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1. 发明申请

WO2011146208A3 FEEDBACK FOR POLISHING RATE CORRECTION IN CHEMICAL MECHANICAL POLISHING 审中-公开
标题翻译：化学机械抛光抛光率校正反馈
公开(公告)号：WO2011146208A3
公开(公告)日：2012-03-01
申请号：PCT/US2011033998
申请日：2011-04-26
申请人： APPLIED MATERIALS INC , QIAN JUN , GARRETSON CHARLES C , DHANDAPANI SIVAKUMAR , DAVID JEFFREY DRUE , LEE HARRY Q
发明人： QIAN JUN , GARRETSON CHARLES C , DHANDAPANI SIVAKUMAR , DAVID JEFFREY DRUE , LEE HARRY Q
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B49/04 , B24B49/12
摘要： A substrate having a plurality of zones is polished and spectra are measured. For each zone, a first linear function fits a sequence of index values associated with reference spectra that best match the measured spectra. A projected time at which a reference zone will reach the target index value is determined based on the first linear function, and for at least one adjustable zone, a polishing parameter adjustment is calculated such that the adjustable zone has closer to the target index at the projected time than without such adjustment. The adjustment is calculated based on a feedback error calculated for a previous substrate. The feedback error for a subsequent substrate is calculated based on a second linear function that fits a sequence of index values associated with reference spectra that best match spectra measured after the polishing parameter is adjusted.
摘要翻译：研磨具有多个区域的基板并测量光谱。对于每个区域，第一个线性函数拟合与参考光谱相关联的索引值序列，该参考光谱与测量的光谱最匹配。基于第一线性函数确定参考区域将达到目标指标值的预计时间，并且对于至少一个可调整区域，计算抛光参数调整，使得可调节区域更接近目标索引处的目标索引预计时间比没有这样的调整。基于对先前基板计算的反馈误差来计算调整。基于适合与调整抛光参数之后测量的最佳匹配光谱的参考光谱相关联的索引值序列的第二线性函数来计算后续衬底的反馈误差。

2. 发明申请

WO2012015699A3 SELECTING REFERENCE LIBRARIES FOR MONITORING OF MULTIPLE ZONES ON A SUBSTRATE 审中-公开
标题翻译：选择用于监测基底上多个区域的参考文献
公开(公告)号：WO2012015699A3
公开(公告)日：2012-05-24
申请号：PCT/US2011045096
申请日：2011-07-22
申请人： APPLIED MATERIALS INC , QIAN JUN , SWEDEK BOGUSLAW A , LEE HARRY Q , DAVID JEFFREY DRUE , DHANDAPANI SIVAKUMAR , OSTERHELD THOMAS H
发明人： QIAN JUN , SWEDEK BOGUSLAW A , LEE HARRY Q , DAVID JEFFREY DRUE , DHANDAPANI SIVAKUMAR , OSTERHELD THOMAS H
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： G05B23/0208 , G05B2219/31459 , G05B2219/45232
摘要： A method of configuring a polishing monitoring system includes receiving user input selecting a plurality of libraries, each library of the plurality of libraries comprising a plurality of reference spectra for use in matching to measured spectra during polishing, each reference spectrum of the plurality of reference spectra having an associated index value, for a first zone of a substrate, receiving user input selecting a first subset of the plurality of libraries, and for a second zone of the substrate, receiving user input selecting a second subset of the plurality of libraries.
摘要翻译：配置抛光监视系统的方法包括接收选择多个库的用户输入，多个库的每个库包括多个参考光谱，用于与抛光期间的测量光谱匹配，多个参考光谱的每个参考光谱具有相关联的索引值，对于衬底的第一区域，接收选择所述多个库的第一子集的用户输入以及所述衬底的第二区域，接收选择所述多个库的第二子集的用户输入。

