专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2022256221A1 ASYMMETRY CORRECTION VIA VARIABLE RELATIVE VELOCITY OF A WAFER 审中-公开
公开(公告)号：WO2022256221A1
公开(公告)日：2022-12-08
申请号：PCT/US2022/031093
申请日：2022-05-26
申请人： APPLIED MATERIALS, INC.
发明人： ZHANG, Jimin , BROWN, Brian J. , LAU, Eric , MIKHAYLICHENKO, Ekaterina , OH, Jeonghoon , ALONZO, Gerald J.
IPC分类号： B24B37/04 , B24B37/10 , B24B37/28 , H01L21/67
摘要： Certain aspects of the present disclosure provide techniques for a method of removing material on a substrate. An exemplary method includes rotating a substrate about a first axis in a first direction and urging a surface of the substrate against a polishing surface of a polishing pad while rotating the substrate, wherein rotating the substrate about the first axis includes rotating the substrate a first angle at a first rotation rate, and then rotating the substrate a second angle at a second rotation rate, and the first rotation rate is different from the second rotation rate.

2. 发明申请

WO2022250879A1 METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE USING IMPROVED SHIELD CONFIGURATIONS 审中-公开
公开(公告)号：WO2022250879A1
公开(公告)日：2022-12-01
申请号：PCT/US2022/027222
申请日：2022-05-02
申请人： APPLIED MATERIALS, INC.
发明人： JEMBULINGAM, Soundarrajan , CHEN, Jian, Janson , OH, Jeonghoon
IPC分类号： C23C14/56 , C23C14/34 , H01J37/34
摘要： Methods and apparatus for processing a substrate using improved shield configurations are provided herein. For example, a process kit for use in a physical vapor deposition chamber comprises a shield comprising an inner wall comprising an upper portion having a first wavy fin configuration and a bottom portion having a second wavy fin configuration different from the first wavy fin configuration such that a surface area of the shield is about 1400 in2 to about 1410 in2.

3. 发明申请

WO2015164149A1 RETAINING RING HAVING INNER SURFACES WITH FACETS 审中-公开
标题翻译：具有表面的内表面的保持环
公开(公告)号：WO2015164149A1
公开(公告)日：2015-10-29
申请号：PCT/US2015/026004
申请日：2015-04-15
申请人： APPLIED MATERIALS, INC.
发明人： OH, Jeonghoon , ZUNIGA, Steven M. , NAGENGAST, Andrew J. , HSU, Samuel Chu-Chiang , DANDAVATE, Gautam Shashank
IPC分类号： H01L21/304
CPC分类号： H01L21/3212 , B24B37/04 , B24B37/32 , B24B41/06
摘要： A retaining ring comprises a generally annular body. The body comprises a top surface, a bottom surface, an outer surface connected to the top surface at an outer top perimeter and the bottom surface at an outer bottom perimeter, and an inner surface connected to the top surface at an inner top perimeter and the bottom surface at an inner bottom perimeter. The inner surface comprises seven or more planar facets. Adjacent planar facets are connected at corners. The inner bottom perimeter comprises straight edges of the planar facets connected at the corners.
摘要翻译：保持环包括大致环形体。主体包括顶表面，底表面，外表面和外表面，外表面在外顶部周边处连接到顶表面，底表面连接到外底边周边，内表面在内顶部周边连接到顶表面，底部表面处于内底部周边。内表面包括七个或更多个平面。相邻的平面小平面连接在角落处。内底部周边包括连接在拐角处的平面的平直边缘。

4. 发明申请

WO2015051134A1 COATED RETAINING RING 审中-公开
标题翻译：涂层保持环
公开(公告)号：WO2015051134A1
公开(公告)日：2015-04-09
申请号：PCT/US2014/058849
申请日：2014-10-02
申请人： APPLIED MATERIALS, INC.
发明人： MARTIN, Daniel L. , OH, Jeonghoon , YAVELBERG, Simon
IPC分类号： H01L21/304 , B24B37/04
CPC分类号： B24B37/32 , B05D1/08 , B05D1/60 , B05D7/52 , C09D127/18 , C09D165/04
摘要： A retaining ring for a polishing system is disclosed. The retaining ring has a process-resistant coating over a portion thereof. The process-resistant coating is a thin, smooth, conformal layer that is resistant to wear and chemical attack. The process-resistant coating is formed by a method that includes vapor deposition from a precursor gas mixture, which may deposit polyparaxyxylene from a gas mixture comprising paracyclophane. Adhesion of the process-resistant coating to the retaining ring may be enhanced by treating the surface of the ring prior to forming the coating. Resistance of the coating to the process may be further enhanced by treating the surface of the coating with an etching or deposition gas to impart texture.
摘要翻译：公开了一种用于抛光系统的保持环。保持环在其一部分上具有耐加工涂层。耐加工涂层是一种薄而光滑的共形层，耐磨损和化学侵蚀。耐加工涂层通过包括从前体气体混合物的气相沉积的方法形成，前体气体混合物可以从包含对环磷烷的气体混合物中沉积聚对二甲苯。可以通过在形成涂层之前处理环的表面来增强耐保护涂层对保持环的粘合性。通过用蚀刻或沉积气体处理涂层的表面以赋予纹理，可以进一步提高涂层对该方法的电阻。

