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1. 发明专利

JP2009158971A Device manufacturing method, lithography device, and device manufactured thereby 有权
标题翻译：器件制造方法，光刻设备及其制造的器件
公开(公告)号：JP2009158971A
公开(公告)日：2009-07-16
申请号：JP2009090699
申请日：2009-04-03
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： OTTENS JOOST JEROEN , BAKKER LEVINUS PIETER , BOX WILHELMUS JOSEPHUS , VAN ELP JAN , SCHUURMANS FRANK JEROEN PIETER , VAN DER WERF JAN EVERT
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F7/70425 , G03F7/70433 , H01J37/3026 , H01J2237/31764
摘要： PROBLEM TO BE SOLVED: To provide a device manufacturing method, a lithography device, and a device manufactured by the method. SOLUTION: The device manufacturing method is disclosed wherein a substrate W is provided, a projection beam of radiation PB is provided using an illumination system IL, a patterning means MA is used to impart the projection beam PB with a pattern in its cross section, the patterned beam of radiation PB is projected subsequently to a number of outer target portions CO of the substrate W before the patterned beam is projected to inner target portion CI of the substrate W, wherein each subsequent outer target portion COi+1 is spaced-apart from the outer target portion COi preceding that subsequent outer target portion COi+1. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种器件制造方法，光刻设备以及通过该方法制造的器件。解决方案：公开了一种器件制造方法，其中设置有衬底W，使用照明系统IL提供辐射PB的投射束，使用图案形成装置MA来使投影光束PB在其十字形中具有图案在将图案化的光束投影到基板W的内部目标部分CI之前，将图案化的光束束PB随后投射到基板W的多个外部目标部分CO，其中每个随后的外部目标部分COi + 1间隔开从该后续外部目标部分COi + 1之前的外部目标部分COi释放。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2008124495A Filter window, lithographic projection apparatus, methods of manufacturing filter window and device, and device manufactured thereby 有权
标题翻译：过滤窗，平面投影仪，制造过滤器窗口和设备的方法，以及制造的设备
公开(公告)号：JP2008124495A
公开(公告)日：2008-05-29
申请号：JP2008004936
申请日：2008-01-11
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KURT RALPH , BAKKER LEVINUS PIETER
IPC分类号： G03F1/14 , H01L21/027 , G03F1/16 , G03F7/20 , G21K1/10
CPC分类号： G03F1/62 , B82Y10/00 , B82Y40/00 , G03F1/24 , G21K1/10
摘要： PROBLEM TO BE SOLVED: To provide a filter window that is employed to separate a projection optical box from a wafer compartment of a device or to shield a reticle from particle contamination.
SOLUTION: This invention relates to the filter window for EUV lithography including a pellicle with a first layer comprising at least one of AlN, Ru, Ir, Au, SiN, Rh and C, and a wire structure for supporting the pellicle. The pellicle containing these materials has not only the slowest oxidation speed but also extremely low EUV absorption. The thickness of the pellicle is preferably between 30 nm and 100 nm. It is possible to easily check that the absorption of EUV radiation of the thin pellicle is equal to known filter windows, i. e. approximately 50% at a wavelength of 13.5 nm, but the oxidation of the pellicle according to the invention is much smaller.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于将投影光学盒与装置的晶片隔室分离或用于屏蔽掩模版免受颗粒污染的过滤器窗口。解决方案：本发明涉及用于EUV光刻的滤光镜，包括具有包含AlN，Ru，Ir，Au，SiN，Rh和C中的至少一种的第一层的防护薄膜和用于支撑防护薄膜的线结构。含有这些材料的防护薄膜不仅具有最低的氧化速度，而且还具有非常低的EUV吸收。防护薄膜的厚度优选为30nm〜100nm。可以容易地检查薄薄膜的EUV辐射的吸收是否等于已知的过滤器窗口，即在波长13.5nm处为约50％，但根据本发明的防护薄膜组件的氧化要小得多。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2006235595A Optical element, lithographic system including such an optical element, device manufacturing method and device manufactured by the method 有权
标题翻译：光学元件，包括这样的光学元件的光刻系统，器件制造方法和由该方法制造的器件
公开(公告)号：JP2006235595A
公开(公告)日：2006-09-07
申请号：JP2005378882
申请日：2005-12-28
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VAN HERPEN MAARTEN MARINUS JOH , BAKKER LEVINUS PIETER , KLUNDER DERK JAN WILFRED
IPC分类号： G02B5/08 , G02B1/11 , G02B5/26 , G03F7/20 , G21K1/06 , H01L21/027
CPC分类号： G03F7/70958 , G02B1/113 , G02B5/0891 , G03F7/70575 , G21K1/06 , G21K2201/067
摘要： PROBLEM TO BE SOLVED: To provide a spectrum-purifying filter, designed to reflect EUV radiation but not to reflect undesired radiation. SOLUTION: The optical element including an antireflection (AR) film is built to reflect only the extra-ultraviolet (EUV) radiation. By covering the surface of the substrate with a film of approximately. 1/4λ thickness or 1/4λ thickness or thinner, the light reflected on the top surface makes a 180° phase shift from the one reflected at the lower surface, producing attenuation interference, and the reflection of the radiation is eliminated in a specified λ range. Thus, losses of light can be reduced over a larger spectrum range, by using multi-layers films. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种频谱净化滤波器，设计用于反射EUV辐射，但不反射不需要的辐射。解决方案：包括抗反射（AR）膜的光学元件被构建为仅反射超紫外（EUV）辐射。通过用大约的膜覆盖基板的表面。 1 /4λ厚度或1 /4λ厚度或更薄，在顶表面上反射的光与从下表面反射的光线相移180°，产生衰减干扰，并且辐射的反射在指定的λ 范围。因此，通过使用多层膜，可以在更大的光谱范围内减少光的损失。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2006191091A Lithography device, illumination system, filter system and method for cooling support of such filter system 有权