3. 发明申请

WO2011139524A3 AUTOMATIC GENERATION OF REFERENCE SPECTRA FOR OPTICAL MONITORING 审中-公开
标题翻译：用于光学监测的参考光谱自动生成
公开(公告)号：WO2011139524A3
公开(公告)日：2012-03-08
申请号：PCT/US2011032650
申请日：2011-04-15
申请人： APPLIED MATERIALS INC , DAVID JEFFREY DRUE , LEE HARRY Q , QIAN JUN , ZHANG JIMIN
发明人： DAVID JEFFREY DRUE , LEE HARRY Q , QIAN JUN , ZHANG JIMIN
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/042 , B24B37/005 , B24B49/12 , H01L22/12 , H01L22/26
摘要： A computer-implemented method of generating reference spectra includes polishing a first substrate in a polishing apparatus having a rotatable platen, measuring a sequence of spectra from the substrate during polishing with an in-situ monitoring system, associating each spectrum in the sequence of spectra with a index value equal to a number of platen rotations at which the each spectrum was measured, and storing the sequence of spectra as reference spectra.
摘要翻译：计算机实现的产生参考光谱的方法包括在具有可旋转压板的抛光设备中抛光第一衬底，在用原位监测系统抛光期间测量来自衬底的光谱序列，将光谱序列中的每个光谱与指示值等于测量每个光谱的平板旋转数，并将光谱序列存储为参考光谱。

4. 发明申请

WO2008076601B1 DETERMINING PHYSICAL PROPERTY OF SUBSTRATE 审中-公开
标题翻译：确定基质的物理性质
公开(公告)号：WO2008076601B1
公开(公告)日：2008-08-14
申请号：PCT/US2007085810
申请日：2007-11-28
申请人： APPLIED MATERIALS INC , RAVID ABRAHAM , SWEDEK BOGUSLAW A , DAVID JEFFREY DRUE , QIAN JUN , CARLSSON INGEMAR , BENVEGNU DOMINIC J , LEE HARRY Q , KARUPPIAH LAKSHMANAN
发明人： RAVID ABRAHAM , SWEDEK BOGUSLAW A , DAVID JEFFREY DRUE , QIAN JUN , CARLSSON INGEMAR , BENVEGNU DOMINIC J , LEE HARRY Q , KARUPPIAH LAKSHMANAN
IPC分类号： G01B11/06
CPC分类号： G01B11/0683 , G01B11/0625 , Y10S707/99936
摘要： A method of determining a physical property of a substrate includes recording a first spectrum obtained from a substrate, the first spectrum being obtained during a polishing process that alters a physical property of the substrate. The method includes identifying, in a database, at least one of several previously recorded spectra that is similar to the recorded first spectrum. Each of the spectra in the database has a physical property value associated therewith. The method includes generating a signal indicating that a first value of the physical property is associated with the first spectrum, the first value being determined using the physical property value associated with the identified previously recorded spectrum in the database. A system for determining a physical property of a substrate includes a polishing machine, an endpoint determining module, and a database.
摘要翻译：确定衬底的物理特性的方法包括记录从衬底获得的第一光谱，第一光谱是在抛光处理期间获得的，其改变衬底的物理特性。该方法包括在数据库中识别与记录的第一光谱类似的若干先前记录的光谱中的至少一个。数据库中的每个光谱具有与其相关的物理属性值。该方法包括产生指示物理性质的第一值与第一光谱相关联的信号，第一值使用与数据库中识别的先前记录的光谱相关联的物理性质值来确定。用于确定衬底的物理性质的系统包括抛光机，端点确定模块和数据库。

