专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2011061199A Shutter member, lithographic apparatus and device manufacturing method 有权
标题翻译： SHUTTER会员，LITHOGRAPHIC设备和设备制造方法
公开(公告)号：JP2011061199A
公开(公告)日：2011-03-24
申请号：JP2010199597
申请日：2010-09-07
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KANEKO TAKESHI , EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA , DZIOMKINA NINA VLADIMIROVNA , KRUIZINGA MATTHIAS
IPC分类号： H01L21/027
CPC分类号： G03F7/70341 , G03F7/70733
摘要： PROBLEM TO BE SOLVED: To reduce the risk of an interference with a positioning system of an immersion liquid. SOLUTION: An immersion lithographic apparatus contains a substrate table, a fluid handling structure and a swap table. The substrate table is configured to support a substrate. The fluid handling structure is configured to supply and confine the immersion liquid to a space demarcated between a projection system and the substrate table, between the projection system and the substrate, or the both. The swap table includes, for example, a shutter surface configured to be under the fluid handling structure during swapping of the substrate on the substrate table. When used, a transfer surface between the surface of the substrate table and the surface of the swap table is moved under the fluid handling structure to contribute to inhibit leakage of the immersion liquid. A shutter member and the method are also disclosed. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：减少与浸没液体的定位系统的干扰的风险。解决方案：浸没式光刻设备包含基板台，流体处理结构和互换台。衬底台被配置为支撑衬底。流体处理结构构造成将浸没液体供应并限制在投影系统和基板台之间，投影系统和基板之间或两者之间划分的空间。交换台包括例如在基板在基板台上交换期间构造成处于流体处理结构下方的快门表面。当使用时，衬底台的表面和互换台的表面之间的转印面在流体处理结构下移动以有助于抑制浸没液体的泄漏。还公开了一种快门构件和方法。版权所有（C）2011，JPO＆INPIT

2. 发明专利

JP2010123960A Lithographic apparatus provided with swap bridge 有权
标题翻译：提供交流桥的平面设备
公开(公告)号：JP2010123960A
公开(公告)日：2010-06-03
申请号：JP2009261452
申请日：2009-11-17
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KRUIZINGA MATTHIAS , AUER FRANK , FRANSICUS MATHIJS JACOBS , HENSEN RONNIE HERMAN ANNA
IPC分类号： H01L21/027 , G03F7/20 , H01L21/68
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70733
摘要： PROBLEM TO BE SOLVED: To prevent position precision from being reduced when a table etc., is moved. SOLUTION: A lithographic apparatus includes two stages that are each configured to hold a substrate, wherein each stage is provided with a short stroke module to move a table with a substrate and a long stroke module to move the short stroke module of that stage. The lithographic apparatus includes a swap bridge to couple the stages, and wherein, in use, in a first configuration, the stages are moveable with respect to each other, and wherein, in use, in a second configuration, the stages are coupled via the swap bridge to make a joint movement. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：当移动桌子等时，防止位置精度降低。解决方案：光刻设备包括两个各自被配置为保持基板的阶段，其中每个阶段设置有短行程模块以便移动具有基板的台面和长行程模块以移动该行程模块阶段。光刻设备包括用于耦合级的交换桥，并且其中在使用中，在第一配置中，所述级可相对于彼此移动，并且其中，在使用中，在第二配置中，所述级经由互换桥联合运动。版权所有（C）2010，JPO＆INPIT

3. 发明申请

WO2016124536A3 MASK ASSEMBLY AND ASSOCIATED METHODS 审中-公开
标题翻译：面罩组件和相关方法
公开(公告)号：WO2016124536A3
公开(公告)日：2016-10-06
申请号：PCT/EP2016052055
申请日：2016-02-01
申请人： ASML NETHERLANDS BV
发明人： BROUNS DERK SERVATIUS GERTRUDA , DE GRAAF DENNIS , DE KRUIF ROBERTUS CORNELIS MARTINUS , JANSSEN PAUL , KRUIZINGA MATTHIAS , NOTENBOOM ARNOUD WILLEM , SMITH DANIEL ANDREW , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN , WILEY JAMES NORMAN
IPC分类号： G03F1/00 , G03F1/62 , G03F1/66 , G03F1/84
CPC分类号： G03F1/62 , G03F1/66 , G03F1/84
摘要： A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
摘要翻译：一种方法，包括以下步骤：接收包括掩模和由薄膜框架保持的可移除EUV透明薄膜的掩模组件，使用检查工具从掩模移除薄膜框架和EUV透明薄膜，以检查掩模上的掩模图案，随后将由EUV透明薄膜保持在薄膜框架上的面罩附着在面罩上。所述方法还可以包括以下步骤：在从所述掩模移除所述薄膜框架和所述EUV透明薄膜之后，将替代的薄膜框架附接到所述掩模，所述薄膜框架保持由对所述检查工具的检查梁基本上透明的材料形成的替代薄膜 ; 并且在使用检查工具检查掩模上的掩模图案之后，从掩模去除由替代薄膜框架保持的替代薄膜，以便将由薄膜框架保持的EUV透明薄膜附着到掩模。

