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1. 发明申请

WO2020264314A1 METHOD FOR SUBSTRATE REGISTRATION AND ANCHORING IN INKJET PRINTING 审中-公开
公开(公告)号：WO2020264314A1
公开(公告)日：2020-12-30
申请号：PCT/US2020/039850
申请日：2020-06-26
申请人： APPLIED MATERIALS, INC.
发明人： ZHANG, Daihua , NG, Hou, T. , PATIBANDLA, Nag, B. , GANAPATHIAPPAN, Sivapackia , LUO, Yingdong , CHO, Kyuil , CHEN, Han-Wen
IPC分类号： H01L21/56 , H01L21/68 , H01L21/67 , B41J11/42 , B41M5/00
摘要： A method for printing on a substrate includes printing a support structure by printing a liquid precursor material and curing the liquid precursor material, printing one or more alignment markers by printing the liquid precursor material outside the support structure and curing the liquid precursor material, positioning a substrate within the support structure, performing a registration of the substrate using the one or more alignment markers, and printing one or more device structures on the substrate while registered by printing and curing the liquid precursor material.

2. 发明申请

WO2020236551A1 IN-SITU CURING OF COLOR CONVERSION LAYER IN RECESS 审中-公开
公开(公告)号：WO2020236551A1
公开(公告)日：2020-11-26
申请号：PCT/US2020/033054
申请日：2020-05-15
申请人： APPLIED MATERIALS, INC.
发明人： ZHANG, Daihua , LUO, Yingdong , ZHU, Mingwei , NG, Hou T. , GANAPATHIAPPAN, Sivapackia , PATIBANDLA, Nag B.
IPC分类号： H01L27/15 , H01L33/00 , H01L27/12 , H01L33/50
摘要： A method of fabricating a multi-color display includes dispensing a photocurable fluid over a display having an array of LEDs disposed below a cover layer. The cover has an outer surface with a plurality of recesses, and the photo-curable fluid fills the recesses. The photo-curable fluid includes a color conversion agent. A plurality of LEDs in the array are activated to illuminate and cure the photo-curable fluid to form a color conversion layer in the recesses over the activated LEDs. This layer will convert light from these LEDs to light of a first color. An uncured remainder of the photo-curable fluid is removed. Then the process is repeated with a different photo-curable fluid having a different color conversion agent and a different plurality of LEDs. This forms a second color conversion layer in different plurality of recesses to convert light from these LEDs to light of a second color.

3. 发明申请

WO2020153979A1 POLISHING PADS FORMED USING AN ADDITIVE MANUFACTURING PROCESS AND METHODS RELATED THERETO 审中-公开
公开(公告)号：WO2020153979A1
公开(公告)日：2020-07-30
申请号：PCT/US2019/024999
申请日：2019-03-29
申请人： APPLIED MATERIALS, INC.
发明人： CHOCKALINGAM, Ashwin , FUNG, Jason G. , GANAPATHIAPPAN, Sivapackia , BAJAJ, Rajeev , REDFIELD, Daniel
IPC分类号： B24D3/28 , B24D3/34
摘要： Embodiments of the present disclosure generally relate to polishing pads, and methods for manufacturing polishing pads, which may be used in a chemical mechanical polishing (CMP) process in the manufacture of semiconductor devices. The polishing pads described herein feature a continuous polymer phase of polishing pad material comprising one or more first material domains and a plurality of second material domains. The one or more first material domains are formed of a polymerized reaction product of a first pre-polymer composition, the plurality of second material domains are formed of a polymerized reaction product of a second pre-polymer composition, the second pre-polymer composition is different from the first pre-polymer composition, and interfacial regions between the one or more first material domains and the plurality of second material are formed of a co-polymerized reaction product of the first pre-polymer composition and the second pre-polymer composition.

