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1. 发明申请

WO2006039724A2 BELLOWS LINER FOR AN ION BEAM IMPLANTER 审中-公开
标题翻译：用于离子束植绒的BELOWS衬垫
公开(公告)号：WO2006039724A2
公开(公告)日：2006-04-13
申请号：PCT/US2005/036567
申请日：2005-09-28
申请人： AXCELIS TECHNOLOGIES, INC. , STONE, Lyudmila , BARRUSSO, Scott , STONE, Dale , PEREL, Alexander
发明人： STONE, Lyudmila , BARRUSSO, Scott , STONE, Dale , PEREL, Alexander
IPC分类号： H01J37/317
CPC分类号： H01J37/3171
摘要： An ion beam implanter includes ion beam forming and directing apparatus and an implantation station where workpieces are implanted with ions from an ion beam. The beam travels along an evacuated path from an ion source to the implantation station. A flexible bellows couples the implantation station to the beam forming and directing apparatus permitting the implantation station to be pivoted with respect to the beam forming and directing apparatus and thereby change an implantation orientation of the workpieces with respect to the ion beam. A replaceable, flexible bellows liner is disposed within an interior region of the bellows to reduce the volume of implantation byproducts deposited on an interior surface of the bellows.
摘要翻译：离子束注入机包括离子束形成和引导装置以及其中用离子束注入离子的工件的注入站。光束沿着从离子源到注入站的抽真空路径行进。柔性波纹管将植入站耦合到波束形成和引导装置，允许植入站相对于波束形成和引导装置枢转，从而改变相对于离子束的工件的注入取向。可替换的柔性波纹管衬套设置在波纹管的内部区域内，以减小沉积在波纹管内表面上的植入副产物的体积。

2. 发明申请

WO2005091342A3 IN-SITU MONITORING ON A SPINNING-DISK ION IMPLANTER 审中-公开
公开(公告)号：WO2005091342A3
公开(公告)日：2005-09-29
申请号：PCT/US2005/009194
申请日：2005-03-18
申请人： AXCELIS TECHNOLOGIES, INC. , PEREL, Alexander , LOIZIDES, William , STONE, Lyudmila , BENVENISTE, Victor
发明人： PEREL, Alexander , LOIZIDES, William , STONE, Lyudmila , BENVENISTE, Victor
IPC分类号： H01J37/317
摘要： The present invention is directed to in-situ detection of particles and other such features in an ion implantation system (300) during implantation operations to avoid such additional monitoring tool steps otherwise expended before and/or after implantation, for example. One or more such systems are revealed for detecting scattered light from particles on one or more semiconductor wafers illuminated by a light source (e.g., laser beam). The system comprises an ion implanter (302) having a laser (322) for illumination of a spot on the wafer (308) and a pair of detectors (360) (e.g., PMT or photodiode) rotationally opposite from the ion implantation operations. A wafer transport holds a wafer or wafers for translational scanning under the fixed laser spot. A computer analyzes the intensity of the scattered light (326) detected from the illuminated wafer (workpiece) (308), and may also map the light detected to a unique the present invention is directed to in-situ detection of particles and other such features in an ion implantation system during implantation operations to avoid such additional monitoring tool steps otherwise expended before and/or after implantation, for example. One or more such sysetms are revealed for detecting scattered light from particles on one or more semiconductor wafers illuminated by a light source (e, g., laser beam).The system comprises an ion implanter having a laser for illumination of a spot on the wafer and a pair of detectors (e, g., PMT or photodiode ) rotationally opposite from the ion implantation operations. A wafer transport holds a wafer or wafers for tanslational scanning under fixed laser spot. A computer analyzes the intensity of the scattered light detected from the illuminated wafer (workpiece), and may also map the light detected to a unique position. For example, particles or other such contaminates may be identified on wafers during the implantation process before additional time and resources are consumed, and aid in determining the sources of such contaminates. Further, threshold analysis of the quantity or size of such particles, for example, may provide a system interlock for shutdown or feedback control.

