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    • 4. 发明授权
    • Optical switch with reversible electroplating mirrors
    • 具有可逆电镀镜的光开关
    • US06931169B2
    • 2005-08-16
    • US10068269
    • 2002-02-05
    • Jiangjun ZhangPeiching LingJinliang ChenMing Xu
    • Jiangjun ZhangPeiching LingJinliang ChenMing Xu
    • G02B6/35G02F1/15G02F1/313
    • G02F1/313G02B6/3512G02B6/3538G02B6/3546G02F1/1506
    • The present invention discloses an optical switching element that uses reversible electroplating mirrors includes a trench with transparent sidewalls located at the intersection of two waveguides A and B. The trench has two electrodes; one, which is transparent, is placed on the trench sidewall and the other is placed on the trench floor. The trench is filled with an index-matching electrolytic solution containing ions of a metal that can electro-deposit on these two electrodes. To actuate the switching element, a negative electrical potential is applied to the sidewall electrode. Actuation causes metal deposits to form on the sidewall electrode, creating a mirror that reflects light from waveguide A to waveguide B. To deactivate the switching element, a positive electrical potential is applied to the sidewall electrode. Deactivation causes metal deposits move off the sidewall and form on the trench floor. The lack of metal deposits on the sidewall allows light to pass through the switching element and continue along the original waveguide A
    • 本发明公开了一种使用可逆电镀反射镜的光学开关元件,其包括具有位于两个波导A和B的交叉点处的透明侧壁的沟槽。该沟槽具有两个电极; 一个是透明的,放置在沟槽侧壁上,另一个放置在沟槽地板上。 沟槽填充有包含能够沉积在这两个电极上的金属离子的折射率匹配电解液。 为了致动开关元件,向侧壁电极施加负电位。 激励导致在侧壁电极上形成金属沉积物,从而产生将波导A的光反射到波导B的反射镜。为了使开关元件失活,向侧壁电极施加正电位。 停用会导致金属沉积物离开侧壁并在沟槽地板上形成。 侧壁上金属沉积物的缺乏允许光通过开关元件并沿着原始波导A继续
    • 7. 发明授权
    • Magnet system for an ion beam implantation system using high perveance beams
    • 用于离子束植入系统的磁场系统,使用高度方位光束
    • US06403967B1
    • 2002-06-11
    • US09419448
    • 1999-10-15
    • Jiong ChenJinliang ChenEric Henry Jon Antonissen
    • Jiong ChenJinliang ChenEric Henry Jon Antonissen
    • H01J37147
    • H01J37/3171H01J37/05H01J37/147
    • An apparatus for ion implantation using high perveance beams is disclosed. The apparatus includes a dipole magnet apparatus that provides an adjustment to a cross-beam magnetic dipole field in an ion implantation system. Introduction and control of the magnetic dipole field gradient in a low energy implantation system as disclosed herein gives a significant improvement to the magnet's acceptance and beam focusing which largely defines the effective transported beam current. The apparatus involves the use of ferromagnetic yokes of a prescribed shape and a portion of a secondary magnet coil following along the outside radius of a set of primary dipole magnet coils which define and delineate the primary magnetic field area and beam path. The current return path for the secondary magnet coil is via another portion of the secondary magnet coil that follows a path such that the field generated by the return path secondary magnet coil is orthogonal to the primary magnetic field. The resulting magnetic field across the beam cross-section has a sloping shape with relative maxima and minima near the transverse beamline boundary. The action of the magnetic field distribution on the ion beam acts to compensate the space-charge dispersion of high perveance beams.
    • 公开了一种使用高度方位离子束的离子注入装置。 该装置包括偶极磁体装置,其提供离子注入系统中的横梁磁偶极场的调节。 在本文公开的低能量注入系统中的磁偶极场梯度的引入和控制给出了磁体的接受度和束聚焦的显着改进,其大大限定了有效传输的束电流。 该装置涉及使用规定形状的铁磁轭和次级电磁线圈的一部分,沿着一组初级偶极子磁体线圈的外半径,其限定并描绘主磁场区域和射束路径。 次级电磁线圈的电流返回路径经过次级磁体线圈的另一部分,其沿着路径使得由返回路径次级磁体线圈产生的磁场与初级磁场正交。 横截面横截面上产生的磁场具有相对最大值和最小值的横向波束边界附近的倾斜形状。 离子束上的磁场分布的作用用于补偿高通量波束的空间电荷分散。