4. 发明申请

WO2017066077A1 METHOD AND APPARATUS FOR FORMING ADVANCED POLISHING PADS USING AN ADDITIVE MANUFACTURING PROCESS 审中-公开
标题翻译：使用添加剂制造工艺形成先进抛光垫的方法和设备
公开(公告)号：WO2017066077A1
公开(公告)日：2017-04-20
申请号：PCT/US2016/055793
申请日：2016-10-06
申请人： APPLIED MATERIALS, INC.
发明人： GANAPATHIAPPAN, Sivapackia , FU, Boyi , CHOCKALINGAM, Ashwin , REDFIELD, Daniel , BAJAJ, Rajeev , ORILALL, Mahendra C. , NG, Hou T. , FUNG, Jason G. , YAMAMURA, Mayu
IPC分类号： B24D11/00 , B24D3/28 , B24B37/24 , B33Y10/00 , B24B37/26 , B24D11/04 , B24B37/22 , B33Y80/00 , B24D18/00
CPC分类号： B24B37/22 , B24B37/24 , B33Y10/00 , B33Y80/00
摘要： Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, addition polymer precursor compounds, catalysts, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one polymer precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions. Embodiments of the disclosure further provide a polishing pad with polymeric layers that may be interpenetrating polymer networks.
摘要翻译：本公开的实施例涉及具有可调化学，材料和结构特性的高级抛光垫以及制造该抛光垫的新方法。根据本公开的一个或多个实施例，已经发现具有改进性能的抛光垫可以通过诸如三维（3D）印刷工艺的增材制造工艺来生产。本发明的实施例因此可以提供具有离散特征和几何形状的高级抛光垫，其由包括功能聚合物，官能低聚物，反应性稀释剂，加成聚合物前体化合物，催化剂和固化剂的至少两种不同材料形成。例如，高级抛光垫可以由多个聚合物层形成，通过自动顺序沉积至少一种聚合物前体组合物，随后进行至少一个固化步骤，其中每个层可以代表至少一种聚合物组合物和/ 或不同成分的区域。本公开的实施方式进一步提供了具有聚合物层的抛光垫，所述聚合物层可以是互穿聚合物网络。

5. 发明申请

WO2022245404A1 POLISHING PADS HAVING IMPROVED PORE STRUCTURE 审中-公开
公开(公告)号：WO2022245404A1
公开(公告)日：2022-11-24
申请号：PCT/US2022/013292
申请日：2022-01-21
申请人： APPLIED MATERIALS, INC.
发明人： GANAPATHIAPPAN, Sivapackia , SRIDHAR, Uma , LUO, Yingdong , CHOCKALINGAM, Ashwin , YAMAMURA, Mayu , ROZO, Sebastian David , REDFIELD, Daniel , BAJAJ, Rajeev , PATIBANDLA, Nag B. , NG, Hou T. , MADHUSOODHANAN, Sudhakar
IPC分类号： B24D11/00 , B24B37/24
摘要： Embodiments herein generally relate to polishing pads and methods of forming polishing pads. A method of forming a polishing pad includes (a) dispensing droplets of a pre-polymer composition and droplets of a sacrificial material composition onto a surface of a previously formed print layer according to a predetermined droplet dispense pattern. The method includes (b) at least partially curing the dispensed droplets of the pre-polymer composition to form a print layer. The method includes (c) sequentially repeating (a) and (b) to form a polishing layer having a plurality of pore- features formed therein. The pre-polymer composition includes a multifunctional acrylate component. A curing rate of the dispensed droplets of the pre-polymer composition including the multifunctional acrylate component when exposed to a first dose of electromagnetic radiation is greater than a curing rate of the pre-polymer composition without the multifunctional acrylate component when exposed to the same first dose of electromagnetic radiation.

6. 发明申请

WO2022081262A1 HYBRID PRINTING PLATFORM FOR 3D BIOPRINTING OF LIVE ORGANS 审中-公开
公开(公告)号：WO2022081262A1
公开(公告)日：2022-04-21
申请号：PCT/US2021/047567
申请日：2021-08-25
申请人： APPLIED MATERIALS, INC.
发明人： ZHANG, Daihua , SRIDHAR, Uma , NG, Hou T. , GANAPATHIAPPAN, Sivapackia , PATIBANDLA, Nag B.
IPC分类号： B29C64/124 , B29C64/268 , B29C64/245 , B29C64/209 , B33Y10/00 , B33Y30/00 , B33Y80/00 , B33Y70/00 , C12N5/071
摘要： A method of forming a three dimensional object includes dispensing droplets of an electromagnetic energy curable liquid onto a surface to form a plurality of layers of the three dimensional object in liquid form, wherein each droplet forms a layer of liquid on the surface which is larger than a minimum feature size of a structure to be formed by curing the curable liquid, and directing electromagnetic energy capable of curing the liquid and having a beam width intersecting the layer of liquid which is at least as small as the smallest feature of a structure to be formed in the curable liquid.