5. 发明申请

WO2015009605A1 CHEMICAL MECHANICAL POLISHING RETAINING RING METHODS AND APPARATUS 审中-公开
标题翻译：化学机械抛光保持环方法和装置
公开(公告)号：WO2015009605A1
公开(公告)日：2015-01-22
申请号：PCT/US2014/046479
申请日：2014-07-14
申请人： APPLIED MATERIALS, INC
发明人： HSU, Samuel , OH, Jeonghoon , DANDAVATE, Gautam , CHEN, Hung
IPC分类号： B24B37/04 , B24B41/06
CPC分类号： B24B37/32
摘要： A chemical mechanical polishing (CMP) system includes a substrate held in a substrate holder having a substrate retaining ring, the substrate having a peripheral edge supported by the substrate retaining ring, the retaining ring including a polymer ring having a polymer contact portion in contact with at least a portion of the peripheral edge, wherein the polymer contact portion has a hardness that is greater than a remaining portion of the polymer ring. CMP methods and retaining ring apparatus for CMP are provided, as are numerous other aspects.
摘要翻译：化学机械抛光（CMP）系统包括保持在具有基板保持环的基板保持器中的基板，所述基板具有由基板保持环支撑的周边边缘，保持环包括聚合物环，聚合物环具有与所述外围边缘的至少一部分，其中所述聚合物接触部分具有大于所述聚合物环的剩余部分的硬度。提供了用于CMP的CMP方法和保持环装置，以及许多其它方面。

8. 发明公开

EP2926365A1 THREE-ZONE CARRIER HEAD AND FLEXIBLE MEMBRANE 有权
标题翻译：三个区支撑头部和柔性薄膜
公开(公告)号：EP2926365A1
公开(公告)日：2015-10-07
申请号：EP13858763.9
申请日：2013-11-21
申请人： Applied Materials, Inc.
发明人： OH, Jeonghoon , LEIGHTON, Jamie
IPC分类号： H01L21/302
CPC分类号： B24B37/27 , B24B37/30
摘要： A flexible membrane for a carrier head of a chemical mechanical polisher includes a main portion, an annular outer portion, and three annular flaps. The main portion has a substrate mounting surface with a radius R. The annular outer portion extends upwardly from an outer edge of the main portion and has a lower edge connected to the main portion and an upper edge. The three annular flaps include a first annular flap joined to an inner surface of the main portion at a radial position between 75% and 95% of R, a second inwardly-extending annular flap joined to the annular outer portion at a position between the lower edge and the upper edge, and a third inwardly-extending annular flap joined to the upper edge of the annular outer portion.

9. 发明授权

EP3134915B1 RETAINING RING HAVING INNER SURFACES WITH FACETS 有权
公开(公告)号：EP3134915B1
公开(公告)日：2020-12-09
申请号：EP15783681.8
申请日：2015-04-15
申请人： Applied Materials, Inc.
发明人： OH, Jeonghoon , ZUNIGA, Steven M. , NAGENGAST, Andrew J. , HSU, Samuel Chu-Chiang , DANDAVATE, Gautam Shashank
IPC分类号： B24B37/32 , B24B37/04 , B24B41/06 , B24B37/10

10. 发明公开

EP3105778A1 GAS COOLED SUBSTRATE SUPPORT FOR STABILIZED HIGH TEMPERATURE DEPOSITION 有权
标题翻译： GASGEKÜHLTESUBSTRATTRÄGERFÜRSTABILISIERTE HOCHTEMPERATURABSCHEIDUNG
公开(公告)号：EP3105778A1
公开(公告)日：2016-12-21
申请号：EP15748638.2
申请日：2015-01-13
申请人： Applied Materials, Inc.
发明人： WEST, Brian , COX, Michael S. , OH, Jeonghoon
IPC分类号： H01L21/203 , H01L21/683 , H01L21/02
CPC分类号： C23C14/541 , C23C14/50 , C23C16/4586 , H01J37/3244 , H01J37/32715 , H01J37/32724 , H01L21/67109 , H01L23/34
摘要： Embodiments of the present disclosure provides apparatus and method for stabilizing substrate temperature by flowing a flow of cooling gas to an inlet of cooling channels in a substrate support, receiving the flow of cooling gas from an outlet of the cooling channel using a heat exchanger, and releasing the cooling gas to an immediate environment, such as a cleanroom or a minienvironment.
摘要翻译：本公开的实施例提供了用于通过将冷却气流流向衬底支撑件中的冷却通道的入口来稳定衬底温度的装置和方法，使用热交换器从冷却通道的出口接收冷却气体流;以及将冷却气体释放到直接的环境中，例如洁净室或微小环境。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式