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1. 发明申请

WO2006133907A8 PASSIVE RETICLE TOOL, LITHOGRAPHIC APPARATUS AND METHOD OF PATTERNING A DEVICE 审中-公开
标题翻译：被动版本工具，平面设备和设计方法
公开(公告)号：WO2006133907A8
公开(公告)日：2008-04-17
申请号：PCT/EP2006005684
申请日：2006-06-13
申请人： ASML NETHERLANDS BV , VAN DE KERKHOF MARCUS ADRIANUS , DE BOEIJ WILHELMUS PETRUS , VAN GREEVENBROEK HENDRIKUS ROB , KLAASSEN MICHEL FRANSOIS HUBER , KOK HAICO VICTOR , WEHRENS MARTIJN GERARD DOMINIQ , UITTERDIJK TAMMO , ROOIJAKKERS WILHELMUS JACOBUS , KUIPER JOHANNES MARIA , VAN DOOREN LEON , SONNEVELD JACOB , GILING ERWIN JOHANNES MARTINUS
发明人： VAN DE KERKHOF MARCUS ADRIANUS , DE BOEIJ WILHELMUS PETRUS , VAN GREEVENBROEK HENDRIKUS ROB , KLAASSEN MICHEL FRANSOIS HUBER , KOK HAICO VICTOR , WEHRENS MARTIJN GERARD DOMINIQ , UITTERDIJK TAMMO , ROOIJAKKERS WILHELMUS JACOBUS , KUIPER JOHANNES MARIA , VAN DOOREN LEON , SONNEVELD JACOB , GILING ERWIN JOHANNES MARTINUS
IPC分类号： G03F7/20
CPC分类号： G01J4/04 , G03F7/70091 , G03F7/70566 , G03F7/70591 , G03F7/70716
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的偏振传感器，其中所述光罩极化传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。

2. 发明申请

WO2006133907A3 PASSIVE RETICLE TOOL, LITHOGRAPHIC APPARATUS AND METHOD OF PATTERNING A DEVICE 审中-公开
标题翻译：被动版本工具，平面设备和设计方法
公开(公告)号：WO2006133907A3
公开(公告)日：2007-03-08
申请号：PCT/EP2006005684
申请日：2006-06-13
申请人： ASML NETHERLANDS BV , VAN DE KERKHOF MARCUS ADRIANUS , DE BOEIJ WILHELMUS PETRUS , VAN GREEVENBROEK HENDRIKUS ROB , KLAASSEN MICHEL FRANSOIS HUBER , KOK HAICO VICTOR , WEHRENS MARTIJN GERARD DOMINIQ , UITTERDIJK TAMMO , ROOIJAKKERS WILHELMUS JACOBUS , KUIPER JOHANNES MARIA , VAN DOOREN LEON , SONNEVELD JACOB , GILING ERWIN JOHANNES MARTINUS
发明人： VAN DE KERKHOF MARCUS ADRIANUS , DE BOEIJ WILHELMUS PETRUS , VAN GREEVENBROEK HENDRIKUS ROB , KLAASSEN MICHEL FRANSOIS HUBER , KOK HAICO VICTOR , WEHRENS MARTIJN GERARD DOMINIQ , UITTERDIJK TAMMO , ROOIJAKKERS WILHELMUS JACOBUS , KUIPER JOHANNES MARIA , VAN DOOREN LEON , SONNEVELD JACOB , GILING ERWIN JOHANNES MARTINUS
IPC分类号： G03F7/20
CPC分类号： G01J4/04 , G03F7/70091 , G03F7/70566 , G03F7/70591 , G03F7/70716
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的偏振传感器，其中所述光罩极化传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。

3. 发明专利

JP2009147332A Device for transmission image detection for use in lithographic projection apparatus and method for determining third order distortion of patterning device and/or projection system of such a lithographic apparatus 审中-公开
标题翻译：用于在地平线投影装置中使用的传输图像检测装置和用于确定这样的图形装置的图案装置和/或投影系统的第三命令失真的方法
公开(公告)号：JP2009147332A
公开(公告)日：2009-07-02
申请号：JP2008311869
申请日：2008-12-08
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KOK HAICO VICTOR
IPC分类号： H01L21/027 , G01N21/956 , G03F7/20
CPC分类号： G03F7/70875 , G03F7/70666 , G03F7/7085 , G03F9/7049 , G03F9/7088
摘要： PROBLEM TO BE SOLVED: To provide a device for transmission image detection for use in a lithographic projection apparatus. SOLUTION: The device includes an array of gratings 41 and an array 46 of radiation sensitive sensors each of which is arranged to receive radiation coming through one of the gratings. The array 46 of radiation sensitive sensors may be a one-dimensional diode array. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种在光刻投影设备中使用的用于透射图像检测的装置。解决方案：该装置包括光栅阵列41和辐射敏感传感器阵列46，每个辐射敏感传感器布置成接收通过其中一个光栅的辐射。辐射敏感传感器的阵列46可以是一维二极管阵列。版权所有（C）2009，JPO＆INPIT

