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1. 发明申请

US20040016637A1 Multi-chemistry plating system 失效
标题翻译：多化学电镀系统
公开(公告)号：US20040016637A1
公开(公告)日：2004-01-29
申请号：US10616284
申请日：2003-07-08
申请人： APPLIED MATERIALS, INC.
发明人： Michael X. Yang , Ming Xi , Russell C. Ellwanger , Eric B. Britcher , Bernardo Donoso , Lily L. Pang , Svetlana Sherman , Henry Ho , Anh N. Nguyen , Alexander N. Lerner , Allen L. D'Ambra , Arulkumar Shanmugasundram , Tetsuya Ishikawa , Yevgeniy Rabinovich , Dmitry Lubomirsky , Yeuk-Fai Edwin Mok , Son T. Nguyen
IPC分类号： C25D017/00
CPC分类号： H01L21/6719 , A23D7/00 , A23D7/005 , A23D7/01 , A23J7/00 , B08B3/02 , C25D7/123 , C25D17/001 , C25D17/002 , C25D17/02 , C25D21/02 , C25D21/08 , H01L21/67028 , H01L21/67034 , H01L21/67051 , H01L21/67109 , H01L21/6715 , H01L21/67196 , H01L21/6723 , H01L21/68 , H01L21/6838 , H01L21/68707
摘要： Embodiments of the invention generally provide an electrochemical plating system. The plating system includes a substrate loading station positioned in communication with a mainframe processing platform, at least one substrate plating cell positioned on the mainframe, at least one substrate bevel cleaning cell positioned on the mainframe, and a stacked substrate annealing station positioned in communication with at least one of the mainframe and the loading station, each chamber in the stacked substrate annealing station having a heating plate, a cooling plate, and a substrate transfer robot therein.
摘要翻译：本发明的实施方案通常提供电化学电镀系统。电镀系统包括位于与主机处理平台连通的基板装载站，位于主机上的至少一个基板镀覆单元，位于主机上的至少一个基板斜面清洁单元，以及与主机和加载站中的至少一个，层叠基板退火站中的每个室具有加热板，冷却板和基板传送机器人。

2. 发明申请

US20040206373A1 Spin rinse dry cell 审中-公开
标题翻译：旋转冲洗干细胞
公开(公告)号：US20040206373A1
公开(公告)日：2004-10-21
申请号：US10680616
申请日：2003-10-06
申请人： Applied Materials, Inc.
发明人： Bernardo Donoso , Tetsuya Ishikawa , Lily L. Pang , Svetlana Sherman
IPC分类号： B08B003/02
CPC分类号： H01L21/67051 , B08B3/02 , C25D21/08 , H01L21/67028 , H01L21/67034
摘要： Embodiments of the invention generally provide a substrate spin rinse dry cell that may be used in a semiconductor processing system. The cell generally includes a cell body defining an interior processing volume, and a rotatable substrate support member positioned in the processing volume. The rotatable substrate support member includes a rotatable hub assembly having a plurality of upstanding substrate engaging members extending therefrom, and a central member positioned radially inward of the plurality of upstanding substrate engaging members, the central member having a plurality of backside fluid dispensing nozzles and at least one backside gas dispensing nozzle positioned thereon. The cell further includes at least one frontside fluid dispensing nozzle positioned to dispense a rinsing fluid onto an upper surface of a substrate supported by the substrate support member, and at least one frontside gas dispensing nozzle positioned to dispense a drying gas into the processing volume, the drying gas being directed toward the upper substrate surface.
摘要翻译：本发明的实施方案通常提供可用于半导体处理系统的底物旋转漂洗干细胞。电池通常包括限定内部处理容积的电池体和位于处理容积中的可旋转衬底支撑构件。可旋转的基板支撑构件包括可旋转的毂组件，其具有从其延伸的多个直立的基板接合构件和位于多个直立的基板接合构件的径向内侧的中心构件，中心构件具有多个后侧流体分配喷嘴位于其上的至少一个后侧气体分配喷嘴。细胞还包括至少一个前侧流体分配喷嘴，其定位成将冲洗流体分配到由基板支撑构件支撑的基板的上表面上，以及至少一个前侧气体分配喷嘴，其定位成将干燥气体分配到处理体积中，干燥气体被引向上基板表面。

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