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1. 发明申请

US20090064597A1 Polishing Slurry and Polishing Material Using Same 失效
标题翻译：抛光浆料和抛光材料使用相同
公开(公告)号：US20090064597A1
公开(公告)日：2009-03-12
申请号：US11918226
申请日：2006-04-14
申请人： Akinori Etoh , Setsuko Oike , Tomokazu Ishizuka , Shigeharu Fujii , Kiyotaka Shindo
发明人： Akinori Etoh , Setsuko Oike , Tomokazu Ishizuka , Shigeharu Fujii , Kiyotaka Shindo
IPC分类号： C09G1/02
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1454 , H01L21/3212
摘要： Disclosed is a polishing slurry which enables to suppress damages to an under layer while securing an adequate polishing rate. The polishing slurry contains a resin (A) having an amide group and an organic resin (B).
摘要翻译：公开了一种抛光浆料，其能够在确保足够的抛光速率的同时抑制对底层的损伤。研磨浆料含有具有酰胺基的树脂（A）和有机树脂（B）。

2. 发明授权

US08460414B2 Polishing slurry and polishing material using same 失效
标题翻译：抛光浆料和抛光材料使用相同
公开(公告)号：US08460414B2
公开(公告)日：2013-06-11
申请号：US11918226
申请日：2006-04-14
申请人： Akinori Etoh , Setsuko Oike , Tomokazu Ishizuka , Shigeharu Fujii , Kiyotaka Shindo
发明人： Akinori Etoh , Setsuko Oike , Tomokazu Ishizuka , Shigeharu Fujii , Kiyotaka Shindo
IPC分类号： B24D3/28 , B24D3/344 , C09G1/16 , D21H17/375 , A61K47/48176
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1454 , H01L21/3212
摘要： Disclosed is a polishing slurry which enables to suppress damages to an under layer while securing an adequate polishing rate. The polishing slurry contains a resin (A) having an amide group and an organic resin (B).
摘要翻译：公开了一种抛光浆料，其能够在确保足够的抛光速率的同时抑制对底层的损伤。研磨浆料含有具有酰胺基的树脂（A）和有机树脂（B）。

3. 发明授权

US08147712B2 Polishing composition 失效
标题翻译：抛光组成
公开(公告)号：US08147712B2
公开(公告)日：2012-04-03
申请号：US12225374
申请日：2007-03-19
申请人： Akinori Etoh , Setsuko Oike , Shigeharu Fujii , Kiyotaka Shindo , Tomokazu Ishizuka
发明人： Akinori Etoh , Setsuko Oike , Shigeharu Fujii , Kiyotaka Shindo , Tomokazu Ishizuka
IPC分类号： C09K13/00
CPC分类号： H01L21/3212 , C09G1/02 , C09K3/1463 , H01L21/32125
摘要： Disclosed is a polishing composition containing not less than 1 wt % of a water-soluble resin, which is obtained by polymerizing a vinyl monomer containing an amino group and/or an amide group, based on the total weight of the polishing composition.
摘要翻译：公开了一种抛光组合物，该抛光组合物含有不少于1重量％的水溶性树脂，其通过聚合含有氨基和/或酰胺基的乙烯基单体而获得，基于抛光组合物的总重量。

4. 发明申请

US20100155654A1 Polishing Composition 失效
标题翻译：抛光组合
公开(公告)号：US20100155654A1
公开(公告)日：2010-06-24
申请号：US12225374
申请日：2007-03-19
申请人： Akinori Etoh , Setsuko Oike , Shigeharu Fujii , Kiyotaka Shindo , Tomokazu Ishizuka
发明人： Akinori Etoh , Setsuko Oike , Shigeharu Fujii , Kiyotaka Shindo , Tomokazu Ishizuka
IPC分类号： C09K13/00
CPC分类号： H01L21/3212 , C09G1/02 , C09K3/1463 , H01L21/32125
摘要： Disclosed is a polishing composition containing not less than 1 wt % of a water-soluble resin, which is obtained by polymerizing a vinyl monomer containing an amino group and/or an amide group, based on the total weight of the polishing composition.
摘要翻译：公开了一种抛光组合物，该抛光组合物含有不少于1重量％的水溶性树脂，其通过聚合含有氨基和/或酰胺基的乙烯基单体而获得，基于抛光组合物的总重量。

