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1. 发明申请

WO2005043588A3 GAS-USING FACILITY INCLUDING PORTABLE DRY SCRUBBER SYSTEM AND/OR OVER-PRESSURE CONTROL ARRANGEMENT 审中-公开
标题翻译：气体使用设备，包括便携式干燥系统和/或超压控制装置
公开(公告)号：WO2005043588A3
公开(公告)日：2005-11-17
申请号：PCT/US2004033916
申请日：2004-10-14
申请人： ADVANCED TECH MATERIALS , MARGANSKI PAUL J , SWEENEY JOSEPH D , SHREVE THEODORE A , OLANDER KARL W
发明人： MARGANSKI PAUL J , SWEENEY JOSEPH D , SHREVE THEODORE A , OLANDER KARL W
IPC分类号： B01D53/04 , H01L21/00 , F01N3/00 , B32B27/02
CPC分类号： H01L21/67046 , B01D53/0415 , B01D2251/30 , B01D2251/40 , B01D2251/60 , B01D2253/1124 , B01D2257/93 , B01D2258/0216 , B01D2259/40009 , B01D2259/40084 , B01D2259/402 , B01D2259/4525 , B01D2259/4541
摘要： A gas-using facility including a portable dry scrubber system and/or over-pressure control arrangement. The portable dry scrubber system is of a unitary modular form, accommodating transport and ready set-up, take-down, and redeployment in the process facility. The over-pressure control arrangement provides capability for release of over-pressure gas from a compressed gas storage vessel during an over-pressure event, e.g., overheating of a compressed gas cylinder during a semiconductor foundry fire, while avoiding the bulk release of the entire vessel contents that occurs when conventional pressure relief devices are employed.
摘要翻译：包括便携式干式洗涤器系统和/或过压控制装置的气体使用设备。便携式干式洗涤器系统具有单一的模块化形式，可以在过程设施中提供运输和准备安装，拆卸和重新部署。过压控制装置提供了在过压事件期间从压缩气体储存容器释放过压气体的能力，例如在半导体铸造火灾期间压缩气瓶的过热，同时避免了整体的大量释放当使用常规的压力释放装置时发生的容器内容物。

2. 发明申请

WO2004075262A3 LOW PRESSURE DROP CANISTER FOR FIXED BED SCRUBBER APPLICATIONS AND METHOD OF USING SAME 审中-公开
标题翻译：固定床用橡胶应用的低压降罐及其使用方法
公开(公告)号：WO2004075262A3
公开(公告)日：2006-04-13
申请号：PCT/US2004004733
申请日：2004-02-17
申请人： ADVANCED TECH MATERIALS , MARGANSKI PAUL J , SHREVE THEODORE A , SWEENEY JOSEPH , OLANDER KARL W , ARNO JOSE , HOLST MARK
发明人： MARGANSKI PAUL J , SHREVE THEODORE A , SWEENEY JOSEPH , OLANDER KARL W , ARNO JOSE , HOLST MARK
IPC分类号： B01D53/04 , B01D53/68 , B01D53/70
CPC分类号： B01D53/0415 , B01D53/0446 , B01D53/685 , B01D53/70 , B01D2253/10 , B01D2253/102 , B01D2253/112 , B01D2256/26 , B01D2258/0216
摘要： An apparatus and method are provided for treating pollutants in a process effluent stream. The apparatus comprises an up-flow canister having a lower section plenum space (22), a section for a sorbent bed material (18), an upper section plenum space (24), and inlet (20) for introducing a process effluent stream to the lower section plenum space, and an outlet (26) for egress of the process effluent stream from the canister, the inlet, lower section plenum space, and sorbent bed material being arranged in a manner which provides for process effluent stream to flow into the sorbent bed against gravity, by a pressure differential.
摘要翻译：提供了一种用于处理工艺流出物流中的污染物的装置和方法。该装置包括具有下段增压空间（22），用于吸附剂床材料（18）的部分，上段增压空间（24）和用于将工艺流出物流引入的入口（20）的上流式罐所述下段增压空间和用于从所述罐，所述入口，下部区域空间和吸附剂床材料排出的所述工艺流出物流的出口（26）以提供流程流出物流的方式布置吸附剂床反对重力，通过压差。

