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1. 发明申请

WO2006014565A1 DEVICE AND METHOD FOR MEASUREMENT OF BEAM ANGLE AND DIVERGENCE NORMAL TO PLANE OF SCANNED BEAM OR RIBBON BEAM 审中-公开
标题翻译：用于测量光束角度和波长的波长的方法和方法正常到扫描光束或RIBBON光束的平面
公开(公告)号：WO2006014565A1
公开(公告)日：2006-02-09
申请号：PCT/US2005/024162
申请日：2005-07-07
申请人： AXCELIS TECHNOLOGIES, INC. , RATHMELL, Robert , BROWN, Douglas , RAY, Andrew
发明人： RATHMELL, Robert , BROWN, Douglas , RAY, Andrew
IPC分类号： H01J37/317 , H01J37/304 , H01J37/244
CPC分类号： H01J37/3171 , H01J37/244 , H01J37/304 , H01J2237/24507 , H01J2237/24528 , H01J2237/31703
摘要： The present invention facilitates semiconductor device fabrication by obtaining angle of incidence values and divergence of an ion beam normal to a plane of a scanned beam. A divergence detector comprising a mask (310) and profiler/sensor (314) is employed to obtain beamlets (312) from the incoming ion beam (308) and then to measure beam current at a number of vertical positions (316, 318). These beam current measurements are then employed to provide the vertical angle of incidence values, which provide a vertical divergence profile that serves to characterize the ion beam. These values can be employed by an ion beam generation mechanism to perform adjustments on the generated ion beam or position of the workpiece if the values indicate deviation from desired values.
摘要翻译：本发明通过获得垂直于扫描光束的平面的离子束的入射角和发散角来促进半导体器件的制造。使用包括掩模（310）和轮廓仪/传感器（314）的发散检测器从入射离子束（308）获得小束（312），然后测量多个垂直位置（316,318）处的束电流。然后使用这些射束电流测量来提供垂直入射角，其提供用于表征离子束的垂直发散分布。这些值可以由离子束产生机构使用，以对所产生的离子束或工件的位置执行调整，如果值表示偏离期望值。

2. 发明申请

WO2005045921A1 METHOD OF MAKING A MEMS ELECTROSTATIC CHUCK 审中-公开
标题翻译：制造MEMS静电卡盘的方法
公开(公告)号：WO2005045921A1
公开(公告)日：2005-05-19
申请号：PCT/US2004/035891
申请日：2004-10-28
申请人： AXCELIS TECHNOLOGIES INC. , KELLERMAN, Peter , QIN, Shu , ALLEN, Ernie , BROWN, Douglas , ALLEN, Ernie
发明人： KELLERMAN, Peter , QIN, Shu , ALLEN, Ernie , BROWN, Douglas , ALLEN, Ernie
IPC分类号： H01L21/68
CPC分类号： H01L21/6833
摘要： The present invention is directed to a method of forming a clamping plate for a multi-polar electrostatic chuck. The method comprises forming a first electrically conductive layer over a semiconductor platform and defining a plurality of portions of the first electrically conductive layer which are electrically isolated from one another. A first electrically insulative layer is formed over the first electrically conductive layer, the first electrically insulative layer comprising a top surface having a plurality of MEMS protrusions extending a first distance therefrom. A plurality of poles are furthermore electrically connected to the respective plurality of portions of the first electrically conductive layer, wherein a voltage applied between the plurality of poles is operable to induce an electrostatic force in the clamping plate.
摘要翻译：本发明涉及一种形成多极静电卡盘夹紧板的方法。该方法包括在半导体平台上形成第一导电层，并且限定彼此电隔离的第一导电层的多个部分。第一电绝缘层形成在第一导电层之上，第一电绝缘层包括具有从其延伸第一距离的多个MEMS突起的顶表面。多个极还电连接到第一导电层的相应多个部分，其中施加在多个极之间的电压可操作以在夹持板中引起静电力。