标题翻译：光刻设备，照明系统，过滤系统和冷却支持这种过滤系统的方法
公开(公告)号：JP2006191091A
公开(公告)日：2006-07-20
申请号：JP2005377813
申请日：2005-12-28
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： WASSINK ARNOUD C , BAKKER LEVINUS PIETER , MOORS JOHANNES HUBERTUS JOSEPH , SCHUURMANS FRANK JEROEN PIETER
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70916
摘要： PROBLEM TO BE SOLVED: To provide a filter system for actively catching debris particles by rotating a foil trap, and for cooling the foil trap in a lithography device. SOLUTION: This lithography device is provided with an illumination system configured so that radiation beams can be conditioned, a projection system configured so that the radiation beams can be projected to a substrate and a filter system for filter-removing debris particles from the radiation beam. A filter 820 system includes a plurality of foils F1 and F2 for trapping debris particles, supports S1 and S2 for storing a plurality of foils and cooling systems CS1 and CS2 having surfaces configured to be cooled. The cooling systems and supports are positioned so that a gap G can be formed between the surface of the cooling system and the support. The cooling system is configured to inject gas into the gap. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于通过旋转箔捕获器并且用于在光刻装置中冷却箔捕获器来主动捕获碎屑颗粒的过滤系统。解决方案：该光刻设备设置有照明系统，其被配置为可以对辐射束进行调节;投影系统被配置成使得辐射束可以投射到基底和用于从辐射束。过滤器820系统包括用于捕集碎屑颗粒的多个箔F1和F2，用于存储多个箔的支撑件S1和S2以及具有被配置为被冷却的表面的冷却系统CS1和CS2。冷却系统和支撑件被定位成使得可以在冷却系统的表面和支撑件之间形成间隙G. 冷却系统配置成将气体注入到间隙中。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2005328058A Lithography apparatus, manufacturing method of device, and radiation system 有权
标题翻译：光刻设备，器件制造方法和辐射系统
公开(公告)号：JP2005328058A
公开(公告)日：2005-11-24
申请号：JP2005139187
申请日：2005-05-12
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KURT RALPH , BAKKER LEVINUS PIETER , SCHUURMANS FRANK JEROEN PIETER , VAN DER WERF JAN EVERT
IPC分类号： G03B27/52 , G03F7/20 , G21K1/06 , G21K5/00 , G21K5/02 , H01L21/027
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/7005 , G21K1/06
摘要： PROBLEM TO BE SOLVED: To provide lithography projection apparatus that increases radiation output.
SOLUTION: Lithography apparatus has an illumination system configured in order to provide a radiation beam, and a projection system configured such that it projects a patterned radiation beam onto a target portion of a substrate. The illumination system has a first radiation source 10 and at least one mirror 14 configured in order to increase output of the radiation source. Moreover, the illumination system has a second radiation source 12, and at least one mirror 14 disposed between the radiation sources, and focuses output of the second radiation source on the first radiation source, so that the output of the radiation sources is increased. The radiation source operates in a way of emitting radiation within an EUV wavelength range.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供增加辐射输出的光刻投影装置。解决方案：平版印刷设备具有配置为提供辐射束的照明系统，以及配置成使得其将图案化的辐射束投射到基板的目标部分上的投影系统。照明系统具有第一辐射源10和至少一个反射镜14，其被配置为增加辐射源的输出。此外，照明系统具有第二辐射源12和设置在辐射源之间的至少一个反射镜14，并且将第二辐射源的输出聚焦在第一辐射源上，使得辐射源的输出增加。辐射源以发射EUV波长范围内的辐射的方式工作。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2005322904A Lithography system and device manufacturing method 有权
标题翻译： LITHOGRAPHY系统和器件制造方法
公开(公告)号：JP2005322904A
公开(公告)日：2005-11-17
申请号：JP2005129262
申请日：2005-04-27
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VADIM YEVGENYEVICH BANINE , BAKKER LEVINUS PIETER , JONKERS JEROEN , LOOPSTRA ERIK ROELOF
IPC分类号： G02B5/08 , G03B27/54 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70008 , G03F7/7005
摘要： PROBLEM TO BE SOLVED: To provide lithography system which enhances the output of an EUV radiation source by combining the outputs of a plurality of EUV radiation sources.
SOLUTION: The lithography system includes an illumination system for providing a radiation beam, a support for supporting a pattern forming device, a substrate table, and a projection system. Further, the lithography system includes the plurality of EUV radiation sources for providing the illumination system with EUV radiation, and a distribution means for transforming EUV radiation from each of the EUV radiation sources to the intermediate radiation beam. The intermediate radiation beam is directed from the distribution means to a first direction by mirror surface. The distribution means further includes a rotating mirror array, whose axis of rotation is non-parallel with the mirror surface.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供通过组合多个EUV辐射源的输出来增强EUV辐射源的输出的光刻系统。解决方案：光刻系统包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑件，衬底台和投影系统。此外，光刻系统包括用于向照明系统提供EUV辐射的多个EUV辐射源，以及用于将来自EUV辐射源中的每一个的EUV辐射转换成中间辐射束的分配装置。中间辐射束从分布装置通过镜面指向第一方向。分配装置还包括旋转镜阵列，其旋转轴与镜面不平行。版权所有（C）2006，JPO＆NCIPI