3. 发明公开

EP2248153A4 ION SOURCE CLEANING IN SEMICONDUCTOR PROCESSING SYSTEMS 失效转让
标题翻译：清洁离子源半导体处理系统
公开(公告)号：EP2248153A4
公开(公告)日：2012-01-18
申请号：EP09709805
申请日：2009-02-11
申请人： SWEENEY JOSEPH D , YEDAVE SHARAD N , BYL OLEG , KAIM ROBERT , ELDRIDGE DAVID , SERGI STEVEN , FENG LIN , BISHOP STEVEN E , OLANDER KARL W , TANG YING , ADVANCED TECH MATERIALS
发明人： SWEENEY JOSEPH D , YEDAVE SHARAD N , BYL OLEG , KAIM ROBERT , ELDRIDGE DAVID , SERGI STEVEN , FENG LIN , BISHOP STEVEN E , OLANDER KARL W , TANG YING
IPC分类号： H01L21/265 , C23C16/44 , C23G5/00 , H01J37/08 , H01J37/16 , H01J37/18 , H01J37/317
CPC分类号： H01J37/3171 , C23C14/48 , C23C14/54 , C23C14/564 , H01J37/08 , H01J37/16 , H01J37/18 , H01J2237/082 , H01J2237/22

4. 发明专利

SG188150A1 ION SOURCE CLEANING IN SEMICONDUCTOR PROCESSING SYSTEMS 未知
公开(公告)号：SG188150A1
公开(公告)日：2013-03-28
申请号：SG2013010889
申请日：2009-02-11
申请人： ADVANCED TECH MATERIALS , SWEENEY JOSEPH D , YEDAVE SHARAD N , BYL OLEG , KAIM ROBERT , ELDRIDGE DAVID , SERGI STEVEN , FENG LIN , BISHOP STEVEN E , OLANDER KARL W , TANG YING
发明人： SWEENEY JOSEPH D , YEDAVE SHARAD N , BYL OLEG , KAIM ROBERT , ELDRIDGE DAVID , SERGI STEVEN , FENG LIN , BISHOP STEVEN E , OLANDER KARL W , TANG YING
摘要： ION SOURCE CLEANING IN SEMICONDUCTOR PROCESSING SYSTEMSCleaning of an ion implantation system or components thereof, utilizing a reactive cleaning reagent enabling growth/etching of the filament in an ion source of the arc chamber, by appropriate control of temperature in the arc chamber to effect the desired filament growth or alternative filament etching. Also described is the use of reactive gases such as XeFx, WFx, AsFx, PFx and TaFx, wherein x has a stoichioimetrically appropriate value or range of values, for cleaning regions of ion implanters, or components of implanters, in in situ or ex situ cleaning arrangements, under ambient temperature, elevated temperature or plasma conditions. Among specific reactive cleaning agents, BrF3 is described as useful for cleaning ion implant systems or component(s) thereof, in in situ or ex situ cleaning arrangements. Also described is a method of cleaning the forelines of an ion implant system for at least partial removal of ionization-related deposit from said forelines, comprising contacting said forelines with a cleaning gas wherein said cleaning gas is chemically reactive with said deposit. Also described is a method of improving the performance and extending the lifetime of an ion implant system, comprising contacting the cathode with a gas mixture.[ No Suitable Figure ]

5. 发明申请

WO2009102762A3 ION SOURCE CLEANING IN SEMICONDUCTOR PROCESSING SYSTEMS 审中-公开
标题翻译：半导体加工系统中的离子源清洁
公开(公告)号：WO2009102762A3
公开(公告)日：2009-11-12
申请号：PCT/US2009033754
申请日：2009-02-11
申请人： SWEENEY JOSEPH D , YEDAVE SHARAD N , BYL OLEG , KAIM ROBERT , ELDRIDGE DAVID , SERGI STEVEN , FENG LIN , BISHOP STEVEN E , OLANDER KARL W , TANG YING
发明人： SWEENEY JOSEPH D , YEDAVE SHARAD N , BYL OLEG , KAIM ROBERT , ELDRIDGE DAVID , SERGI STEVEN , FENG LIN , BISHOP STEVEN E , OLANDER KARL W , TANG YING
IPC分类号： H01L21/265
CPC分类号： H01J37/3171 , C23C14/48 , C23C14/54 , C23C14/564 , H01J37/08 , H01J37/16 , H01J37/18 , H01J2237/082 , H01J2237/22
摘要： Cleaning of an ion implantation system or components thereof, utilizing a reactive cleaning reagent enabling growth/etching of the filament in an ion source of the arc chamber, by appropriate control of temperature in the arc chamber to effect the desired filament growth or alternative filament etching. Also described is the use of reactive gases such as XeFx, WFx, AsFx, PFx and TaFx, wherein x has a stoichioimetrically appropriate value or range of values, for cleaning regions of ion implanters, or components of implanters, in in situ or ex situ cleaning arrangements, under ambient temperature, elevated temperature or plasma conditions. Among specific reactive cleaning agents, BrF3 is described as useful for cleaning ion implant systems or component(s) thereof, in in situ or ex situ cleaning arrangements. Also described is a method of cleaning the forelines of an ion implant system for at least partial removal of ionization-related deposit from said forelines, comprising contacting said forelines with a cleaning gas wherein said cleaning gas is chemically reactive with said deposit. Also described is a method of improving the performance and extending the lifetime of an ion implant system, comprising contacting the cathode with a gas mixture.
摘要翻译：使用能够在电弧室的离子源中生长/蚀刻细丝的反应性清洁剂来清洁离子注入系统或其组分，通过适当地控制电弧室中的温度以实现所需的长丝生长或替代的细丝蚀刻。还描述了使用诸如XeFx，WFx，AsFx，PFx和TaFx的反应性气体，其中x具有化学计量学上适当的值或值范围，用于清除离子注入器或植入物的组分的原位或非原生境清洁布置，在环境温度，升高的温度或等离子体条件下。在特定的反应性清洁剂中，BrF3被描述为用于在原位或非原位清洁装置中清洁离子注入系统或其组分。还描述了一种清洁离子注入系统的前沿以从所述前线至少部分去除电离相关沉积物的方法，包括使所述前沿与清洁气体接触，其中所述清洁气体与所述沉积物化学反应。还描述了改进离子注入系统的性能和延长寿命的方法，包括使阴极与气体混合物接触。

