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1. 发明申请

WO2005081931A2 NICKEL-COATED FREE-STANDING SILICON CARBIDE STRUCTURE FOR SENSING FLUORO OR HALOGEN SPECIES IN SEMICONDUCTOR PROCESSING SYSTEMS, AND PROCESSES OF MAKING AND USING SAME 审中-公开
标题翻译：用于在半导体加工系统中感测氟或者卤素物质的镍涂层的自由置换的硅碳结构，以及制造和使用它们的方法
公开(公告)号：WO2005081931A2
公开(公告)日：2005-09-09
申请号：PCT/US2005/005607
申请日：2005-02-23
申请人： ADVANCED TECHNOLOGY MATERIALS, INC. , DIMEO, Frank, Jr. , CHEN, Philip, S.H. , CHEN, Ing-Shin , NEUNER, Jeffrey, W. , WELCH, James
发明人： DIMEO, Frank, Jr. , CHEN, Philip, S.H. , CHEN, Ing-Shin , NEUNER, Jeffrey, W. , WELCH, James
IPC分类号： G01N33/00
CPC分类号： G01N27/16 , G01N27/128 , H01J37/3244 , H01J37/32935 , H01J37/32981
摘要： A (MEMS)-based gas sensor assembly for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. Such gas sensor assembly in a preferred embodiment comprises a free-standing silicon carbide support structure having a layer of a gas sensing material, preferably nickel or nickel alloy, coated thereon. Such gas sensor assembly is preferably fabricated by micro-molding techniques employing sacrificial molds that are subsequently removable for forming structure layers.
摘要翻译：一种基于（MEMS）的气体传感器组件，其用于检测含有其的气体中的含氟物质，例如经历HF，NF 3等蚀刻清洁的半导体加工工具的流出物。优选实施例中的这种气体传感器组件包括独立式碳化硅支撑结构，其具有涂覆在其上的气体感测材料层，优选镍或镍合金层。这种气体传感器组件优选地通过使用牺牲模具的微型模制技术来制造，所述牺牲模具随后可拆卸以形成结构层。

2. 发明申请

WO2006047410A3 FLUID STORAGE AND DISPENSING SYSTEM INCLUDING DYNAMIC FLUID MONITORING OF FLUID STORAGE AND DISPENSING VESSEL 审中-公开
公开(公告)号：WO2006047410A3
公开(公告)日：2006-05-04
申请号：PCT/US2005/038173
申请日：2005-10-24
申请人： ADVANCED TECHNOLOGY MATERIALS, INC. , DIETZ, James , BISHOP, Steven, E. , MCMANUS, James, V. , LURCOTT, Steven, M. , WODJENSKI, Michael, J. , KAIM, Robert , DIMEO, Frank, Jr.
发明人： DIETZ, James , BISHOP, Steven, E. , MCMANUS, James, V. , LURCOTT, Steven, M. , WODJENSKI, Michael, J. , KAIM, Robert , DIMEO, Frank, Jr.
IPC分类号： H01L21/44 , H01L21/31 , C23C16/30
摘要： A monitoring system (100) for monitoring fluid in a fluid supply vessel (22, 24, 26, 28, 108) during operation including dispensing of fluid from the fluid supply vessel. The monitoring system includes (i) one or more sensors (114, 126) for monitoring a characteristic of the fluid supply vessel or the fluid dispensed therefrom, (ii) a data acquisition module (40, 132, 146) operatively coupled to the one or more sensors to receive monitoring data therefrom and responsively generate an output correlative to the characteristic monitored by the one or more sensors, and (iii) a processor (50, 150) and display (52, 150) operatively coupled with the data acquisition module and arranged to process the output from the data acquisition module and responsively output a graphical representation of fluid in the fluid supply vessel, billing documents, usage reports, and/or resupply requests.

3. 发明申请

WO2007024988A2 MATERIAL CONTAINMENT SYSTEM 审中-公开
标题翻译：材料容纳系统
公开(公告)号：WO2007024988A2
公开(公告)日：2007-03-01
申请号：PCT/US2006/032978
申请日：2006-08-22
申请人： ADVANCED TECHNOLOGY MATERIALS, INC. , MCMANUS, James, V. , DIMEO, Frank, Jr.
发明人： MCMANUS, James, V. , DIMEO, Frank, Jr.
IPC分类号： G06F21/20
CPC分类号： F17C11/00 , B65D55/14
摘要： Containment packages (10) having utility for transport of hazardous gases and security systems for controlling access to packages, e.g., hazardous gas containment packages (20). In a specific implementation, a containment package includes an overpack (11) for improving the safety and security of gas-containment vessels during transportation, e.g., air shipment, in which the overpack is pressurized by a protective gas at pressure in excess of the pressure in the gas- containment vessels, and a global positioning system (GPS) coordinated programmable lock and key system (30) is integrated with the containment package for controlled access to the gas- containment vessels only when the GPS component indicates that the containment package is at a specific geographic location.
摘要翻译：具有用于运输危险气体的容纳包装（10）和用于控制进入包装的安全系统，例如危险气体容纳包装（20）。在具体实施中，遏制包装包括用于改善运输期间气体容纳容器的安全性和安全性的外包装（11），例如空运，其中外包装由压力超过压力的保护气体加压在气体储存容器中，并且全球定位系统（GPS）协调的可编程锁和钥匙系统（30）与容纳包集成在一起，仅在GPS组件指示容纳包是在特定的地理位置。

