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1. 发明申请

WO2012166313A2 APPARATUS AND METHODS FOR POSITIONING A SUBSTRATE USING CAPACITIVE SENSORS 审中-公开
标题翻译：使用电容式传感器定位基板的装置和方法
公开(公告)号：WO2012166313A2
公开(公告)日：2012-12-06
申请号：PCT/US2012/037311
申请日：2012-05-10
申请人： APPLIED MATERIALS, INC. , KOELMEL, Blake , RANISH, Joseph M. , SANCHEZ, Errol C.
发明人： KOELMEL, Blake , RANISH, Joseph M. , SANCHEZ, Errol C.
IPC分类号： H01L21/68
CPC分类号： H01L21/68 , H01L21/67115 , H01L21/67259
摘要： Embodiments of the present invention provide apparatus and methods for positioning a substrate in a processing chamber using capacitive sensors. One embodiment of the present invention provides an apparatus for processing a substrate. The apparatus includes first and second capacitive sensors disposed in an inner volume. The first capacitive sensor is positioned to detect a location of an edge of the substrate at a first angular location. The second capacitive sensor is positioned to detect a vertical position of the substrate.
摘要翻译：本发明的实施例提供了使用电容式传感器将衬底定位在处理室中的装置和方法。本发明的一个实施例提供一种用于处理衬底的装置。该装置包括设置在内部容积中的第一和第二电容传感器。第一电容传感器被定位成在第一角度位置处检测衬底的边缘的位置。第二电容传感器被定位成检测基板的垂直位置。

2. 发明申请

WO2009094275A3 APPARATUS AND METHOD FOR SUPPORTING, POSITIONING AND ROTATING A SUBSTRATE IN A PROCESSING CHAMBER 审中-公开
公开(公告)号：WO2009094275A3
公开(公告)日：2009-07-30
申请号：PCT/US2009/030996
申请日：2009-01-14
申请人： APPLIED MATERIALS, INC. , KOELMEL, Blake , LERNER, Alexander, N. , RANISH, Joseph, M. , SANGAM, Kedarnath , SORABJI, Khurshed
发明人： KOELMEL, Blake , LERNER, Alexander, N. , RANISH, Joseph, M. , SANGAM, Kedarnath , SORABJI, Khurshed
IPC分类号： H01L21/683 , H01L21/687 , H01L21/205 , H01L21/324
摘要： Embodiments of the invention contemplate a method, apparatus and system that are used to support, position, and rotate a substrate during processing. Embodiments of the invention may also include a method of controlling the transfer of heat between a substrate and substrate support positioned in a processing chamber. The apparatus and methods described herein remove the need for complex, costly and often unreliable components that would be required to accurately position and rotate a substrate during one or more processing steps, such as an rapid thermal processing (RTP) process, a chemical vapor deposition (CVD) process, a physical vapor deposition (PVD) process, atomic layer deposition (ALD) process, dry etching process, wet clean, and/or laser annealing process.

3. 发明申请

WO2012166322A1 APPARATUS AND METHODS FOR SUPPORTING AND CONTROLLING A SUBSTRATE 审中-公开
标题翻译：用于支撑和控制基板的装置和方法
公开(公告)号：WO2012166322A1
公开(公告)日：2012-12-06
申请号：PCT/US2012/037473
申请日：2012-05-11
申请人： APPLIED MATERIALS, INC. , KOELMEL, Blake , RANISH, Joseph M.
发明人： KOELMEL, Blake , RANISH, Joseph M.
IPC分类号： H01L21/683 , H01L21/205
CPC分类号： H01L21/67109 , H01L21/6838
摘要： Embodiments of the present invention provide apparatus and methods for supporting and controlling a substrate during thermal processing. One embodiment of the present invention provides an apparatus for processing a substrate. The apparatus includes a chamber body defining an inner volume, a substrate support disposed in the inner volume, and an auxiliary force assembly configured to apply an auxiliary force to the substrate. Another embodiment provides a gas delivery assembly configured to adjust a thermal mass of a fluid flow delivered to position, control and/or rotate a substrate.
摘要翻译：本发明的实施例提供了用于在热处理期间支撑和控制基板的装置和方法。本发明的一个实施例提供一种用于处理衬底的装置。该装置包括限定内部容积的室主体，设置在内部容积中的基板支撑件以及被配置成向基板施加辅助力的辅助力组件。另一个实施例提供一种气体输送组件，其构造成调节输送到位置的流体流的热质量，控制和/或旋转基底。