5. 发明申请

WO2012102871A2 GATHERING SPECTRA FROM MULTIPLE OPTICAL HEADS 审中-公开
标题翻译：从多个光学头收集光谱
公开(公告)号：WO2012102871A2
公开(公告)日：2012-08-02
申请号：PCT/US2012021135
申请日：2012-01-12
申请人： APPLIED MATERIALS INC , DAVID JEFFREY DRUE , SWEDEK BOGUSLAW A , BENVEGNU DOMINIC J , DHANDAPANI SIVAKUMAR
发明人： DAVID JEFFREY DRUE , SWEDEK BOGUSLAW A , BENVEGNU DOMINIC J , DHANDAPANI SIVAKUMAR
IPC分类号： H01L21/304
CPC分类号： B24B49/12 , B24B37/013 , B24B37/105
摘要： A polishing apparatus includes a platen to hold a polishing pad having a plurality of optical apertures, a carrier head to hold a substrate against the polishing pad, a motor to generate relative motion between the carrier head and the platen, and an optical monitoring system. The optical monitoring system includes at least one light source, a common detector, and an optical assembly configured to direct light from the at least one light source to each of a plurality of separated positions in the platen, to direct light from each position of the plurality of separated positions to the substrate as the substrate passes over said each position, to receive reflected light from the substrate as the substrate passes over said each position, and to direct the reflected light from each of the plurality of separated positions to the common detector.
摘要翻译：抛光装置包括用于保持具有多个光学孔径的抛光垫的台板，用于将基板保持在抛光垫上的载体头，在载体头与台板之间产生相对运动的电机以及光学监测系统。该光学监测系统包括至少一个光源，公共检测器以及光学组件，该光学组件被配置为将来自至少一个光源的光引导至台板中的多个分离位置中的每一个，以引导来自当衬底经过所述每个位置时将多个分离位置提供给衬底，以便当衬底经过所述每个位置时接收来自衬底的反射光，并将来自多个分离位置中的每一个的反射光引导至公共检测器。

6. 发明申请

WO2012019044A3 TECHNIQUES FOR MATCHING MEASURED SPECTRA TO REFERENCE SPECTRA FOR IN-SITU OPTICAL MONITORING 审中-公开
标题翻译：将测量光谱匹配到用于现场光学监测的参考光谱的技术
公开(公告)号：WO2012019044A3
公开(公告)日：2012-05-18
申请号：PCT/US2011046646
申请日：2011-08-04
申请人： APPLIED MATERIALS INC , HU XIAOYUAN , WANG ZHIHONG , LEE HARRY Q , ZHU ZHIZE , DAVID JEFFREY DRUE , BENVEGNU DOMINIC J , ZHANG JIMIN , TU WEN-CHIANG
发明人： HU XIAOYUAN , WANG ZHIHONG , LEE HARRY Q , ZHU ZHIZE , DAVID JEFFREY DRUE , BENVEGNU DOMINIC J , ZHANG JIMIN , TU WEN-CHIANG
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/013 , B24B37/042 , B24B37/107 , B24B37/205 , B24B49/045 , B24B49/12
摘要： A method of controlling polishing includes storing a library having a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum using a matching technique other than sum of squared differences to generate a sequence of best matching reference spectra, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra. Finding a best matching reference spectrum may include performing a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the greatest correlation to the measured spectrum as a best matching reference spectrum.
摘要翻译：控制抛光的方法包括：存储具有多个参考光谱的库，抛光衬底，在抛光期间测量来自衬底的光的光谱序列，对于光谱序列的每个测量光谱，使用除了平方差的和以产生最佳匹配参考光谱的序列之外的匹配技术，以及基于最佳匹配参考光谱的序列来确定抛光终点或抛光速率的调整中的至少一个。找到最佳匹配的参考光谱可以包括执行所测量的光谱与来自文库的多个参考光谱中的两个或更多个的互相关，并选择与所测量的光谱具有最大相关性的参考光谱作为最佳匹配参考光谱。