4. 发明申请

WO2005072161A2 APPARATUS AND PROCESS FOR SENSING TARGET GAS SPECIES IN SEMICONDUCTOR PROCESSING SYSTEMS 审中-公开
标题翻译：在半导体处理系统中用于检测目标气体种类的装置和方法
公开(公告)号：WO2005072161A2
公开(公告)日：2005-08-11
申请号：PCT/US2005/001409
申请日：2005-01-14
申请人： ADVANCED TECHNOLOGY MATERIALS, INC. , CHEN, Philip, S., H. , CHEN, Ing-Shin , DIMEO, Frank, Jr. , NEUNER, Jeffrey, W. , WELCH, James , ROEDER, Jeffrey, F.
发明人： CHEN, Philip, S., H. , CHEN, Ing-Shin , DIMEO, Frank, Jr. , NEUNER, Jeffrey, W. , WELCH, James , ROEDER, Jeffrey, F.
IPC分类号： G01N9/00 , G01N27/12 , G01N33/00
CPC分类号： G01N27/16
摘要： A gas detector and process for detecting a target gas species, such as a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF 3 , etc. The gas detector in one aspect employs a nickel-containing filament that is sensitive to the fluorine-containing species, which can function both as a sensing component and as a heat source when elevated temperature sensing is required. The gas detector in one aspect employs an elongated gas sensor element that can be vertically mounted on a support structure. Vertical mounting of such elongated gas sensor element on the support structure significantly improves the signal strength, reduces the response time, minimizes the footprint of the gas detector, and provides structural flexibility for accommodating thermal expansion/contraction of such gas sensor element.
摘要翻译：用于检测目标气体物质的气体检测器和方法，所述目标气体物质例如在含有气体的气体中的含氟物质，例如用HF进行蚀刻清洁的半导体加工工具的流出物，气体检测器在一个方面采用对含氟物质敏感的含镍丝，当升高温度感测时，所述含镍丝可以用作感测组件和热源需要。气体检测器在一个方面采用可以垂直安装在支撑结构上的细长的气体传感器元件。这种细长的气体传感器元件在支撑结构上的垂直安装显着提高了信号强度，减少了响应时间，使气体检测器的占用面积最小，并且提供了适应这种气体传感器元件的热膨胀/收缩的结构灵活性。 >

5. 发明申请

WO2007024987A2 MATERIAL CONTAINMENT SYSTEM 审中-公开
标题翻译：材料容器系统
公开(公告)号：WO2007024987A2
公开(公告)日：2007-03-01
申请号：PCT/US2006/032977
申请日：2006-08-22
申请人： ADVANCED TECHNOLOGY MATERIALS, INC. , MCMANUS, James, V. , SAMETH, Jerrold, David , DIMEO, Frank, Jr.
发明人： MCMANUS, James, V. , SAMETH, Jerrold, David , DIMEO, Frank, Jr.
IPC分类号： B65B3/00
CPC分类号： B65D7/045 , B65D85/84 , B65D2203/10
摘要： Containment packages (10) having utility for transport of hazardous gases and security systems for controlling access to packages, e.g., hazardous gas containment packages (20). In a specific implementation, a containment package includes an overpack (11) for improving the safety and security of gas-containment vessels during transportation, e.g., air shipment, in which the overpack is pressurized by a protective gas at pressure in excess of the pressure in the gas-containment vessels, and a global positioning system (GPS) coordinated programmable lock and key system (30) is integrated with the containment package for controlled access to the gas- containment vessels only when the GPS component indicates that the containment package is at a specific geographic location.
摘要翻译：（10）具有用于运输危险气体的实用性和用于控制对包装（例如危险气体密封包装（20））的访问的安全系统。在具体的实施方式中，容纳包装包括用于在运输（例如空运）期间提高气体容纳容器的安全性和安全性的外包装（11），其中，外包装通过压力超过压力的保护气体在全球定位系统（GPS）协调的可编程锁和钥匙系统（30）中与气密容器集成在一起，用于仅当GPS部件指示容纳包是在特定的地理位置。

