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1. 发明申请

WO2017005290A1 CARRIER FOR SUPPORTING AT LEAST ONE SUBSTRATE DURING A SPUTTER DEPOSITION PROCESS, APPARATUS FOR SPUTTER DEPOSITION ON AT LEAST ONE SUBSTRATE, AND METHOD FOR SPUTTER DEPOSITION ON AT LEAST ONE SUBSTRATE 审中-公开
标题翻译：用于在溅射沉积过程中支持至少一个基底的载体，用于至少一个基底上的溅射沉积的装置，以及用于至少一个基板上的溅射沉积的方法
公开(公告)号：WO2017005290A1
公开(公告)日：2017-01-12
申请号：PCT/EP2015/065366
申请日：2015-07-06
申请人： APPLIED MATERIALS, INC. , KELLER, Stefan , BRÜNING, Andre , SCHÜSSLER, Uwe , ZILBAUER, Thomas Werner , BANGERT, Stefan
发明人： KELLER, Stefan , BRÜNING, Andre , SCHÜSSLER, Uwe , ZILBAUER, Thomas Werner , BANGERT, Stefan
IPC分类号： C23C14/50 , C23C14/56 , H01J37/32 , C23C14/34
CPC分类号： C23C14/50 , C23C14/34 , C23C14/562 , C23C14/564 , H01J37/32715 , H01J37/34 , H01M10/052 , H01M10/0562
摘要： A carrier (100) for supporting at least one substrate during a sputter deposition process is provided. The carrier (100) includes a carrier body (102) and an insulating portion provided at the carrier body (102). The insulating portion provides a surface (103) of an electrically insulating material, wherein the surface (103) is configured to face one or more sputter deposition sources during the sputter deposition process.
摘要翻译：提供了一种用于在溅射沉积工艺期间支撑至少一个基板的载体（100）。载体（100）包括载体（102）和设置在载体（102）上的绝缘部分。绝缘部分提供电绝缘材料的表面（103），其中表面（103）构造成在溅射沉积过程期间面向一个或多个溅射沉积源。

2. 发明申请

WO2017005290A8 CARRIER FOR SUPPORTING AT LEAST ONE SUBSTRATE DURING A SPUTTER DEPOSITION PROCESS, APPARATUS FOR SPUTTER DEPOSITION ON AT LEAST ONE SUBSTRATE, AND METHOD FOR SPUTTER DEPOSITION ON AT LEAST ONE SUBSTRATE 审中-公开
标题翻译：用于在至少一个基板上支撑至少一个基板的载体，用于至少一个基板上的溅射沉积的设备以及用于在至少一个基板上溅射沉积的方法
公开(公告)号：WO2017005290A8
公开(公告)日：2017-01-12
申请号：PCT/EP2015/065366
申请日：2015-07-06
申请人： APPLIED MATERIALS, INC. , KELLER, Stefan , BRÜNING, Andre , SCHÜßLER, Uwe , ZILBAUER, Thomas Werner , BANGERT, Stefan
发明人： KELLER, Stefan , BRÜNING, Andre , SCHÜßLER, Uwe , ZILBAUER, Thomas Werner , BANGERT, Stefan
IPC分类号： C23C14/50 , C23C14/56 , H01J37/32 , C23C14/34
摘要： A carrier (100) for supporting at least one substrate during a sputter deposition process is provided. The carrier (100) includes a carrier body (102) and an insulating portion provided at the carrier body (102). The insulating portion provides a surface (103) of an electrically insulating material, wherein the surface (103) is configured to face one or more sputter deposition sources during the sputter deposition process.
摘要翻译：提供了用于在溅射沉积过程期间支撑至少一个衬底的载体（100）。载体（100）包括载体主体（102）和设置在载体主体（102）处的绝缘部分。绝缘部分提供电绝缘材料的表面（103），其中表面（103）被配置为在溅射沉积工艺期间面向一个或多个溅射沉积源。