3. 发明申请

WO2005036637A1 MEMS BASED CONTACT CONDUCTIVITY ELECTROSTATIC CHUCK 审中-公开
标题翻译：基于MEMS的接触电导率静电卡盘
公开(公告)号：WO2005036637A1
公开(公告)日：2005-04-21
申请号：PCT/US2004/033247
申请日：2004-10-08
申请人： AXCELIS TECHNOLOGIES INC. , KELLERMAN, Peter , QIN, Shu , ALLEN, Ernie , BROWN, Douglas
发明人： KELLERMAN, Peter , QIN, Shu , ALLEN, Ernie , BROWN, Douglas
IPC分类号： H01L21/68
CPC分类号： H01L21/6831 , Y10S438/964
摘要： The present invention is directed to a method for clamping and processing a semiconductor substrate using a semiconductor processing apparatus. According to one aspect of the present invention, a multi-polar electrostatic chuck and associated method is disclosed which provides heating or cooling of a substrate by thermal contact conduction between the electrostatic chuck and the substrate. The multi-polar electrostatic chuck comprises a semiconductor platform having a plurality of protrusions that define gaps therebetween, a surface roughness of the plurality of protrusions is less than 100 Angstroms. The electrostatic chuck further comprises a voltage control system operable to control a voltage applied to the electrostatic chuck to thus control a contact heat transfer coefficient of the electrostatic chuck, wherein the heat transfer coefficient of the electrostatic chuck is primarily a function of a contact pressure between the substrate and the plurality of protrusions.
摘要翻译：本发明涉及使用半导体处理装置夹持和处理半导体衬底的方法。根据本发明的一个方面，公开了一种多极静电卡盘和相关方法，其通过静电卡盘和基板之间的热接触传导来提供加热或冷却基板。多极静电卡盘包括具有限定间隙的多个突起的半导体平台，多个突起的表面粗糙度小于100埃。静电卡盘还包括电压控制系统，其可操作以控制施加到静电卡盘的电压，从而控制静电卡盘的接触热传递系数，其中静电卡盘的传热系数主要是介于静电卡盘之间的接触压力的函数基板和多个突起。

4. 发明申请

WO2005101463A1 WAFER SCANNING SYSTEM WITH RECIPROCATING ROTARY MOTION UTILIZING SPRINGS AND COUNTERWEIGHTS 审中-公开
标题翻译：带旋转旋转运动的波浪扫描系统利用弹簧和对比
公开(公告)号：WO2005101463A1
公开(公告)日：2005-10-27
申请号：PCT/US2005/011586
申请日：2005-04-05
申请人： AXCELIS TECHNOLOGIES, INC. , KELLERMAN, Peter , BENEVENISTE, Victor , SAADATMAND, Kourosh , ASDIGHA, Mehran , BROWN, Douglas
发明人： KELLERMAN, Peter , BENEVENISTE, Victor , SAADATMAND, Kourosh , ASDIGHA, Mehran , BROWN, Douglas
IPC分类号： H01L21/00
CPC分类号： H01L21/67069 , H01J2237/20228 , H01J2237/31701
摘要： The present invention is directed to a scanning apparatus and method for processing a workpiece, wherein the scanning apparatus comprises a wafer arm and moving arm fixedly coupled to one another, wherein the wafer arm and moving arm are operable to rotate about a first axis. An end effector, whereon the workpiece resides, is coupled to the wafer arm. A rotational shaft couples the wafer arm and moving arm to a first actuator, wherein the first actuator provides a rotational force to the shaft. A momentum balance mechanism is coupled to the shaft and is operable to generally reverse the rotational direction of the shaft. The momentum balance mechanism comprises one or more fixed spring elements operable to provide a force to a moving spring element coupled to the moving arm. A controller is further operable to maintain a generally constant translational velocity of the end effector within a predetermined scanning range.
摘要翻译：本发明涉及一种用于处理工件的扫描装置和方法，其中扫描装置包括彼此固定地连接的晶片臂和移动臂，其中晶片臂和移动臂可操作以围绕第一轴线旋转。工件所在的端部执行器与晶片臂连接。旋转轴将晶片臂和移动臂联接到第一致动器，其中第一致动器向轴提供旋转力。动量平衡机构联接到轴上并且可操作地大体上使轴的旋转方向反转。动量平衡机构包括一个或多个固定弹簧元件，其可操作以向耦合到移动臂的移动弹簧元件提供力。控制器还可操作以将末端执行器的大致恒定的平移速度保持在预定扫描范围内。

5. 发明申请

WO2005020316A1 MEMS BASED MULTI-POLAR ELECTROSTATIC CHUCK 审中-公开
标题翻译：基于MEMS的多极静电卡盘
公开(公告)号：WO2005020316A1
公开(公告)日：2005-03-03
申请号：PCT/US2004/026896
申请日：2004-08-18
申请人： AXCELIS TECHNOLOGIES INC. , KELLERMAN, Peter , QIN, Shu , BROWN, Douglas
发明人： KELLERMAN, Peter , QIN, Shu , BROWN, Douglas
IPC分类号： H01L21/68
CPC分类号： H01L21/6875 , H01L21/6833
摘要： The present invention is directed to a semiconductor processing apparatus and a method for clamping a semiconductor substrate and controlling a heat transfer associated therewith. According to one aspect of the present invention, a multi-polar electrostatic chuck and associated method is disclosed which provides a controlled and uniform heat transfer coefficient across a surface thereof. The multi-polar electrostatic chuck comprises a semiconductor platform having a plurality of protrusions that define gaps therebetween, wherein a distance or depth of the gaps is uniform and associated with a mean free path of the cooling gas therein. The electrostatic chuck is permits a control of a backside pressure of a cooling gas within the plurality of gaps to thus control a heat transfer coefficient of the cooling gas. The plurality of protrusions further provide a uniform contact surface, wherein a contact conductivity between the plurality of protrusions and the substrate is controllable and significantly uniform across the substrate.
摘要翻译：本发明涉及一种用于夹持半导体衬底并控制与之相关的热传递的半导体处理装置和方法。根据本发明的一个方面，公开了一种多极静电卡盘和相关方法，其提供跨越其表面的受控且均匀的传热系数。多极静电卡盘包括具有限定间隙的多个突起的半导体平台，其中间隙的距离或深度是均匀的，并且与其中的冷却气体的平均自由路径相关联。静电吸盘可以控制多个间隙内的冷却气体的背侧压力，从而控制冷却气体的传热系数。多个突起还提供均匀的接触表面，其中多个突起和基底之间的接触导电性在基底上是可控的和显着均匀的。