4. 发明申请

WO2016079052A3 APPARATUS 审中-公开
标题翻译：仪器
公开(公告)号：WO2016079052A3
公开(公告)日：2016-09-22
申请号：PCT/EP2015076688
申请日：2015-11-16
申请人： ASML NETHERLANDS BV
发明人： VAN DER MEULEN FRITS , JANSEN MAARTEN MATHIJS MARINUS , AZEREDO LIMA JORGE MANUEL , BROUNS DERK SERVATIUS GERTRUDA , BRUIJN MARC , DEKKERS JEROEN , JANSSEN PAUL , KRAMER RONALD HARM GUNTHER , KRUIZINGA MATTHIAS , LANSBERGEN ROBERT GABRIËL MARIA , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LOOPSTRA ERIK ROELOF , VAN DEN BOSCH GERRIT , VAN LOO JÉRÔME FRANÇOIS SYLVAIN VIRGILE , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN , DE KLERK ANGELO CESAR PETER , DINGS JACOBUS MARIA , JANSSEN MAURICE LEONARDUS JOHANNES , KERSTENS ROLAND JACOBUS JOHANNES , KESTERS MARTINUS JOZEF MARIA , LOOS MICHEL , MIDDEL GEERT , REIJNDERS SILVESTER MATHEUS , THEUERZEIT FRANK JOHANNES CHRISTIAAN , VAN LIEVENOOGEN ANNE JOHANNES WILHELMUS
IPC分类号： G03F1/62 , G03F1/00 , G03F7/20
CPC分类号： G03F7/70983 , G03F1/64 , G03F7/70825
摘要： Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
摘要翻译：用于适用于光刻工艺的掩模组件的模具，所述掩模组件包括图案形成装置; 以及防护薄膜框架，其构造成支撑防护薄膜组件并且用安装件安装在所述图案形成装置上; 其中所述安装件在所述图案形成装置和所述防护膜框架之间提供可释放地接合的附接。

5. 发明申请

WO2016079051A3 MASK ASSEMBLY 审中-公开
标题翻译：面罩大会
公开(公告)号：WO2016079051A3
公开(公告)日：2016-09-22
申请号：PCT/EP2015076687
申请日：2015-11-16
申请人： ASML NETHERLANDS BV , ASML HOLDING NV
发明人： KRUIZINGA MATTHIAS , JANSEN MAARTEN MATHIJS MARINUS , AZEREDO LIMA JORGE MANUEL , BOGAART ERIK WILLEM , BROUNS DERK SERVATIUS GERTRUDA , BRUIJN MARC , BRULS RICHARD JOSEPH , DEKKERS JEROEN , JANSSEN PAUL , KAMALI MOHAMMAD REZA , KRAMER RONALD HARM GUNTHER , LANSBERGEN ROBERT GABRIËL MARIA , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LIPSON MATTHEW , LOOPSTRA ERIK ROELOF , LYONS JOSEPH H , ROUX STEPHEN , VAN DEN BOSCH GERRIT , VAN DEN HEIJKANT SANDER , VAN DER GRAAF SANDRA , VAN DER MEULEN FRITS , VAN LOO JÉRÔME FRANÇOIS SYLVAIN VIRGILE , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN
IPC分类号： G03F1/62 , G03F1/00 , G03F7/20
CPC分类号： G03F7/70983 , G03F1/64 , G03F7/70825
摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
摘要翻译：适用于光刻过程的掩模组件，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述支架被构造成相对于所述图案形成装置悬挂所述薄膜框架，使得所述薄膜框架和所述图案形成装置之间存在间隙; 并且其中所述安装件在所述图案形成装置和所述薄膜框架之间提供可释放地接合的附接。