7. 发明申请

WO2011146213A3 ENDPOINT CONTROL OF MULTIPLE SUBSTRATES WITH MULTIPLE ZONES ON THE SAME PLATEN IN CHEMICAL MECHANICAL POLISHING 审中-公开
标题翻译：在化学机械抛光中在同一板上具有多个区域的多个基板的端点控制
公开(公告)号：WO2011146213A3
公开(公告)日：2012-02-23
申请号：PCT/US2011034212
申请日：2011-04-27
申请人： APPLIED MATERIALS INC , LEE HARRY Q , ZHANG JIMIN , DAVID JEFFREY DRUE , SWEDEK BOGUSLAW A
发明人： LEE HARRY Q , ZHANG JIMIN , DAVID JEFFREY DRUE , SWEDEK BOGUSLAW A
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/013 , B24B37/042
摘要： A plurality of substrates are polished simultaneously on the same polishing pad. A sequence of spectra is measured from each zone of each substrate, and for each measured spectrum in the sequence of spectra for each zone of each substrate, a best matching reference spectrum is determined from a library of reference spectra. For each zone of each substrate, a linear function is fit to a sequence of index values associated with the best matching reference spectra. For at least one zone, a projected time at which the zone will reach a target index value is determined based on the linear function, and the polishing parameter for at least one zone on at least one substrate is adjusted such that the at least one zone of the at least one substrate has closer to the target index at the projected time than without such adjustment.
摘要翻译：多个基板在同一抛光垫上同时被抛光。从每个底物的每个区域测量光谱序列，并且对于每个底物的每个区域的光谱序列中的每个测量的光谱，从参考光谱库确定最佳匹配的参考光谱。对于每个衬底的每个区域，线性函数适合于与最佳匹配参考光谱相关联的索引值序列。对于至少一个区域，基于线性函数确定区域将达到目标指标值的预计时间，并且调整至少一个基底上的至少一个区域的抛光参数，使得至少一个区域的至少一个基板在投影时间比没有这种调整更接近于目标指标。

8. 发明申请

WO2007024807A3 APPARATUS AND METHODS FOR SPECTRUM BASED MONITORING OF CHEMICAL MECHANICAL POLISHING 审中-公开
标题翻译：用于基于频谱监测化学机械抛光的装置和方法
公开(公告)号：WO2007024807A3
公开(公告)日：2007-07-12
申请号：PCT/US2006032659
申请日：2006-08-21
申请人： APPLIED MATERIALS INC , BENVEGNU DOMINIC J , DAVID JEFFREY DRUE , SWEDEK BOGDAN , LEE HARRY Q , KARUPPIAH LAKSHMANAN
发明人： BENVEGNU DOMINIC J , DAVID JEFFREY DRUE , SWEDEK BOGDAN , LEE HARRY Q , KARUPPIAH LAKSHMANAN
IPC分类号： B24B37/04 , B24B49/12
CPC分类号： B24B37/042 , B24B37/205 , B24B49/12
摘要： Apparatus and methods for spectrum based monitoring of chemical mechanical polishing, including spectrum based endpointing, spectrum based polishing rate adjustment, flushing a top surface of an optical head (53), or a pad (30) with a window. The spectrum-based endpointing uses a reference spectrum which is empirically selected for particular spectrum based endpoint determination logic so that the target thickness is achieved when endpoint is called by applying the particular spectrum based endpoint logic. The polishing endpoint can be determined using a difference trace or a sequence of index values. The flushing system creates a laminar gas flow across the top surface of the optical head (53) . The vacuum nozzle (308) and vacuum sources (312) are configured so that the flow of gas is laminar. The window includes a soft plastic portion and a crystalline or glass like portion. The spectrum based polishing rate adjustment includes obtaining spectra for different zones on a substrate.
摘要翻译：用于基于频谱的化学机械抛光监测的装置和方法，包括基于光谱的终点，基于光谱的抛光速率调整，冲洗光学头（53）的顶表面或具有窗口的垫（30）。基于频谱的终点使用参考频谱，该参考频谱是针对特定的基于频谱的端点确定逻辑进行经验选择的，以便通过应用特定的基于频谱的端点逻辑来调用端点时实现目标厚度。可以使用差异迹线或索引值序列来确定抛光终点。冲洗系统在光学头（53）的顶表面上产生层流气流。真空喷嘴（308）和真空源（312）构造成使得气体流是层流的。窗口包括软塑料部分和结晶或玻璃状部分。基于光谱的抛光速率调节包括获得基底上不同区域的光谱。