7. 发明专利

JP2005150721A Lithographic apparatus suppressed in contamination, method of manufacturing device, and device manufactured by them 有权
标题翻译：污染物抑制装置，制造方法及其制造的装置
公开(公告)号：JP2005150721A
公开(公告)日：2005-06-09
申请号：JP2004325789
申请日：2004-11-10
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： BAKKER LEVINUS PIETER , BANINE VADIM YEVGENYEVICH , IVANOV VLADIMIR V , KOSHELEV KONSTANTIN N , KRIVTSUN VLADIMIR M
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70908 , G03F7/70916
摘要： PROBLEM TO BE SOLVED: To provide a lithographic projector provided with a radiation system which emits a radiant projected beam. SOLUTION: The lithographic projector is provided with a particle supply unit 22 which supplies getter particles into a radiant projected beam for performing the role of a getter for contaminated particles in the projected beam. The getter particles have diameters of ≥1 nm, preferably, COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种设置有发射辐射投影光束的辐射系统的光刻投影仪。解决方案：光刻投影仪设置有颗粒供应单元22，其将吸气剂颗粒提供到辐射投影光束中，用于执行投影光束中污染颗粒的吸气剂的作用。吸气剂颗粒的直径为≥1nm，优选<1,000nm。在一个实施例中，该光刻投影仪具有伴随有板构件52,57,59和69的污染物捕集器9,50,55和67，用于捕获投影光束中的污染颗粒; 颗粒供给单元22,45,54,58,65和71，其将污染物捕集器9,50,55和67的颗粒供应到上游侧的空间，使得颗粒可能与污染的颗粒碰撞并给出附加的速度分量到被污染的颗粒朝向板状构件52,57,59和69.版权所有（C）2005，JPO＆NCIPI

8. 发明专利

JP2005142569A Optical element, lithographic equipment having such optical element, and device manufacturing method 有权
标题翻译：光学元件，具有这种光学元件的光刻设备和器件制造方法
公开(公告)号：JP2005142569A
公开(公告)日：2005-06-02
申请号：JP2004321406
申请日：2004-11-05
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： BAKKER LEVINUS PIETER
IPC分类号： G02B5/02 , G02B1/11 , G02B5/00 , G02B5/08 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70191 , G02B1/11 , G02B5/00 , Y10T428/24355
摘要： PROBLEM TO BE SOLVED: To provide an optical element, such as optical filter, optical diffraction grating, mirror, or lens, which is provided with a layer, having a small reflection for incident EUV radiation in the wavelength λ range of 5 to 20 nm. SOLUTION: The optical element is equipped with a top layer which is transparent to an EUV radiation in the wavelength λ range of 5 to 20 nm. The structure of the top layer has a root mean square roughness of not less than λ/10 for a spatial period of not more than λ/2. With such a configuration, transmission of the EUV radiation from the top layer to the optical element is promoted. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一种光学元件，例如光学滤光器，光学衍射光栅，反射镜或透镜，其具有层，对波长λ范围为5的入射EUV辐射具有小的反射至20nm。解决方案：光学元件配备有对于5至20nm的波长λ范围内的EUV辐射是透明的顶层。对于不大于λ/ 2的空间周期，顶层的结构具有不小于λ/ 10的均方根粗糙度。通过这样的结构，EUV辐射从顶层向光学元件的传输得到促进。版权所有（C）2005，JPO＆NCIPI