6. 发明公开

EP1766655A1 DEVICE AND METHOD FOR MEASUREMENT OF BEAM ANGLE AND DIVERGENCE NORMAL TO PLANE OF SCANNED BEAM OR RIBBON BEAM 审中-公开
标题翻译：装置和方法用于测量光线角度和正常新发散扫描束束或带
公开(公告)号：EP1766655A1
公开(公告)日：2007-03-28
申请号：EP05772494.0
申请日：2005-07-07
申请人： AXCELIS TECHNOLOGIES, INC.
发明人： RATHMELL, Robert , BROWN, Douglas , RAY, Andrew
IPC分类号： H01J37/317 , H01J37/304 , H01J37/244
CPC分类号： H01J37/3171 , H01J37/244 , H01J37/304 , H01J2237/24507 , H01J2237/24528 , H01J2237/31703
摘要： The present invention facilitates semiconductor device fabrication by obtaining angle of incidence values and divergence of an ion beam normal to a plane of a scanned beam. A divergence detector comprising a mask (310) and profiler/sensor (314) is employed to obtain beamlets (312) from the incoming ion beam (308) and then to measure beam current at a number of vertical positions (316, 318). These beam current measurements are then employed to provide the vertical angle of incidence values, which provide a vertical divergence profile that serves to characterize the ion beam. These values can be employed by an ion beam generation mechanism to perform adjustments on the generated ion beam or position of the workpiece if the values indicate deviation from desired values.

7. 发明申请

WO2004019386A2 OPTICAL PATH IMPROVEMENT, FOCUS LENGTH CHANGE COMPENSATION, AND STRAY LIGHT REDUCTION FOR TEMPERATURE MEASUREMENT SYSTEM OF RTP TOOL 审中-公开
标题翻译： RTP工具温度测量系统的光学路径改进，聚焦长度变化补偿和轻量化减轻
公开(公告)号：WO2004019386A2
公开(公告)日：2004-03-04
申请号：PCT/US2003/026278
申请日：2003-08-21
申请人： AXCELIS TECHNOLOGIES, INC.
发明人： BROWN, Douglas , MEADOWS, Robert, David , TAO, David , KOCH, Mathias
IPC分类号： H01L21/00
CPC分类号： G01J5/08 , G01J5/0003 , G01J5/0007 , G01J5/02 , G01J5/0255 , G01J5/04 , G01J5/045 , G01J5/046 , G01J5/061 , G01J5/0806 , G01J5/084 , G01J5/0846 , G01J5/0875 , G01J5/0893 , H01L21/67248
摘要： The present invention is directed to a pyrometer system and comprises an elevator tube. The elevator tube comprises an inner tube and an outer tube surrounding the inner tube in telescoping arrangement and extending from a top to a bottom thereof, the arrangement defining a fluid passageway therebetween. The elevator tube further comprises a port associated with the outer tube that is operable to transmit a cooling gas therethrough into the fluid passageway. A pyrometer head is coupled to the bottom of the inner tube and is operable to transmit and receive radiation through the inner tube. The system further comprises a spider collar coupled to at least one of a top of the inner tube or outer tube, and is operable to support a work piece for thermal measurement thereof.
摘要翻译：本发明涉及一种高温计系统，包括电梯管。电梯管包括内管和外管，其围绕内管以伸缩布置并从其顶部延伸到底部，该布置在其间限定了流体通道。电梯管还包括与外管相关联的端口，其可操作以将冷却气体通过其传送到流体通道中。高温计头部连接到内管的底部并且可操作以通过内管传送和接收辐射。所述系统还包括联接到所述内管或外管的顶部中的至少一个的蜘蛛环，并且可操作以支撑用于其热测量的工件。