4. 发明申请

WO2008141105A1 AN APPARATUS AND METHOD FOR SUPPORTING, POSITIONING AND ROTATING A SUBSTRATE IN A PROCESSING CHAMBER 审中-公开
标题翻译：用于支撑，定位和旋转加工室中的基板的装置和方法
公开(公告)号：WO2008141105A1
公开(公告)日：2008-11-20
申请号：PCT/US2008/063105
申请日：2008-05-08
申请人： APPLIED MATERIALS, INC. , KOELMEL, Blake , LERNER, Alexander N. , RANISH, Joseph M. , SANGAM, Kedarnath , SORABJI, Khurshed
发明人： KOELMEL, Blake , LERNER, Alexander N. , RANISH, Joseph M. , SANGAM, Kedarnath , SORABJI, Khurshed
IPC分类号： B05C13/00
CPC分类号： H01L21/6838 , H01L21/67115
摘要： An apparatus and method for supporting, positioning and rotating a substrate are provided. In one embodiment, a support assembly for supporting a substrate includes an upper base plate and a lower base plate. The substrate is floated on a thin layer of air over the upper base plate. A positioning assembly includes a plurality of air bearing edge rollers or air flow pockets used to position the substrate in a desired orientation inside above the upper base plate. A plurality of slanted apertures or air flow pockets are configured in the upper base plate for flowing gas therethrough to rotate the substrate to ensure uniform heating during processing.
摘要翻译：提供了用于支撑，定位和旋转衬底的装置和方法。在一个实施例中，用于支撑衬底的支撑组件包括上基板和下基板。衬底浮在上层底板上的薄层空气上。定位组件包括多个空气轴承边缘辊或气流袋，其用于将衬底定位在上部基板的上方所期望的取向。多个倾斜的孔或气流袋被配置在上基板中，用于使气体流过其中以旋转基板以确保在加工期间的均匀加热。

5. 发明申请

WO2012115682A1 EDGE RING FOR A THERMAL PROCESSING CHAMBER 审中-公开
标题翻译： EDGE环热处理室
公开(公告)号：WO2012115682A1
公开(公告)日：2012-08-30
申请号：PCT/US2011/046008
申请日：2011-07-29
申请人： APPLIED MATERIALS, INC. , KOELMEL, Blake , RANISH, Joseph M. , MAYUR, Abhilash J.
发明人： KOELMEL, Blake , RANISH, Joseph M. , MAYUR, Abhilash J.
IPC分类号： H01L21/683 , H01L21/324 , H01L21/02
CPC分类号： H01L21/67346 , F27D5/0037 , F27D11/12 , F27D2005/0081 , H01L21/67115 , H01L21/68735
摘要： Embodiments of the present invention provide an edge ring for supporting a substrate with increased temperature uniformity. More particularly, embodiments of the present invention provide an edge ring having one or more surface area increasing structures formed on an energy receiving surface of the edge ring.
摘要翻译：本发明的实施例提供了用于支撑具有提高的温度均匀性的衬底的边缘环。更具体地说，本发明的实施例提供了一种边缘环，其具有形成在边缘环的能量接收表面上的一个或多个表面积增加结构。