3. 发明申请

WO2015067298A1 RADIO FREQUENCY (RF) - SPUTTER DEPOSITION SOURCE, DEPOSITION APPARATUS AND METHOD OF ASSEMBLING THEREOF 审中-公开
标题翻译：无线射频（RF） - 溅射沉积源，沉积装置及其组装方法
公开(公告)号：WO2015067298A1
公开(公告)日：2015-05-14
申请号：PCT/EP2013/073038
申请日：2013-11-05
申请人： APPLIED MATERIALS, INC. , KELLER, Stefan , SCHÜSSLER, Uwe , HAAS, Dieter , BANGERT, Stefan
发明人： KELLER, Stefan , SCHÜSSLER, Uwe , HAAS, Dieter , BANGERT, Stefan
IPC分类号： H01J37/32 , H01J37/34
CPC分类号： H01J37/3408 , C23C14/35 , H01J37/32183 , H01J37/32577 , H01J37/3444 , H01J37/3455
摘要： A sputter deposition source for sputter deposition in a vacuum chamber is described. The source includes a wall portion of the vacuum chamber; a target providing a material to be deposited during the sputter deposition; an RF power supply for providing RF power to the target; a power connector for connecting the target with the RF power supply; and a conductor rod extending through the wall portion from inside of the vacuum chamber to outside of the vacuum chamber, wherein the conductor rod is connected to one or more components inside of the vacuum chamber and wherein the conductor rod is connected to the RF power supply outside of the vacuum chamber to generate a defined RF return path through the conductor rod.
摘要翻译：描述了用于在真空室中溅射沉积的溅射沉积源。源包括真空室的壁部分; 在溅射沉积期间提供要沉积的材料的靶; 用于向目标提供RF功率的RF电源; 用于将目标与RF电源连接的电源连接器; 以及导体杆，其通过所述壁部从所述真空室的内部延伸到所述真空室的外部，其中所述导体杆连接到所述真空室内的一个或多个部件，并且其中所述导体杆连接到所述RF电源在真空室外部，以产生通过导体棒的限定的RF返回路径。

4. 发明申请

WO2014096302A1 EVAPORATOR, DEPOSITION ARRANGEMENT, DEPOSITION APPARATUS AND METHODS OF OPERATION THEREOF 审中-公开
标题翻译：蒸发器，沉积装置，沉积装置及其操作方法
公开(公告)号：WO2014096302A1
公开(公告)日：2014-06-26
申请号：PCT/EP2013/077569
申请日：2013-12-20
申请人： APPLIED MATERIALS, INC. , KELLER, Stefan , SCHÜSSLER, Uwe , DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , KWAK BYUNG-SUNG, Leo
发明人： KELLER, Stefan , SCHÜSSLER, Uwe , DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , KWAK BYUNG-SUNG, Leo
IPC分类号： C23C14/24
CPC分类号： C23C16/4485 , C23C14/246 , C23C16/06 , C23C16/45519 , C23C16/45561 , C23C16/45565 , C23C16/4557 , C23C16/52
摘要： A depositing arrangement for evaporation of a material including an alkali metal or alkaline earth metal, and for deposition of the material on a substrate (4) is described. The arrangement a first chamber (110) configured for liquefying the material, a valve (130) being in fluid communication with the first chamber, and being downstream of the first chamber, wherein the valve is configured for control of the flow rate of the liquefied material through the valve, an evaporation zone (114) being in fluid communication with the valve, and being downstream of the valve, wherein the evaporation zone is configured for vaporizing the liquefied material, and one or more outlets (116) for directing the vaporized material towards the substrate.
摘要翻译：描述了用于蒸发包括碱金属或碱土金属的材料并用于将材料沉积在基板（4）上的沉积布置。该装置构造成用于液化材料的第一室（110），与第一室流体连通并且位于第一室的下游的阀（130），其中阀构造成用于控制液化的流速材料通过阀，蒸发区（114）与阀流体连通并且位于阀的下游，其中蒸发区被配置为蒸发液化材料，以及一个或多个出口（116），用于引导蒸发的材料朝向基板。