3. 发明申请

WO2007127068A1 LOAD LOCK CONTROL 审中-公开
标题翻译：负载锁定控制
公开(公告)号：WO2007127068A1
公开(公告)日：2007-11-08
申请号：PCT/US2007/009150
申请日：2007-04-13
申请人： AXCELIS TECHNOLOGIES, INC. , FASHEH, Tariq , CARROLL, James , PETRY, Klaus , STONE, Dale , STONE, Lyudmila , WEIDERSPAHN, Dave
发明人： FASHEH, Tariq , CARROLL, James , PETRY, Klaus , STONE, Dale , STONE, Lyudmila , WEIDERSPAHN, Dave
IPC分类号： H01L21/00
CPC分类号： H01L21/67201 , Y10S414/139
摘要： A control for pressurizing a load lock. The control initiates pressurization of the loadlock interior by coupling a source of gas to the loadlock interior. A representative load lock includes a pressure sensor and multiple valves to atmosphere where at least one such valves is a passthrough valve for removal of and insertion of workpieces from and into a load lock interior. A second fast acting valve also opens to atmosphere. A pressure rise inside the loadlock interior is monitored and when the pressure reaches a threshold pressure above atmosphere the fast acting valve is opened to atmosphere. This second fast acting valve is configured to relieve overpressure from the passthrough valve prior to opening of said passthrough valve. Workpiece movement is accomplished with the aid of a robot which reaches into the loadlock interior as it is either depositing workpieces or retrieving them. This system and process minimizes particle contamination of the load lock interior as well as contamination in the region outside the loadlock near the passthrough valve and any scheduled workpieces.
摘要翻译：用于对加载锁加压的控制。该控制通过将气源连接到负载锁内部来启动负载锁内部的加压。代表性的加载锁包括压力传感器和多个阀，其中至少一个这样的阀是用于从工作装置锁定内部移除和插入工件的直通阀。第二个快动作阀也向大气敞开。监控负载锁内部的压力上升，当压力达到高于大气压的阈值压力时，快速作用阀向大气开放。该第二快动阀构造成在打开所述通气阀之前减轻通气阀的过压。工件运动是借助于一个机器人来实现的，该机器人可以通过放置工件或检索它们而进入到装载锁内部。该系统和过程最大限度地减少了负载锁内部的颗粒污染以及穿通阀附近的负载锁定区域和任何预定工件的污染。

4. 发明申请

WO2009064974A2 EMBOSSED ELECTROSTATIC CHUCK 审中-公开
标题翻译：压花静电卡盘
公开(公告)号：WO2009064974A2
公开(公告)日：2009-05-22
申请号：PCT/US2008/083540
申请日：2008-11-14
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. , LISCHER, D., Jeffrey , STONE, Dale, K. , STONE, Lyudmila , SUURONEN, David , BLAKE, Julian, G.
发明人： LISCHER, D., Jeffrey , STONE, Dale, K. , STONE, Lyudmila , SUURONEN, David , BLAKE, Julian, G.
IPC分类号： H01L21/683 , H01L21/68
CPC分类号： H01L21/6831
摘要： An electrostatic chuck includes a layer having a plurality of protrusions to support a workpiece, wherein at least a portion of the layer has a first plurality of the plurality of protrusions. The first plurality of protrusions is spaced to geometrically form a pattern of hexagons. The first plurality of protrusions may be spaced an equal distance from adjacent protrusions and the equal distance may be about 4.0 millimeters from a center of one protrusion to a center of another protrusion. The present disclosure reduces peak mechanical stress levels conventionally present along an edge of each protrusion. Reducing such mechanical stress levels helps reduce backside damage to a supported workpiece, which in turn can reduce the generation of unwanted particles caused by such damage.
摘要翻译：静电吸盘包括具有多个支撑工件的突起的层，其中该层的至少一部分具有第一多个多个突起。第一多个突起间隔开以几何形成六边形图案。第一多个突起可以与相邻的突起间隔相等的距离，并且等距离可以从一个突起的中心到另一个突起的中心大约4.0毫米。本公开减少沿着每个突起的边缘常规存在的峰值机械应力水平。减少这种机械应力水平有助于减少对支撑工件的背面损伤，进而减少由此类损伤引起的不需要的颗粒的产生。