4. 发明专利

JP2008028386A Lithographic apparatus, radiation sensor and radiation sensor manufacturing method 有权
标题翻译：光电设备，辐射传感器和辐射传感器制造方法
公开(公告)号：JP2008028386A
公开(公告)日：2008-02-07
申请号：JP2007180592
申请日：2007-07-10
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KOK HAICO VICTOR , VAN DER SIJS ARIE JOHAN
IPC分类号： H01L21/027
CPC分类号： G03F7/7085 , G01J1/04 , G01J1/0425 , G01J1/4228 , G01J1/58
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus which is equipped with a sensor at the board level appropriate for use in a system with high sensitivity and high NA. SOLUTION: A radiation sensor comprises a radiation receiver, placed on a final element focal plane of a projection system, a transparent plate for supporting the radiation receiver on a side facing the projection system, a quantum transformation layer formed for absorbing first wavelength incoming light incident on the transparent plate and re-radiating second wavelength light, a fiber optics block with multiple optical fibers, and a radiation detector. In the radiation sensor, a plurality of optical fibers guide the light re-radiated at the quantum transformation layer to the radiation detector. This sensor can be used as a board level sensor in a lithographic apparatus. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种光刻设备，其在板级上配备有适用于具有高灵敏度和高NA的系统的传感器。解决方案：辐射传感器包括放置在投影系统的最终元件焦平面上的辐射接收器，用于在面向投影系统的一侧支撑辐射接收器的透明板，用于吸收第一波长的量子变换层入射到透明板上并重新辐射第二波长光的入射光，具有多根光纤的光纤块和辐射探测器。在辐射传感器中，多个光纤将在量子变换层再次辐射的光引导到辐射检测器。该传感器可用作光刻设备中的板级传感器。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2006245571A Sensor used in lithography system 有权
标题翻译：传感器用于LITHOGRAPHY系统
公开(公告)号：JP2006245571A
公开(公告)日：2006-09-14
申请号：JP2006049444
申请日：2006-02-27
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KOK HAICO VICTOR , VAN DE KERKHOF MARCUS A , KRUIZINGA BORGERT , SENGERS TIMOTHEUS F , MOEST BEARRACH , HAAST MARC ANTONIUS MARIA , WEISSBRODT PETER WERNER , SCHRENK MANFRED HELMUT GUSTAV , HARZENDORF TORSTEN
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/7085
摘要： PROBLEM TO BE SOLVED: To provide a sensor at a substrate level suitable for use in a system having high sensitivity and NA. SOLUTION: A sensor used at a substrate level in a lithography system having high NA has a transparent plate covering sensing elements, and arrangement for improving coupling between radiation and the sensing elements. The arrangement includes a Fresnel lens, a holographic optical element, a reverse Winston cone, a spherical lens, and surface roughening. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种适于在具有高灵敏度和NA的系统中使用的基板级的传感器。解决方案：在具有高NA的光刻系统中在基底层处使用的传感器具有覆盖感测元件的透明板，以及用于改善辐射与感测元件之间的耦合的装置。该装置包括菲涅尔透镜，全息光学元件，反向温斯顿锥体，球面透镜和表面粗糙化。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2009158959A Device manufacturing method and lithographic apparatus 有权
标题翻译：设备制造方法和平面设备
公开(公告)号：JP2009158959A
公开(公告)日：2009-07-16
申请号：JP2008323014
申请日：2008-12-19
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KOK HAICO VICTOR , BASELMANS JOHANNES JACOBUS MAT , VAN DE KERKHOF MARCUS A
IPC分类号： H01L21/027
CPC分类号： G03F7/70116 , G03F7/70075 , G03F7/706
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus that overcomes or relaxes one or a plurality of faults of conventional techniques, and to provide a device manufacturing method. SOLUTION: The device manufacturing method includes a measurement phase and an exposure phase. The measurement phase includes conditioning a radiation beam with a first beam condition, forming the patterned radiation beam by imparting the radiation beam with the first beam condition with a first pattern in its cross-section, and projecting the patterned beam onto a sensor capable of providing a sensor output signal. The exposure phase includes fast switching for the conditioning of the radiation beam to a second beam condition, with the second beam condition which is different from the first beam condition, forming the patterned radiation beam by imparting the radiation beam with the second beam condition with a second pattern in its cross-section, with the second pattern being provided by a patterning device, and projecting the patterned beam onto a target portion of the substrate. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供克服或松弛常规技术的一个或多个故障的光刻设备，并提供一种器件制造方法。解决方案：器件制造方法包括测量阶段和曝光阶段。测量阶段包括对具有第一光束条件的辐射束进行调节，通过在其横截面中赋予具有第一图案的第一光束条件的辐射束来形成图案化的辐射束，并且将图案化的光束投影到能够提供传感器输出信号。曝光阶段包括用于将辐射束调节到第二光束状态的快速切换，其中第二光束条件不同于第一光束条件，通过将第二光束条件赋予辐射束来形成图案化的辐射束，第二图案在其横截面中，第二图案由图案形成装置提供，并且将图案化的光束投影到基板的目标部分上。版权所有（C）2009，JPO＆INPIT