6. 发明申请

WO2006083363A3 PENTABORANE(9) STORAGE AND DELIVERY 审中-公开
标题翻译： PENTABORANE（9）存储和交付
公开(公告)号：WO2006083363A3
公开(公告)日：2007-04-12
申请号：PCT/US2005042490
申请日：2005-11-23
申请人： ADVANCED TECH MATERIALS , OLANDER KARL W , ARNO JOSE I
发明人： OLANDER KARL W , ARNO JOSE I
IPC分类号： C23C14/48 , B67D99/00 , C23C14/14 , C23C16/38 , F17C7/04
CPC分类号： C23C14/48 , C23C16/4485 , F17C2205/0338 , F17C2205/0391 , H01L21/265
摘要： A fluid storage and dispensing system (100) comprising a vessel (126) in a liquid nitrogen bath (128) for holding a pentaborane(9)-containing fluid at subatmospheric pressure. The pentaborane may be supplied from liquid or synthesis source (124), nitrogen from valve (120), which are controlled by gas regulators (R-I & R-2). The fluid storage and dispensing system may be communicatively connected via various valves (AV-I to AV- 16 & MV-I to MV-4) to a semiconductor or liquid crystal manufacturing facility, whereby the pentaborane(9) is used as a substitute for commercially available boron hydride compounds, such as diborane. The system may include the exhaust pump (130), scrubbing means (140), and three-way valve (162) to sample the concentration of pentaborane(9) output therefrom.
摘要翻译：一种液体储存和分配系统（100），其包括用于在低于大气压的压力下保持含有五硼烷（9）的流体的液氮浴（128）中的容器（126）。五硼烷可以由液体或合成源（124），来自阀（120）的氮提供，其由气体调节剂（R-1和R-2）控制。液体储存和分配系统可以经由各种阀（AV-1至AV-16和MV-1至MV-4）通信连接到半导体或液晶制造设备，由此使用五硼烷（9）作为替代物用于市售的硼氢化合物，例如乙硼烷。系统可以包括排气泵（130），洗涤装置（140）和三通阀（162），以对从其输出的五硼烷（9）的浓度进行采样。

