Y10T428/12056 , Y10T428/249953 , Y10T428/24997 , Y10T428/249974
摘要： In a method of manufacturing a microstructure, an aluminum member having an aluminum substrate and a micropore-bearing anodized layer present on a surface of the aluminum substrate is subjected at least to, in order, a pore-ordering treatment which involves performing one or more cycles of a step that includes a first film dissolution treatment for dissolving 0.001 to 20 wt % of a material constituting the anodized layer and an anodizing treatment which follows the first film dissolution treatment; and a second film dissolution treatment for dissolving the anodized layer, thereby obtaining the microstructure having micropores formed on a surface thereof. This method enables a microstructure having an ordered array of pits to be obtained in a short period of time.
摘要翻译：在制造微结构的方法中，具有铝基板和存在于铝基板表面上的微孔阳极氧化层的铝构件至少依次进行孔序处理，其涉及执行一个或多个包括第一膜溶解处理以使构成阳极氧化层的材料为0.001〜20重量％的步骤的循环和在第一膜溶解处理之后的阳极氧化处理; 以及用于溶解阳极氧化层的第二膜溶解处理，从而获得在其表面上形成有微孔的微结构。该方法能够在短时间内获得具有有序排列阵列的微结构。

9. 发明申请

US20080057293A1 Microstructure and method of manufacturing the same 有权
标题翻译：微结构及其制造方法
公开(公告)号：US20080057293A1
公开(公告)日：2008-03-06
申请号：US11699447
申请日：2007-01-30
申请人： Yusuke Hatanaka , Tadabumi Tomita , Yoshinori Hotta , Akio Uesugi
发明人： Yusuke Hatanaka , Tadabumi Tomita , Yoshinori Hotta , Akio Uesugi
IPC分类号： B32B3/26 , C25D5/00
CPC分类号： C25D11/045 , B01J23/42 , B01J23/52 , B01J35/0013 , B01J35/006 , B01J37/0211 , B01J37/0226 , B01J37/348 , C25D11/12 , C25D11/18 , Y10T428/249953 , Y10T428/24999
摘要： A microstructure includes an anodized aluminum layer that has on a surface thereof micropores, at least some of which contain a catalyst, in a micropore array with a degree of ordering of at least 40%. A method of manufacturing the microstructure includes anodizing an aluminum member to form on its surface an anodized layer having micropores, removing the aluminum member, and supporting a catalyst on at least part of the anodized layer. The microstructure is excellent in heat resistance.
摘要翻译：微结构包括阳极氧化铝层，其表面上具有至少40％的有序度的微孔阵列中的微孔，其至少一些含有催化剂。制造微结构的方法包括阳极氧化铝构件以在其表面上形成具有微孔的阳极氧化层，去除铝构件，并在至少部分阳极氧化层上支撑催化剂。微结构耐热性优异。

10. 发明申请

US20060219568A1 Microstructure 审中-公开
标题翻译：微结构
公开(公告)号：US20060219568A1
公开(公告)日：2006-10-05
申请号：US11392635
申请日：2006-03-30
申请人： Yoshinori Hotta , Tadabumi Tomita , Akio Uesugi
发明人： Yoshinori Hotta , Tadabumi Tomita , Akio Uesugi
IPC分类号： C25D11/22
CPC分类号： C25D11/16 , C25D11/045
摘要： A microstructure with regularly arranged micropores is obtained by anodizing an aluminum layer having a Vickers hardness Hv of up to 20. The microstructure has a well-ordered region of large surface area and can be manufactured at low cost.
摘要翻译：通过对维氏硬度Hv高达20的铝层进行阳极氧化，获得具有规则排列的微孔的微结构。微结构具有大面积的良好有序的区域，并且可以以低成本制造。

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