5. 发明申请

US20080248727A1 Polishing Slurry 审中-公开
标题翻译：抛光泥浆
公开(公告)号：US20080248727A1
公开(公告)日：2008-10-09
申请号：US11579151
申请日：2005-04-28
申请人： Kiyotaka Shindo , Akinori Etoh , Tomokazu Ishizuka
发明人： Kiyotaka Shindo , Akinori Etoh , Tomokazu Ishizuka
IPC分类号： B24B1/00
CPC分类号： C09K3/1463 , C09G1/02 , C09G1/04 , H01L21/3212
摘要： The present invention provides a polishing slurry which remarkably inhibits the occurrence of scratch, dishing or erosion. According to the present invention, provided is a polishing slurry comprising organic particles (A), an oxidizing agent and a complexing agent, wherein said organic particles (A) are those obtained by coating a part of the surface of an organic particle (B) having functional groups capable of reacting with a metal to be polished on the surface with a resin (C) free from functional groups capable of reacting with a metal to be polished, and the organic particle (B) is preferably one containing a copolymer obtained by polymerization of a monomer composition comprising 1 to 50 weight % of one, two or more monomers selected from a monomer having a carboxyl group, a monomer having a hydroxyl group, a monomer having an amino group, a monomer having an acetoacetoxy group and a monomer having a glycidyl group, and 99 to 50 weight % of other monomers, with each percentage based on the total weight of the monomers.
摘要翻译：本发明提供了显着抑制刮擦，凹陷或侵蚀的发生的研磨浆料。根据本发明，提供了包含有机颗粒（A），氧化剂和络合剂的抛光浆料，其中所述有机颗粒（A）是通过涂布有机颗粒（B）的一部分表面而获得的那些，具有能够在表面上与能够与被研磨金属反应的官能团的树脂（C）与表面上的被研磨金属反应的官能团，有机粒子（B）优选含有通过包含1至50重量％的一种或多种选自具有羧基的单体，具有羟基的单体，具有氨基的单体，具有乙酰乙酰氧基的单体和单体的单体组合物的聚合反应具有缩水甘油基和99至50重量％的其它单体，每个百分比基于单体的总重量。

6. 发明授权

US08394740B2 Thermosensitive recording material 有权
标题翻译：热敏记录材料
公开(公告)号：US08394740B2
公开(公告)日：2013-03-12
申请号：US12682421
申请日：2008-10-02
申请人： Akinori Etoh , Tomokazu Ishizuka
发明人： Akinori Etoh , Tomokazu Ishizuka
IPC分类号： B41M5/42
CPC分类号： B41M5/44 , B41M2205/04 , B41M2205/40
摘要： The present invention provides a material that is less likely to cause flex cracking, has high scratch resistance, and is suitable for a protective layer for a thermosensitive material. A thermosensitive recording material according to the present invention includes a base, a thermosensitive recording layer formed on the base, and a protective layer formed on the thermosensitive recording layer, wherein the protective layer is formed from a mixture that contains an emulsion (a) containing particles formed of a hydrophobic polymer (1) and a hydrophilic polymer (2); and a non-crosslinking urea compound (b). Preferably, the hydrophobic polymer (1) contains an acrylonitrile-derived constitutional unit. Preferably, the non-crosslinking urea compound (b) is urea or a urea derivative.
摘要翻译：本发明提供一种不太可能引起挠曲裂纹，耐划伤性高，适用于热敏材料保护层的材料。根据本发明的热敏记录材料包括基底，形成在基底上的热敏记录层和形成在热敏记录层上的保护层，其中保护层由含有乳液（a）的混合物形成，所述乳液（a）含有由疏水性聚合物（1）和亲水性聚合物（2）形成的颗粒; 和非交联脲化合物（b）。优选地，疏水性聚合物（1）含有丙烯腈衍生的结构单元。优选地，非交联脲化合物（b）是脲或脲衍生物。