7. 发明专利

JP2006237617A Lithography equipment and method of determining polarization property 有权
标题翻译：地质设备和确定极化性质的方法
公开(公告)号：JP2006237617A
公开(公告)日：2006-09-07
申请号：JP2006048306
申请日：2006-02-24
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VEN DE KERKHOF MARCUS ADRIANUS , BOEIJ WILHELMUS PETRUS DE , GREEVENBROEK HENDRIKUS ROBERTU , KLAASSEN MICHEL FRANSOIS HUBER , KOK HAICO VICTOR , WEHRENS MARTIJN GERARD DOMINIQ , UITTERDIJK TAMMO , ROOIJAKKERS WILHELMUS JACOBUS
IPC分类号： H01L21/027
CPC分类号： G03F7/70133 , G03F7/70566 , G03F7/70591 , G03F7/7085
摘要： PROBLEM TO BE SOLVED: To provide the method of looking for the polarization property of lithography equipment.
SOLUTION: Lithography equipment comprises a lighting system IL, a support, a substrate table, a projection system PS, and a detector 14. The equipment further comprises an adjustable polarization transformation element 10 such as a quadrant wavelength plate and a polarization analyzer 12 such as a straight line polarizer. The polarization transformation element and the polarization analyzer are aligned and arranged on a position in which a pattern forming apparatus is held by the support in a beam path. Information on a radial polarization state of the position of the pattern forming apparatus can be acquired by carrying out the measurement of strength toward the mutually different rotation direction of the polarization transformation element 10 using the detector 14. Since the polarization analyzer 12 is located before the projection system PS, the fact that the detector 14 is located after the projection system PS such as substrate height does not affect measurement.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供寻找光刻设备的偏振特性的方法。解决方案：光刻设备包括照明系统IL，支撑件，衬底台，投影系统PS和检测器14.该设备还包括可调偏振变换元件10，例如象限波长板和偏振分析器 12，如直线偏振器。偏振变换元件和偏振分析器对准并布置在图案形成装置由支撑件在光束路径中保持的位置。关于图案形成装置的位置的径向极化状态的信息可以通过使用检测器14对偏振变换元件10的相互不同的旋转方向进行强度测量而获得。由于偏振分析器12位于投影系统PS，检测器14位于诸如基板高度的投影系统PS之后的事实不影响测量。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2003068637A Lithography system, method of manufacturing device, and device manufactured thereby 审中-公开
标题翻译：光刻系统，制造方法及其制造方法
公开(公告)号：JP2003068637A
公开(公告)日：2003-03-07
申请号：JP2002170092
申请日：2002-06-11
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KROON MARK , VAN DER WERF JAN EVERT , KOK HAICO VICTOR
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F9/7088 , G03F7/706 , G03F7/707 , G03F7/70708 , G03F7/70716 , G03F7/7085
摘要： PROBLEM TO BE SOLVED: To provide an image-sensing device having several sensors that can be positioned very close to each other, so that the dimension of the arranging area of the sensors may become small and the detecting structures of the sensors. SOLUTION: A lithographic projection apparatus includes a radiation system, a pattern-forming means supporting structure, a substrate table, a projecting system which projects a beam upon substrates, and the image sensing device. The image-sensing device includes a slab, provided at least with one radiation sensitive sensor on its first side face and a film made of a material, that does not transmit the radiation of the projected beam. The image-sensing sensor is integrated with the slab and responds to the radiation of the projected beam, and the film is provided on the first side face of the slab to cover the sensor and has a division patterned, to selectively transmit the radiation of the projected beam to the sensor on the sensor. The slab is mounted on the slab bearing surface of an intermediate plate by its second surface on a side opposite to its first surface.
摘要翻译：要解决的问题：为了提供具有可以彼此非常接近的几个传感器的图像感测装置，使得传感器的布置区域的尺寸变小并且传感器的检测结构变小。解决方案：光刻投影装置包括辐射系统，图案形成装置支撑结构，衬底台，将光束投射到基板上的投影系统和图像感测装置。图像感测装置包括在其第一侧面上至少设置有一个辐射敏感传感器的板坯和不透射投射光束的辐射的材料制成的薄膜。图像感测传感器与平板一体化并响应于投影光束的辐射，并且膜被设置在板的第一侧面上以覆盖传感器并且具有分割图案化，以选择性地传输辐射投射到传感器上的传感器。板坯通过其第二表面在与其第一表面相对的一侧上安装在中间板的板坯承载表面上。