5. 发明申请

WO2018108266A1 DEPOSITION SYSTEM 审中-公开
公开(公告)号：WO2018108266A1
公开(公告)日：2018-06-21
申请号：PCT/EP2016/081027
申请日：2016-12-14
申请人： APPLIED MATERIALS, INC. , HAAS, Dieter , SCHÜSSLER, Uwe , DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan
发明人： HAAS, Dieter , SCHÜSSLER, Uwe , DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan
IPC分类号： C23C14/24 , C23C14/50 , C23C14/56 , C23C14/04 , C03C17/02
摘要： According to the present disclosure, a processing system (100) for depositing one or more layers on a substrate supported by a carrier is provided. The processing system includes: a load lock chamber (110) for loading a substrate; a routing module (410) for transporting the substrate; a first vacuum swing module (131); and a process module (510) including a deposition source for depositing material; a service module (610); an unload lock chamber (116) for unloading the substrate; a further routing module (412); a mask carrier magazine (320) configured for storing and transporting masks employed during operation of the processing system; a further vacuum swing module (132); and a transportation system (710) configured for transporting the carrier between the first vacuum swing module (131) and the further vacuum swing module (132).

6. 发明申请

WO2015139776A1 EVAPORATION SOURCE FOR ORGANIC MATERIAL 审中-公开
标题翻译：有机材料蒸发源
公开(公告)号：WO2015139776A1
公开(公告)日：2015-09-24
申请号：PCT/EP2014/055741
申请日：2014-03-21
申请人： APPLIED MATERIALS, INC. , BANGERT, Stefan , DIEGUEZ-CAMPO, Jose Manuel , SCHÜSSLER, Uwe , LOPP, Andreas
发明人： BANGERT, Stefan , DIEGUEZ-CAMPO, Jose Manuel , SCHÜSSLER, Uwe , LOPP, Andreas
IPC分类号： C23C14/24 , C23C14/04
CPC分类号： H01L51/56 , C23C14/042 , C23C14/243 , C23C14/26 , H01L51/001 , H01L51/0011 , H01L51/0012
摘要： An evaporation source for organic material is described. The evaporation source includes an evaporation crucible, wherein the evaporation crucible is configured to evaporate the organic material, a distribution pipe with one or more outlets provided along the length of the distribution pipe, wherein the distribution pipe is in fluid communication with the evaporation crucible, and wherein the distribution pipe has a cross-section perpendicular to the length of the distribution pipe, which is non-circular, and which includes: an outlet side at which the one or more outlets are provided, wherein the width of the outlet side of the cross-section is 30% or less of the maximum dimension of the cross-section.
摘要翻译：描述了有机材料的蒸发源。蒸发源包括蒸发坩埚，其中蒸发坩埚被配置为蒸发有机材料，分配管具有沿着分配管的长度设置的一个或多个出口，其中分配管与蒸发坩埚流体连通，并且其中所述分配管具有垂直于所述分配管的长度的横截面，所述分布管是非圆形的，并且包括：设置所述一个或多个出口的出口侧，其中出口侧的宽度横截面为横截面最大尺寸的30％以下。

