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    • 7. 发明授权
    • Method and system for providing a hard bias structure in a magnetic recording transducer
    • 在磁记录传感器中提供硬偏置结构的方法和系统
    • US08547667B1
    • 2013-10-01
    • US12324735
    • 2008-11-26
    • Anup Ghosh RoyMing MaoMahendra Pakala
    • Anup Ghosh RoyMing MaoMahendra Pakala
    • G11B5/127
    • G11B5/3932
    • A method and system for providing a magnetic transducer is described. The method and system include providing a seed layer and providing at least one adjustment layer on the seed layer. The method and system also include providing a hard bias structure on the at least one adjustment layer. The seed layer has a first template including a first template dimension and a first texture. The at least one adjustment layer has a second template including a second template dimension and a second texture. The hard bias structure has a third template including a third template dimension and a third texture. The second template is between the first template and the third template.
    • 描述了一种用于提供磁换能器的方法和系统。 该方法和系统包括提供种子层并在种子层上提供至少一个调节层。 该方法和系统还包括在至少一个调节层上提供硬偏压结构。 种子层具有包括第一模板尺寸和第一纹理的第一模板。 所述至少一个调整层具有包括第二模板尺寸和第二纹理的第二模板。 硬偏置结构具有包括第三模板尺寸和第三纹理的第三模板。 第二个模板位于第一个模板和第三个模板之间。
    • 9. 发明申请
    • Sputter deposition system and methods of use
    • 溅射沉积系统及其使用方法
    • US20070209932A1
    • 2007-09-13
    • US11372517
    • 2006-03-10
    • Piero SferlazzoMing MaoJinliang ChenDavid FelsenthalRobert HieronymiMiroslav Eror
    • Piero SferlazzoMing MaoJinliang ChenDavid FelsenthalRobert HieronymiMiroslav Eror
    • C23C14/00
    • C23C14/352C23C14/505C23C14/568C23C14/5833
    • The present invention relates to a sputter deposition system and to methods of use thereof for processing substrates using planetary sputter deposition methods. The sputter deposition system includes a deposition chamber having an azimuthal axis. A rotatable member is situated in the chamber and includes a plurality of magnetrons provided thereon. Each magnetron includes a corresponding one of a plurality of sputtering targets. The rotatable member is configured to position each of the magnetrons to direct sputtered material from the corresponding one of the sputtering targets to a deposition zone defined in the deposition chamber. A transport mechanism is situated in the deposition chamber and includes an arm rotatable about the azimuthal axis. A substrate holder is attached to the arm of the transport mechanism and supports the substrate as the arm rotates the substrate holder to intersect the deposition zone for depositing sputtered material on the substrate.
    • 溅射沉积系统技术领域本发明涉及一种溅射沉积系统及其使用方法,用于使用行星式溅射沉积方法来处理衬底 溅射沉积系统包括具有方位角轴的沉积室。 可旋转构件位于腔室中并且包括设置在其上的多个磁控管。 每个磁控管包括多个溅射靶中相应的一个。 可旋转构件被构造成定位每个磁控管以将溅射的材料从相应的一个溅射靶引导到在沉积室中限定的沉积区。 输送机构位于沉积室中并且包括可围绕方位轴线旋转的臂。 衬底保持器附接到输送机构的臂上并且当臂旋转衬底保持器以与沉积区相交以在基底上沉积溅射材料时支撑衬底。