9. 发明专利

JP2011044710A Lithographic device, and method of manufacturing device 有权
标题翻译：光刻设备及其制造方法
公开(公告)号：JP2011044710A
公开(公告)日：2011-03-03
申请号：JP2010181988
申请日：2010-08-17
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： CORBEIJ WILHELMUS MARIA , VAN DE KERKHOF MARCUS A , KOK HAICO VICTOR
IPC分类号： H01L21/027 , G03F1/08
CPC分类号： G03B27/68 , G03F7/70783 , G03F7/7085
摘要： PROBLEM TO BE SOLVED: To reduce influence of an overlay error caused by heating of a reticle or lens.
SOLUTION: A method of determining higher distortion of a patterning device of this lithographic device and an associated device is disclosed. The higher distortion is measured using a transmission imaging device. In a main embodiment, an improved reticle is used which can include an additional alignment diffractive grating in an outer edge part, the inside of a marking-off line of an image field or the image field itself.
COPYRIGHT: (C)2011,JPO&INPIT

10. 发明专利

JP2009278133A Lithography apparatus and method of determining polarization property 审中-公开
标题翻译：地平线设备及确定极化性质的方法
公开(公告)号：JP2009278133A
公开(公告)日：2009-11-26
申请号：JP2009190966
申请日：2009-08-20
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VEN DE KERKHOF MARCUS ADRIANUS , BOEIJ WILHELMUS PETRUS DE , GREEVENBROEK HENDRIKUS ROBERTU , KLAASSEN MICHEL FRANSOIS HUBER , KOK HAICO VICTOR , WEHRENS MARTIJN GERARD DOMINIQ , UITTERDIJK TAMMO , ROOIJAKKERS WILHELMUS JACOBUS
IPC分类号： H01L21/027 , G02B5/30 , G03F7/20
CPC分类号： G03F7/70133 , G03F7/70566 , G03F7/70591 , G03F7/7085
摘要： PROBLEM TO BE SOLVED: To provide a method for obtaining polarization property of a lithography apparatus. SOLUTION: The lithography apparatus includes an illumination system IL, a support, a substrate table, a projection system PS, and a detector 14. The apparatus further includes: a polarization changing element 10, such as a quarter-wave plate, that is adjustable; and a polarization analyzer 12, such as a linear polarizer, wherein the polarization changing element and the polarization analyzer are arranged in the radiation beam path at a position at which a patterning device is held by the support. By taking intensity measurements, using the detector 14, for different rotational orientations of the polarization changing element 10, information on the state of polarization of the radiation at the position of the patterning device can be obtained. Because the polarization analyzer 12 is located before the projection system PS, the measurements are not affected by the fact that the detector 14 is located after the projection system PS, such as at the level of the substrate. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种获得光刻设备的偏振特性的方法。解决方案：光刻设备包括照明系统IL，支撑件，衬底台，投影系统PS和检测器14.该装置还包括：偏振改变元件10，例如四分之一波片，这是可调的以及诸如线性偏振器的偏振分析器12，其中偏振改变元件和偏振分析器被布置在辐射束路径中由支撑件保持图案形成装置的位置。通过采用强度测量，使用检测器14，对于偏振变化元件10的不同旋转取向，可以获得关于在图案形成装置的位置处的辐射的偏振状态的信息。由于偏振分析器12位于投影系统PS之前，测量不受检测器14位于投影系统PS之后（例如在基底的水平面）的事实的影响。版权所有（C）2010，JPO＆INPIT

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