专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2011134978A1 ELECTRODE POUR PROCEDE PLASMA DBD 审中-公开
标题翻译：用于DBD等离子体工艺的电极
公开(公告)号：WO2011134978A1
公开(公告)日：2011-11-03
申请号：PCT/EP2011/056621
申请日：2011-04-27
申请人： AGC GLASS EUROPE , TIXHON, Eric , MICHEL, Eric , LECLERCQ, Joseph
发明人： TIXHON, Eric , MICHEL, Eric , LECLERCQ, Joseph
IPC分类号： H01J37/32 , H05H1/24
CPC分类号： H01J37/32724 , H01J37/32348 , H01J37/3255 , H01J61/52 , H05H1/2406 , H05H2001/2412
摘要： U ne électrode plane pour traitement plasma DBD d'une surface comprend une enveloppe métallique (8) portée à haute tension dotée une partie active (2) destinée à être disposée parallèlement à une surface à traiter (27). Cette partie active (2) est recouverte extérieurement d'une plaque de matériau diélectrique (4), à laquelle elle est fixée par une couche polymérique (6). La face interne de la partie active (2) forme avec l'enveloppe métallique (8) un échangeur de chaleur relié à un circuit de refroidissement secondaire (34) dans lequel circule un fluide réfrigérant (10).
摘要翻译：用于DBD等离子体处理表面的平面电极包括升高到高电压的金属壳体（8），并且设置有与待处理表面（27）平行放置的活性部分（2）。该活性部分（2）通过由聚合物层（6）固定的电介质材料片（4）在外部覆盖。活性部分（2）的内表面与金属壳体（8）形成热交换器，其连接到二次冷却回路（34），制冷剂（10）通过该二次冷却回路循环。

2. 发明公开

EP2564412A1 ELECTRODE POUR PROCEDE PLASMA DBD 有权转让
标题翻译： ELEKTRODEFÜREIN DBD-PLASMAVERFAHREN
公开(公告)号：EP2564412A1
公开(公告)日：2013-03-06
申请号：EP11716268.5
申请日：2011-04-27
申请人： AGC Glass Europe
发明人： TIXHON, Eric , MICHEL, Eric , LECLERCQ, Joseph
IPC分类号： H01J37/32 , H05H1/24
CPC分类号： H01J37/32724 , H01J37/32348 , H01J37/3255 , H01J61/52 , H05H1/2406 , H05H2001/2412
摘要： A planar electrode for the DBD plasma treatment of a surface comprises a metal casing (8) raised to a high voltage and provided with an active part (2) intended to be placed in parallel with a surface to be treated (27). This active part (2) is covered on the outside by a sheet (4) of dielectric material to which it is fixed by a polymer layer (6). The internal face of the active part (2) forms with the metal casing (8) a heat exchanger connected to a secondary cooling circuit (34) through which a refrigerant (10) circulates.
摘要翻译：用于DBD等离子体处理表面的平面电极包括升高到高电压的金属外壳（8），并设有与待处理表面（27）平行放置的活性部分（2）。该活性部分（2）通过由聚合物层（6）固定的电介质材料片（4）在外面覆盖。活性部分（2）的内表面与金属壳体（8）形成热交换器，其连接到二次冷却回路（34），制冷剂（10）通过该二次冷却回路循环。

3. 发明公开

EP2321070A1 PROCESS AND INSTALLATION FOR SURFACE PREPARATION BY DIELECTRIC BARRIER DISCHARGE 失效
标题翻译：方法和系统进行表面处理BY阻挡放电
公开(公告)号：EP2321070A1
公开(公告)日：2011-05-18
申请号：EP09797509.8
申请日：2009-07-16
申请人： AGC Glass Europe
发明人： TIXHON, Eric , LECLERCQ, Joseph , MICHEL, Eric
IPC分类号： B08B7/00
CPC分类号： B08B7/0035 , H01J37/32009 , H01J37/32348 , H01J37/32376 , H05H1/2406 , H05H2001/2412
摘要： A process for surface preparation of a substrate (2), which comprises introducing or running a substrate (2) into a reaction chamber (6, 106). A dielectric barrier (14, 114) is placed between electrodes (1, 10, 110). A high-frequency electrical voltage is generated, to generate filamentary plasma (12, 112). Molecules (8, 108) are introduced into the reaction chamber (6, 106). Upon contact with the plasma, they generate active species typical of reacting with the surface of the substrate. An adjustable inductor (L) placed in parallel with the inductor of the installation is employed to reduce the phase shift between the voltage and the current generated and to increase the time during which the current flows in the plasma (12, 112).