6. 发明申请

WO2012115907A2 EDGE RING FOR A THERMAL PROCESSING CHAMBER 审中-公开
标题翻译：用于热处理室的边缘环
公开(公告)号：WO2012115907A2
公开(公告)日：2012-08-30
申请号：PCT/US2012/025818
申请日：2012-02-20
申请人： APPLIED MATERIALS, INC. , KOELMEL, Blake , RANISH, Joseph M. , MAYUR, Abhilash J.
发明人： KOELMEL, Blake , RANISH, Joseph M. , MAYUR, Abhilash J.
CPC分类号： H01L21/67346 , F27D5/0037 , F27D11/12 , F27D2005/0081 , H01L21/67115 , H01L21/68735
摘要： Embodiments of the present invention provide an edge ring for supporting a substrate with increased temperature uniformity. More particularly, embodiments of the present invention provide an edge ring having one or more surface area increasing structures formed on an energy receiving surface of the edge ring.
摘要翻译：本发明的实施例提供了一种用于支撑具有增加的温度均匀性的基板的边缘环。更具体地，本发明的实施例提供一种边缘环，其具有形成在边缘环的能量接收表面上的一个或多个表面积增加结构。

7. 发明申请

WO2010002742A2 APPARATUS AND METHOD FOR MEASURING RADIATION ENERGY DURING THERMAL PROCESSING 审中-公开
标题翻译：用于测量热处理期间的辐射能量的装置和方法
公开(公告)号：WO2010002742A2
公开(公告)日：2010-01-07
申请号：PCT/US2009/048939
申请日：2009-06-26
申请人： APPLIED MATERIALS, INC. , RANISH, Joseph, M. , KOELMEL, Blake , HUNTER, Aaron
发明人： RANISH, Joseph, M. , KOELMEL, Blake , HUNTER, Aaron
IPC分类号： H01L21/66 , H01L21/324
CPC分类号： H01L22/10 , H01L21/67115 , H01L21/67248
摘要： Embodiments of the present invention provide apparatus and method for reducing heating source radiation influence in temperature measurement during thermal processing. In one embodiment of the present invention, background radiant energy, such as an energy source of a thermal processing chamber, is marked within a selected spectrum, a characteristic of the background is then determined by measuring radiant energy at a reference wavelength within the selected spectrum and a comparing wavelength just outside the selected spectrum.
摘要翻译：本发明的实施例提供用于减少热处理期间热源辐射对温度测量的影响的设备和方法。在本发明的一个实施例中，诸如热处理室的能量源之类的背景辐射能量被标记在选定光谱内，然后通过测量所选光谱内的参考波长处的辐射能量来确定背景的特性和一个比较波长就在选定的频谱之外。

8. 发明申请

WO2013162842A1 WAFER EDGE MEASUREMENT AND CONTROL 审中-公开
标题翻译： WAFER边缘测量和控制
公开(公告)号：WO2013162842A1
公开(公告)日：2013-10-31
申请号：PCT/US2013/035168
申请日：2013-04-03
申请人： APPLIED MATERIALS, INC. , KOELMEL, Blake
发明人： KOELMEL, Blake
IPC分类号： H01L21/68 , H01L21/683
CPC分类号： H01L21/681 , H01L21/67259
摘要： Devices and methods are provided for positioning and/or rotating a substrate without solid contact, such as by floating the wafer on a thin layer of gas. Since there is no solid contact with components of a processing chamber, features on the wafer are used to determine wafer position and rotational speed. Closed loop control systems are provided with capacitive sensors to monitor the position of the edge of the wafer in a horizontal plane. Control systems may also monitor the position of a wafer feature as it rotates, such as a notch in the edge of the wafer. Because the presence of a notch can disrupt sensors facing the edge of the wafer, methods and devices to reduce or eliminate this disruption are also provided.
摘要翻译：提供了用于定位和/或旋转衬底而没有固体接触的装置和方法，例如通过将晶片浮在薄层气体上。由于与处理室的部件没有固体接触，所以使用晶片上的特征来确定晶片位置和转速。闭环控制系统设置有电容传感器，以在水平面内监测晶片边缘的位置。控制系统还可以监视晶片特征在其旋转时的位置，例如晶片边缘中的凹口。由于存在凹口可能会破坏面向晶片边缘的传感器，因此还提供了减少或消除此破坏的方法和设备。