5. 发明申请

WO2009005959A1 TECHNIQUES FOR HANDLING SUBSTRATES 审中-公开
标题翻译：处理基板的技术
公开(公告)号：WO2009005959A1
公开(公告)日：2009-01-08
申请号：PCT/US2008/066309
申请日：2008-06-09
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. , STONE, Dale, K. , STONE, Lyudmila , BLAKE, Julian, G. , GUDAPATI, Suneethi
发明人： STONE, Dale, K. , STONE, Lyudmila , BLAKE, Julian, G. , GUDAPATI, Suneethi
IPC分类号： H01L21/687 , H01L21/683
CPC分类号： H01L21/68707
摘要： Techniques for handling substrates are disclosed. In one particular exemplary embodiment, the techniques may be realized as a substrate support. The substrate support may comprise a mounting portion. The substrate support may also comprise a wall extending from the mounting portion, wherein the wall may form a generally enclosed area and may have a contact surface at a distal end.
摘要翻译：公开了处理衬底的技术。在一个特定的示例性实施例中，这些技术可以被实现为衬底支撑。衬底支撑件可以包括安装部分。衬底支撑件还可以包括从安装部分延伸的壁，其中壁可以形成大致封闭的区域并且可以在远端具有接触表面。

6. 发明申请

WO2012033922A3 HIGH CONDUCTIVITY ELECTROSTATIC CHUCK 审中-公开
公开(公告)号：WO2012033922A3
公开(公告)日：2012-03-15
申请号：PCT/US2011/050841
申请日：2011-09-08
申请人： ENTEGRIS, INC. , VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. , SUURONEN, David , STONE, Lyudmila , BLAKE, Julian , STONE, Dale, K. , COOKE, Richard, A. , DONNELL, Steven , VENKATRAMAN, Chandra
发明人： SUURONEN, David , STONE, Lyudmila , BLAKE, Julian , STONE, Dale, K. , COOKE, Richard, A. , DONNELL, Steven , VENKATRAMAN, Chandra
IPC分类号： H01L21/683 , H01L21/687 , B23Q3/15 , H02N13/00
摘要： In accordance with an embodiment of the invention, there is provided an electrostatic chuck comprising a conductive path covering at least a portion of a workpiece-contacting surface of a gas seal ring of the electrostatic chuck, the conductive path comprising at least a portion of an electrical path to ground; and a main field area of a workpiece-contacting surface of the electrostatic chuck comprising a surface resistivity in the range of from about 10 8 to about 10 12 ohms per square.

7. 发明申请

WO2020055376A2 PLATEN TO CONTROL CHARGE ACCUMULATION 审中-公开
公开(公告)号：WO2020055376A2
公开(公告)日：2020-03-19
申请号：PCT/US2010/045173
申请日：2010-08-11
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. , STONE, Dale, K. , STONE, Lyudmila , BLAKE, Julian, G. , AMMON, Frederick, B. , SUURONEN, David, E.
发明人： STONE, Dale, K. , STONE, Lyudmila , BLAKE, Julian, G. , AMMON, Frederick, B. , SUURONEN, David, E.
摘要： An embossed platen to control charge accumulation includes a dielectric layer, a plurality of embossments on a surface of the dielectric layer to support a workpiece, each of a first plurality of the plurality of embossments having a conductive portion to contact a backside of the workpiece when the workpiece is in a clamped position, and a conductor to electrically couple the conductive portion of the first plurality of embossments to ground. An ion implanter having such an embossed platen Is also provided.

8. 发明申请

WO2009091943A1 IN-VACUUM PROTECTIVE LINERS 审中-公开
标题翻译：真空保护衬管
公开(公告)号：WO2009091943A1
公开(公告)日：2009-07-23
申请号：PCT/US2009/031192
申请日：2009-01-16
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. , STONE, Lyudmila , BLAKE, Julian, G. , STONE, Dale, K. , SERISKY, Ron, S.
发明人： STONE, Lyudmila , BLAKE, Julian, G. , STONE, Dale, K. , SERISKY, Ron, S.
IPC分类号： H01J37/30 , H01L21/26
CPC分类号： H01J37/3171 , H01J37/16 , H01J2237/0213 , H01J2237/022 , H01J2237/0268 , H01J2237/31705
摘要： This device has a liner disposed on a face in a vacuum chamber. A component in the vacuum chamber defines the face. The liner is configured to protect the workpiece from contamination or to prevent blistering of the face caused by implantation of atoms or ions into the face. The liner may be disposable and removed from the face in the vacuum chamber and replaced with a new liner in some embodiments. This liner may be a polymer with a roughened surface, be carbon-based, or be composed of carbon nanotubes in some embodiments.
摘要翻译：该装置具有设置在真空室中的表面上的衬垫。真空室中的部件限定了面。衬套被配置为保护工件免受污染或防止由于将原子或离子注入到面中引起的起泡。在一些实施例中，衬垫可以是一次性的并且从真空室中的表面移除并替换为新衬里。在一些实施方案中，该衬垫可以是具有粗糙表面的聚合物，为碳基，或由碳纳米管组成。