9. 发明申请

WO2011139575A3 ENDPOINT METHOD USING PEAK LOCATION OF MODIFIED SPECTRA 审中-公开
标题翻译：使用修改光谱的峰位置的端点方法
公开(公告)号：WO2011139575A3
公开(公告)日：2012-02-23
申请号：PCT/US2011033320
申请日：2011-04-20
申请人： APPLIED MATERIALS INC , DAVID JEFFREY DRUE , SIN GARRETT HO , LEE HARRY Q , BENVEGNU DOMINIC J
发明人： DAVID JEFFREY DRUE , SIN GARRETT HO , LEE HARRY Q , BENVEGNU DOMINIC J
IPC分类号： H01L21/304
CPC分类号： B24B37/013 , H01L22/12 , H01L22/26
摘要： A method of optically monitoring a substrate during polishing includes receiving an identification of a selected spectral feature and a characteristic of the selected spectral feature to monitor during polishing, measuring a first spectrum from the substrate during polishing, the first spectrum measured within an initial time following initiation of polishing, measuring a sequence of second spectra from the substrate during polishing, the sequence of second spectra measured after the initial time, for each second spectrum in the sequence of second spectra, removing the first spectrum from the second spectrum to generate a sequence of modified third spectra, determining a value of a characteristic of the selected spectral feature for each third spectrum in the sequence of third spectra to generate a sequence of values for the characteristic, and determining a polishing endpoint or an adjustment for a polishing rate based on the sequence of values.
摘要翻译：在抛光期间光学监测基底的方法包括接收所选择的光谱特征的标识和所选择的光谱特征的特征以在抛光期间监测，在抛光期间测量来自基底的第一光谱，在初始时间之后测量的第一光谱开始抛光，在抛光期间测量来自衬底的第二光谱序列，在初始时间之后测量的第二光谱序列，对于第二光谱序列中的每个第二光谱，从第二光谱去除第一光谱以产生序列修改的第三光谱，确定在第三光谱序列中的每个第三光谱的所选光谱特征的特征值，以产生该特征值的序列，以及基于以下步骤确定抛光终点或抛光速率的调整：值序列。

10. 发明申请

WO2010028180A3 ADJUSTING POLISHING RATES BY USING SPECTROGRAPHIC MONITORING OF A SUBSTRATE DURING PROCESSING 审中-公开
标题翻译：利用加工过程中基体的光谱监测来调整抛光速率
公开(公告)号：WO2010028180A3
公开(公告)日：2010-05-20
申请号：PCT/US2009055935
申请日：2009-09-03
申请人： APPLIED MATERIALS INC , DAVID JEFFREY DRUE , BENVEGNU DOMINIC J , LEE HARRY Q , SWEDEK BOGUSLAW A
发明人： DAVID JEFFREY DRUE , BENVEGNU DOMINIC J , LEE HARRY Q , SWEDEK BOGUSLAW A
IPC分类号： H01L21/304
CPC分类号： B24B37/005 , B24B37/013 , B24B49/12 , H01L21/302
摘要： A computer implemented method includes receiving a sequence of current spectra of reflected light from a substrate; comparing each current spectrum from the sequence of current spectra to a plurality of reference spectra from a reference spectra library to generate a sequence of best match reference spectra; determining a goodness of fit for the sequence of best match reference spectra; and determining at least one of whether to adjust a polishing rate or an adjustment for the polishing rate, based on the goodness of fit.
摘要翻译：一种计算机实现的方法包括：接收来自衬底的反射光的当前光谱的序列; 将来自当前光谱序列的每个当前光谱与来自参考光谱库的多个参考光谱进行比较以生成最佳匹配参考光谱的序列; 确定最佳匹配参考光谱序列的拟合度; 并基于拟合度来确定是调整抛光速率还是调整抛光速率中的至少一个。

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