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    • 5. 发明申请
    • ION IMPLANTATION PROCESS AND ION IMPLANTED GLASS SUBSTRATES
    • 离子植入工艺和离子植入玻璃基材
    • WO2016062779A1
    • 2016-04-28
    • PCT/EP2015/074400
    • 2015-10-21
    • AGC GLASS EUROPEASAHI GLASS CO LTDQUERTECH INGÉNIERIE
    • NAVET, BenjamineBOULANGER, PierreVENTELON, LionelBUSARDO, DenisGUERMALEC, Frédéric
    • C03C23/00
    • C03C23/0055C23C14/48
    • The invention concerns a process for increasing the scratch resistance of a glass substrate by implantation of simple charge and multicharge ions, comprising maintaining the temperature of the area of the glass substrate being treated at a temperature that is less than or equal to the glass transition temperature of the glass substrate, selecting the ions to be implanted among the ions of Ar, He, and N, setting the acceleration voltage for the extraction of the ions at a value comprised between 5 kV and 200 kV and setting the ion dosage at a value comprised between 10 14 ions/cm² and 2,5 x 10 17 ions/cm².The invention further concerns glass substrates comprising an area treated by implantation of simple charge and multicharge ions according to this process and their use for reducing the probability of scratching on the glass substrate upon mechanical contact.
    • 本发明涉及一种通过注入简单的电荷和多重离子来增加玻璃衬底的耐划伤性的方法,包括将待处理的玻璃衬底的区域的温度保持在小于或等于玻璃化转变温度 在Ar,He和N的离子中选择要注入的离子,将用于提取离子的加速电压设定在5kV至200kV之间的值,并将离子剂量设定为一个值 包括1014个离子/ cm 2和2.5×10 17个离子/ cm 2。本发明还涉及包括根据该方法通过注入简单电荷和多重离子处理的区域的玻璃基底及其用于降低在玻璃上划伤的可能性的用途 基板机械接触。