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1. 发明申请

US20040165173A1 Lithographic apparatus, device manufacturing method, and method of manufacturing a component 有权
标题翻译：平版印刷设备，器件制造方法和组件的制造方法
公开(公告)号：US20040165173A1
公开(公告)日：2004-08-26
申请号：US10785046
申请日：2004-02-25
申请人： ASML NETHERLANDS B.V.
发明人： Wilhelmus Josephus Box
IPC分类号： G03B027/32
CPC分类号： G03F7/70058 , G03F7/70216 , G03F7/70891 , G03F7/70958
摘要： A method of manufacturing a component that will, in use, experience a thermal load and will be operated at a mean temperature, includes selecting a material having a coefficient of thermal expansion having a zero-crossing at a first temperature and manufacturing the component using the selected material at a second temperature. The first temperature is between the second temperature and the mean operating temperature. Deformation of the component at the mean operating temperature are thus minimized. A lithographic apparatus includes a radiation system configured to provide a beam of radiation and a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. At least one component of the apparatus that in use experiences a thermal load is made of the selected material. A device manufacturing method includes providing a beam of radiation using a radiation system, patterning the beam, and projecting the patterned beam onto a target portion of the layer of radiation-sensitive material using a projection system. At least one component of the radiation system and/or projection system that experiences a thermal load in use is made of the selected material.
摘要翻译：一种在使用中将经历热负荷并将在平均温度下操作的部件的制造方法包括在第一温度下选择具有过零点的热膨胀系数的材料，并使用在第二温度下选择材料。第一温度在第二温度和平均工作温度之间。因此，在平均工作温度下的组分变形最小化。光刻设备包括被配置为提供辐射束的辐射系统和被配置为将图案化的辐射束投射到基板的目标部分上的投影系统。在使用中经受热负荷的装置的至少一个部件由所选择的材料制成。一种器件制造方法包括使用辐射系统提供辐射束，图案化该束，并且使用投影系统将图案化的光束投影到辐射敏感材料层的目标部分上。辐射系统和/或投影系统中经受使用中的热负荷的至少一个部件由所选择的材料制成。

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