9. 发明专利

JP2009124182A Radiation source device for suppressing debris particle, lithographic apparatus, illuminating system, and method 审中-公开
标题翻译：用于抑制碎片颗粒的放射源装置，光刻装置，照明系统和方法
公开(公告)号：JP2009124182A
公开(公告)日：2009-06-04
申请号：JP2009053262
申请日：2009-03-06
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VADIM YEVGENYEVICH BANINE , BAKKER LEVINUS PIETER , KOLESNYCHENKO ALEKSEY YURIEVIC , MOORS JOHANNES HUBERTUS J , SCHUURMANS FRANK JEROEN PIETER
IPC分类号： H01L21/027
CPC分类号： G03F7/70916
摘要： PROBLEM TO BE SOLVED: To provide a radiation source device in which individual provision of gas in an area where radiation travels from a radiation source to an illuminator is extremely small with regard to the suppression of debris particles in the area.
SOLUTION: The lithographic apparatus includes the radiation source for generating the radiation, an illuminating system for adjusting the radiation, a patterning device for patterning the adjusted radiation, and a projection system for projecting the patterned radiation onto a target section of a substrate. The illuminating system includes a debris suppressing system for suppressing the debris particles produced by the generation of the radiation and an optical system for collecting the radiation. The debris suppressing systems are disposed so as to directly evaporate the debris particles, to directly charge the debris particles, to directly generate plasma from the debris particles, or to perform those arbitrary combinations, in a path where the radiation travels from radiation source to the optical system.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种辐射源装置，其中在辐射源从辐射源传播到照明器的区域中单独提供气体对于抑制该区域中的碎屑颗粒是非常小的。解决方案：光刻设备包括用于产生辐射的辐射源，用于调节辐射的照明系统，用于对经调节的辐射进行图案化的图案形成装置，以及用于将图案化辐射投影到基板的目标部分上的投影系统。照明系统包括用于抑制由辐射产生产生的碎屑颗粒的碎片抑制系统和用于收集辐射的光学系统。碎片抑制系统被设置成直接蒸发碎屑颗粒，直接对碎屑颗粒进行充填，从碎片颗粒直接产生等离子体，或者在辐射从辐射源传播到光学系统。版权所有（C）2009，JPO＆INPIT

10. 发明专利

JP2006196890A Method for providing operable filter system for filtering particle out of beam of radiation, filter system, apparatus, and lithographic apparatus comprising the filter system 有权
标题翻译：提供用于过滤辐射束颗粒的可操作过滤系统的方法，过滤系统，装置和包含过滤系统的平面设备
公开(公告)号：JP2006196890A
公开(公告)日：2006-07-27
申请号：JP2005375653
申请日：2005-12-27
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： BAKKER LEVINUS PIETER
IPC分类号： H01L21/027 , G03F7/20 , G21K3/00 , G21K5/00
CPC分类号： H05G2/001 , G03F7/70916
摘要： PROBLEM TO BE SOLVED: To provide a method for providing an operable filter system for filtering particles out of a beam of radiation, a filter system, an apparatus, and a lithographic apparatus. SOLUTION: The method for providing an operable filter system suited for use in lithography, for example extreme ultraviolet lithography, and used for filtering particles out of a beam of radiation is disclosed. The method includes providing a slack foil or wire for intercepting the particles, mounting at least a first point or side of the foil or wire to a first position of a mounting assembly, and substantially stretching the slack foil or wire at least during the usage at least within the beam of radiation, substantially parallel to a direction in which the radiation propagates. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于提供用于从辐射束中过滤颗粒的可操作的过滤器系统的方法，过滤器系统，设备和光刻设备。公开了一种用于提供适用于光刻的可操作的滤光器系统的方法，例如极紫外光刻技术，并用于从辐射束中过滤颗粒。该方法包括提供用于拦截颗粒的松弛的箔或线，至少将箔或线的第一点或一侧安装到安装组件的第一位置，并至少在使用过程中基本拉伸松弛的箔或线至少在辐射束内，基本上平行于辐射传播的方向。版权所有（C）2006，JPO＆NCIPI

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