9. 发明申请

WO2012109071A1 TRIBOELECTRIC CHARGE CONTROLLED ELECTRO-STATIC CLAMP 审中-公开
标题翻译：三电荷充电控制电动夹
公开(公告)号：WO2012109071A1
公开(公告)日：2012-08-16
申请号：PCT/US2012/023481
申请日：2012-02-01
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. , BLAKE, Julian, G. , STONE, Dale, K. , STONE, Lyudmila , SUURONEN, David, E. , OSHIRO, Shigeo
发明人： BLAKE, Julian, G. , STONE, Dale, K. , STONE, Lyudmila , SUURONEN, David, E. , OSHIRO, Shigeo
IPC分类号： H01L21/683
CPC分类号： H01L21/6831
摘要： An electrostatic clamp which more effectively removes built up charge from a substrate prior to removal is disclosed. Currently, the lift pins and the ground pins are the only mechanism used to remove charge from the substrate after implantation. The present discloses describes an electrostatic chuck In which the top dielectric surface has an embedded conductive region, such as a ring shaped conductive region in the sealing ring. Thus, regardless of the orientation of the substrate during release, at least a portion of the substrate will contain the conductive region on the dielectric layer of the workpiece support. This conductive region may be connected to ground through the use of conductive vias in the dielectric layer. In some embodiments, these conductive vias are the fluid conduits used to supply gas to the back side of the substrate.
摘要翻译：公开了一种在去除之前更有效地从衬底去除积聚电荷的静电夹。目前，升降针和接地引脚是用于在植入后从衬底去除电荷的唯一机制。本公开描述了一种静电卡盘，其中顶部电介质表面具有嵌入的导电区域，例如密封环中的环形导电区域。因此，无论衬底在释放过程中的取向如何，衬底的至少一部分将包含工件支撑体的电介质层上的导电区域。该导电区域可以通过使用电介质层中的导电通孔而连接到地。在一些实施例中，这些导电通孔是用于向衬底的背侧供应气体的流体导管。

10. 发明申请

WO2010120983A2 REMOVAL OF CHARGE BETWEEN A SUBSTRATE AND AN ELECTROSTATIC CLAMP 审中-公开
标题翻译：去除基板和静电夹之间的电荷
公开(公告)号：WO2010120983A2
公开(公告)日：2010-10-21
申请号：PCT/US2010/031170
申请日：2010-04-15
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES , STONE, Dale, K. , STONE, Lyudmila , PETRY, Klaus , SUURONEN, David , BLAKE, Julian, G.
发明人： STONE, Dale, K. , STONE, Lyudmila , PETRY, Klaus , SUURONEN, David , BLAKE, Julian, G.
IPC分类号： H01L21/265 , H01L21/687
CPC分类号： H01L21/6831 , H01L21/68742 , Y10T29/49998 , Y10T279/23
摘要： An electrostatic clamp, which more effectively removes built up charge from a substrate prior to and during removal, is disclosed. Currently, the lift pins and ground pins are the only mechanisms used to remove charge from the substrate after implantation. The present discloses describes a clamp having one of more additional Sow resistance paths to ground. These additional conduits allow built up charge to be dissipated prior to and during the removal of the substrate from the clamp. By providing sufficient charge drainage from the backside surface of the substrate 114, the problem whereby the substrate sticks to the clamp can be reduced. This results in a corresponding reduction in substrate breakage.
摘要翻译：公开了一种静电夹具，其在去除和移除之前更有效地从衬底上去除积聚的电荷。目前，电极引脚和接地引脚是植入后从衬底去除电荷的唯一机制。本公开描述了一种夹具，具有一个更多额外的Sow电阻到地的路径。这些额外的管道允许在从夹具移除衬底之前和期间消耗积分电荷。通过从基板114的背面提供足够的电荷排出，可以减少基板粘附到夹具上的问题。这导致基板断裂的相应减少。

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