7. 发明申请

WO2018077388A1 MEASUREMENT ASSEMBLY FOR MEASURING A DEPOSITION RATE, EVAPORATION SOURCE, DEPOSITION APPARATUS, AND METHOD THEREFOR 审中-公开
标题翻译：用于测量沉积速率的测量组件，蒸发源，沉积装置及其方法
公开(公告)号：WO2018077388A1
公开(公告)日：2018-05-03
申请号：PCT/EP2016/075681
申请日：2016-10-25
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , SCHÜSSLER, Uwe , LANDGRAF, Heike , LOPP, Andreas , STAAF, Hans
发明人： DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , SCHÜSSLER, Uwe , LANDGRAF, Heike , LOPP, Andreas , STAAF, Hans
IPC分类号： C23C14/04 , C23C14/12 , C23C14/24 , C23C14/54 , G01B7/06
CPC分类号： C23C14/546 , C23C14/042 , C23C14/12 , C23C14/24
摘要： A measurement assembly (100) for measuring a deposition rate of an evaporated material is described. The measurement assembly (100) includes: a first oscillation crystal (110) for measuring the deposition rate; a second oscillation crystal (120) for measuring the deposition rate; and a movable shutter (140). The movable shutter (140) is configured for blocking the evaporated material provided from a first measurement outlet (151), the first measurement outlet directed for providing evaporated material to the first oscillation crystal (110). Further, the movable shutter (140) is configured for blocking the evaporated material provided from a second measurement outlet (152), the second measurement outlet directed for providing evaporated material to the second oscillation crystal (120).
摘要翻译：描述用于测量蒸发材料的沉积速率的测量组件（100）。测量组件（100）包括：用于测量沉积速率的第一振荡晶体（110）第二振荡晶体（120），用于测量沉积速率; 和可动快门（140）。可移动遮光器（140）被配置用于阻挡从第一测量出口（151）提供的蒸发材料，第一测量出口指向用于将蒸发材料提供给第一振荡晶体（110）。此外，可动快门（140）被配置用于阻挡从第二测量出口（152）提供的蒸发材料，第二测量出口指向用于向第二振荡晶体（120）提供蒸发材料。

8. 发明申请

WO2017050349A1 MEASUREMENT ASSEMBLY FOR MEASURING A DEPOSITION RATE AND METHOD THEREFORE 审中-公开
标题翻译：用于测量沉积速率的测量装置及其方法
公开(公告)号：WO2017050349A1
公开(公告)日：2017-03-30
申请号：PCT/EP2015/071608
申请日：2015-09-21
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , LOPP, Andreas , SCHÜSSLER, Uwe , BANGERT, Stefan
发明人： DIEGUEZ-CAMPO, Jose Manuel , LOPP, Andreas , SCHÜSSLER, Uwe , BANGERT, Stefan
IPC分类号： G01N29/02 , C23C14/54 , G01N29/24 , H01L41/113
CPC分类号： C23C14/546 , C23C14/24 , G01N29/022 , G01N29/2443 , G01N2291/0256
摘要： A measurement assembly (100) for measuring a deposition rate of an evaporated material is described. The measurement assembly (100) includes an oscillation crystal (110) for measuring the deposition rate, a measurement outlet (150) for providing evaporated material to the oscillation crystal (110), and a magnetic closing mechanism (160) configured for opening and closing the measurement outlet (150) by magnetic force.
摘要翻译：描述了用于测量蒸发材料的沉积速率的测量组件（100）。测量组件（100）包括用于测量沉积速率的振荡晶体（110），用于向振荡晶体（110）提供蒸发材料的测量出口（150）以及用于打开和关闭的磁性关闭机构（160）测量出口（150）通过磁力。