9. 发明申请

WO2009155117A2 METHOD AND APPARATUS FOR DETECTING THE SUBSTRATE TEMPERATURE IN A LASER ANNEAL SYSTEM 审中-公开
标题翻译：用于检测激光神经系统中底物温度的方法和装置
公开(公告)号：WO2009155117A2
公开(公告)日：2009-12-23
申请号：PCT/US2009/045699
申请日：2009-05-29
申请人： APPLIED MATERIALS, INC. , KOELMEL, Blake , MAYUR, Abhilash, J.
发明人： KOELMEL, Blake , MAYUR, Abhilash, J.
IPC分类号： H01L21/66 , H01L21/324
CPC分类号： H01L21/67248 , G01J5/048 , H01L21/67253 , H01L21/68742
摘要： Embodiments of the invention provide a method and an apparatus for detecting the temperature of a substrate surface. In one embodiment, a method for measuring the temperature is provided which includes exposing the surface of the substrate to a laser beam radiating from a laser source, radiating emitted light from a portion of the surface of the substrate, through the shadow ring, and towards a thermal sensor, and determining the temperature of the portion of the surface of the substrate from the emitted light. The substrate may be disposed on a substrate support within a treatment region and a shadow ring may be disposed between the laser source and the surface of the substrate. The shadow ring may be selectively opaque to the laser beam and transparent to the emitted light.
摘要翻译：本发明的实施例提供了一种用于检测衬底表面的温度的方法和装置。在一个实施例中，提供了一种用于测量温度的方法，其包括将衬底的表面暴露于从激光源辐射的激光束，从衬底表面的一部分通过阴影环辐射发射的光，并朝向热传感器，并且从所发射的光确定衬底的表面部分的温度。衬底可以设置在处理区域内的衬底支撑件上，并且阴影环可以设置在激光源和衬底的表面之间。阴影环可以选择性地对激光束不透明并且对于发射的光是透明的。

10. 发明申请

WO2009102600A1 MILLISECOND ANNEALING (DSA) EDGE PROTECTION 审中-公开
标题翻译： MILLISECOND ANNEALING（DSA）边缘保护
公开(公告)号：WO2009102600A1
公开(公告)日：2009-08-20
申请号：PCT/US2009/033102
申请日：2009-02-04
申请人： APPLIED MATERIALS, INC. , KOELMEL, Blake , MCINTOSH, Robert C. , LARMAGNAC, David D. L. , LERNER, Alexander N. , MAYUR, Abhilash J. , YUDOVSKY, Joseph
发明人： KOELMEL, Blake , MCINTOSH, Robert C. , LARMAGNAC, David D. L. , LERNER, Alexander N. , MAYUR, Abhilash J. , YUDOVSKY, Joseph
IPC分类号： H01L21/00 , H01L21/02 , H01L21/324
CPC分类号： H01L21/67115 , H01L21/268 , H01L21/68735 , H01L21/68742
摘要： A method and apparatus for thermally processing a substrate is provided. A substrate is disposed within a processing chamber configured for thermal processing by directing electromagnetic energy toward a surface of the substrate. An energy blocker is provided to block at least a portion of the energy directed toward the substrate. The blocker prevents damage to the substrate from thermal stresses as the incident energy approaches an edge of the substrate.
摘要翻译：提供了一种用于热处理衬底的方法和装置。衬底被布置在处理室内，其被配置用于通过将电磁能量引导到衬底的表面来进行热处理。提供能量阻挡器以阻挡朝向衬底的能量的至少一部分。当入射能量接近衬底的边缘时，阻挡剂防止由于热应力而损坏衬底。

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