7. 发明申请

WO2022020350A1 QUANTUM DOT FORMULATIONS WITH THIOL-BASED CROSSLINKERS FOR UV-LED CURING 审中-公开
公开(公告)号：WO2022020350A1
公开(公告)日：2022-01-27
申请号：PCT/US2021/042367
申请日：2021-07-20
申请人： APPLIED MATERIALS, INC.
发明人： LUO, Yingdong , GANAPATHIAPPAN, Sivapackia , ZHANG, Daihua , NG, Hou T. , PATIBANDLA, Nag B.
IPC分类号： C08F20/14 , C08F2/50 , C08F2/44 , C08K5/37 , C08K3/013 , C09K11/08 , H01L33/50
摘要： A photocurable composition includes a nanomaterial selected to emit radiation in a first wavelength band in the visible light range in response to absorption of radiation in a second wavelength band in the UV or visible light range. The second wavelength band is different than the first wavelength band. The photocurable composition further includes one or more (meth)acrylate monomers, a thiol crosslinker, and a photoinitiator that initiates polymerization of the one or more (meth)acrylate monomers in response to absorption of radiation in the second wavelength band. A light-emitting device includes a plurality of light-emitting diodes and the cured photocurable composition in contact with a surface through which radiation in a first wavelength band in the UV or visible light range is emitted from each of the light-emitting diodes.

8. 发明申请

WO2021252540A1 ADDITIVE MANUFACTURING OF POLISHING PADS 审中-公开
公开(公告)号：WO2021252540A1
公开(公告)日：2021-12-16
申请号：PCT/US2021/036482
申请日：2021-06-08
申请人： APPLIED MATERIALS, INC.
发明人： SRIDHAR, Uma , GANAPATHIAPPAN, Sivapackia , CHOCKALINGAM, Ashwin Murugappan , BAJAJ, Rajeev , REDFIELD, Daniel , YAMAMURA, Mayu Felicia , LUO, Yingdong , PATIBANDLA, Nag B.
IPC分类号： B24D18/00 , B24B37/24 , B24D3/04 , B29C64/112 , B29K2063/00 , B29K2075/00 , B29K2995/0046 , B29K2995/0089 , B29L2031/736 , B33Y10/00 , B33Y70/00 , B33Y80/00 , C09D11/101 , C09D11/102 , H01L21/30625
摘要： A polishing pad for a semiconductor fabrication operation includes a polishing region and a window region, wherein both regions are made of an interpenetrating polymer network formed from a free-radically polymerized material and a cationically polymerized material.

9. 发明申请

WO2021150311A1 HIGH REFRACTIVE INDEX IMPRINT COMPOSITIONS AND MATERIALS AND PROCESSES FOR MAKING THE SAME 审中-公开
公开(公告)号：WO2021150311A1
公开(公告)日：2021-07-29
申请号：PCT/US2020/063596
申请日：2020-12-07
申请人： APPLIED MATERIALS, INC.
发明人： JOSHI, Amita , MCMACKIN, Ian Matthew , HOURANI, Rami , LUO, Yingdong , GANAPATHIAPPAN, Sivapackia , GODET, Ludovic
IPC分类号： G03F7/004 , C08F20/10 , C08F2/48 , C08F2/44 , C08L83/04 , C08K3/22 , C08K3/04 , C08K9/10 , G03F9/00 , B29C59/005 , B29C71/02 , B29C71/04 , B82Y10/00 , B82Y40/00 , C01G23/043 , C01G25/02 , C01G33/00 , C01P2004/64 , G03F7/0002
摘要： Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition contains one or more types of nanoparticles, one or more surface ligands, one or more solvents, one or more additives, and one or more acrylates.

10. 发明申请

WO2019217012A1 HYDROPHILIC AND ZETA POTENTIAL TUNABLE CHEMICAL MECHANICAL POLISHING PADS 审中-公开
公开(公告)号：WO2019217012A1
公开(公告)日：2019-11-14
申请号：PCT/US2019/025879
申请日：2019-04-04
申请人： APPLIED MATERIALS, INC.
发明人： GANAPATHIAPPAN, Sivapackia , FU, Boyi , CHOCKALINGAM, Ashwin , VORA, Ankit , REDFIELD, Daniel , BAJAJ, Rajeev , PATIBANDLA, Nag B. , NG, Hou T. , MADHUSOODHANAN, Sudhakar
IPC分类号： B24B37/22 , B24B37/24 , B29C64/112 , B33Y10/00 , B33Y70/00
摘要： In one implementation, a method of forming a porous polishing pad is provided. The method comprises depositing a plurality of composite layers with a 3D printer to reach a target thickness. Depositing the plurality of composite layers comprises dispensing one or more droplets of a curable resin precursor composition onto a support. Depositing the plurality of composite layers further comprises dispensing one or more droplets of a porosity-forming composition onto the support, wherein at least one component of the porosity-forming composition is removable to form the pores in the porous polishing pad.

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