6. 发明申请

WO2005017175A2 CHEMICAL SENSOR RESPONSIVE TO CHANGE IN VOLUME OF MATERIAL EXPOSED TO TARGET PARTICLE 审中-公开
标题翻译：化学传感器响应于物料暴露于目标颗粒的量变化
公开(公告)号：WO2005017175A2
公开(公告)日：2005-02-24
申请号：PCT/US2004/013769
申请日：2004-05-03
申请人： ADVANCED TECHNOLOGY MATERIALS, INC. , CHEN, Ing-Shin , DIMEO, Frank, Jr.
发明人： CHEN, Ing-Shin , DIMEO, Frank, Jr.
IPC分类号： C12Q
CPC分类号： G01N29/036 , G01N2291/0256
摘要： A sensor comprises sensing material that changes volume when exposed to one or more target particles. The sensor also comprises a transducing platform comprising a piezoresistive component to sense change in volume of the sensing material. The sensing material is positioned over the piezoresistive component.
摘要翻译：传感器包括当暴露于一个或多个目标颗粒时改变体积的感测材料。传感器还包括传感平台，该传感平台包括用于检测感测材料的体积变化的压阻组件。感测材料位于压阻元件上方。

7. 发明申请

WO2006101897A3 METHOD AND APPARATUS FOR MONITORING PLASMA CONDITIONS IN AN ETCHING PLASMA PROCESSING FACILITY 审中-公开
公开(公告)号：WO2006101897A3
公开(公告)日：2006-09-28
申请号：PCT/US2006/009330
申请日：2006-03-15
申请人： ADVANCED TECHNOLOGY MATERIALS, INC , CHEN, Ing-Shin , NEUNER, Jeffrey, W. , DIMEO, Frank, Jr. , CHEN, Philip, S.H. , WELCH, James , ROEDER, Jeffrey, F.
发明人： CHEN, Ing-Shin , NEUNER, Jeffrey, W. , DIMEO, Frank, Jr. , CHEN, Philip, S.H. , WELCH, James , ROEDER, Jeffrey, F.
IPC分类号： H01L21/302
摘要： The present invention relates to a method and system of using downstream sensor elements (214) for determining the plasma conditions (e.g., plasma etching end point) in a semiconductor etching facility (202) that utilizes halogen-containing plasma and/or oxygen- containing plasma. Such sensor elements (214) are capable of exhibiting temperature change in the presence of energetic gas species, e.g., fluorine, chlorine, iodine, bromine, oxygen, and derivatives and radicals thereof that are generated by the plasma (204), and correspondingly generating an output signal indicative of such temperature change for determination of the plasma conditions in the etching plasma processing facility (202).

8. 发明申请

WO2006047373A2 NOVEL METHODS FOR CLEANING ION IMPLANTER COMPONENTS 审中-公开
标题翻译：用于清洁离子植入物组分的新方法
公开(公告)号：WO2006047373A2
公开(公告)日：2006-05-04
申请号：PCT/US2005/038102
申请日：2005-10-21
申请人： ADVANCED TECHNOLOGY MATERIALS, INC. , DIMEO, Frank, Jr. , DIETZ, James , OLANDER, W., Karl , KAIM, Robert , BISHOP, Steven, E. , NEUNER, Jeffrey, w. , ARNO, Jose, I.
发明人： DIMEO, Frank, Jr. , DIETZ, James , OLANDER, W., Karl , KAIM, Robert , BISHOP, Steven, E. , NEUNER, Jeffrey, w. , ARNO, Jose, I.
IPC分类号： B08B6/00 , B08B9/00
CPC分类号： C23G5/00 , C23C14/564 , H01J37/08 , H01J37/32862 , H01J2237/022 , H01J2237/31701
摘要： A method and apparatus for cleaning residue from components of the vacuum chamber and beaming of an ion implanter used in the fabrication of microelectronic devices. To effectively remove residue, the components are contacted with a gas-phase reactive halide composition for sufficient time and under sufficient conditions to at least partially remove the residue. The gas-phase reactive halide composition is chosen to react selectively with the residue, while not reacting with the components of the ion source region of the vacuum chamber.
摘要翻译：一种用于清洁真空室的部件的残留物和用于制造微电子器件的离子注入机的抛光的方法和装置。为了有效地除去残留物，将组分与气相反应性卤化物组合物接触足够的时间并在足够的条件下至少部分地除去残余物。选择气相反应性卤化物组合物与残留物选择性反应，而不与真空室的离子源区域的组分反应。