6. 发明专利

CA2968159A1 APPARATUS 未知
公开(公告)号：CA2968159A1
公开(公告)日：2016-05-26
申请号：CA2968159
申请日：2015-11-16
申请人： ASML NETHERLANDS BV
发明人： VAN DER MEULEN FRITS , JANSEN MAARTEN MATHIJS MARINUS , AZEREDO LIMA JORGE MANUEL , BROUNS DERK SERVATIUS GERTRUDA , BRUIJN MARC , DEKKERS JEROEN , JANSSEN PAUL , KRAMER RONALD HARM GUNTHER , KRUIZINGA MATTHIAS , LANSBERGEN ROBERT GABRIEL MARIA , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LOOPSTRA ERIK ROELOF , VAN DEN BOSCH GERRIT , VAN LOO JEROME FRANCOIS SYLVAIN VIRGILE , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN , DE KLERK ANGELO CESAR PETER , DINGS JACOBUS MARIA , JANSSEN MAURICE LEONARDUS JOHANNES , KERSTENS ROLAND JACOBUS JOHANNES , KESTERS MARTINUS JOZEF MARIA , LOOS MICHEL , MIDDEL GEERT , REIJNDERS SILVESTER MATHEUS , THEUERZEIT FRANK JOHANNES CHRISTIAAN , VAN LIEVENOOGEN ANNE JOHANNES WILHELMUS
IPC分类号： G03F1/62 , G03F1/00 , G03F7/20
摘要： Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

7. 发明专利

CA3021916A1 A MEMBRANE FOR EUV LITHOGRAPHY 未知
公开(公告)号：CA3021916A1
公开(公告)日：2017-11-02
申请号：CA3021916
申请日：2017-04-12
申请人： ASML NETHERLANDS BV
发明人： NASALEVICH MAXIM ALEKSANDROVICH , ABEGG ERIK ACHILLES , BANERJEE NIRUPAM , BLAUW MICHIEL ALEXANDER , BROUNS DERK SERVATIUS GERTRUDA , JANSSEN PAUL , KRUIZINGA MATTHIAS , LENDERINK EGBERT , MAXIM NICOLAE , NIKIPELOV ANDREY , NOTENBOOM ARNOUD WILLEM , PILIEGO CLAUDIA , PETER MARIA , RISPENS GIJSBERT , SCHUH NADJA , VAN DE KERKHOF MARCUS ADRIANUS , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERBURG ANTONIUS WILLEM , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID , VOORTHUIJZEN WILLEM-PIETER , ZDRAVKOV ALEKSANDAR NIKOLOV
IPC分类号： G03F1/24 , G03F1/62 , G03F7/20
摘要： Membranes for EUV lithography are disclosed. In one arrangement, a membrane comprises a stack having layers in the following order: a first capping layer comprising an oxide of a first metal; a base layer comprising a compound comprising a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer comprising an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

8. 发明专利

CA2968151A1 MASK ASSEMBLY 未知
公开(公告)号：CA2968151A1
公开(公告)日：2016-05-26
申请号：CA2968151
申请日：2015-11-16
申请人： ASML HOLDING NV , ASML NETHERLANDS BV
发明人： KRUIZINGA MATTHIAS , JANSEN MAARTEN MATHIJS MARINUS , AZEREDO LIMA JORGE MANUEL , BOGAART ERIK WILLEM , BROUNS DERK SERVATIUS GERTRUDA , BRUIJN MARC , BRULS RICHARD JOSEPH , DEKKERS JEROEN , JANSSEN PAUL , KAMALI MOHAMMAD REZA , KRAMER RONALD HARM GUNTHER , LANSBERGEN ROBERT GABRIEL MARIA , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LIPSON MATTHEW , LOOPSTRA ERIK ROELOF , LYONS JOSEPH H , ROUX STEPHEN , VAN DEN BOSCH GERRIT , VAN DEN HEIJKANT SANDER , VAN DER GRAAF SANDRA , VAN DER MEULEN FRITS , VAN LOO JEROME FRANCOIS SYLVAIN VIRGILE , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN
IPC分类号： G03F1/62 , G03F1/00 , G03F7/20
摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

9. 发明专利

CA2975806A1 MASK ASSEMBLY AND ASSOCIATED METHODS 未知
公开(公告)号：CA2975806A1
公开(公告)日：2016-08-11
申请号：CA2975806
申请日：2016-02-01
申请人： ASML NETHERLANDS BV
发明人： BROUNS DERK SERVATIUS GERTRUDA , DE GRAAF DENNIS , DE KRUIF ROBERTUS CORNELIS MARTINUS , JANSSEN PAUL , KRUIZINGA MATTHIAS , NOTENBOOM ARNOUD WILLEM , SMITH DANIEL ANDREW , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN , WILEY JAMES NORMAN
IPC分类号： G03F1/00 , G03F1/62 , G03F1/66 , G03F1/84
摘要： A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.

10. 发明专利

NL2005322A A SHUTTER MEMBER, A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. 未知
公开(公告)号：NL2005322A
公开(公告)日：2011-03-14
申请号：NL2005322
申请日：2010-09-07
申请人： ASML NETHERLANDS BV
发明人： KANEKO TAKESHI , EUMMELEN ERIK , DZIOMKINA NINA , KRUIZINGA MATTHIAS
IPC分类号： G03F7/20

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式