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    • 1. 发明申请
    • METHOD AND APPARATUS FOR FORMING ADVANCED POLISHING PADS USING AN ADDITIVE MANUFACTURING PROCESS
    • 使用添加剂制造工艺形成先进抛光垫的方法和设备
    • WO2017066077A1
    • 2017-04-20
    • PCT/US2016/055793
    • 2016-10-06
    • APPLIED MATERIALS, INC.
    • GANAPATHIAPPAN, SivapackiaFU, BoyiCHOCKALINGAM, AshwinREDFIELD, DanielBAJAJ, RajeevORILALL, Mahendra C.NG, Hou T.FUNG, Jason G.YAMAMURA, Mayu
    • B24D11/00B24D3/28B24B37/24B33Y10/00B24B37/26B24D11/04B24B37/22B33Y80/00B24D18/00
    • B24B37/22B24B37/24B33Y10/00B33Y80/00
    • Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, addition polymer precursor compounds, catalysts, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one polymer precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions. Embodiments of the disclosure further provide a polishing pad with polymeric layers that may be interpenetrating polymer networks.
    • 本公开的实施例涉及具有可调化学,材料和结构特性的高级抛光垫以及制造该抛光垫的新方法。 根据本公开的一个或多个实施例,已经发现具有改进性能的抛光垫可以通过诸如三维(3D)印刷工艺的增材制造工艺来生产。 本发明的实施例因此可以提供具有离散特征和几何形状的高级抛光垫,其由包括功能聚合物,官能低聚物,反应性稀释剂,加成聚合物前体化合物,催化剂和固化剂的至少两种不同材料形成。 例如,高级抛光垫可以由多个聚合物层形成,通过自动顺序沉积至少一种聚合物前体组合物,随后进行至少一个固化步骤,其中每个层可以代表至少一种聚合物组合物和/ 或不同成分的区域。 本公开的实施方式进一步提供了具有聚合物层的抛光垫,所述聚合物层可以是互穿聚合物网络。