9. 发明公开

EP1721143A2 NICKEL-COATED FREE-STANDING SILICON CARBIDE STRUCTURE FOR SENSING FLUORO OR HALOGEN SPECIES IN SEMICONDUCTOR PROCESSING SYSTEMS, AND PROCESSES OF MAKING AND USING SAME 审中-公开
标题翻译：镀镍被拆卸SILIZIUMCARBIDSTRUKTUR于所有生产和使用出来携带或卤素物质在氟HALBLEITERPROZESSIERUNGSSYSTEMEN及其方法
公开(公告)号：EP1721143A2
公开(公告)日：2006-11-15
申请号：EP05723491.6
申请日：2005-02-23
申请人： ADVANCED TECHNOLOGY MATERIALS, INC.
发明人： DIMEO, Frank, Jr. , CHEN, Philip, S.H. , CHEN, Ing-Shin , NEUNER, Jeffrey, W. , WELCH, James
IPC分类号： G01N9/00
CPC分类号： G01N27/16 , G01N27/128 , H01J37/3244 , H01J37/32935 , H01J37/32981
摘要： A (MEMS)-based gas sensor assembly (35) for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. Such gas sensor assembly in a preferred embodiment comprises a free-standing silicon carbide (4) support structure having a layer of a gas sensing material, preferably nickel or nickel alloy, coated thereon. Such gas sensor assembly is preferably fabricated by micro-molding techniques employing sacrificial molds (16) that are subsequently removable for forming structure layers.
摘要翻译： A（MEMS）的气体传感器组件用于在气体含相同，例如，在经受蚀刻用HF清洗，NF _{3 半导体处理工具的排出物等搜索检测的含氟物种气体传感器组件的优选实施例包括具有气体感测材料，优选镍或镍合金，在其上涂覆的层的自立式碳化硅支撑结构。搜索气体传感器组件优选地通过微模制技术用人牺牲模具随后被做可拆卸用于形成结构层制造。}

10. 发明公开

EP1812965A2 FLUID STORAGE AND DISPENSING SYSTEM INCLUDING DYNAMIC FLUID MONITORING OF FLUID STORAGE AND DISPENSING VESSEL 审中-公开
标题翻译：流体储存和分配系统的动态流体监测流体储存和供应船
公开(公告)号：EP1812965A2
公开(公告)日：2007-08-01
申请号：EP05815611.8
申请日：2005-10-24
申请人： ADVANCED TECHNOLOGY MATERIALS, INC.
发明人： DIETZ, James , BISHOP, Steven, E. , MCMANUS, James, V. , LURCOTT, Steven, M. , WODJENSKI, Michael, J. , KAIM, Robert , DIMEO, Frank, Jr.
IPC分类号： H01L21/66
CPC分类号： G01N33/00 , F17C11/00 , G01F15/063 , G01F22/02 , G01F23/0076 , G01M3/32 , G01M3/3236 , G06Q10/087 , G06Q30/04 , G06Q50/04 , H01L21/561 , H01L21/568 , H01L21/6835 , H01L22/10 , H01L23/5389 , H01L24/24 , H01L24/48 , H01L24/82 , H01L25/03 , H01L25/0652 , H01L25/16 , H01L2224/16225 , H01L2224/16227 , H01L2224/24011 , H01L2224/2518 , H01L2224/48091 , H01L2224/48227 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01023 , H01L2924/01027 , H01L2924/01033 , H01L2924/01058 , H01L2924/01076 , H01L2924/01078 , H01L2924/01082 , H01L2924/014 , H01L2924/09701 , H01L2924/14 , H01L2924/19042 , H05K1/185 , H05K3/4602 , H05K2203/0165 , H05K2203/085 , H05K2203/1469 , Y02P90/30 , Y10T29/4913 , Y10T29/49133 , Y10T29/49165 , Y10T29/53183 , H01L2224/45099
摘要： A monitoring system (100) for monitoring fluid in a fluid supply vessel (22, 24, 26, 28, 108) during operation including dispensing of fluid from the fluid supply vessel. The monitoring system includes (i) one or more sensors (114, 126) for monitoring a characteristic of the fluid supply vessel or the fluid dispensed therefrom, (ii) a data acquisition module (40, 132, 146) operatively coupled to the one or more sensors to receive monitoring data therefrom and responsively generate an output correlative to the characteristic monitored by the one or more sensors, and (iii) a processor (50, 150) and display (52, 150) operatively coupled with the data acquisition module and arranged to process the output from the data acquisition module and responsively output a graphical representation of fluid in the fluid supply vessel, billing documents, usage reports, and/or resupply requests.

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