4. 发明授权

EP2505041B8 PROCÉDÉ ET DISPOSITIF DE POLARISATION D'UNE ÉLECTRODE DBD 有权转让
标题翻译：方法和装置极化的DBD铅
公开(公告)号：EP2505041B8
公开(公告)日：2014-04-23
申请号：EP10784500.0
申请日：2010-11-23
申请人： AGC Glass Europe
发明人： MICHEL, Eric , TIXHON, Eric , LECLERCQ, Joseph
IPC分类号： H05H1/24
CPC分类号： H01J37/32348 , C23C16/50 , C23C16/507 , C23C16/545 , H05H1/2406 , H05H2001/2412 , H05H2242/1005

5. 发明授权

EP2321070B1 PROCESS AND INSTALLATION FOR SURFACE PREPARATION BY DIELECTRIC BARRIER DISCHARGE 失效
标题翻译：方法和系统进行表面处理BY阻挡放电
公开(公告)号：EP2321070B1
公开(公告)日：2012-11-28
申请号：EP09797509.8
申请日：2009-07-16
申请人： AGC Glass Europe
发明人： TIXHON, Eric , LECLERCQ, Joseph , MICHEL, Eric
IPC分类号： B08B7/00
CPC分类号： B08B7/0035 , H01J37/32009 , H01J37/32348 , H01J37/32376 , H05H1/2406 , H05H2001/2412

6. 发明授权

EP2342167B1 MIROIR 有权
标题翻译：明镜
公开(公告)号：EP2342167B1
公开(公告)日：2012-08-15
申请号：EP09783726.4
申请日：2009-10-05
申请人： AGC Glass Europe
发明人： VENTELON, Lionel , COSIJNS, Bruno , BOULAGER, Pierre , LECLERCQ, Joseph
IPC分类号： C23C18/16 , C03C17/38 , G02B5/08 , C03C17/36
CPC分类号： C03C17/38 , C03C17/3663 , C03C2218/31 , C03C2218/32 , C23C18/165 , C23C18/166 , C23C18/1689 , C23C18/1889 , G02B5/0808
摘要： The invention relates to a process for manufacturing mirrors and to mirrors thus manufactured. The process comprises a step of forming a layer of silver on one surface of a glass substrate, during which said surface is brought into contact with a silvering solution and a painting step during which the silver layer is covered with at least one layer of paint. It is characterized by the fact that it comprises, between the step of forming the silver layer and the painting step, a step of annealing the silver layer at a temperature of at least 200°C.

7. 发明授权

EP2310554B8 PROCESS AND INSTALLATION FOR DEPOSITING FILMS ONTO A SUBSTRATE 失效转让
标题翻译：方法和系统为电影的一个基质添加
公开(公告)号：EP2310554B8
公开(公告)日：2012-04-11
申请号：EP09797507.2
申请日：2009-07-16
申请人： AGC Glass Europe
发明人： TIXHON, Eric , LECLERCQ, Joseph , MICHEL, Eric
IPC分类号： C23C16/509 , C23C16/54 , C03C17/00
CPC分类号： C23C16/52 , C03C17/001 , C03C17/002 , C23C16/509 , C23C16/54 , H01J37/32174 , H01J37/32348 , H01J37/32403 , H01J37/32889
摘要： The process comprises introducing or rolling a substrate in a reaction chamber (6) in which two electrodes (4, 10) are placed, where a dielectric barrier is positioned between the electrodes, generating a high frequency voltage to generate a plasma (12) between the electrodes, operating an adjustable inductor (L) arranged in parallel with own installation inductor generating voltage to reduce the phase difference between voltage and the generated current, and introducing a mixture (8) of which the composition is contacting the plasma into the reaction chamber. The process comprises introducing or rolling a substrate in a reaction chamber (6) in which two electrodes (4, 10) are placed, where a dielectric barrier is positioned between the electrodes, generating a high frequency voltage to generate a plasma (12) between the electrodes, operating an adjustable inductor (L) arranged in parallel with own installation inductor generating voltage to reduce the phase difference between voltage and the generated current, introducing a mixture (8) of which the composition is contacting the plasma into the reaction chamber, adjusting the voltage and/or frequency provided by the generator circuit and/or the value of the adjustable inductor at the beginning or during the process to obtain optimal characteristics of reaction, and maintaining the substrate in the chamber for a sufficient time to obtain a layer of desired thickness on the surface. The mixture is decomposed and generates species to deposit a layer on the substrate. The process further comprises adjusting the voltage and/or the frequency provided by the circuit generator and/or the value of the inductor to enhance the harmonic production extending the time during which voltage remains greater than the value of maintaining the electric charge, and changing the position and/or the configuration of an electrode to obtain the optimal characteristics of the reaction. The harmonics is enhanced in the order of 3-5. The chamber is opened or closed at its two ends, and comprises an inlet area and an outlet area for the substrate. The substrate insulates and forms a dielectric barrier and electrode. The mixture is introduced into the reaction chamber in the form of a reactive gas, a liquid reagent, and a reactive powder. An independent claim is included for an installation for depositing a layer on a substrate.