7. 发明申请

WO2006119428A2 FLUID STORAGE AND DISPENSING SYSTEMS, AND FLUID SUPPLY PROCESSES COMPRISING SAME 审中-公开
标题翻译：流体储存和分配系统，以及包含其的流体供应方法
公开(公告)号：WO2006119428A2
公开(公告)日：2006-11-09
申请号：PCT/US2006017149
申请日：2006-05-03
申请人： ADVANCED TECH MATERIALS , OLANDER KARL W , MCMANUS JAMES V , HULTQUIST STEVEN J , ARNO JOSE I , VAN BUSKIRK PETER
发明人： OLANDER KARL W , MCMANUS JAMES V , HULTQUIST STEVEN J , ARNO JOSE I , VAN BUSKIRK PETER
IPC分类号： B67D1/04
CPC分类号： F17C11/00 , F17C2201/0109 , F17C2201/032 , F17C2201/035 , F17C2201/054 , F17C2201/056 , F17C2201/058 , F17C2203/0639 , F17C2203/0678 , F17C2205/0184 , F17C2205/0326 , F17C2205/0329 , F17C2205/0338 , F17C2205/0391 , F17C2221/011 , F17C2221/013 , F17C2221/014 , F17C2221/031 , F17C2221/033 , F17C2221/035 , F17C2221/037 , F17C2223/0123 , F17C2223/013 , F17C2223/033 , F17C2223/035 , F17C2225/0123 , F17C2225/013 , F17C2225/033 , F17C2225/035 , F17C2225/038 , F17C2227/0114 , F17C2227/0135 , F17C2227/0157 , F17C2250/032 , F17C2250/0443 , F17C2250/0636 , F17C2270/0168 , F17C2270/02 , F17C2270/0518
摘要： Fluid storage and dispensing systems, and processes for supplying fluids for use thereof. Various arrangements of fluid storage and dispensing systems are described, involving permutations of the physical sorbent-containing fluid storage and dispensing vessels and internal regulator-equipped fluid storage and dispensing vessels. The systems and processes are applicable to a wide variety of end-use applications, including storage and dispensing of hazardous fluids with enhanced safety. In a specific end-use application, reagent gas is dispensed to a semiconductor manufacturing facility from a large-scale, fixedly positioned fluid storage and dispensing vessel containing physical sorbent holding gas at subatmospheric pressure, with such vessel being refillable from a safe gas source of refill gas, as disclosed herein.
摘要翻译：流体储存和分配系统以及用于供应流体的方法。描述了流体存储和分配系统的各种布置，包括物理吸附剂流体存储和分配容器和内部调节器装备的流体存储和分配容器的排列。这些系统和工艺适用于各种各样的最终用途应用，包括存储和分配危险液体，并具有更高的安全性。在特定的最终用途应用中，反应气体从大规模固定位置的液体储存和分配容器中分配到半导体制造设备，所述流体储存和分配容器含有处于低于大气压的气体的物理吸附剂，该容器可再填充于安全气体源再填充气体，如本文所公开的。

8. 发明专利

SG152060A1 PRESSURE-BASED GAS DELIVERY SYSTEM AND METHOD FOR REDUCING RISKS ASSOCIATED WITH STORAGE AND DELIVERY OF HIGH PRESSURE GASES 未知
公开(公告)号：SG152060A1
公开(公告)日：2009-05-29
申请号：SG2006085476
申请日：2003-05-29
申请人： ADVANCED TECH MATERIALS
发明人： OLANDER KARL W , DONATUCCI MATTHEW B , WANG LUPING , WODJENSKI MICHAEL J
IPC分类号： F17C7/00 , F17C5/00 , B08B5/00 , G05B11/01 , G06F15/00
摘要： Apparatus and method for dispensing a gas using a gas source (102) coupled in selective flow relationship with a gas manifold (126). The gas manifold (126) including flow circuitry (110) for discharging gas to a gas-using zone, and the gas source (126) includes a pressure-regulated gas source vessel (126) containing the gas at superatomospheric pressure.

9. 发明专利

AT336291T 未知
公开(公告)号：AT336291T
公开(公告)日：2006-09-15
申请号：AT98923580
申请日：1998-05-20
申请人： ADVANCED TECH MATERIALS
发明人： OLANDER KARL W , MCMANUS JAMES V
IPC分类号： F17C5/02 , B01D53/04 , F17C5/06 , F17C11/00
摘要： A fill system and methodology for the manufacture of fluid storage and dispensing vessels containing sorbent material for holding a sorbable fluid, for on-demand dispensing of the fluid in the use of the vessel. The fill system and methodology are directed to minimizing the processing time required to dissipate the heat of sorption incident to the loading of the sorbable fluid onto the sorbent material, so that thermal equilibration time in the manufacture of the vessels is substantially reduced in relation to the use of only ambient convective air cooling for dissipation of the heat of sorption from the fluid-filled vessel.

10. 发明专利

AU2003237350A1 PRESSURE-BASED GAS DELIVERY SYSTEM AND METHOD FOR REDUCING RISKS ASSOCIATED WITH STORAGE AND DELIVERY OF HIGH PRESSURE GASES 未知
公开(公告)号：AU2003237350A1
公开(公告)日：2003-12-22
申请号：AU2003237350
申请日：2003-05-29
申请人： ADVANCED TECH MATERIALS
发明人： DONATUCCI MATTHEW B , WANG LUPING , WODJENSKI MICHAEL J , OLANDER KARL W
IPC分类号： F17C7/00 , F17C5/00 , B08B9/027 , B08B5/00 , G05B11/01 , G06F15/00
摘要： A method of reducing ventilation gas flow rate through a gas cabinet comprising a gas source vessel and a gas delivery system comprising a gas cabinet.

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