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    • 6. 发明公开
    • 써모크로믹 유리 및 그 제조방법
    • 热变色玻璃及其制造方法
    • KR1020130081847A
    • 2013-07-18
    • KR1020120002908
    • 2012-01-10
    • 코닝정밀소재 주식회사
    • 문동건김현빈차지윤
    • C03C4/00C03C17/06C23C14/34
    • C03C17/245C03C17/09C03C2217/218C03C2217/259C03C2217/70
    • PURPOSE: A thermochromic glass and a method for manufacturing the same are provided to improve visible light permeability and increase differences in near infrared ray permeability before and after phase shifting by adjusting the grain sizes of vanadium dioxide (VO2) and improving crystallinity of the thermochromic glass. CONSTITUTION: A thermochromic glass (100) comprises a glass substrate (110) and a thermochromic layer (120). The thermochromic layer is formed on the glass substrate, and the grain sizes of the thermochromic layer are in the range of 50-300 nm. Differences in the near infrared ray permeability of the thermochromic glass is more than or equal to 10% before and after phase shifting. The thermochromic layer is made of vanadium dioxide (VO2). A method for manufacturing a thermochromic glass comprises the steps: depositing a thermochromic material having grain sizes of 50-300 nm on a glass substrate; and forming a thermochromic layer on the glass substrate by drying the deposited thermochromic material. The deposition is performed by a sputtering process.
    • 目的:提供一种热致变色玻璃及其制造方法,以通过调节二氧化钒(VO2)的晶粒尺寸和改善热致变色玻璃的结晶度来提高可见光透过率并增加相移前后的近红外透射率差异 。 构成:热致变色玻璃(100)包括玻璃基板(110)和热变色层(120)。 热致变色层形成在玻璃基板上,热变色层的晶粒尺寸在50-300nm的范围内。 热变色玻璃的近红外线透过率的差异在相变之前和之后大于或等于10%。 热变色层由二氧化钒(VO2)制成。 一种制造热致变色玻璃的方法包括以下步骤:将具有50-300nm粒度的热变色材料沉积在玻璃基底上; 并通过干燥沉积的热变色材料在玻璃基板上形成热致变色层。 通过溅射工艺进行沉积。
    • 7. 发明公开
    • 에너지절약형 창 및 복층유리
    • 节能窗和配对玻璃
    • KR1020120118303A
    • 2012-10-26
    • KR1020110035789
    • 2011-04-18
    • 코닝정밀소재 주식회사
    • 문동건심면기최용원김현빈정영수김두환정영진김아라
    • E06B3/67E06B5/20
    • C03C17/23C03C17/3417C03C17/366C03C17/3681C03C2217/218C03C2217/70G02F1/0147Y10T428/24942
    • PURPOSE: An energy-saving type double window and double window are provided to coat a high refractive thing film on a thermochromic thin film controlling a transmission rate of sunlight depending on an external environment, thereby reducing a cooling-and-heating load of a building by improving transmission efficiency and blocking efficiency of solar energy. CONSTITUTION: An energy-saving type double window comprises a board(100), a thermochromic thin film(110), and a high refractive thin film(120). The thermochromic thin film is coated on the board. The thermochromic thin film is formed with one among discretization vanadium(VO2), titanium oxide(TI2O3), oxidation NB(NbO2), and nickel sulfate(NiS). The high refractive thin film is coated on the thermochromic thin film. The high refractive thin film moves frequencies in which a transmission rate difference before and after the phase transition of the thermochromic thin film becomes a negative value in an infrared ray domain to short frequencies. The high refractive thin film is formed with one or more among zinc oxide(ZnO), titanium oxide(IV)(TiO2), zirconia(ZrO2), hfO2(HFO2), and antimony trioxide(Sb2O3).
    • 目的:提供节能型双窗和双窗以在热变色薄膜上涂覆高折射物膜,根据外部环境控制阳光透射率,从而降低建筑物的制冷和加热负载 通过提高太阳能的传输效率和阻塞效率。 构成:节能型双窗包括板(100),热变色薄膜(110)和高折射薄膜(120)。 热变色薄膜涂在板上。 热变色薄膜由离子化钒(VO2),氧化钛(TI2O3),氧化NB(NbO2)和硫酸镍(NiS)之一形成。 高折射薄膜被涂覆在热致变色薄膜上。 高折射薄膜移动在热致变色薄膜的相变之前和之后的传输速率差在红外线域变为负值的频率到短频。 高折射薄膜由氧化锌(ZnO),氧化钛(IV)(TiO 2),氧化锆(ZrO 2),hfO 2(HFO 2)和三氧化锑(Sb 2 O 3)之中的一种或多种形成。
    • 8. 发明公开
    • 디스플레이 장치용 커버기판
    • 显示单元覆盖基板
    • KR1020160076036A
    • 2016-06-30
    • KR1020140185669
    • 2014-12-22
    • 코닝정밀소재 주식회사
    • 최용원김창규문동건안진수오정홍윤중훈김민석
    • B32B17/06B32B9/00B32B7/02
    • B32B7/02B32B9/00B32B17/06
    • 본발명은디스플레이장치용커버기판에관한것으로서더욱상세하게는유리재질의기재를강화시키기위해, 기재상에형성되는강화층에발생되는내부응력을완화시킴으로써, 표면경도를증가시킬수 있고, 이를통해, 크랙발생의원인이되는결함및 스크래치발생을방지할수 있는디스플레이장치용커버기판에관한것이다. 이를위해, 본발명은, 기재; 상기기재상에형성되고, 인장응력층과압축응력층의교대적층으로이루어진강화층; 및상기기재와상기강화층사이에형성되는버퍼층을포함하는것을특징으로하는디스플레이장치용커버기판을제공한다.
    • 本发明涉及一种用于显示装置的盖基板,更具体地说,涉及一种能够通过减轻由形成在由玻璃材料制成的基座上形成的加强层中产生的内应力来提高表面硬度的显示装置用盖基板 以增强基体,从而防止形成裂纹的缺陷和划痕。 为此,本发明提供了一种用于显示装置的覆盖基板,包括:基座; 形成在基体上并且包括交替层叠的拉伸应力层和压应力层的增强层; 以及形成在基部和加强层之间的缓冲层。