8. 发明公开

EP1733419A1 WAFER SCANNING SYSTEM WITH RECIPROCATING ROTARY MOTION UTILIZING SPRINGS AND COUNTERWEIGHTS 审中-公开
标题翻译：晶圆扫描系统WENDEL轮换使用的羽毛及其配重
公开(公告)号：EP1733419A1
公开(公告)日：2006-12-20
申请号：EP05732814.8
申请日：2005-04-05
申请人： Axcelis Technologies, Inc.
发明人： KELLERMAN, Peter , BENEVENISTE, Victor , SAADATMAND, Kourosh , ASDIGHA, Mehran , BROWN, Douglas
IPC分类号： H01L21/00
CPC分类号： H01L21/67069 , H01J2237/20228 , H01J2237/31701
摘要： The present invention is directed to a scanning apparatus and method for processing a workpiece, wherein the scanning apparatus comprises a wafer arm and moving arm fixedly coupled to one another, wherein the wafer arm and moving arm are operable to rotate about a first axis. An end effector, whereon the workpiece resides, is coupled to the wafer arm. A rotational shaft couples the wafer arm and moving arm to a first actuator, wherein the first actuator provides a rotational force to the shaft. A momentum balance mechanism is coupled to the shaft and is operable to generally reverse the rotational direction of the shaft. The momentum balance mechanism comprises one or more fixed spring elements operable to provide a force to a moving spring element coupled to the moving arm. A controller is further operable to maintain a generally constant translational velocity of the end effector within a predetermined scanning range.

9. 发明公开

EP1532666A2 OPTICAL PATH IMPROVEMENT, FOCUS LENGTH CHANGE COMPENSATION, AND STRAY LIGHT REDUCTION FOR TEMPERATURE MEASUREMENT SYSTEM OF RTP TOOL 审中-公开
标题翻译：提高光学WAY，补偿FOCAL改变并在温度测量系统用于RTP工具透镜还原的
公开(公告)号：EP1532666A2
公开(公告)日：2005-05-25
申请号：EP03793265.4
申请日：2003-08-21
申请人： Axcelis Technologies Inc.
发明人： BROWN, Douglas , MEADOWS, Robert, David , TAO, David , KOCH, Mathias
IPC分类号： H01L21/00 , G01J5/00
CPC分类号： G01J5/08 , G01J5/0003 , G01J5/0007 , G01J5/02 , G01J5/0255 , G01J5/04 , G01J5/045 , G01J5/046 , G01J5/061 , G01J5/0806 , G01J5/084 , G01J5/0846 , G01J5/0875 , G01J5/0893 , H01L21/67248
摘要： The present invention is directed to a pyrometer system and comprises an elevator tube. The elevator tube comprises an inner tube and an outer tube surrounding the inner tube in telescoping arrangement and extending from a top to a bottom thereof, the arrangement defining a fluid passageway therebetween. The elevator tube further comprises a port associated with the outer tube that is operable to transmit a cooling gas therethrough into the fluid passageway. A pyrometer head is coupled to the bottom of the inner tube and is operable to transmit and receive radiation through the inner tube. The system further comprises a spider collar coupled to at least one of a top of the inner tube or outer tube, and is operable to support a work piece for thermal measurement thereof. In another embodiment, a sleeve having a coefficient of thermal expansion is provided at the top portion of the elevator tube, so that temperature dependent changes in the focal length of a lens associated with the sleeve are compensated.

10. 发明公开

EP1673803A1 MEMS BASED CONTACT CONDUCTIVITY ELECTROSTATIC CHUCK 审中-公开
标题翻译： WITH接触导电性ON MEMS BASIS静电吸盘
公开(公告)号：EP1673803A1
公开(公告)日：2006-06-28
申请号：EP04794563.9
申请日：2004-10-08
申请人： Axcelis Technologies, Inc.
发明人： KELLERMAN, Peter , QIN, Shu , ALLEN, Ernie , BROWN, Douglas
IPC分类号： H01L21/68
CPC分类号： H01L21/6831 , Y10S438/964
摘要： The present invention is directed to a method for clamping and processing a semiconductor substrate using a semiconductor processing apparatus. According to one aspect of the present invention, a multi-polar electrostatic chuck and associated method is disclosed which provides heating or cooling of a substrate by thermal contact conduction between the electrostatic chuck and the substrate. The multi-polar electrostatic chuck comprises a semiconductor platform having a plurality of protrusions that define gaps therebetween, a surface roughness of the plurality of protrusions is less than 100 Angstroms. The electrostatic chuck further comprises a voltage control system operable to control a voltage applied to the electrostatic chuck to thus control a contact heat transfer coefficient of the electrostatic chuck, wherein the heat transfer coefficient of the electrostatic chuck is primarily a function of a contact pressure between the substrate and the plurality of protrusions.

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