9. 发明申请

WO2016070943A1 MATERIAL SOURCE ARRANGMENT AND MATERIAL DISTRIBUTION ARRANGEMENT FOR VACUUM DEPOSITION 审中-公开
标题翻译：真空沉积物的材料来源安排和材料分配布置
公开(公告)号：WO2016070943A1
公开(公告)日：2016-05-12
申请号：PCT/EP2014/074090
申请日：2014-11-07
申请人： APPLIED MATERIALS, INC. , BANGERT, Stefan , SCHÜSSLER, Uwe , LOPP, Andreas , DIEGUEZ-CAMPO, Jose Manuel
发明人： BANGERT, Stefan , SCHÜSSLER, Uwe , LOPP, Andreas , DIEGUEZ-CAMPO, Jose Manuel
IPC分类号： H01L51/00 , C23C14/12 , C23C14/24 , C23C16/455
CPC分类号： C23C14/12 , C23C14/042 , C23C14/24 , H01L51/001
摘要： A linear distribution pipe (106) for depositing evaporated material on a substrate (121) in a vacuum chamber (110) is described. The distribution pipe (106) includes a distribution pipe housing (116) extending along a first direction (136), wherein the first direction provides the linear extension of the linear distribution pipe, and wherein the distribution pipe housing comprises a first housing material. The distribution pipe (106) further includes a plurality of openings in the distribution pipe housing (116), wherein the plurality of openings is distributed along the linear extension of the linear distribution pipe. Further, the distribution pipe housing (116) includes a plurality of nozzles (712) for the linear distribution pipe (106), wherein the plurality of nozzles (712) is configured for guiding the evaporated material in the vacuum chamber (110). The nozzles (712) include a first nozzle material having a thermal conductivity larger than the first housing material and/or larger than 21 W/mK.
摘要翻译：描述了用于在真空室（110）中的衬底（121）上沉积蒸发材料的线性分布管（106）。分配管（106）包括沿着第一方向（136）延伸的分配管壳（116），其中第一方向提供线性分配管的线性延伸，并且其中分配管壳体包括第一壳体材料。分配管（106）还包括在分配管壳体（116）中的多个开口，其中多个开口沿着线性分配管的线性延伸部分布。此外，分配管壳体116包括用于线性分配管106的多个喷嘴712，其中多个喷嘴构造成用于引导真空室110内的蒸发材料。喷嘴（712）包括热导率大于第一壳体材料的第一喷嘴材料和/或大于21W / mK。

10. 发明申请

WO2015139777A1 EVAPORATION SOURCE FOR ORGANIC MATERIAL 审中-公开
标题翻译：有机材料蒸发源
公开(公告)号：WO2015139777A1
公开(公告)日：2015-09-24
申请号：PCT/EP2014/055744
申请日：2014-03-21
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose, Manuel , BANGERT, Stefan , LOPP, Andreas , SCHÜSSLER, Uwe
发明人： DIEGUEZ-CAMPO, Jose, Manuel , BANGERT, Stefan , LOPP, Andreas , SCHÜSSLER, Uwe
IPC分类号： C23C14/24 , C23C14/04 , C23C14/56
CPC分类号： C23C14/243 , C23C14/042 , C23C14/56 , H01L51/001 , H01L51/0011 , H01L51/56
摘要： An evaporation source array for depositing two or more organic materials on a substrate is described. The evaporation source array includes two or more evaporation crucibles, wherein the two or more evaporation crucibles are configured to evaporate the two or more organic materials, two or more distribution pipes with outlets provided along the length of the two or more distribution pipes, wherein a first distribution pipe of the two or more distribution pipes is in fluid communication with a first evaporation crucible of the two or more evaporation crucibles, two or more heat shields, which surround the first distribution pipe, a cooling shield arrangement provided at at least one side of the two or more distribution pipes, wherein the at least one side is the side at which the outlets are provided, and a cooling element provided at or in the cooling shield arrangement for active cooling of the cooling shield arrangement.
摘要翻译：描述了用于在衬底上沉积两种或更多种有机材料的蒸发源阵列。蒸发源阵列包括两个或更多个蒸发坩埚，其中两个或更多个蒸发坩埚被配置为蒸发两个或更多个有机材料，两个或更多个分配管，其具有沿着两个或更多个分配管的长度设置的出口，其中两个或更多个分配管的第一分配管与两个或更多个蒸发坩埚的第一蒸发坩埚，围绕第一分配管的两个或更多个隔热罩流体连通，设置在至少一个侧面上的冷却屏蔽装置的两个或更多个分配管，其中所述至少一个侧面是设置所述出口的一侧，以及设置在所述冷却屏蔽装置中或所述冷却屏蔽装置中的用于主动冷却所述冷却屏蔽装置的冷却元件。

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