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1. 发明公开

KR1020120117484A 유도결합 플라즈마 처리장치 无效
标题翻译：电感耦合等离子体加工设备
公开(公告)号：KR1020120117484A
公开(公告)日：2012-10-24
申请号：KR1020110035265
申请日：2011-04-15
申请人： 주식회사 원익홀딩스
发明人： 조생현 , 이향주 , 김진홍
IPC分类号： H05H1/46 , H01L21/3065 , H01L21/205
CPC分类号： H01J37/3211 , H01J37/32513 , H01J37/32715 , H01Q1/366 , H05H1/46 , H05H2001/2412 , H05H2001/4667
摘要： PURPOSE: An inductively coupled plasma processing apparatus is provided to prevent damage to a dielectric by dispersing stress added to the dielectric. CONSTITUTION: A chamber body(110) has an opening formed on an upper portion. A dielectric(150) is installed in order to cover the opening of the chamber body. The dielectric includes one or more through holes(210). A substrate supporter(130) is installed to the chamber body in order to support a substrate(10). An antenna(160) is installed on an upper portion of the dielectric in order to form an induction field in a process space. A ceiling portion(170) is arranged on the upper portion of the chamber body. A plurality of dielectric supporting members(220) is inserted into a through hole(210) of the dielectric. The plurality of dielectric supporting members is combined with the ceiling portion in order to support the dielectric.
摘要翻译：目的：提供电感耦合等离子体处理装置，通过分散施加在电介质上的应力来防止电介质损坏。构成：室主体（110）具有形成在上部的开口。安装电介质（150）以覆盖室主体的开口。电介质包括一个或多个通孔（210）。衬底支撑件（130）安装到腔室主体以便支撑衬底（10）。在电介质的上部安装天线（160），以便在处理空间中形成感应场。在室主体的上部设置有顶部（170）。多个电介质支撑构件（220）插入电介质的通孔（210）中。多个电介质支撑构件与天花板部分结合以支撑电介质。

2. 发明公开

KR1020120048919A 유도결합 플라즈마 처리장치 无效
标题翻译：电感耦合等离子体加工设备
公开(公告)号：KR1020120048919A
公开(公告)日：2012-05-16
申请号：KR1020100110407
申请日：2010-11-08
申请人： 주식회사 원익홀딩스
发明人： 조생현 , 이향주 , 김진홍
IPC分类号： H01L21/205 , H01L21/3065
CPC分类号： H01J37/32119 , H01J37/3211
摘要： PURPOSE: An inductively coupled plasma processing apparatus is provided to reduce the manufacturing cost of an apparatus by reducing the thickness of a dielectric since a dielectric assembly forming a sealed process space along with a chamber body is formed into a dome structure. CONSTITUTION: A substrate support(130) is installed in a chamber body(110) and supports a substrate(10). A gas injector(150) spray gas to a process space(S). A dielectric assembly(200) forms a sealed process space along with the chamber body. A dielectric(210) is interposed between the process space and an antenna. One or more supporting frames(220) are installed to support the dielectric.
摘要翻译：目的：提供电感耦合等离子体处理装置，通过减小电介质的厚度来降低装置的制造成本，因为形成密封处理空间的介质组件与室主体一起形成为圆顶结构。构成：衬底支撑件（130）安装在室主体（110）中并支撑衬底（10）。气体喷射器（150）将气体喷射到处理空间（S）。电介质组件（200）与室主体一起形成密封的工艺空间。电介质（210）介于处理空间和天线之间。安装一个或多个支撑框架（220）以支撑电介质。

3. 发明公开

KR1020130009561A 동력 전달 장치 및 이를 포함하는 진공 설비 无效
标题翻译：功率转向装置和真空设备，包括它们
公开(公告)号：KR1020130009561A
公开(公告)日：2013-01-23
申请号：KR1020110121183
申请日：2011-11-18
申请人： 주식회사 원익홀딩스
发明人： 김진홍
IPC分类号： H01L21/02
CPC分类号： H01L21/02 , H01L21/67034 , H01L21/67098 , H01L21/67207
摘要： PURPOSE: A power transmitting device and vacuum equipment including the same are provided to minimize damage to a power transmitting device by preventing foreign materials from being inputted to a body member by a blocking member. CONSTITUTION: A body member(110) forms an outer shape of a power transmitting device(100). A rotating member(120) includes a base part(121) and a protrusion part(122). A bearing(130) supports the rotation of the rotating member. A vacuum maintaining member(140) prevents air from being inputted from the outside to a vacuum member. A blocking member(160) seals the exposed part of the bearing.
摘要翻译：目的：提供一种电力传输装置和包括该电力传输装置的真空设备，以通过防止异物通过阻挡构件输入到本体构件来最小化对电力传送装置的损坏。构成：身体构件（110）形成动力传递装置（100）的外形。旋转构件（120）包括基部（121）和突出部（122）。轴承（130）支撑旋转构件的旋转。真空保持构件（140）防止空气从外部输入到真空构件。阻挡构件（160）密封轴承的暴露部分。

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