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    • 6. 发明公开
    • 연마패드 및 그 제조방법
    • 抛光垫及其制造方法
    • KR1020130130893A
    • 2013-12-03
    • KR1020120054523
    • 2012-05-23
    • 케이피엑스케미칼 주식회사삼성전자주식회사
    • 안봉수장영준정진수이상목송기천김승근서장원추정선강학수공경표
    • B24D11/00B24D3/16
    • B24B37/24B24B37/26B24D11/001B24D11/003B24D18/00
    • The present invention relates to a polishing pad and a method of manufacturing the same. The polishing pad manufacturing method according to the present invention mixes polishing layer forming materials and solidifies the layer by a chemical reaction, comprising the following steps of: pulverizing organic materials in a physical method and forming the organic materials as fine organic particles; mixing the fine organic particles formed in the previous step with the polishing layer forming materials; forming vapor pores by mixing the mixture with at least one among an inert gas, which can control the size of the pores, a capsule type foaming agent, and a chemical foaming agent; manufacturing a polishing layer by gelatinizing and hardening the mixture generated through the previous steps; and distributing the pores by processing the polishing layer and opening the vapor pours on the surface.
    • 抛光垫及其制造方法技术领域本发明涉及抛光垫及其制造方法。 根据本发明的抛光垫制造方法将抛光层形成材料混合并通过化学反应固化该层,包括以下步骤:以物理方法粉碎有机材料并形成有机材料作为有机微粒; 将上一步形成的微细有机颗粒与抛光层形成材料混合; 通过将混合物与能够控制孔的大小的惰性气体,胶囊型发泡剂和化学发泡剂中的至少一种混合来形成蒸气孔; 通过使通过前述步骤产生的混合物凝胶化和硬化来制造抛光层; 并通过处理抛光层并在表面上打开蒸汽倾倒来分配孔。
    • 7. 发明公开
    • 화학적 기계적 연마장치
    • 化学机械抛光装置
    • KR1020100096459A
    • 2010-09-02
    • KR1020090015349
    • 2009-02-24
    • 삼성전자주식회사
    • 최재광정진수홍명기윤보언
    • H01L21/304
    • B24B37/26
    • PURPOSE: A chemical mechanical polishing device is provided to improve abrasion efficiency by forming a concave region into an ellipse shape. CONSTITUTION: A grinding pad comprises a plurality of concave regions(1430a, 1430b, 1430c). The concave regions are two-dimensionally arranged in the grinding pad. The concave regions towards a first direction have a first pitch. The concave regions towards a second direction have a second pitch which is the same as the first pitch. A plurality of grooves(1420) are formed in the grinding pad and divides the concave regions.
    • 目的:提供一种化学机械抛光装置,通过将凹区形成为椭圆形来提高磨损效率。 构成:研磨垫包括多个凹入区域(1430a,1430b,1430c)。 凹陷区域二维排列在研磨垫中。 朝向第一方向的凹入区域具有第一间距。 朝向第二方向的凹入区域具有与第一间距相同的第二间距。 在研磨垫中形成多个凹槽(1420),并分割凹部区域。
    • 8. 发明公开
    • 배향막 식각 장치
    • 蚀刻对准膜的装置
    • KR1020080056965A
    • 2008-06-24
    • KR1020060130209
    • 2006-12-19
    • 삼성전자주식회사
    • 노순준정진수전백균이희근
    • G02F1/1337
    • G02F1/13378G02F1/133734G02F2001/133792
    • An alignment film etching apparatus is provided to prevent an alignment film from deteriorating from a backlight unit or the circumference by using the inorganic alignment film. Power with high voltage is supplied to a power electrode(135). A nozzle(120) is interposed between the power electrode and a ground electrode(130) and discharges the plasma under the normal pressure for etching an alignment film on the substrate. A barrier(170) is formed at the end of the nozzle and encompasses the plasma under the normal pressure. The barrier is a cylindrical type. The diameter of the barrier is larger than that of the nozzle. The barrier is made of non-metal material. The barrier is also made of polymer or PTFE(Poly Tetra Fluoro Ethylene) or PEEK(Poly Ether Ether Kethone) and the like. A buffer driving member(180) fixes the barrier to the end of the nozzle and reciprocates the barrier toward the length direction of the nozzle. The alignment film is an inorganic alignment film including silicon.
    • 提供了一种取向膜蚀刻装置,以通过使用无机取向膜来防止取向膜从背光单元或周围劣化。 向电源电极(135)供给高电压的电力。 在电源电极和接地电极(130)之间插入喷嘴(120),并在常压下排出等离子体,以蚀刻基板上的取向膜。 在喷嘴的端部形成有阻挡层(170),并且在常压下包围等离子体。 屏障是圆柱形的。 屏障的直径大于喷嘴的直径。 屏障由非金属材料制成。 屏障还由聚合物或PTFE(聚四氟乙烯)或PEEK(聚醚醚酮)等制成。 缓冲驱动构件(180)将阻挡件固定到喷嘴的端部,并使阻挡件朝向喷嘴的长度方向往复运动。 取向膜是包含硅的无机取向膜。
    • 10. 发明公开
    • 박막액 토출 장치
    • 用于喷射薄膜液体的装置
    • KR1020080046763A
    • 2008-05-28
    • KR1020060116144
    • 2006-11-23
    • 삼성전자주식회사
    • 정진수전백균
    • B05C5/02G02F1/13G02F1/1337
    • B05C5/0225B05C11/1005G02F1/1337
    • An ejection device of a thin film liquid is provided to correct a discharge amount of a head unit by disposing head compensation units at the side parts of a head unit, and to minimize the installation space and cost of the head compensation units by placing the head compensation units within the ejection device. An ejection device(100) of a thin film liquid includes: a supply tank filled with a thin film liquid; a head unit(400) which is connected with the supply tank via a supply line, and has plural discharge heads capable of discharging the thin film liquid onto a substrate(20) through plural nozzles to form thin film; and head compensation devices(500) which are united with the supply line at the side parts of the head unit, and have a compensation head that corrects a discharge amount of the thin film liquid and is replaced with the discharge head.
    • 提供薄膜液体的喷射装置,通过在头单元的侧部设置头部补偿单元来校正头单元的排出量,并且通过将头部的头部放置头部来最小化头部补偿单元的安装空间和成本 排出装置内的补偿单元。 薄膜液体的喷射装置(100)包括:填充有薄膜液体的供给槽; 头单元(400),其通过供给线与供给箱连接,并且具有能够通过多个喷嘴将薄膜液体排出到基板(20)上的多个排出头,以形成薄膜; 以及头部补偿装置(500),其与头部单元的侧部处的供应线结合,并且具有校正薄膜液体的排出量并被排出头代替的补偿头。