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1. 发明授权

US5016986A Display device having an improvement in insulating between conductors connected to electronic components 失效
标题翻译：具有连接到电子部件的导体之间的绝缘性改善的显示装置
公开(公告)号：US5016986A
公开(公告)日：1991-05-21
申请号：US337155
申请日：1989-04-12
申请人： Akihiro Kawashima , Hirokazu Yoshida , Yasunobu Tagusa , Kiyoshi Inada , Hideshi Makita , Yoshihisa Dotta
发明人： Akihiro Kawashima , Hirokazu Yoshida , Yasunobu Tagusa , Kiyoshi Inada , Hideshi Makita , Yoshihisa Dotta
IPC分类号： G02F1/13 , G02F1/1345
CPC分类号： G02F1/13452 , G02F1/1345
摘要： In a liquid crystal display apparatus, in order to reduce the size and weight, an integrated circuit for driving a liquid crystal is mounted on the glass substrate including the liquid crystal panel either directly or by way of a tape carrier. That is, two glass substrates of liquid crystal panel are mutually overlapped with an offset, and a liquid crystal material is injected into the overlapping regions of the two glass substrates, and liquid crystal display is effected in this region. Further, in the non-overlapping region of the two glass substrates, the integrated circuit is connected either directly or by way of a tape carrier. On the glass substrates, electrodes for varying the optical characteristics of the liquid crystals are provided, and the integrated circuit drives the liquid crystal by controlling the voltage applied to the electrodes. Further transparent insulation films are formed usually formed on the electrodes. The transparent insulation films are also formed in the non-overlapping region of the glass substrates. Since the transparent insulation films are finely patterned by photolithography, they may be selectively formed on the portions where defective insulation is likely to occur between the wiring conductors following the integrated circuit from the electrodes, or between the integrated circuit and the peripheral portion of the connecting part.

2. 发明申请

US20110258808A1 SUBSTRATE CLEANING APPARATUS 有权
标题翻译：基板清洁装置
公开(公告)号：US20110258808A1
公开(公告)日：2011-10-27
申请号：US13140527
申请日：2009-11-09
申请人： Hideshi Makita , Toru Tanigawa
发明人： Hideshi Makita , Toru Tanigawa
IPC分类号： A47L9/00
CPC分类号： C03C23/0075 , B08B1/00 , B08B5/04 , B08B7/02
摘要： A substrate cleaning apparatus includes a cleaning plate, a vibration unit for vibrating the cleaning plate, a suction unit having an intake opening in the vicinity of a tip end portion of the cleaning plate, for sucking an upper surface of a substrate to be cleaned without being in contact with the substrate, and a moving mechanism for moving the cleaning plate relative to the substrate. In the substrate cleaning apparatus, the tip end portion of the cleaning plate is pressed against the upper surface of the substrate to cause the cleaning plate to be elastically deformed, and the cleaning plate moves relative to the substrate in the cleaning direction of the substrate, with the tip end portion of the cleaning plate being in line contact or surface contact with the upper surface of the substrate. Such a configuration allows the substrate to be cleaned stably while preventing scratching the substrate.
摘要翻译：一种基板清洗装置，包括清洁板，用于振动清洁板的振动单元，具有在清洁板的顶端部附近的进气口的吸引单元，用于吸取要清洁的基板的上表面而没有与基板接触，以及用于相对于基板移动清洁板的移动机构。在基板清洗装置中，清洁板的前端部被压靠在基板的上表面，使得清洁板弹性变形，并且清洁板沿着基板的清洁方向相对于基板移动，其中清洁板的顶端部分与衬底的上表面线接触或表面接触。这样的结构使得能够稳定地清洗基板，同时防止刮擦基板。

3. 发明授权

US08789236B2 Substrate cleaning apparatus 有权
标题翻译：基材清洗装置
公开(公告)号：US08789236B2
公开(公告)日：2014-07-29
申请号：US13140527
申请日：2009-11-09
申请人： Hideshi Makita , Toru Tanigawa
发明人： Hideshi Makita , Toru Tanigawa
IPC分类号： A47L9/06 , B08B5/00
CPC分类号： C03C23/0075 , B08B1/00 , B08B5/04 , B08B7/02
摘要： A substrate cleaning apparatus includes a cleaning plate, a vibration unit for vibrating the cleaning plate, a suction unit having an intake opening in the vicinity of a tip end portion of the cleaning plate, for sucking an upper surface of a substrate to be cleaned without being in contact with the substrate, and a moving mechanism for moving the cleaning plate relative to the substrate. In the substrate cleaning apparatus, the tip end portion of the cleaning plate is pressed against the upper surface of the substrate to cause the cleaning plate to be elastically deformed, and the cleaning plate moves relative to the substrate in the cleaning direction of the substrate, with the tip end portion of the cleaning plate being in line contact or surface contact with the upper surface of the substrate. Such a configuration allows the substrate to be cleaned stably while preventing scratching the substrate.
摘要翻译：一种基板清洗装置，包括清洁板，用于振动清洁板的振动单元，具有在清洁板的顶端部附近的进气口的吸引单元，用于吸取要清洁的基板的上表面而没有与基板接触，以及用于相对于基板移动清洁板的移动机构。在基板清洗装置中，清洁板的前端部被压靠在基板的上表面，使得清洁板弹性变形，并且清洁板沿着基板的清洁方向相对于基板移动，其中清洁板的顶端部分与衬底的上表面线接触或表面接触。这样的结构使得能够稳定地清洗基板，同时防止刮擦基板。

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