7. 发明申请

US20090258784A1 Heat-Sensitive Recording Materials 有权
标题翻译：热敏记录材料
公开(公告)号：US20090258784A1
公开(公告)日：2009-10-15
申请号：US12083974
申请日：2006-10-24
申请人： Akinori Etoh , Keiichi Taki , Shinjirou Sakurai , Tomokazu Ishizuka , Yasuo Okada
发明人： Akinori Etoh , Keiichi Taki , Shinjirou Sakurai , Tomokazu Ishizuka , Yasuo Okada
IPC分类号： B41M5/28 , B41M5/42
CPC分类号： B41M5/44
摘要： A heat-sensitive recording material includes a heat-sensitive recording layer on a support which layer produces a color upon heating, and a protective layer on the heat-sensitive recording layer. The protective layer is obtained from a composition (A) based on an emulsion of a copolymer resin (a). The copolymer resin (a) includes a vinyl monomer component having a carboxyl group, and a vinyl monomer component copolymerizable with the vinyl monomer component. The copolymer resin (a) contains 1 to 10 parts by weight of the vinyl monomer component having a carboxyl group. The copolymer resin has a SP value (solubility parameter) of not less than 9.5 (cal/cm3)1/2 and a glass transition temperature (Tg) of 20 to 130° C. The emulsion of the copolymer resin (a) has a minimum film-forming temperature (MFT) of more than 5° C. The emulsion for heat-sensitive recording material provides high durability, in particular water resistance, antiblocking properties in water-wetted state and chemical resistance, and has significantly improved storage stability.
摘要翻译：热敏记录材料包括在加热时该层产生颜色的载体上的热敏记录层和热敏记录层上的保护层。保护层由基于共聚物树脂（a）的乳液的组合物（A）获得。共聚物树脂（a）包括具有羧基的乙烯基单体组分和可与乙烯基单体组分共聚的乙烯基单体组分。共聚物树脂（a）含有1〜10重量份的具有羧基的乙烯基单体组分。共聚物树脂的SP值（溶解度参数）不小于9.5（cal / cm 3）1/2，玻璃化转变温度（Tg）为20-130℃。共聚物树脂（a）的乳液具有最低成膜温度（MFT）超过5℃。用于热敏记录材料的乳液提供高耐久性，特别是耐水性，防水性和耐化学性的防粘连性，并且显着提高了储存稳定性。

8. 发明授权

US08298987B2 Heat-sensitive recording materials 有权
标题翻译：热敏记录材料
公开(公告)号：US08298987B2
公开(公告)日：2012-10-30
申请号：US12083974
申请日：2006-10-24
申请人： Akinori Etoh , Keiichi Taki , Shinjirou Sakurai , Tomokazu Ishizuka , Yasuo Okada
发明人： Akinori Etoh , Keiichi Taki , Shinjirou Sakurai , Tomokazu Ishizuka , Yasuo Okada
IPC分类号： B41M5/30 , B41M5/42
CPC分类号： B41M5/44
摘要： A heat-sensitive recording material includes a heat-sensitive recording layer on a support which layer produces a color upon heating, and a protective layer on the heat-sensitive recording layer. The protective layer is obtained from a composition (A) based on an emulsion of a copolymer resin (a). The copolymer resin (a) includes a vinyl monomer component having a carboxyl group, and a vinyl monomer component copolymerizable with the vinyl monomer component. The copolymer resin (a) contains 1 to 10 parts by weight of the vinyl monomer component having a carboxyl group. The copolymer resin has a SP value (solubility parameter) of not less than 9.5 (cal/cm3)1/2 and a glass transition temperature (Tg) of 20 to 130° C. The emulsion of the copolymer resin (a) has a minimum film-forming temperature (MFT) of more than 5° C. The emulsion for heat-sensitive recording material provides high durability, in particular water resistance, antiblocking properties in water-wetted state and chemical resistance, and has significantly improved storage stability.
摘要翻译：热敏记录材料包括在加热时该层产生颜色的载体上的热敏记录层和热敏记录层上的保护层。保护层由基于共聚物树脂（a）的乳液的组合物（A）获得。共聚物树脂（a）包括具有羧基的乙烯基单体组分和可与乙烯基单体组分共聚的乙烯基单体组分。共聚物树脂（a）含有1〜10重量份的具有羧基的乙烯基单体组分。共聚物树脂的SP值（溶解度参数）不小于9.5（cal / cm 3）1/2，玻璃化转变温度（Tg）为20-130℃。共聚物树脂（a）的乳液具有最低成膜温度（MFT）超过5℃。用于热敏记录材料的乳液提供高耐久性，特别是耐水性，防水性和耐化学性的防粘连性，并且显着提高了储存稳定性。