8. 发明公开

EP2300633A1 PROCESS AND INSTALLATION FOR DESPOSITING FILMS SIMULTANEOUSLY ONTO BOTH SIDES OF A SUBSTRATE. 失效
标题翻译：方法和系统，用于在基材的两面面膜的同时沉积
公开(公告)号：EP2300633A1
公开(公告)日：2011-03-30
申请号：EP09797508.0
申请日：2009-07-16
申请人： AGC Glass Europe
发明人： TIXHON, Eric , LECLERCQ, Joseph , MICHEL, Eric
IPC分类号： C23C16/509 , C23C16/54 , C03C17/00
CPC分类号： C23C16/509 , C03C17/002 , C03C2218/365 , C23C16/54
摘要： A process for the simultaneous deposition of films onto both sides of a substrate (2), which comprises in particular introducing a substrate (2) into a reaction chamber (106, 206) or making said substrate run therethrough, in which chamber at least two electrodes (110, 210) are placed. At least one dielectric barrier (14, 114) is placed between these at least two electrodes (110, 210). An adjustable inductor (L) is placed in the secondary circuit of the transformer in parallel with the circuit comprising the at least two electrodes. A high-frequency electrical voltage is generated, said voltage being such that it generates a filamentary plasma (112, 212) on each side of the substrate between the at least two electrodes (110, 210).

9. 发明授权

EP2564412B1 ELECTRODE POUR PROCEDE PLASMA DBD 有权转让
公开(公告)号：EP2564412B1
公开(公告)日：2018-03-14
申请号：EP11716268.5
申请日：2011-04-27
申请人： AGC Glass Europe
发明人： TIXHON, Eric , MICHEL, Eric , LECLERCQ, Joseph
IPC分类号： H01J37/32 , H05H1/24
CPC分类号： H01J37/32724 , H01J37/32348 , H01J37/3255 , H01J61/52 , H05H1/2406 , H05H2001/2412

10. 发明授权

EP2300633B1 PROCESS AND INSTALLATION FOR DESPOSITING FILMS SIMULTANEOUSLY ONTO BOTH SIDES OF A SUBSTRATE. 失效
标题翻译：方法和系统，用于在基材的两面面膜的同时沉积
公开(公告)号：EP2300633B1
公开(公告)日：2012-02-29
申请号：EP09797508.0
申请日：2009-07-16
申请人： AGC Glass Europe
发明人： TIXHON, Eric , LECLERCQ, Joseph , MICHEL, Eric
IPC分类号： C23C16/509 , C23C16/54 , C03C17/00
CPC分类号： C23C16/509 , C03C17/002 , C03C2218/365 , C23C16/54
摘要： A process for the simultaneous deposition of films onto both sides of a substrate (2), which comprises in particular introducing a substrate (2) into a reaction chamber (106, 206) or making said substrate run therethrough, in which chamber at least two electrodes (110, 210) are placed. At least one dielectric barrier (14, 114) is placed between these at least two electrodes (110, 210). An adjustable inductor (L) is placed in the secondary circuit of the transformer in parallel with the circuit comprising the at least two electrodes. A high-frequency electrical voltage is generated, said voltage being such that it generates a filamentary plasma (112, 212) on each side of the substrate between the at least two electrodes (110, 210).

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式