9. 发明申请

US20080071039A1 Protective Material for Heat Sensitive Paper 审中-公开
标题翻译：热敏纸保护材料
公开(公告)号：US20080071039A1
公开(公告)日：2008-03-20
申请号：US11662387
申请日：2005-09-07
申请人： Akinori Etoh , Tomokazu Ishizuka , Yukie Ogawa , Takashi Kojima
发明人： Akinori Etoh , Tomokazu Ishizuka , Yukie Ogawa , Takashi Kojima
IPC分类号： C08G18/62
CPC分类号： B41M5/44 , B41M2205/04 , B41M2205/36 , B41M2205/38 , B41M2205/40
摘要： A protective material for a heat sensitive paper, which is an emulsion including water, a water soluble polymer (A), and a hydrophobic polymer (B), at least one of (A) and (B) containing a structural unit derived from a monomer (C) having a sulfonic acid group or a salt thereof. The protective material can provide a higher level of durability (e.g., water resistance, plasticizer resistance, alcohol resistance) against various materials, and can ensure good running stability, as compared with the conventional protective material.
摘要翻译：作为包含水，水溶性聚合物（A）和疏水性聚合物（B）的乳液的热敏性纸的保护材料，含有来源于（A）的结构单元的（A）和（B）中的至少一种具有磺酸基的单体（C）或其盐。与常规保护材料相比，保护材料能够对各种材料提供更高水平的耐久性（例如耐水性，耐增塑剂性，耐醇性），并且可以确保良好的运行稳定性。

10. 发明申请

US20100248958A1 THERMOSENSITIVE RECORDING MATERIAL 有权
标题翻译：耐热记录材料
公开(公告)号：US20100248958A1
公开(公告)日：2010-09-30
申请号：US12682421
申请日：2008-10-02
申请人： Akinori Etoh , Tomokazu Ishizuka
发明人： Akinori Etoh , Tomokazu Ishizuka
IPC分类号： B41M5/26
CPC分类号： B41M5/44 , B41M2205/04 , B41M2205/40
摘要： The present invention provides a material that is less likely to cause flex cracking, has high scratch resistance, and is suitable for a protective layer for a thermosensitive material.A thermosensitive recording material according to the present invention includes a base, a thermosensitive recording layer formed on the base, and a protective layer formed on the thermosensitive recording layer, wherein the protective layer is formed from a mixture that contains an emulsion (a) containing particles formed of a hydrophobic polymer (1) and a hydrophilic polymer (2); and a non-crosslinking urea compound (b). Preferably, the hydrophobic polymer (1) contains an acrylonitrile-derived constitutional unit. Preferably, the non-crosslinking urea compound (b) is urea or a urea derivative.
摘要翻译：本发明提供一种不太可能引起挠曲裂纹，耐划伤性高，适用于热敏材料保护层的材料。根据本发明的热敏记录材料包括基底，形成在基底上的热敏记录层和形成在热敏记录层上的保护层，其中保护层由含有乳液（a）的混合物形成，所述乳液（a）含有由疏水性聚合物（1）和亲水性聚合物（2）形成的颗粒; 和非交联脲化合物（b）。优选地，疏水性聚合物（1）含有丙烯腈衍生的结构单元。优选地，非交联脲化合物（b）是脲或脲衍生物。

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